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1. 发明专利

JP2011201786A 2-endo-6-exo-DIAMINOMETHYL-BICYCLO[2,2,1]HEPTANE AND METHOD FOR PRODUCING THE SAME 有权
标题翻译： 2-内-6-外 - 二氨基甲酰基 - 双丙基[2,2,1]庚烷及其制备方法
公开(公告)号：JP2011201786A
公开(公告)日：2011-10-13
申请号：JP2010068198
申请日：2010-03-24
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： URAGAMI TATSUNOBU , OKAZAKI MASAKI , FUKUKAWA KENICHI , ABE TAKATOSHI , YAMASHITA WATARU
IPC分类号： C07C211/19 , C07C209/52
CPC分类号： Y02P20/55
摘要： PROBLEM TO BE SOLVED: To provide highly pure 2-endo-6-exo-diaminomethyl-bicyclo[2,2,1]heptane, and a method for producing the same.SOLUTION: The 2-endo-6-exo-diaminomethyl-bicyclo[2,2,1]heptane represented by formula (IV) having purity of ≥95% when analyzed by gas chromatography is produced by: protecting amino groups in individual compounds included in an isomer mixture with protective groups; separating the isomers; and deprotecting the protective groups in the separated isomers.
摘要翻译：要解决的问题：提供高纯度的2-内-6-外 - 二氨基甲基 - 双环[2,2,1]庚烷及其制备方法。溶液：2-内-6-异 - 二氨基甲基 - 通过气相色谱法分析纯度≥95％的式（IV）表示的双环[2,2,1]庚烷是通过以下方法制备的：通过保护基保护包含在异构体混合物中的各个化合物中的氨基; 分离异构体; 并将分离的异构体中的保护基脱保护。

2. 发明专利

JP2008184499A Polyimide copolymer, positive type photosensitive resin composition and method for forming pattern 有权
标题翻译：聚酰胺共聚物，阳性型感光树脂组合物和形成图案的方法
公开(公告)号：JP2008184499A
公开(公告)日：2008-08-14
申请号：JP2007017340
申请日：2007-01-29
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： OKAZAKI MASAKI , ONISHI HITOSHI , YAMASHITA WATARU
IPC分类号： C08G73/10 , C08L79/08 , G03F7/004 , G03F7/039 , G03F7/32 , H05K3/28
摘要： PROBLEM TO BE SOLVED: To provide a new precursor of a polyimide copolymer, to provide the polyimide copolymer having excellent solder heat resistance and bent plate folding endurance representing folding endurance and to simultaneously provide a positive type photosensitive resin composition having pattern-forming properties of high resolution and developable with an aqueous solution of an alkali. SOLUTION: The positive type photosensitive resin composition comprises (A) the precursor of the polyimide copolymer having a specific repeating unit (hereinafter based on pts.wt.) and the following (B) to (D): (B) 2-5 pts.wt. of a photosensitizer generating an acid by irradiation of active rays, (C) 15-25 pts.wt. of a cross-linking agent represented by general formula (5) (not shown) and (D) 150-1,900 pts.wt. of an aprotic polar amide solvent represented by formula (2) (not shown). COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供聚酰亚胺共聚物的新前体，提供具有优异的耐焊锡性的聚酰亚胺共聚物和表现耐折性的弯曲板折叠耐久性，并且同时提供具有图案形成的正型感光性树脂组合物高分辨率的性质和用碱的水溶液显影。解决方案：正型感光性树脂组合物包含（A）具有特定重复单元的聚酰亚胺共聚物的前体（以下以重量计）和以下（B）〜（D）：（B）2 -5磅的光敏剂，通过活性光线的照射产生酸，（C）15-25重量份的由通式（5）（未示出）表示的交联剂和（D）150-1,900重量份。的由式（2）表示的非质子极性的酰胺溶剂（未显示）。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2014034590A Polyimide film and method for producing the same 有权
标题翻译：聚酰亚胺膜及其制造方法
公开(公告)号：JP2014034590A
公开(公告)日：2014-02-24
申请号：JP2012175013
申请日：2012-08-07
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： SAKATA YOSHIHIRO , FUKUKAWA KENICHI , OKAZAKI MASAKI , URAGAMI TATSUNOBU , MATSUDA TOSHINORI , ONO YOSUKE , YAMASHITA WATARU
IPC分类号： C08J5/18 , B29C41/12 , C08G73/10 , G02B5/20 , G02F1/1333 , H01L51/50 , H05B33/02
摘要： PROBLEM TO BE SOLVED: To provide a polyimide film and a method for producing the same, the film having high optical transparency and a small in-plane retardation.SOLUTION: A production method is provided for a polyimide film having overall light transmittance of 80% or more and an in-plane retardation of 10 nm or less. The method includes steps of: (a) applying a polyimide precursor-containing solution containing a polyimide precursor on a substrate; (b) heating a polyimide precursor film comprising the coating film of the polyimide precursor-containing solution until an imidization rate of the polyimide precursor reaches 90% or more and the residual amount of the solvent is reduced to 1 mass% or less; (c) peeling off the film obtained in step (b) from the substrate; and (d) heating the film obtained in step (c) again. In the step (d), a heating temperature of the film obtained in step (c) is controlled to be equal to or lower than the glass transition temperature of the polyimide.
摘要翻译：要解决的问题：为了提供一种聚酰亚胺膜及其制造方法，该膜具有高的光学透明度和小的面内延迟。解决方案：提供了一种制备方法，该聚酰亚胺膜的总透光率为80％以上，面内延迟为10nm以下。该方法包括以下步骤：（a）在基材上涂布含有聚酰亚胺前体的含聚酰亚胺前体溶液; （b）加热含有聚酰亚胺前体的溶液的涂膜的聚酰亚胺前体膜，直到聚酰亚胺前体的酰亚胺化率达到90％以上，溶剂的残留量为1质量％以下。（c）从基板剥离步骤（b）中获得的膜; 和（d）再次加热步骤（c）中获得的膜。在步骤（d）中，将步骤（c）中获得的膜的加热温度控制在等于或低于聚酰亚胺的玻璃化转变温度。

