会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明专利
    • Semiconductor device and manufacturing method thereof
    • 半导体器件及其制造方法
    • JP2008270503A
    • 2008-11-06
    • JP2007111089
    • 2007-04-20
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • YOSHIDA TAKAYUKIHONDO TAKUMAFUKUDA TOSHIYUKI
    • H01L21/3205H01L23/02H01L23/52
    • H01L2224/45144H01L2224/48091H01L2224/48227H01L2924/00014H01L2924/00
    • PROBLEM TO BE SOLVED: To provide a semiconductor device of low-profile and smaller size, capable of protecting a main surface from α line coming from the rear surface side, even if a semiconductor element is thin. SOLUTION: A semiconductor device 10 comprises a semiconductor element 11 in which a circuit element 18 is formed on a main surface 11a, and a first α line shielding film 21 that covers a rear surface 11b. A sum T of a thickness T1 of the semiconductor element 11 and a thickness T1 of the first α line shielding film 21 is set larger than a flying distance R1 of α line that enters the first α line shielding film 21 and then travels toward the main surface 11a of the semiconductor element 11 along the thickness direction. Even if a mold resin and wiring are arranged to adjoin the rear surface 11b of the semiconductor element 11, and even if the α line is emitted from the metal material contained in them, it does not reach so far as the main surface 11a of the semiconductor element 11, avoiding the effect on the circuit element 18. COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:即使半导体元件薄,也可以提供一种小型化,小尺寸的半导体器件,其能够保护来自背面侧的α线的主表面。 解决方案:半导体器件10包括在主表面11a上形成电路元件18的半导体元件11和覆盖后表面11b的第一α线屏蔽膜21。 将半导体元件11的厚度T1和第一α线屏蔽膜21的厚度T1的和T设定为大于进入第一α线屏蔽膜21的α线的飞行距离R1,然后向主体 半导体元件11的厚度方向的表面11a。 即使模制树脂和布线被布置成邻接半导体元件11的后表面11b,并且即使α线从包含在其中的金属材料发射,也不会达到这样的主表面11a 半导体元件11,避免对电路元件18的影响。版权所有(C)2009,JPO&INPIT
    • 5. 发明专利
    • Semiconductor integrated circuit device and manufacturing method thereof
    • 半导体集成电路器件及其制造方法
    • JP2005322703A
    • 2005-11-17
    • JP2004137964
    • 2004-05-07
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • YOSHIDA TAKAYUKITSUURA KATSUHIKO
    • H01L23/52H01L21/3205H01L21/82
    • H01L2224/11H01L2224/16225H01L2224/32225H01L2224/73204H01L2224/92125H01L2924/14H01L2924/00H01L2924/00012
    • PROBLEM TO BE SOLVED: To provide a semiconductor integrated circuit device which can obtain the desired memory characteristics, can also be matched with a high-frequency circuit as an external circuit, even when the high-density mounting requiring many terminals of the semiconductor circuit element is requested, can adjust the threshold of the semiconductor circuit element, and can prevent damage by corrosion or by impact from the outside. SOLUTION: In the semiconductor integrated circuit device, an Al electrode pad 10 is formed to be a redundant circuit, a structure covered with BCB or the like, having an electrode aperture, is formed on the Al electrode pad 10, and a conductor 11 is formed among the desired pads of a plurality of Al electrode pads 10. For the first issue, the conductor 11 of the redundant circuit forms a fuse for memory redundant relief. Accordingly, the flip-chip mounting structure, enabling redundant relief of the memory after the formation of bumps, can be realized. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了提供可以获得期望的存储特性的半导体集成电路器件,也可以与作为外部电路的高频电路匹配,即使当需要许多端子的高密度安装 要求半导体电路元件,可以调节半导体电路元件的阈值,并且可以防止腐蚀或来自外部的冲击的损坏。 解决方案:在半导体集成电路器件中,Al电极焊盘10形成为冗余电路,在Al电极焊盘10上形成具有电极孔的BCB等覆盖的结构,并且 导体11形成在多个Al电极焊盘10的期望的焊盘之间。对于第一个问题,冗余电路的导体11形成用于存储器冗余浮雕的熔丝。 因此,可以实现倒装芯片安装结构,能够在形成凸块之后实现对存储器的冗余的释放。 版权所有(C)2006,JPO&NCIPI
    • 6. 发明专利
    • Semiconductor device
    • 半导体器件
    • JP2005079431A
    • 2005-03-24
    • JP2003309880
    • 2003-09-02
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • MATSUMURA KAZUHIKOYOSHIDA TAKAYUKIMATSUMOTO KATSUYOSHIKAINO NORIYUKIKAWABATA TAKESHI
    • H01L23/52H01L21/3205H01L23/12
    • H01L2224/11H01L2224/73204H01L2224/92125
