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    • 3. 发明专利
    • Polybenzoxazole, its positive type photosensitive resin composition and pattern-forming method
    • 聚苯并噻唑,其阳离子型感光树脂组合物和图案形成方法
    • JP2007031511A
    • 2007-02-08
    • JP2005214523
    • 2005-07-25
    • Mitsui Chemicals Inc三井化学株式会社
    • OKAZAKI MASAKIKIDA JOTAROGOTO KENICHI
    • C08G73/22G03F7/004G03F7/037H01L21/027
    • PROBLEM TO BE SOLVED: To provide a polybenzoxazole having excellent heat resistance and low dielectric characteristics, a polybenzoxazole precursor capable of forming a high resolving degree positive type pattern developable with an alkali aqueous solution when used as a photosensitive resin composition, a positive type photosensitive resin composition containing the same, and a pattern-forming method using the composition.
      SOLUTION: The polybenzoxazole precursor has a specific structure having a spiroindan skeleton and a phenyldiisopropylidene skeleton (bisphenol P type). The polybenzoxazole is obtained therefrom. The photosensitive resin composition comprises the polybenzoxazole precursor and a sensitizer or the polybenzoxazole precursor, a sensitizer, and a crosslinking agent.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题为了提供具有优异的耐热性和低介电特性的聚苯并恶唑,当用作感光性树脂组合物时,可以形成可用碱性水溶液显影的高分辨度正型图案的聚苯并恶唑前体,阳性 含有它们的感光性树脂组合物和使用该组合物的图案形成方法。 解决方案:聚苯并恶唑前体具有螺螺旦骨架和苯基二异丙叉骨架(双酚P型)的具体结构。 得到聚苯并恶唑。 感光性树脂组合物包含聚苯并恶唑前体和敏化剂或聚苯并恶唑前体,敏化剂和交联剂。 版权所有(C)2007,JPO&INPIT
    • 4. 发明专利
    • Positive photosensitive resin composition and positive pattern forming method
    • 正性感光树脂组合物和正型图案形成方法
    • JP2006098426A
    • 2006-04-13
    • JP2004280826
    • 2004-09-28
    • Mitsui Chemicals Inc三井化学株式会社
    • TAKEDA KOJIKIDA JOTAROGOTO KENICHITAMAI MASAJI
    • G03F7/039C08G73/10G03F7/004G03F7/037G03F7/38H01L21/027
    • PROBLEM TO BE SOLVED: To provide a photosensitive resin composition comprising a polyimide precursor which can be developed with an alkaline aqueous solution and has positive pattern forming ability, and to provide a new positive pattern forming method. SOLUTION: The positive photosensitive resin composition comprises (A) the polyimide precursor, (B) an epoxy group-containing compound and (C) a photosensitizing agent as essential components. In the positive pattern forming method, the positive photosensitive resin composition is coated on a substrate, dried, exposed and heated, only an exposed portion in which an acid is generated from the component (C) is dissolved in an alkaline aqueous solution to develop a positive pattern, and this positive pattern is subjected to imidization heat treatment. COPYRIGHT: (C)2006,JPO&NCIPI
    • 解决的问题:提供一种包含可用碱性水溶液显影并具有正图案形成能力的聚酰亚胺前体的感光性树脂组合物,并提供新的正型图案形成方法。 解决方案:正型感光性树脂组合物包含(A)聚酰亚胺前体,(B)含环氧基的化合物和(C)光敏剂作为必需成分。 在正型图案形成方法中,将正型感光性树脂组合物涂布在基板上,干燥,曝光和加热,仅将由(C)成分产生酸的露出部分溶解在碱性水溶液中,形成 阳性图案,并且该阳性图案进行酰亚胺化热处理。 版权所有(C)2006,JPO&NCIPI
    • 8. 发明专利
    • THERMAL RECORDING MATERIAL
    • JP2002321460A
    • 2002-11-05
    • JP2001126023
    • 2001-04-24
    • MITSUI CHEMICALS INC
    • KIDA JOTAROTAKIZAWA NOBUHIRO
    • B41M5/333B41M5/26B41M5/30B41M5/337
    • PROBLEM TO BE SOLVED: To provide a thermal recording material with outstanding texture shelf stability. SOLUTION: The thermal recording material has a thermal recording layer containing an electron-donative color developing compound and an electron- receptive compound, formed on a support and further, an undercoat layer formed between a support and the thermal recording layer. This material contains at least one kind of chemical compound selected from the group consisting of chemical compounds represented by formula (1) as the electron-receptive compound and the undercoat layer contains at least one kind of pigment with a pH value of 3 to 8 in a 5% water suspension. (In the formula, R1 to R5 are each a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group or an aryl group; R6 is a hydrogen atom or an alkyl group; R7 is a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group or a hydroxyl group. Further, mutually adjacent groups selected from R1 and R2 and R2 and R3 may bond each other and form a carbon cyclic aromatic ring with a substituted carbon atom).