4. 发明专利

JP2012255985A Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element having the liquid crystal alignment film 有权
标题翻译：液晶晶体代理，液晶对准膜和液晶显示元件，液晶对准膜
公开(公告)号：JP2012255985A
公开(公告)日：2012-12-27
申请号：JP2011130091
申请日：2011-06-10
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： YAMASHITA WATARU , FUKUKAWA KENICHI , OKAZAKI MASAKI , SAKATA YOSHIHIRO , URAGAMI TATSUNOBU
IPC分类号： G02F1/1337 , C08G73/10
摘要： PROBLEM TO BE SOLVED: To provide a liquid crystal alignment film extremely excellent in aligning property for a liquid crystal cell, an appearance of the liquid crystal cell and transparency, and achieving both of a low coefficient of thermal expansion and cost reduction, and to provide a liquid crystal aligning agent capable of achieving the above excellent effects.SOLUTION: The liquid crystal aligning agent comprises a block polyamide acid imide, which includes a block comprising a repeating structural unit represented by specified formula (1A) and a block comprising a repeating structural unit represented by specified formula (1B). The liquid crystal alignment film is formed of a block polyimide including a block comprising a repeating structural unit represented by specified formula (2A) and a block comprising a repeating structural unit represented by specified formula (1B).
摘要翻译：要解决的问题为了提供一种液晶单元的取向性能极好的液晶单元的外观和透明性，同时实现低的热膨胀系数和成本降低两者的液晶取向膜，并提供能够实现上述优异效果的液晶取向剂。解决方案：液晶取向剂包括嵌段聚酰胺酰亚胺，其包括包含由特定式（1A）表示的重复结构单元的嵌段和包含由指定式（1B）表示的重复结构单元的嵌段。液晶取向膜由包括由特定式（2A）表示的重复结构单元的嵌段和包含由特定式（1B）表示的重复结构单元的嵌段组成的嵌段聚酰亚胺形成。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2011201952A Polyimide, process for producing the same, polyamic acid and process for producing the same 有权
标题翻译：聚酰亚胺，其制造方法，聚氨酯及其制造方法
公开(公告)号：JP2011201952A
公开(公告)日：2011-10-13
申请号：JP2010068200
申请日：2010-03-24
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： URAGAMI TATSUNOBU , OKAZAKI MASAKI , FUKUKAWA KENICHI , YAMASHITA WATARU
IPC分类号： C08G73/10
摘要： PROBLEM TO BE SOLVED: To provide a polyimide which has a high degree of polymerization and can form a film or sheet excellent in heat resistance, optical properties, and folding endurance and exhibiting good elongation.SOLUTION: The polyimide has a repeating unit represented by formula (1A) (wherein R is a tetravalent organic group). The repeating unit represented by formula (1A) contains not less than 95 mol% repeating unit represented by formula (2A) (wherein R is a tetravalent organic group) or not less than 95 mol% repeating unit represented by formula (3A) (wherein R is a tetravalent organic group).
摘要翻译：要解决的问题：提供一种具有高聚合度的聚酰亚胺，并且可以形成耐热性，光学性能和折叠耐久性优异的伸长率的薄膜或片材。溶液：聚酰亚胺具有由式（1A）（其中R是四价有机基团）。由式（1A）表示的重复单元含有不低于95摩尔％的由式（2A）表示的重复单元（其中R是四价有机基团）或不低于95摩尔％的由式（3A）表示的重复单元（其中 R是四价有机基团）。

