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1. 发明专利

JP2003324111A Semiconductor device and its manufacturing method 审中-公开
标题翻译：半导体器件及其制造方法
公开(公告)号：JP2003324111A
公开(公告)日：2003-11-14
申请号：JP2002130637
申请日：2002-05-02
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： SHIROMIZU TATSUYA , SASAKI HAJIME , NAKAMOTO TAKAHIRO , FUJINO NAOHIKO
IPC分类号： H01L29/812 , H01L21/338
摘要： PROBLEM TO BE SOLVED: To provide a semiconductor device and its manufacturing method capable of sufficiently obtaining an effect as a passivation film.
SOLUTION: The semiconductor device comprises: an n-type active layer 1 having a recess 1a on the surface thereof, a gate electrode 6 electrically connected to the n-type active layer 1 in the recess 1a, an insulating spacer film 2 formed with a hole 2a having a wall surface surrounding the periphery of the gate electrode 6, and a passivation film 10 coating the gate electrode 6 and the insulating spacer film 2. The wall surface of the hole 2a is located on the outer peripheral side of the recess 1a so that the insulating spacer film 2 is not located immediately above the recess 1a.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供能够充分获得作为钝化膜的效果的半导体器件及其制造方法。解决方案：半导体器件包括：在其表面上具有凹部1a的n型有源层1，与凹部1a中的n型有源层1电连接的栅电极6，绝缘间隔膜2 形成有具有围绕栅电极6的周边的壁面的孔2a，以及涂覆栅电极6和绝缘间隔膜2的钝化膜10.孔2a的壁面位于凹部1a使得绝缘间隔膜2不位于凹部1a的正上方。版权所有（C）2004，JPO

2. 发明专利

JP2000208603A STORAGE CASE FOR SUBSTRATE AND METHOD FOR STORING AND TRANSPORTING SUBSTRATE 失效
公开(公告)号：JP2000208603A
公开(公告)日：2000-07-28
申请号：JP924299
申请日：1999-01-18
申请人： MITSUBISHI ELECTRIC CORP
发明人： KAMIYAMA AKIYOSHI , NAKA JIRO , FUJINO NAOHIKO
IPC分类号： H05K7/14 , H01L21/673 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a storage case and a storage method, with which a substrate can be prevented from being contaminated due to sticking of organic matters on the surface of the substrate, and to provide a method for transporting the substrate so as not to be contaminated by organic matters. SOLUTION: For the storage case for a substrate 3, provided with a main body 1 having an opening part 15 for inserting the substrate 3, a lid body 2 for closing the opening part 15 and a holding part for the substrate 3 formed on at least one of the main body 1 and the lid body 2, the main body 1, the lid body 2 and the holding part are formed from metal films. Additionally, the main body 1 is formed into deep tray. Furthermore, the holding part holds the outer peripheral edge of the substrate 3, and a void is formed between the substrate 3 and the bottom of the main body. After housing the substrate 3 and immediately prior to closing the opening part 15, at least one of the main body 1 and the lid body 2 is heated and activated. Moreover, the substrate 3 is transported, while housing the storage case in which the substrate 3 is stored into an outer box.

3. 发明专利

JPH11290650A APPARATUS AND METHOD FOR REMOVING IMPURITY IN GAS AND APPARATUS AND METHOD FOR PRODUCING HIGHLY PURE GAS 失效
公开(公告)号：JPH11290650A
公开(公告)日：1999-10-26
申请号：JP9321498
申请日：1998-04-06
申请人： MITSUBISHI ELECTRIC CORP
发明人： KOBAYASHI JUNJI , FUJINO NAOHIKO , HIRANO NORIKO , MIYAMOTO MAKOTO , NAKAGAWA MITSUO
IPC分类号： B01D53/64 , B01D53/14 , B01D53/18 , C01B13/10
摘要： PROBLEM TO BE SOLVED: To efficiently remove metallic impurities in a gas such as an ozone gas and obtain a gas with high cleanliness by installing a container containing an aqueous acidic solution and supplying a gas containing metallic impurities into the aqueous acidic solution and, at the same time, releasing the gas as bubbles to the aqueous acidic solution. SOLUTION: An ozone generating apparatus 17 comprises an ozone generating part 1 and an impurity removing part 18 and the ozone generating part 1 generates an ozone gas. The impurity removing part 18 comprises an impinger 3, which is a container, an acidic ultra pure water 7 contained in the impinger 3, and a pipe 2a for supplying the ozone gas generated in the ozone generating part 1 to the acidic ultra pure water 7. The contact surface area of the ozone gas 6a and the acidic ultra pure water 7 is made wide by supplying the ozone gas 6a containing metallic impurities as bubbles to the acidic ultra pure water 7, so that the metallic impurities of the ozone gas 6a are efficiently dissolved in the acidic ultra pure water 7 and an ozone gas 6b with high cleanliness is obtained.

