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    • 4. 发明专利
    • Gas sampler, gas sampling system, exhaust gas separation method and exhaust gas analyzing method
    • 气体取样器,气体采样系统,排气分离方法和排气分析方法
    • JP2010133875A
    • 2010-06-17
    • JP2008311502
    • 2008-12-05
    • Mitsubishi Heavy Ind Ltd三菱重工業株式会社
    • NOZAKI AKIHIROCHIYOMARU MASARUTSUKAHARA CHISATODOBASHI SHINSAKU
    • G01N1/22G01N30/04G01N30/88G01N31/00G01N31/16
    • PROBLEM TO BE SOLVED: To provide a gas sampler, gas sampling system, exhaust gas separation method and exhaust gas analyzing method for analyzing a gas component in exhaust gas simply and more accurately. SOLUTION: The gas sampler 10A includes: an injection syringe 14A that includes an outer cylinder 11A and an inner cylinder 12A insertably installed in the outer cylinder 11A and that has a storage part 13 for storing a predetermined amount of off-gas when the inner cylinder 12A is pulled out; and an absorbent liquid containing part 15 that is formed inside the inner cylinder 12A and that contains an absorbent liquid for absorbing a particular component in a predetermined amount of exhaust gas, wherein the absorbent liquid is supplied into the storage part 13. When sampling an off-gas, an absorbent liquid corresponding to a target component is contained in the absorbent liquid containing part 15 and thus a component being the main cause of deposition in the off-gas is absorbed by the absorbent liquid and separated, and then the concentrations of the component in the absorbent liquid and another component in the remaining gas are analyzed and thus the balance of the entire gas composition of the off-gas is determined. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种简单,准确地分析排气中的气体成分的气体取样器,气体取样系统,废气分离方法和排气分析方法。 气体取样器10A包括:注射注射器14A,其包括外筒11A和可插入安装在外筒11A中的内筒12A,并且具有用于储存预定量的废气的储存部13, 内筒12A被拉出; 以及吸收液体容纳部15,其形成在内筒12A的内部,并且含有用于吸收规定量的废气中的特定成分的吸收液,其中,吸收液被供给到收纳部13中。 气体,吸收剂液体容纳部15中含有与目标成分相当的吸收性液体,因此作为废气中沉积的主要原因的成分被吸收液吸收并被分离, 分析吸收液中的成分和剩余气体中的其他成分,确定废气的全部气体成分的平衡。 版权所有(C)2010,JPO&INPIT
    • 9. 发明专利
    • Apparatus for forming carbon-based thin film, film-forming apparatus and film-forming method
    • 用于形成基于碳的薄膜,成膜装置和成膜方法的装置
    • JP2005082887A
    • 2005-03-31
    • JP2003320205
    • 2003-09-11
    • Mitsubishi Heavy Ind LtdTsuru Gakuen三菱重工業株式会社学校法人鶴学園
    • YOSHIDA MITSUHIROKATSURA TOSHIAKICHIYOMARU MASARUFUKUMORI KENJITAKAGI TOSHINORITANAKA TAKESHI
    • H05H1/46C23C14/06C23C14/34C23C14/40
    • PROBLEM TO BE SOLVED: To provide a film-forming technology for further optimizing a quality and structure of a carbon-based thin film. SOLUTION: This film-forming apparatus comprises a vacuum vessel (1) for accommodating a workpiece (W); raw material-feeding mechanisms (4, 7 and 8) for feeding a raw material of the carbon-based thin film to be formed on the surface of the workpiece (W); an electrode (6) which is accommodated in the vacuum vessel (1) and holds the workpiece (W); and a power source (11) for generating plasma, which applies voltage for generating plasma inside the vacuum vessel (1) to the electrode (6). The voltage for generating plasma applied to the electrode (6) comprises a pulsed alternating current with RF (Radio Frequency) (22) in which alternating voltage is continued with a frequency in a radio frequency RF band for a predetermined period of time, a pulsed direct current having positive voltage (21), and a pulsed direct current having negative voltage (23). COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供一种用于进一步优化碳基薄膜的质量和结构的成膜技术。 解决方案:该成膜装置包括用于容纳工件(W)的真空容器(1)。 用于将要形成的碳基薄膜的原料供给到工件(W)的表面上的原料供给机构(4,7和8); 容纳在真空容器(1)中并保持工件(W)的电极(6); 以及用于产生等离子体的电源(11),其将用于在所述真空容器(1)内产生等离子体的电压施加到所述电极(6)。 用于产生施加到电极(6)的等离子体的电压包括具有射频(射频)(22)的脉冲交流电,其中交变电压以射频RF频带中的频率持续预定时间段,脉冲 具有正电压(21)的直流电流和具有负电压(23)的脉冲直流电。 版权所有(C)2005,JPO&NCIPI