专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2005321415A Defect inspection method and defect inspecting apparatus 审中-公开
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：JP2005321415A
公开(公告)日：2005-11-17
申请号：JP2005212914
申请日：2005-07-22
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： ONOYAMA AYUMI , SAKURAI KOICHI , OKA KAZUHIRO , ISHII HIROYUKI , FUJIYOSHI KATSUHIRO
IPC分类号： G01N21/956 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To detect defects, such as lack of conductors, short-circuitings, and adhesion of foreign matters on a wafer containing a normal conductive pattern, having irregularities with high probability in a film formation and etching process, in the manufacture of a semiconductor device.
SOLUTION: A defect inspection apparatus has an imaging element for converting the optical image of a part, containing a normal conductive pattern having surface irregularities, and that of a part compared with a part to be inspected, to an electric charge image for extracting as an electrical signal. The optical image containing a conductive pattern part, having surface irregularities, is set to be an element signal by the imaging element, and the quantity of light in the optical image is controlled so that the element signal is saturated. Further, the element signal of the part to be inspected is fetched by using the quantity of light, thus determining the defects, according to the differential signal of an element signal fetched from the part to be compared and the absolute value of the difference between the element signal of the part having irregularities in the conductive pattern and a saturation level.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了检测诸如缺少导体，短路以及含有正常导电图案的晶片的缺陷，在成膜和蚀刻工艺中具有高概率的不规则性的缺陷，制造半导体器件。解决方案：缺陷检查装置具有成像元件，用于将包含具有表面凹凸的正常导电图案的部分的光学图像和与被检查部分相比的部分的光学图像转换成电荷图像，提取为电信号。含有具有表面不规则性的导电图案部分的光学图像被成像元件设置为元件信号，并且控制光学图像中的光量，使得元件信号饱和。此外，通过使用光量来取出要检查的部件的元件信号，从而根据从要比较的部件取出的元件信号的差分信号和第元件信号在导电图案中具有不规则性和饱和度。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2001022937A METHOD AND DEVICE FOR CHECKING DEFECT 失效
公开(公告)号：JP2001022937A
公开(公告)日：2001-01-26
申请号：JP19432199
申请日：1999-07-08
申请人： MITSUBISHI ELECTRIC CORP
发明人： ONOYAMA AYUMI , SAKURAI KOICHI , OKA KAZUHIRO , ISHII HIROYUKI , FUJIYOSHI KATSUHIRO
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , G06T1/00 , G06T7/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To detect a defect such as conductor omission, short-circuit and foreign matter attachment on a wafer, including a normal conductor pattern having ruggedness with high probability in the process of film creating and etching, in manufacturing of a semiconductor device. SOLUTION: This device is provided with an image pickup device which converts the optical image of a part comparing a part, including normal conductor patterns 34 having surface ruggedness with a part to be a check object into a charge pattern and fetches the charge pattern as an electric signal, the image pickup device makes the optical image including the conductor pattern parts having the surface ruggedness an element signal, and the quantity Q of light of the optical image is controlled, so that the element signal can be saturated or can become a state just before saturation. Furthermore, the element signal of a part to be a check object is fetched by using the quantity Q of light, a difference signal with the element signal fetched from the comparing part is calculated, and defects are decided from the difference signal.

3. 发明专利

JPH11126736A APPARATUS AND SYSTEM FOR MANAGING MANUFACTURE OF SEMICONDUCTOR DEVICE 失效
公开(公告)号：JPH11126736A
公开(公告)日：1999-05-11
申请号：JP29019897
申请日：1997-10-23
申请人： MITSUBISHI ELECTRIC CORP
发明人： OKA KAZUHIRO , ISHII HIROYUKI , SAKURAI KOICHI , ASAHINA MASAKO
IPC分类号： H01L21/66 , H01L21/02
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for managing manufacture of a semiconductor device which can reliably judge the device by judging the semiconductor manufacture management on the basis of the number of defects in the device. SOLUTION: The apparatus includes a means 4 for detecting the number of defects on a wafer as a defect number, a means 5 for detecting the number of defective ones of chips on the wafer as a defective chip number T, a means 6 for setting a plurality of predetermined regions on the basis of a reference defective chip number T and a reference defect number H as preset references with respect to wafer productivity, and a means 7 for judging that a relationship between the defect number and defective chip number is included in either one of the regions preset by the region setting means 6 to judge acceptance or rejection of the wafer.

