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    • 9. 发明专利
    • Ceramic substrate
    • 陶瓷基材
    • JPS6112039A
    • 1986-01-20
    • JP13367384
    • 1984-06-26
    • Mitsubishi Electric Corp
    • UCHIUMI YOSHIKAZU
    • H05K1/03H01L21/52H01L21/58H01L21/84H01L23/15
    • H01L21/84
    • PURPOSE:To obtain the ceramic substrate having the coefficient of thermal expansion approximate to that of semiconductor silicon, a high thermal conductivity and a high insulating property in plane direction by a method wherein an insulating film of specific thickness is formed on the surface of a ceramic plate having SiC as the main component and also having the heat conductivity in excess of the specific value. CONSTITUTION:An insulating film having the final film thickness of 5mum or above is formed on the surface of a ceramic plate containing SiC as main component and having the thermal conductivity of 1.6W/cm deg.C or above. Such ceramic plate as above-mentioned has the SiC content of 90-99%, desirably 95- 99%, it has a high thermal conductivity in general and has the coefficient of thermal expansion of 4.5X10 / deg.C or thereabout. A reactive sintered Si ceramic plate and the like, which is obtained by sintering while Si powder and C powder are mixed in SiC powder, for example, is used. Also, the glass, material consisting of crystal and glass, thin film type ceramic, Si3N4 and the like can be used as the material of the insulating film.
    • 目的:通过在陶瓷的表面上形成特定厚度的绝缘膜的方法,获得具有接近于半导体硅的热膨胀系数的陶瓷基板,具有高导热性和平面方向上的高绝缘性 以SiC为主要成分,导热系数超过规定值。 构成:以SiC为主要成分,导热率为1.6W / cm 3以上的陶瓷板的表面形成最终膜厚为5μm以上的绝缘膜。 如上所述的这种陶瓷板的SiC含量为90-99%,理想的为95-99%,通常具有高导热性,并且热膨胀系数为4.5×10 -6 /℃或 在那边 使用例如通过在Si粉末和C粉末中烧结而获得的反应性烧结Si陶瓷板等。 此外,可以使用玻璃,由晶体和玻璃构成的材料,薄膜型陶瓷,Si 3 N 4等作为绝缘膜的材料。