6. 发明专利

JP2011201787A 2,5-diaminomethyl-bicyclo[2,2,1]heptane and method for producing the same 有权
标题翻译： 2,5-DIAMINOMETHYL-BICYCLO [2,2,1] HEPTANE AND METHOD FOR PRODUCE THE SAME
公开(公告)号：JP2011201787A
公开(公告)日：2011-10-13
申请号：JP2010068199
申请日：2010-03-24
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： URAGAMI TATSUNOBU , OKAZAKI MASAKI , FUKUKAWA KENICHI , YAMASHITA WATARU
IPC分类号： C07C211/19 , C07B51/00 , C07C209/86
CPC分类号： Y02P20/55
摘要： PROBLEM TO BE SOLVED: To provide highly pure 2,5-diaminomethyl-bicyclo[2,2,1]heptane substantially free of isomers, and a method for producing the same.SOLUTION: The 2,5-diaminomethyl-bicyclo[2,2,1]heptane represented by formula (I) or (II) having purity of ≥95% when analyzed by gas chromatography is produced by: protecting amino groups in individual compounds included in an isomer mixture with protective groups; separating the isomers; and deprotecting the protective groups in the separated isomers.
摘要翻译：要解决的问题：提供基本上不含异构体的高纯度2,5-二氨基甲基 - 双环[2,2,1]庚烷及其制备方法。溶液：2,5-二氨基甲基 - 双环[ 通过气相色谱法分析纯度≥95％的由式（I）或（II）表示的2,1]庚烷是通过以下方法制备的：通过保护基保护包含在异构体混合物中的各个化合物中的氨基; 分离异构体; 并将分离的异构体中的保护基脱保护。

