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JP2012104496A Method and apparatus for producing uniform processing rate 审中-公开
标题翻译：用于生产均匀加工速率的方法和装置
公开(公告)号：JP2012104496A
公开(公告)日：2012-05-31
申请号：JP2011279987
申请日：2011-12-21
申请人： Lam Research Corporation , ラムリサーチコーポレーションLam Research Corporation
发明人： ARTHUR M HOWALD , ANDRAS KUTHI , MARK HENRY WILLCOXSON , ANDREW D BAILEY III
IPC分类号： H05H1/46 , H01J37/32 , H01L21/3065 , H01Q1/26 , H01Q7/00 , H01Q11/12 , H01Q21/29
CPC分类号： H01J37/321 , H01J37/3299 , H01Q7/00 , H01Q21/29 , H05H1/46
摘要： PROBLEM TO BE SOLVED: To provide an antenna arrangement for generating an rf electromagnetic field distribution at a plasma generating region in a process chamber of a plasma processing apparatus.SOLUTION: The antenna arrangement includes an rf inductive antenna 210 for generating a first rf electromagnetic field extending into the plasma generating region, and passive antennas 220, 222. The passive antennas 220, 222 are inductively coupled to the rf inductive antenna 210 to generate a second rf electromagnetic field. The second rf electromagnetic field modifies the first rf electromagnetic field such that the rf electromagnetic field at the plasma generating region has altered radial and azimuthal distributions to provide a different degree of processing uniformity of the processing apparatus from that in the absence of the passive antennas 220, 222. The rf electromagnetic field distribution at the plasma generating region has a different azimuthal symmetry from that in the absence of the passive antennas 220, 222 to the rf inductive antenna 210.
摘要翻译：要解决的问题：提供一种用于在等离子体处理装置的处理室中的等离子体产生区域处产生rf电磁场分布的天线装置。解决方案：天线装置包括用于产生延伸到等离子体产生区域中的第一射频电磁场的射频感应天线210以及无源天线220,222。无源天线220,222感应耦合到射频感应天线210 以产生第二射频电磁场。第二射频电磁场修改第一射频电磁场，使得等离子体产生区域处的射频电磁场具有改变的径向和方位分布，以提供处理装置与不存在无源天线220时的不同程度的处理均匀性等离子体产生区域上的射频电磁场分布具有与在无源天线220,222不存在于rf感应天线210时不同的方位角对称性。（C）2012，JPO和INPIT

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