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    • 1. 发明专利
    • WASHING APPARATUS
    • JPH0312275A
    • 1991-01-21
    • JP14685289
    • 1989-06-12
    • MARINE INSTR CO LTD
    • KUBO KAZUKI
    • B08B3/08
    • PURPOSE:To prevent the scattering due to the disturbance of an air stream accompanied by the transport of the object to be washed within a washing tank and to certainly control the presence of vapor by forming a liquid film between a tank wall and a distribution plate by a liquid film generating apparatus to absorb vapor in the tank. CONSTITUTION:A liquid outlet hole 2 is formed to the tank wall 1 of a washing apparatus and a distribution plate 3 is fixed inside the tank wall 1. A solvent inlet part 7 is provided to the single surface of the jacket 6 arranged to the outside of the tank wall 1. The solvent fed in the jacket 6 under pressure from the solvent inlet part 7 is injected to the interior inside the tank wall 1 from the liquid outlet hole 2 to be distributed between the distribution plate 3 and the tank wall 1 and flows downwardly in a tank to form a solvent liquid film 21. The vapor 17 present inside the tank wall 1 is absorbed and recovered by said liquid film 21. Since the vapor can be efficiently absorbed by this method, the presence of the vapor can be freely adjusted and, since the vapor is not whirled by an object 40 to be washed, the diffusion of solvent gas can be prevented.
    • 4. 发明专利
    • WASHING APPARATUS
    • JPH0312276A
    • 1991-01-21
    • JP14685389
    • 1989-06-12
    • MARINE INSTR CO LTD
    • KUBO KAZUKI
    • B08B3/08C23G5/04
    • PURPOSE:To prevent environmental pollution accompanied by the diffusion of solvent gas and to achieve the reduction of running cost and the enhancement of the quality of a recovered regenerated solvent by providing a tank shutter to the shutter box at the boundary of a chamber and a solvent vapor chamber. CONSTITUTION:A solvent vapor chamber 3 is partitioned from a chamber 5 by a tank shutter 6 and the tank shutter 6 reciprocally moves in the shutter box 11 integrally formed to the solvent vapor chamber 3 and the chamber 5 so as to protrude in the direction crossing both chambers 3, 5 at a right angle. The solvent vapor chamber 3 is brought to a hermetically closed state by the opening and closing operation of said shutter 6. Further, an entrance and exit shutter 7 opening and closing the solvent vapor chamber 3 with respect to the outside is provided to the upper part of the solvent vapor chamber 3. Since either one of the shutters 6, 7 is closed in a state shifted in timing and the hermetically closed chamber is negative in pressure, the vapor leaked in the chamber 5 during the opening and closing operation of the shutters 6, 7 is efficiently and certainly recovered from an exhaust port 12.
    • 5. 发明专利
    • METHOD FOR GENERATING LIQUID FILM OF SOLVENT VAPOR
    • JPH0312274A
    • 1991-01-21
    • JP14685189
    • 1989-06-12
    • MARINE INSTR CO LTD
    • KUBO KAZUKI
    • B08B3/08C23G5/04
    • PURPOSE:To certainly alter the vapor line of the solvent gas in a washing apparatus by providing an opening part to the tank wall of the washing apparatus and forming a liquid film between the distribution plate, which is arranged so as to be spaced apart from the inner surface of the tank wall by a predetermined distance to cover the opening part, and the tank wall. CONSTITUTION:A liquid outlet hole 2 is formed to the tank wall 1 of a washing apparatus and a distribution plate 3 is fixed to the tank wall 1 inside said wall 1. A solvent inlet part 7 is provided to the single surface of the jacket 6 arranged to the outside of the tank wall 1. The solvent fed into the jacket 6 under pressure from the solvent inlet part 7 is injected to the interior of the tank wall from the liquid outlet hole 2 to be distributed between the distribution plate 3 and the tank wall 1 and flows downwardly in a tank to form a liquid film. The vapor present inside the tank wall 1 is condensed and absorbed by said liquid film to alter a vapor line. Since vapor can be efficiently absorbed by this method, the alteration of the vapor line can be rapidly adjusted and, since vapor is not whirld up by an object to be washed, the diffusion of solvent gas can be prevented.
    • 6. 发明专利
    • SOLVENT REPRODUCTION AND RECYCLING METHOD IN SOLVENT VAPOR WASHING DEVICE
    • JPH02135124A
    • 1990-05-24
    • JP28886588
    • 1988-11-17
    • MARINE INSTR CO LTD
    • KUBO KAZUKI
    • B01D53/44B01D53/34B01D53/74
    • PURPOSE:To highly clean the materials to be washed by condensing and liquefying the solvent vapor evaporated in a solvent distilling and reproducing vessel to introduce into a solvent vapor washing vessel and returning the polluted solvent in a solvent washing vessel and in the solvent vapor washing vessel to the above-mentioned reproducing vessel. CONSTITUTION:The solvent vapor evaporated in the solvent distilling and reproducing vessel 9 is condensed, liquefied and introduced to the solvent vapor washing vessel 4, and a part of the solvent vapor evaporated in the washing vessel 4 is cooled to liquefied and introduced to the solvent washing vessels 3, 2. The polluted solvent in the solvent washing vessel 3, 2 is returned to the reproducing vessel 9, and the polluted solvent which dissolves the dirts in the materials 11 to be washed in the upper part of the washing vessel 4, is liquefied and dropped down, is collected by a receiving pan 12 to return to the reproducing vessel 9. As a result, the solvent in the washing vessel 14 is kept in a clean state, so that the materials to be washed are highly cleaned.