4. 发明专利

JPH11265677A SURFACE ANALYSIS METHOD, SURFACE ANALYSIS DEVICE AND AUGER ELECTRON SPECTRAL ANALYSIS DEVICE 失效
公开(公告)号：JPH11265677A
公开(公告)日：1999-09-28
申请号：JP6840498
申请日：1998-03-18
申请人： MITSUBISHI ELECTRIC CORP
发明人： KUROKI HIROSHI , FUJINO NAOHIKO , KOBAYASHI JUNJI
IPC分类号： H01J37/06 , G01N23/227 , H01J37/252
摘要： PROBLEM TO BE SOLVED: To perform the analysis of surface composition or impurity in a minute area without machining a sample to expose the side wall or inner wall by curving the track of a pulse-like electron beam by a magnetic field to emit the electron beam to the side wall of a stepped structure or the inner wall of a cylinder, and detecting the Auger electron generated there. SOLUTION: A pulse electron beam 10 formed by emitting an electron beam accelerated by an accelerating voltage of several kV to several ten kV from an electron gun 51, forming it into a pulse of several psec to several fsec by an ultra short pulse voltage added to a deflecting electrode 52, and converging it by an electromagnetic lens 53 is incident vertically to the center of a hole 3 provided in a sample 2. A magnetic field 4 is applied to the sample 2 horizontally in pulse form, whereby the pulse electron beam 10 receives a Lorentz force to curve the track, and irradiates the side surface 5 of the cylindrical hole 3 to spring out Auger electrons. The irradiating position is changed by changing the magnetic field 4, and the number and energy of Auger electrons sprung out from the emitting part are measured.

5. 发明专利

JPH11162923A APPARATUS AND METHOD FOR WASHING AND DRYING 失效
公开(公告)号：JPH11162923A
公开(公告)日：1999-06-18
申请号：JP33218897
申请日：1997-12-02
申请人： MITSUBISHI ELECTRIC CORP
发明人： ISHIKAWA HIROAKI , KOTO SATORU , TANAKA HIROSHI , FUJINO NAOHIKO
IPC分类号： B08B3/04 , F26B3/04 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a washing and drying apparatus for preventing the generation of stains on the surface of a substrate and for improving the yield and the throughput. SOLUTION: Washing treatment and drying treatment are carried out in a single treating tank 11 under atmospheric pressure, and an object treated 200 is put into the ascending flow of washing liquid in the treating tank formed by flow adjusting means 20 and is then washed. Then, a drying gas containing an organic solvent is supplied into the treating tank 11, and the washing liquid is gradually removed to replace the water adhered to the object treated 200 with a thin film of organic solvent. Finally, the thin film of the organic solvent is evaporated by means of an inert gas.

6. 发明专利

JPH10288618A SURFACE ANALYZING DEVICE 失效
公开(公告)号：JPH10288618A
公开(公告)日：1998-10-27
申请号：JP9935197
申请日：1997-04-16
申请人： SEIKO INSTR INC , MITSUBISHI ELECTRIC CORP
发明人： WAKIYAMA SHIGERU , FUJINO NAOHIKO
IPC分类号： G01B21/30 , G01N23/00 , G01N37/00 , G01Q10/06 , G01Q30/18 , G01Q60/24 , G01Q60/32 , G01Q70/14 , G01Q90/00 , G10K11/178 , H01J37/02
摘要： PROBLEM TO BE SOLVED: To provide a probe microscope with high resolving power which reduces the low-frequency components of noise from output results by incorporating a vibration-isolating platform which reduces disturbance components from floor vibrations even placed at a location of device placement with low-frequency components. SOLUTION: A probe microscope as this device is mounted on a socalled active vibration-isolating platform. This vibration-isolating platform detects vibrations given to a vibration-isolating platform surface plate 14 due to floor vibrations through the use of a displacement meter 15, accelerometer 16, etc., and provides the vibration-isolating platform surface plate 14 with vibrations with phases opposite to that of the detected vibrations. By this, vibrations from the floor is reduced on the vibration-isolating platform surface plate 14. External vibration components from floor vibrations are reduced even at a location of device placement with low-frequency components to high-frequency components.

7. 发明专利

JPH10242228A METHOD AND APPARATUS FOR RECOVERING IMPURITIES ON SILICON WAFER SURFACE 失效
公开(公告)号：JPH10242228A
公开(公告)日：1998-09-11
申请号：JP4568097
申请日：1997-02-28
申请人： MITSUBISHI ELECTRIC CORP
发明人： NAKA JIRO , FUJINO NAOHIKO , HIRANO NORIKO , KOBAYASHI JUNJI , KURAMOTO KAZUO
IPC分类号： G01N1/28 , H01L21/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a method and apparatus for recovering impurities on an Si wafer surface having an oxide film, nitride film or oxide nitride film on the surface which is capable of naturally collecting reactive liq. drops, with needing the scan of recovering liq. drops and recovering only impurities meanly contained in the Si wafer surface, without recovering local contaminants at the wafer ends. SOLUTION: The method comprises a first step of dipping the end 4 of an Si wafer 1 having an oxide film 3 or nitride film on the surface in a pre-treating soln. 2, rotating the wafer to decompose the oxide, nitride or oxide nitride film at the end and to remove impurities on the end surface and second step of inclining the wafer, dropping an impurity recovering soln. 6 down, leaving it for a fixed time, and recovering it, thereby decomposing the oxide, nitride or oxide nitride film and recovering the impurities.

