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1. 发明专利

JP2007251083A Electrostatic attraction device for glass substrate and attraction secession method therefor 有权
标题翻译：用于玻璃基板的静电吸引装置及其吸收部分方法
公开(公告)号：JP2007251083A
公开(公告)日：2007-09-27
申请号：JP2006076033
申请日：2006-03-20
申请人： Mitsubishi Heavy Ind Ltd , 三菱重工業株式会社
发明人： KATO MITSUO , HORIE SHIGENARI , AOI TATSUFUMI , KAWANO MASAKI , TSUMOTO YOSHIKIMI , OGASAWARA HIROAKI , KOBAYASHI TOSHIRO
IPC分类号： H01L21/683 , H02N13/00
CPC分类号： B65G49/061 , H01L21/6831 , H02N13/00
摘要： PROBLEM TO BE SOLVED: To provide an electrostatic attraction device for a glass substrate that can surely attract and quickly secede and its attraction secession method. SOLUTION: Based on a physical characteristic of a glass substrate, attractive power for attracting a glass substrate is searched, attraction voltage V c (t) needed to obtain the attractive power is searched, and hold voltage V h (t) for holding the attraction status and secession voltage V r (t) for seceding the glass substrate are searched (S1 to S7). An actual attraction measurement time t c is measured, and when it differs from a predetermined attraction time t 1 , a hold voltage V h (t) and a secession voltage V r (t) are recalculated based on the actual attraction measurement time t c (S8 to S11). COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够可靠地吸引并快速分离的玻璃基板的静电吸引装置及其吸引分离方法。解决方案：基于玻璃基板的物理特性，搜索吸引玻璃基板的吸引力，搜索获得吸引力所需的吸引电压V SB（t），并保持搜索用于保持用于分离玻璃基板的吸引状态和分离电压V SB SB（t）的电压V h（SB）（S1〜S7）。测量实际吸引测量时间t c ，并且当其与预定吸引时间t 1 不同时，保持电压V ）和分离电压V SB SB（t）基于实际吸引测量时间t SB SB（S8至S11）重新计算。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2008112902A Supporting method and supporting structure of substrate 审中-公开
标题翻译：支撑方法和支撑基底结构
公开(公告)号：JP2008112902A
公开(公告)日：2008-05-15
申请号：JP2006295772
申请日：2006-10-31
申请人： Mitsubishi Heavy Ind Ltd , 三菱重工業株式会社
发明人： HORIE SHIGENARI , KAWANO MASAKI , TSUMOTO YOSHIKIMI , OIZUMI MITSUNORI
IPC分类号： H01L21/683 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a supporting method and a supporting structure of a substrate in which high-precision positioning is ensured by reducing warpage of a glass substrate when the periphery of the glass substrate is supported from below. SOLUTION: One supporting pin 4a is arranged on each short side 3a of a rectangular glass substrate 3 while two supporting pins 4b are arranged on each long side 3b of the rectangular glass substrate 3. The supporting structure is constituted by using in total six supporting pins 4a and 4b and arranging the support pins 4a and 4b on the periphery of the glass substrate 3 while avoiding four corners thereof thus supporting the glass substrate 3 from below. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种基板的支撑方法和支撑结构，其中当从下方支撑玻璃基板的周边时，通过减小玻璃基板的翘曲来确保高精度定位。解决方案：一个支撑销4a布置在矩形玻璃基板3的每个短边3a上，而两个支撑销4b布置在矩形玻璃基板3的每个长边3b上。支撑结构总体上使用六个支撑销4a和4b，并且将支撑销4a和4b布置在玻璃基板3的周边上，同时避免其四个角部，从而从下方支撑玻璃基板3。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2004095677A Substrate treatment device 审中-公开
标题翻译：基板处理装置
公开(公告)号：JP2004095677A
公开(公告)日：2004-03-25
申请号：JP2002251909
申请日：2002-08-29
申请人： Mitsubishi Heavy Ind Ltd , 三菱重工業株式会社
发明人： KOBAYASHI TOSHIRO , HIRAI ETSURO , WADA TETSUYOSHI , KAMIKAWA SUSUMU , YOSHITAKE TAKASHI , TSUMOTO YOSHIKIMI
IPC分类号： C23C14/56 , C23C16/54 , H01L21/205
摘要： PROBLEM TO BE SOLVED: To provide a substrate treatment device capable of preventing a substrate having flexibility from being deflected in the widthwise direction of the substrate, preventing the infiltration of gas from adjacent treatment rooms, and continuously performing a plurality of different treatment.