4. 发明专利

JPH0734222A FORMATION OF THIN FILM ON EDGE PART OF THIN SHEET MEMBER AND FILM FORMING DEVICE THEREFOR 失效
公开(公告)号：JPH0734222A
公开(公告)日：1995-02-03
申请号：JP17888593
申请日：1993-07-20
申请人： MITSUBISHI ELECTRIC CORP
发明人： OKA KAZUHIRO , YOSHIDA KAZUO , IKUTA YOSHIKAZU , YAGI TOSHINORI
IPC分类号： C23C14/04
摘要： PURPOSE:To provide a method for forming thin films on the edge parts of thin sheet members in which the formation of thin films is made possible even without using masks at the edge parks of many thin sheet members. CONSTITUTION:At the time of forming thin films T by applying energy to a coating material 10 from a prescribed direction in a vacuum to stick evaporating grains 12 from the coating material 10 scattered in a prescribed direction to one end part which is the film forming parts P1 of plural thin sheet members P, the plural thin sheet members P are arranged in such a manner that they are obliquely shifted, and the film forming parts P1 of the thin sheet members P are exposed in the flying direction of the evaporating grains 12 from the coating material 10. Since the film forming parts P1 themselves of the adjacent thin sheet members P play the role of masks, special masks such as sticking preventing sheets or the like are eliminated.

5. 发明专利

JPH06147082A ROTOR ELECTRODE FOR DISTRIBUTOR AND MANUFACTURE THEREOF 失效
公开(公告)号：JPH06147082A
公开(公告)日：1994-05-27
申请号：JP30403692
申请日：1992-11-13
申请人： MITSUBISHI ELECTRIC CORP
发明人： OKA KAZUHIRO , OHASHI YUTAKA
IPC分类号： F02P7/02
摘要： PURPOSE:To simplify the manufacturing process and improve the productivity of a rotor electrode. CONSTITUTION:In a rotor electrode for a distributor equipped with a bedding film 10 forming a lower layer and a discharge inductive film 20 forming an upper layer both at a tip part 1a of a rotor electrode body 1A, the thickness of the bedding film 10 and/or thickness of the discharge inductive film 20 with which the tip part 1a of the rotor electrode body 1a is covered are made alterable every part.

6. 发明专利

JPH0458067A ROTOR ELECTRODE FOR DISTRIBUTOR 失效
公开(公告)号：JPH0458067A
公开(公告)日：1992-02-25
申请号：JP17091490
申请日：1990-06-26
申请人： MITSUBISHI ELECTRIC CORP
发明人： MORITA TAKESHI , OKA KAZUHIRO , OHASHI YUTAKA
IPC分类号： F02P7/02
摘要： PURPOSE:To provide a rotor electrode for a distributor, which is high in skin adhesion strength and also high in noise electric wave prevention effect by forming a high resistance material layer while being laminated by means of vacuum deposition, and thereby making up the layer from plural ceramics the compositions of whose main components are different. CONSTITUTION:Substrate ceramics 2a and 2b are formed, which increase adhesion strength onto the electrode 1 of a skin. Following which, finishing ceramics 3a and 3c excellent in noise electric wave prevention effect are formed over the substrate ceramics 2a and 2b. By this constitution, a rotor electrode 1 for a distributor, which is high in skin adhesion strength and also high in noise electric wave prevention effect, can thereby be provided.

7. 发明专利

JPS63137162A APPARATUS FOR FORMING MULTILAYERED FILM BY VAPOR DEPOSITION WITH LASER 失效
公开(公告)号：JPS63137162A
公开(公告)日：1988-06-09
申请号：JP28372186
申请日：1986-11-28
申请人： MITSUBISHI ELECTRIC CORP
发明人： OKA KAZUHIRO , MURAKAMI KOHEI , MORIYASU MASAHARU , OMINE MEGUMI
IPC分类号： C23C14/28
摘要： PURPOSE:To continuously form a multilayered film having stable quality, by moving different ceramic materials to a position on which laser light is converged in the same vacuum. CONSTITUTION:Difference ceramic materials 6 are placed on a movable pedestal 8 in vacuum so that they confront a base material 7. The desired ceramic materials 6A-6C are successively moved to a position on which laser beams 1 are radiated. The ceramic materials 6A-6C are successively evaporated and the resulting vapors are stuck and deposited on the base material 7.

