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    • 6. 发明专利
    • Polishing method
    • 抛光方法
    • JP2009083027A
    • 2009-04-23
    • JP2007254794
    • 2007-09-28
    • Kumamoto PrefectureKumamoto UnivNishinihon Nagase Co Ltd国立大学法人 熊本大学熊本県西日本長瀬株式会社
    • NAGAOKA SHOJINAGATA MASANORIIHARA HIROTAKATAKATO MAKOTOSATO MASARUHIRAKAWA KAZUNARI
    • B24B37/00H01L21/304
    • PROBLEM TO BE SOLVED: To provide a polishing method for enabling highly uniform polishing by considerably reducing scratches, damages and waviness, and also enabling high speed polishing. SOLUTION: A polishing device 100 provided with a rotary surface plate 111 having a smooth surface and a weight 112 arranged oppositely to the surface of the rotary surface plate 111 to add pressing force to a workpiece M via the surface of the rotary surface plate 111 is prepared. After the workpiece M is mounted between the rotary surface plate 111 and the weight 112, and the pressing force is added to the workpiece M, at least one of the rotary surface plate 111 and the weight 112 is displaced in a direction orthogonal to an opposite direction of the rotary surface plate 111 and the weight 112. A polishing liquid 1 in which compound particles 2 having base materials 11 and abrasive grains 12 made of one or a plurality of kinds of inorganic materials and deposited on the surface of at least the base material 11 are dispersed in a dispersant 3, is supplied between the workpiece M and the rotary surface plate 111, to polish the surface on the rotary surface plate 111 side of the workpiece M. COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:提供一种抛光方法,通过显着减少划痕,损伤和波纹,并且还能够进行高速抛光,从而能够进行高度均匀的抛光。 解决方案:抛光装置100设置有具有平滑表面的旋转表面板111和与旋转表面板111的表面相对设置的重物112,以通过旋转表面的表面向工件M增加压力 制备板111。 在工件M安装在旋转表面板111和重物112之间,并且将加压力附加到工件M上之后,旋转表面板111和配重112中的至少一个在与相反的方向正交的方向上移位 旋转面板111和重物112的方向。一种抛光液体1,其中具有基材11的复合颗粒2和由一种或多种无机材料制成并且沉积在至少基体的表面上的磨粒12 材料11分散在分散剂3中,被供给到工件M和旋转面板111之间,以对工件M的旋转面板111侧的表面进行抛光。版权所有(C)2009,JPO&INPIT