SOLUTION: The substrate treatment device 1 provided with at least a delivering roll 3 for delivering a substrate having flexibility to treatment rooms 6, 7, the treatment rooms 6, 7 for treating the surface of the delivered substrate 20, and a rewinding roll 5 for rewinding the treated substrate 20, is provided also with a passing roll 4 for allowing the substrate 20 to abut on its side face 4a, and allowing the substrate 20 to pass through the treatment rooms 6, 7, and differential exhaust rooms 8-10 arranged adjacently to the treatment rooms 6, 7 arranged in the peripheral direction of the passing roll 4 to exhaust gas from the differential exhaust rooms 8-10. Consequently the infiltration of gas into the adjacent treatment rooms 7, 6 can be prevented and a plurality of different treatment can be continuously performed.
COPYRIGHT: (C)2004,JPO
摘要翻译：解决的问题：提供一种能够防止具有挠性的基板在基板的宽度方向上偏转的基板处理装置，防止来自相邻处理室的气体的渗透，并且连续进行多种不同的处理。解决方案：至少设置有用于将具有柔性的基板输送到治疗室6,7，用于处理输送的基板20的表面的处理室6,7的基板处理装置1和倒带用于重新卷绕经处理的基板20的辊5还设置有用于允许基板20邻接其侧面4a的通过辊4，并且允许基板20通过处理室6,7和差动排气室8 10，其布置在经过辊4的圆周方向上的处理室6,7中，排出来自差动排气室8-10的废气。因此，可以防止气体渗透到相邻的处理室6,7中，并且可以连续地进行多种不同的处理。版权所有（C）2004，JPO

4. 发明专利

JP2008112901A Positioning method and device of substrate, carrier device and process device 有权
标题翻译：基板，载体装置和工艺装置的定位方法和装置
公开(公告)号：JP2008112901A
公开(公告)日：2008-05-15
申请号：JP2006295771
申请日：2006-10-31
申请人： Mitsubishi Heavy Ind Ltd , 三菱重工業株式会社
发明人： HORIE SHIGENARI , KAWANO MASAKI , TSUMOTO YOSHIKIMI , OIZUMI MITSUNORI
IPC分类号： H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a positioning method and a positioning device of substrate in which positional precision is enhanced by taking account of warpage or deformation of a glass substrate itself, and to provide a carrier device and a process device. SOLUTION: After a load or torque equal to the maximum static frictional force of a glass substrate 3 is imparted by pressing plates 10 and 13 to the glass substrate 3 side, the glass substrate 3 is pressed against reference surface plates 6 and 8. A judgment is made that positioning of the glass substrate 3 is completed at a moment when the load or torque imparted by the pressing plates 10 and 13 to the glass substrate 3 exceeds dynamic frictional force of the glass substrate 3. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过考虑玻璃基板本身的翘曲或变形来提高位置精度的基板的定位方法和定位装置，并提供载体装置和处理装置。解决方案：在通过将板10和13按压玻璃基板3侧赋予与玻璃基板3的最大静摩擦力相等的载荷或力矩后，将玻璃基板3压在基准面板6,8上判定玻璃基板3的定位是在由加压板10,13施加到玻璃基板3上的载荷或扭矩超过玻璃基板3的动态摩擦力的时刻完成的。（C）2008，JPO＆INPIT

5. 发明专利

JP2010189739A Evaporator 审中-公开
标题翻译：蒸发器
公开(公告)号：JP2010189739A
公开(公告)日：2010-09-02
申请号：JP2009037302
申请日：2009-02-20
申请人： Mitsubishi Heavy Ind Ltd , 三菱重工業株式会社
发明人： KOBAYASHI TOSHIRO , KAWANO MASAKI , TSUMOTO YOSHIKIMI , HIRANO TATSUYA , SHIGEOKA NOBUYUKI
IPC分类号： C23C14/24 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide an evaporator whose maintenance can be easily performed.