8. 发明专利

JPH0829354A DETECTION AND INSPECTION METHOD OF SMALL FOREIGN MATTER SCANNING-TYPE PROBE MICROSCOPE USED THEREFOR, AND MANUFACTURE OF SEMICONDUCTOR ELEMENT AND LIQUID CRYSTAL DISPLAY ELEMENT USING THEM 失效
公开(公告)号：JPH0829354A
公开(公告)日：1996-02-02
申请号：JP12131394
申请日：1994-06-02
申请人： MITSUBISHI ELECTRIC CORP
发明人： NAKAGAWA ZENSHI , SOEDA FUSAYOSHI , FUJINO NAOHIKO , KANO ISAMU , WADA OSAMU , KUROKAWA HIROSHI , HORI KOICHIRO , HATTORI NOBUMI , SEKINE MASAHIRO , OMORI MASASHI , KURAMOTO KAZUO , KOBAYASHI JUNJI
IPC分类号： G01B11/30 , G01N21/88 , G01N21/94 , G01N21/956 , G01N37/00 , G01Q30/02 , G01Q60/10 , G01Q60/24 , G01Q90/00 , H01L21/66
摘要： PURPOSE:To provide a method for detecting and inspecting a small foreign matter which can selectively measure the three-dimensional shape of a part where the small foreign matter exists on the surface of a sample such as a silicon wafer by efficiently and quickly detecting the position, and a scanning-type probe microscope device for the method. CONSTITUTION:By applying beams 8 to the surface of a sample and performing observation from a dark visual field part or a bright visual field part using, for example, a microscope 16 which is focused to the spot part, or a photo-diode, a position where irregular reflection occurred is detected, the coordinates (x1, y1) are registered at an x-y actuator 12, and the sample or a probe is moved by a difference from the position (x0, y0) of the probe of the scanning-type probe microscope, thus measuring the three-dimensional shape of a small foreign matter 11. Also, by obtaining the position of the small foreign matter 11 in advance with a particle detection device and performing spot application of beams within a range considering the deviation of coordinates with the scanning-type probe microscope, the detection and inspection efficiency can be improved.

9. 发明专利

JPH06252121A WET-CLEANING DEVICE AND ITS CHEMICAL EXCHANGING METHOD 失效
公开(公告)号：JPH06252121A
公开(公告)日：1994-09-09
申请号：JP3847393
申请日：1993-02-26
申请人： MITSUBISHI ELECTRIC CORP
发明人： FUJINO NAOHIKO , SASAI HIROSHI , OMORI MASASHI
IPC分类号： B08B9/08 , H01L21/304
摘要： PURPOSE:To provide the chemical exchanging method of a wet-cleaning device by which the cleaning ability of a chemical can be maintained for a long period by suppressing the deterioration of the original cleaning ability of the chemical even when the chemical is repeatedly exchanged and the remaining of foreign matters in the chemical and the adhesion of the foreign matters to a product are not allowed immediately after exchanging the chemical. CONSTITUTION:In the title chemical changing method for a wet-cleaning device equipped with a filter 8 in a chemical circulating systems 7 and 9, a chemical in the filter 8 is replaced with a new chemical after once replacing the chemical with pure water.

10. 发明专利

JPH05291221A 失效
公开(公告)号：JPH05291221A
公开(公告)日：1993-11-05
申请号：JP9508692
申请日：1992-04-15
申请人： MITSUBISHI ELECTRIC CORP
发明人： FUJINO NAOHIKO
IPC分类号： B08B3/08 , H01L21/304 , H05K3/26
摘要： PURPOSE:To remove contaminative particles of 0.1mum or lower and to completely remove a molecular contamination composed of an organic substance and a contamination composed of carbonic acid by a method wherein an object to be cleaned is immersed in a solution in which ozone has been dissolved or in a liquid in which ozone gas has been bubbled and the surface of the object to be cleaned is irradiated with ultraviolet rays. CONSTITUTION:An object 2 to be cleaned is immersed in a liquid 6 in which ozone has been dissolved or in a liquid in which ozone gas has been bubbled; the surface of the immersed object 2 to be cleaned is irradiated with ultraviolet rays; the object is cleaned. For example, a low-pressure mercury lamp 3 as an ultraviolet-ray generation source and a liquid 6 which is used for cleaning and in which ozone has been dissolved are housed in a cleaning tank 1. The liquid 6 in which the ozone has been dissolved is dissolved in a liquid while ozone gas 5 which has been produced inside an ozone-gas generator 8 and a liquid 4 inside a liquid storage tank 7 are fed into an ozone decomposition device 9. The liquid 6 is supplied sequentially through an insertion pump 10, and an electric current is supplied to the low-pressure mercury lamp 3. Thereby, the surface of an object 2 to be cleaned is irradiated with ultraviolet rays.

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