8. 发明专利

JPH11135591A MANUFACTURE OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND DEFECT INSPECTION EQUIPMENT USED THEREFOR 失效
公开(公告)号：JPH11135591A
公开(公告)日：1999-05-21
申请号：JP29721397
申请日：1997-10-29
申请人： MITSUBISHI ELECTRIC CORP
发明人： ISHII HIROYUKI , OKA KAZUHIRO , SHIRATAKE SHIGERU , MOTONAMI KAORU
IPC分类号： H01L21/66 , H01L21/822 , H01L27/04
摘要： PROBLEM TO BE SOLVED: To easily detect, in a short time, reliability defect which causes troubles by deterioration with time after completion of a product, enable to relieve the reliability defect, and increase the yield, in a manufacturing method of a semiconductor integrated circuit device. SOLUTION: A reliability defect image data base 2 is previously constituted by using past actual results. Reliability defect is detected in the state of a wafer by checking whether a defect image coincident with data in the data base 2 exists in the image data of imperfect external appearance detected by a visual inspection process (S3) arranged in a wafer process (S2). Relief is performed by replacing a reliability defect part by a redundant circuit.

9. 发明专利

JPH07240155A CATHODE-RAY TUBE AND ITS MANUFACTURE 失效
公开(公告)号：JPH07240155A
公开(公告)日：1995-09-12
申请号：JP2851894
申请日：1994-02-25
申请人： MITSUBISHI ELECTRIC CORP
发明人： OKA KAZUHIRO , HASHIMOTO YOICHI , ISHII HIROYUKI , OKUDA HIROSHI
IPC分类号： G02B5/28 , H01J9/22 , H01J9/227 , H01J9/38 , H01J29/18 , H01J29/28 , H01J29/88 , H01J29/89 , H01J31/10
摘要： PURPOSE:To provide a cathode-ray tube which is highly resistant to electron beam emission and can realize a high luminance, and a method for manufacturing it. CONSTITUTION:In the manufacture of a cathode-ray tube having a metal oxide film formed on the inner surface of a panel glass to which electron beams are emitted, when the metal oxide film 2 is formed by evaporation on the panel glass 1 in a vacuum tank 4, a residual moisture trap device 8 is operated in the vacuum tank 4 at the vacuuming of the vacuum tank 4. Thus, a high degree of vacuum can be provided to accelerate the oxidation of the top layer of the metal oxide film.

10. 发明专利

JPH0625834A FORMATION OF VAPOR PHASE FILM 失效
公开(公告)号：JPH0625834A
公开(公告)日：1994-02-01
申请号：JP20320192
申请日：1992-07-08
申请人： MITSUBISHI ELECTRIC CORP
发明人： OKA KAZUHIRO
IPC分类号： C23C14/28
摘要： PURPOSE:To suppress defects, such as pinholes, and to form denser vapor phase films by making combination use of materials which are completely evaporated with materials which are liable to generate coarse particles at the time of depositing these materials by vacuum evaporation. CONSTITUTION:A target 1-b for vapor deposition consisting of materials (SiO2, Al2O3, etc.) which are completely evaporated is used in combination with a target 1-a for evaporation composed of the materials (SiC, AlN, etc.) which are liable to generate the coarse particles at the time of subjecting these materials to vacuum vapor deposition by high-energy beams. These targets 1-a, 1-b are irradiated with the laser beams 2-a, 2-b respectively in a vacuum and vapor phase films 14 are formed on a substrate 4 by the evaporated particles 12-a, 13-b generated in such a manner. The SiC and the SiO2, are so evaporated that the weight ratio (%) of the SiO2 to the SiC attains about 0.2 to 2 times when for example, the SiC and the SiO2, are combined. The vapor phase film 14 improved in strength and sticking force to the substrate 4 is formed in such a manner.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式