SOLUTION: The evaporator 100 is provided with: a hopper 114 storing an evaporation material 1; a first connection tube 112 having a connection opening part 112a conically opened in such a manner that the inner diameter is expanded as it goes to the upper side, on the upper side; a communication tube 113 connecting the lower side of the first connection tube 112 and the hopper 114; a second connection tube 115 having a connection opening part 115a formed into a conical shape in such a manner that the outer diameter is made narrow as it goes to the lower side, and attachably/detachably fitted to the connection opening part 112a of the first connection tube 112, on the lower side; a crucible 116 connected to the upper edge side of the second connection tube 115; an electric heater 118 heating the crucible 116; a cooling jacket 120 surrounding the electric heater 118 together with the crucible 116; a cooling coil 121 cooling the connection opening part 112a of the first connection tube 112; and a screw shaft 122 arranged rotatably within the connection tubes 112, 115.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供可以容易地进行维护的蒸发器。蒸发器100设置有：储存蒸发材料1的料斗114; 第一连接管112，其具有连接开口部112a，该连接开口部112a以内径在上侧朝向上侧膨胀的方式圆锥形地开口; 连接第一连接管112的下侧和料斗114的连通管113; 第二连接管115具有形成为圆锥形状的连接开口部115a，使得外径在下侧变窄时，可拆卸地装配到第一连接件的连接开口部112a 管112，位于下侧; 连接到第二连接管115的上边缘侧的坩埚116; 加热坩埚116的电加热器118; 与坩埚116一起包围电加热器118的冷却套120; 冷却第一连接管112的连接开口部112a的冷却线圈121; 以及可旋转地布置在连接管112,115内的螺杆轴122.版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2008102062A Method and device for inspecting substrate, and inline deposition system with the same 审中-公开
标题翻译：用于检查基板的方法和装置，以及用于其的在线沉积系统
公开(公告)号：JP2008102062A
公开(公告)日：2008-05-01
申请号：JP2006285893
申请日：2006-10-20
申请人： Mitsubishi Heavy Ind Ltd , 三菱重工業株式会社
发明人： KOBAYASHI TOSHIRO , SATO KEIICHI , OGASAWARA HIROAKI , TSUMOTO YOSHIKIMI , YANAGI YUJI
IPC分类号： G01N3/30
摘要： PROBLEM TO BE SOLVED: To provide a method and a device for previously inspecting substrates that inspect the substrates for which a possibility exists resulting in breakage to remove them, and to provide an inline deposition system equipped with them. SOLUTION: A glass substrate 6 is heated by a heating heater 7 under the same conditions as the heating conditions in a process that is performed after inspection; the edges of or the whole surface of the heated glass substrate 6 is inspected by break sensors 8, 9 to detect breakage and damage of the glass substrate 6; and a glass substrate 6 with the breakage greater than a predetermined size which has a possibility of resulting in damage and a glass substrate 6 that is damaged are removed. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于预先检查基板的方法和装置，该基板检查可能存在的基板，导致断裂以去除它们，并提供配备有它们的在线沉积系统。解决方案：玻璃基板6在与检查后进行的加工条件相同的条件下由加热加热器7加热; 加热的玻璃基板6的边缘或整个表面被断裂传感器8,9检查，以检测玻璃基板6的断裂和损坏; 以及具有大于预定尺寸的断裂的玻璃基板6，其具有导致损坏的可能性，并且去除了损坏的玻璃基板6。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2008101254A Vapor deposition apparatus and vapor deposition method 有权
标题翻译：蒸气沉积装置和蒸气沉积方法
公开(公告)号：JP2008101254A
公开(公告)日：2008-05-01
申请号：JP2006285892
申请日：2006-10-20
申请人： Mitsubishi Heavy Ind Ltd , 三菱重工業株式会社
发明人： KOBAYASHI TOSHIRO , SATO KEIICHI , OGASAWARA HIROAKI , TSUMOTO YOSHIKIMI , YANAGI YUJI
IPC分类号： C23C14/50 , C23C14/24
摘要： PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which prevents the cracking and damage of the glass substrate by reducing a temperature difference among positions within the plane of a glass substrate, and to provide a vapor deposition method.