    • PROBLEM TO BE SOLVED: To prevent the disconnection of the top layer wiring of a semiconductor chip under an electrode for external connection by the film stress of the metal film of the electrode for the external connection. SOLUTION: A semiconductor device is provided with a first organic insulation film 6, a wiring pattern 7 and a second organic insulation film 14, and is provided with the wiring or electrode 13 of a size equal to or larger than the second opening, where the electrode 5 for the external connection is formed, of the first organic insulation film 6 on the position of the top layer of the semiconductor chip 1 facing the electrode 5 for the external connection of the wiring pattern 7. Thus, damages given to the wiring of the top layer of the semiconductor chip 1 by the generation of cracks on a protective film 4 by the film stress of the metal film forming the electrode 5 for the external connection are reduced. Thus, the process cost of the semiconductor chip 1 is reduced. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:为了防止用于外部连接的电极的金属膜的膜应力,用于外部连接的电极下方的半导体芯片的顶层布线的断开。 解决方案:半导体器件设置有第一有机绝缘膜6,布线图案7和第二有机绝缘膜14,并且设置有等于或大于第二开口的布线或电极13 其中形成有用于外部连接的电极5的第一有机绝缘膜6位于半导体芯片1的顶层位于布线图案7的外部连接的电极5的位置上。因此, 由于形成用于外部连接的电极5的金属膜的膜应力,在保护膜4上产生裂纹导致半导体芯片1的顶层的布线减少。 因此,半导体芯片1的工艺成本降低。 版权所有(C)2005,JPO&NCIPI
    • 8. 发明专利
    • Semiconductor device
    • 半导体器件
    • JP2003037223A
    • 2003-02-07
    • JP2001225935
    • 2001-07-26
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • SHIMOISHIZAKA NOZOMIYOSHIDA TAKAYUKINOKUBO TAKESHIISHIKAWA KAZUHIROMATSUMOTO KATSUYOSHIKAWABATA TAKESHI
    • H01L23/34
    • PROBLEM TO BE SOLVED: To solve the problem of the need for forming deep unevenness of a radiation fin, in order to improve the cooling effect of a semiconductor element, because of the use of a radiation mechanism using convection with air, so that superior cooling effect is not obtained, when normally awailable silicon substrate on the market (e.g., 625-725 μm of thickness) is subjected to unevenness working.
      SOLUTION: A trench 8 is formed on the rear 7 of a semiconductor element 5. Refrigerant 10, which has flowed into the trench from a refrigerant flow-in hole 11 of a retaining plate 9, passes through the trench 8 and flows out from a refrigerant flow-out hole 12 of the retaining plate 9, thereby dissipating the heat generated from the semiconductor element 5 with high efficiency.
      COPYRIGHT: (C)2003,JPO
    • 要解决的问题为了解决形成辐射翅片的深度不均匀性的问题,为了提高半导体元件的冷却效果,由于使用与空气对流的辐射机构,因此优异的冷却 当市场上通常可用的硅基板(例如,625-725μm的厚度)经受不均匀加工时,不能获得效果。 解决方案:在半导体元件5的后部7上形成有沟槽8.已经从保持板9的制冷剂流入孔11流入沟槽的制冷剂10通过沟槽8并从 制冷剂流出孔12,从而以高效率散发由半导体元件5产生的热量。
    • 9. 发明专利
    • Semiconductor device
    • 半导体器件
    • JP2008141215A
    • 2008-06-19
    • JP2007339218
    • 2007-12-28
    • Matsushita Electric Ind Co Ltd松下電器産業株式会社
    • SAKAI HIROYUKIYOSHIDA TAKAYUKIOTA TOSHIMICHI
    • H01L23/12H01L21/60H01L25/00H01P1/04H01P5/08
    • H01L2224/73204
    • PROBLEM TO BE SOLVED: To provide a small MMIC having small parasitic effect, in which the resonance or unwanted oscillations are less apt to occur, even if flip-chip bonding is performed, and to surely carry out MMICs and MFICs mounting. SOLUTION: A GND plane 12, a dielectric film 13, and a first wiring pattern 14 are formed sequentially on the principal plane of a substrate 11 made of Si, or the like, and the first wiring pattern 14, the dielectric film 13, and the GND plane 12 constitute a micro stripline. An MMIC chip 22, whose element-forming surface has a high-frequency transistor and a second wiring pattern 21, is secured on the substrate 11 using MBB method, with the element-forming surface and the principal plane of the substrate 11 made to face each other. In an MMIC chip 22, the second wiring pattern 21, the dielectric film 13 provided on the substrate 11, and the GND plane 12 constitute the micro stripline. COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:即使执行倒装芯片接合,也可以提供具有小的寄生效应的小型MMIC,其中谐振或不期望的振荡不易发生,并且可靠地执行MMIC和MFIC的安装。 解决方案:在由Si等制成的基板11的主平面上依次形成GND平面12,电介质膜13和第一布线图案14,并且第一布线图案14,电介质膜 13,GND平面12构成微带线。 使用MBB法将元件形成表面具有高频晶体管和第二布线图案21的MMIC芯片22固定在基板11上,使基板11的元件形成表面和主平面朝向 彼此。 在MMIC芯片22中,第二布线图案21,设置在基板11上的电介质膜13和GND平面12构成微带线。 版权所有(C)2008,JPO&INPIT