7. 发明专利

JP2010169944A Negative photosensitive resin composition, method of forming negative pattern using the same, circuit board material, and coverlay for circuit board 审中-公开
标题翻译：负性感光树脂组合物，使用其的负面图案的形成方法，电路板材料和电路板的覆盖
公开(公告)号：JP2010169944A
公开(公告)日：2010-08-05
申请号：JP2009013048
申请日：2009-01-23
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： OKAZAKI MASAKI , YAMASHITA WATARU
IPC分类号： G03F7/038 , C08G73/10 , G03F7/004 , G03F7/32 , G03F7/40 , H01L21/027 , H05K3/28
摘要： PROBLEM TO BE SOLVED: To provide a negative photosensitive resin composition which has high developability because a polyimide precursor cures efficiently even in the presence of a small amount of a photoacid generator, and whose cured product has satisfactory folding resistance suitable for a coverlay or the like.
SOLUTION: The negative photosensitive resin composition contains: (A) a block copolymer having an amic acid block and an oxyalkylene bond-containing imide block; (B) a cross-linking agent comprising a methylol compound and/or a melamine compound; (C) a photoacid generator which generates an acid under actinic rays having a wavelength of ≥350 nm; and (D) a polar solvent which dissolves the block copolymer, the cross-linking agent and the photoacid generator.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决问题：提供一种具有高显影性的负型感光性树脂组合物，因为聚酰亚胺前体即使在少量的光酸产生剂的存在下也能有效地固化，并且其固化产物具有适合于覆盖层的令人满意的折叠阻力或类似物。解决方案：负型感光性树脂组合物含有：（A）具有酰胺酸嵌段和含氧化烯键的酰亚胺嵌段的嵌段共聚物; （B）包含羟甲基化合物和/或三聚氰胺化合物的交联剂; （C）光生酸剂，其在波长≥350nm的光化射线下产生酸; 和（D）溶解嵌段共聚物，交联剂和光酸产生剂的极性溶剂。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2008063298A Imide oligomer and method for producing the same 审中-公开
标题翻译：其它低分子及其制备方法
公开(公告)号：JP2008063298A
公开(公告)日：2008-03-21
申请号：JP2006244947
申请日：2006-09-11
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： TORIIDA MASAHIRO , SAKATA YOSHIHIRO , OKAZAKI MASAKI , ONISHI HITOSHI , YAMASHITA WATARU
IPC分类号： C07D403/14 , C07D487/04 , C08G73/10
摘要： PROBLEM TO BE SOLVED: To provide a new imide oligomer having high heat resistance and being hardly volatilized even when the imide oligomer is heated singly or in the state of a mixture with a polyamic acid, a polyimide, an organic solvent or the like; and to provide a method for producing the imide oligomer.
SOLUTION: The imide oligomer is represented by general formula (1). For example, oxydiphthalic dianhydride and pyromellitic dianhydride as a tetracarboxylic acid, maleic anhydride and nadic anhydride as a dicarboxylic acid, and 1,3-bis(3-aminophenoxy)benzene or the like as a diamine are used as starting materials for the production.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：即使当酰亚胺低聚物单独加热或与聚酰胺酸，聚酰亚胺，有机溶剂或混合物的混合物的状态下，提供具有高耐热性并且几乎不挥发的新型酰亚胺低聚物喜欢; 并提供了制备酰亚胺低聚物的方法。解决方案：酰亚胺低聚物由通式（1）表示。例如，作为四羧酸的氧联二邻苯二甲酸二酐和均苯四酸二酐，作为二羧酸的马来酸酐和纳迪克酸酐以及作为二胺的1,3-双（3-氨基苯氧基）苯等用作生产的原料。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2007031511A Polybenzoxazole, its positive type photosensitive resin composition and pattern-forming method 审中-公开
标题翻译：聚苯并噻唑，其阳离子型感光树脂组合物和图案形成方法
公开(公告)号：JP2007031511A
公开(公告)日：2007-02-08
申请号：JP2005214523
申请日：2005-07-25
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： OKAZAKI MASAKI , KIDA JOTARO , GOTO KENICHI
IPC分类号： C08G73/22 , G03F7/004 , G03F7/037 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a polybenzoxazole having excellent heat resistance and low dielectric characteristics, a polybenzoxazole precursor capable of forming a high resolving degree positive type pattern developable with an alkali aqueous solution when used as a photosensitive resin composition, a positive type photosensitive resin composition containing the same, and a pattern-forming method using the composition.
SOLUTION: The polybenzoxazole precursor has a specific structure having a spiroindan skeleton and a phenyldiisopropylidene skeleton (bisphenol P type). The polybenzoxazole is obtained therefrom. The photosensitive resin composition comprises the polybenzoxazole precursor and a sensitizer or the polybenzoxazole precursor, a sensitizer, and a crosslinking agent.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题为了提供具有优异的耐热性和低介电特性的聚苯并恶唑，当用作感光性树脂组合物时，可以形成可用碱性水溶液显影的高分辨度正型图案的聚苯并恶唑前体，阳性含有它们的感光性树脂组合物和使用该组合物的图案形成方法。解决方案：聚苯并恶唑前体具有螺螺旦骨架和苯基二异丙叉骨架（双酚P型）的具体结构。得到聚苯并恶唑。感光性树脂组合物包含聚苯并恶唑前体和敏化剂或聚苯并恶唑前体，敏化剂和交联剂。版权所有（C）2007，JPO＆INPIT

10. 发明专利

JP2005213393A Polyether ketone resin and use of the same 审中-公开
标题翻译：聚醚酮树脂及其使用
公开(公告)号：JP2005213393A
公开(公告)日：2005-08-11
申请号：JP2004022526
申请日：2004-01-30
申请人： Mitsui Chemicals Inc , 三井化学株式会社
发明人： OKAZAKI MASAKI , GOTO KENICHI , TAMAI MASAJI
IPC分类号： C08G65/40
摘要： PROBLEM TO BE SOLVED: To provide a polyether ketone resin that has an excellent heat resistance, low dielectric constant and low dielectric dissipation factor and can be used as an insulating film material for a wiring board corresponding to transmission of a high frequency signal.
SOLUTION: The polyether ketone resin comprises a main chain having a repeated polyether ketone structure represented by general formula (1), wherein n is an integer of 1-3, R
1 -R
10 are each independently a hydrogen atom, hydrocarbon group of 1-8C, halogen atom, phenyl group and 1-4C alkoxyl group, R
11 -R
18 are each independently any of a hydrogen atom, 1-8C hydrocarbon group or halogen atom.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决的问题：提供一种具有优异的耐热性，低介电常数和低介电损耗因数的聚醚酮树脂，并且可以用作对应于高频信号传输的布线板的绝缘膜材料。聚醚酮树脂包括具有由通式（1）表示的重复聚醚酮结构的主链，其中n是1-3的整数，R SB = -R SB > 10 各自独立地为氢原子，1-8C的烃基，卤素原子，苯基和1-4C烷氧基，R SB为-S SB 18 >各自独立地为氢原子，1-8C烃基或卤素原子。版权所有（C）2005，JPO＆NCIPI

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