SOLUTION: When mounting a glass substrate 4 on a holder 60 which holds a mask member for masking a face to be vapor-deposited of the glass substrate 4 and has a framing member for mounting a peripheral area of the glass substrate 4 thereon; transporting the holder 60 having the glass substrate 4 mounted thereon with a transportation belt 3; and vapor-depositing the surface to be vapor-deposited of the glass substrate 4 with a vapor deposition material through the mask member while supplying the vapor of the vapor deposition material in an evaporation source 55 to the surface to be vapor-deposited of the transported glass substrate 4, in a direction perpendicular to a transportation direction of the glass substrate 4 from a long opening 57 and transporting the glass substrate 4, this vapor deposition method includes heating both ends in the direction perpendicular to the direction of transportation of the glass substrate 4 on the surface opposite to the surface to be vapor-deposited of the glass substrate 4, with a heater 7.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过降低玻璃基板的平面内的位置之间的温度差来防止玻璃基板的破裂和损坏的蒸镀装置，并提供气相沉积方法。解决方案：将玻璃基板4安装在保持玻璃基板4的用于掩蔽要蒸镀的面的掩模构件的保持器60上，并且具有用于将玻璃基板4的周边区域安装在其上的框架构件 ; 运送具有安装在其上的玻璃基板4的保持器60与输送带3; 并且通过掩模构件将气相沉积材料蒸镀玻璃基板4的表面，同时将蒸发源55中的气相沉积材料的蒸汽供应到所运送的蒸汽沉积表面玻璃基板4，从长孔57沿着与玻璃基板4的输送方向垂直的方向，输送玻璃基板4，该蒸镀法包括在垂直于玻璃基板的输送方向的两端加热 4，在与玻璃基板4蒸镀的表面相反的表面上，加热器7。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2007227822A Organic semiconductor manufacturing method, and apparatus therefor 有权
标题翻译：有机半导体制造方法及其设备
公开(公告)号：JP2007227822A
公开(公告)日：2007-09-06
申请号：JP2006049558
申请日：2006-02-27
申请人： Junji Kido , Mitsubishi Heavy Ind Ltd , 三菱重工業株式会社 , 淳二城戸
发明人： TSUMOTO YOSHIKIMI , OGASAWARA HIROAKI , KOBAYASHI TOSHIRO , SATO KEIICHI , KIDO JUNJI
IPC分类号： H01L21/363 , C23C14/56 , H01L51/50 , H05B33/10
CPC分类号： H01L2227/323
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for efficiently continuously producing an organic semiconductor having a plurality of stages of organic layers without line stop, even when any fault occurs in a part, and for manufacturing the organic semiconductors over the arbitrary number of stages. SOLUTION: A method for manufacturing an organic EL panel having a plurality of stages of organic layers has disposing evaporative deposition treatment lines in parallel, comprising a charge generating layer evaporative deposition chamber 1, a hole injection layer evaporative deposition chamber 2, a hole transportation layer evaporative deposition chamber 3, a light emission layer evaporative deposition chamber 4, an electron injection layer evaporative deposition chamber 5, and an AL evaporative deposition chamber 6. A film of organic layer unit in the first stage is formed of a plurality of layers on a substrate while conveying the substrate from an entrance of one of the evaporative deposition treatment lines to its exit. Thereafter, the substrate is carried out from the exit of the one evaporative deposition treatment line through bypass lines 8, 9, to transfer the substrate into an entrance of another line among the evaporative deposition treatment lines disposed in parallel. Further, of the film organic layer in the second stage is formed of a plurality of layers on the substrate while conveying the substrate from the entrance of the other evaporative deposition treatment line to its exit. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：即使在零件中发生任何故障并且用于制造有机半导体的有机半导体的有机半导体的有机半导体的有机半导体的有效半导体的制造方法和装置，任意数量的阶段。解决方案：一种具有多层有机层的有机EL面板的制造方法，其特征在于，并列设置有蒸发沉积处理线，包括电荷产生层蒸发淀积室1，空穴注入层蒸发淀积室2，空穴输送层蒸发沉积室3，发光层蒸发沉积室4，电子注入层蒸发沉积室5和AL蒸发沉积室6.第一级中的有机层单元的膜由多个在将衬底从蒸发沉积处理线之一的入口输送到其出口的同时在衬底上的层。此后，通过旁路管线8,9从一个蒸发沉积处理生产线的出口进行基板，以将基板转移到平行布置的蒸发沉积处理线中的另一条管线的入口。此外，第二阶段的有机薄膜在基板上由多层形成，同时将基板从另一蒸发沉积处理线的入口输送到其出口。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2007176668A Roller carrying device 有权
标题翻译：滚筒携带装置
公开(公告)号：JP2007176668A
公开(公告)日：2007-07-12
申请号：JP2005378728
申请日：2005-12-28
申请人： Mitsubishi Heavy Ind Ltd , 三菱重工業株式会社
发明人： TSUMOTO YOSHIKIMI , MURAOKA SHINZO
IPC分类号： B65G49/00 , B65G13/06 , B65G39/09 , B65G39/12 , F16C33/32 , F16C33/44 , F16C33/62 , F16C33/66
CPC分类号： F16C33/445
摘要： PROBLEM TO BE SOLVED: To provide a roller carrying device capable of maintaining the inside of a vacuum vessel or the inside of a clean room in a dust extremely-reduced clean state.
SOLUTION: This roller carrying device 10 is arranged on one side or both sides of a carrying passage 16 formed in the vacuum vessel or the clean room, and carries a carrying object along the carrying passage 16. A driving source 11 is arranged outside a partition wall 17 forming the vacuum vessel or the clean room. A driving shaft 13 and a driven shaft 14 are arranged inside the partition wall 17. Rolling bearings 23 and 26 are arranged in a part for transmitting rotation of the driving shaft 13 driven by the driving source 11 to the driven shaft 14 and a part for bearing and supporting a shaft part 21 of the driven shaft 14.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够将真空容器内部或洁净室内部保持在非常清洁的尘埃的清洁状态下的滚筒承载装置。解决方案：该滚筒承载装置10布置在形成在真空容器或洁净室中的输送通道16的一侧或两侧，并沿着输送通道16携带携带物体。驱动源11布置在形成真空容器或洁净室的分隔壁17的外部。驱动轴13和从动轴14配置在分隔壁17的内部。滚动轴承23,26配置成将由驱动源11驱动的驱动轴13的旋转传递到从动轴14的部分，轴承和支撑从动轴14的轴部21。版权所有（C）2007，JPO＆INPIT

10. 发明专利

JPH06330360A EQUIPMENT FOR WASHING TREATMENT OF STRIP 失效
公开(公告)号：JPH06330360A
公开(公告)日：1994-11-29
申请号：JP11562293
申请日：1993-05-18
申请人： MITSUBISHI HEAVY IND LTD
发明人： FURUYA TAKUMI , TSUMOTO YOSHIKIMI , HASHIMOTO RITSUO , HIRAI ETSURO , TANIZAKI KEIJI
IPC分类号： C23G3/00 , C23G3/02
摘要： PURPOSE:To increase the pressure in resonance tubes and to intermittently inject the washing liquids in nozzles with high output to the surfaces of a passing strip by feeding gases controlled in flow rate into the resonance tubes and fluctuating gaseous pressures. CONSTITUTION:Air is fed into the resonance tubes 4a, 4b from gas supplying devices 9a, 9b while gas flow rate control valves 10a, 10b are controlled. The strip 101 is passed within a washing tank 1 by driving a crank shaft to rotate and moving a piston back and forth. The air pressures in the resonance tubes 4a, 4b are increased and the injection force of the washing liquids 102 in the upper and lower nozzles 3a, 3b is increased. The air in the resonance tubes 4a, 4b fluctuates periodically and the washing liquids 102 in the nozzles 3a, 3b are intermittently injected with the high output to the surfaces of the strip 101. Nitrogen may be used in place of the air for the gas. As a result, the washing treatment efficiency of the strip is improved.

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