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1. 发明专利

JP2001102325A SILVER ALLOY THIN FILM AND SPUTTERING TARGET FOR FILM FORMATION 失效
公开(公告)号：JP2001102325A
公开(公告)日：2001-04-13
申请号：JP28074499
申请日：1999-09-30
申请人： TOYOSHIMA SEISAKUSHO KK , KURAMOTO SEISAKUSHO CO LTD
发明人： KIMOTO DAISAKU , FURUYAMA KOICHI , SUZUKI TADAKATSU , TAKAHASHI YUKI , SATAKE HIROMITSU
IPC分类号： G02B5/00 , G02B5/08 , G02F1/1335 , G02F1/1343 , G02F1/136 , G02F1/1368 , H01J11/22 , H01J11/34 , H01L21/285 , H01L21/336 , H01L29/786 , H01J11/02
摘要： PROBLEM TO BE SOLVED: To provide an Ag alloy thin film for flat panel display and the like with lower electrical resistance than Al, high chemical resistance and heat resistance, satisfactory adherence to substrate and the like and superior patterning property, and to provide a sputtering material with high film formation rate and easy handling of spent material at a low cost. SOLUTION: An Ag sputtering target is a metallic thin film used for manufacturing electrode film of flat panel display, reflection film and light shielding film. Essentially, the film is made of an Ag/Ru/Cu alloy with electrical resistivity which is not higher than 13 μΩm, average reflection property at 90 nm thickness film surface side and visible radiation range, and optical density not lower than 4.0. Weight percentage of three elements is 75

2. 发明专利

JP2001100010A Ag ALLOY BLACK MATRIX AND COLOR FILTER FOR LIQUID CRYSTAL DISPLAY USING SAME 失效
公开(公告)号：JP2001100010A
公开(公告)日：2001-04-13
申请号：JP28074399
申请日：1999-09-30
申请人： KURAMOTO SEISAKUSHO CO LTD , TOYOSHIMA SEISAKUSHO KK
发明人： SUZUKI TADAKATSU , TAKAHASHI YUKI , SATAKE HIROMITSU , KIMOTO DAISAKU , FURUYAMA KOICHI
IPC分类号： G02B5/00 , G02B5/20 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide a new black matrix not containing a harmful metal such as Cr and excellent in fixability and corrosion resistance. SOLUTION: The black matrix is a metallic black matrix used for the color filter substrate of a liquid crystal panel and the black matrix 4 formed on a transparent substrate 1 with a film forming material not substantially containing a harmful metal such as Cr is an Ag alloy black matrix comprising a ternary alloy based on Ag and containing one (element Mx) selected from Au, Pd, Pt, Ru, Rh and Re and one (element MY) selected from Cu, Ti, Zr, Zn and Al.

3. 发明专利

JP2001188048A INSPECTION METHOD FOR PINHOLE 失效
公开(公告)号：JP2001188048A
公开(公告)日：2001-07-10
申请号：JP37449599
申请日：1999-12-28
申请人： KURAMOTO SEISAKUSHO CO LTD
发明人： SUZUKI TADAKATSU , TAKAHASHI YUKI , SAITO NAOYUKI
IPC分类号： G01N21/894
摘要： PROBLEM TO BE SOLVED: To provide an inspection method, for a pinhole, in which the pinhole can be inspected safely inside an ordinary illuminated room, in which a judgment reference conforming to an actual environment or an actual condition in its inspection can be set and in which the pinhole can be detected not only simply but also with high accuracy and at high speed according to a hole diameter zone. SOLUTION: In the method, the number of pinholes and their hole diameters are inspected by image-processing image data which is obtained in such a way that a beam of light which is transmitted through the pinhole 3 existing in a light-shielding thin film out of beams of light with which one face of a light-shielding thin film substrate 2 is irradiated from a light source 1 is photographed by an image receiving sensor 4 in a position facing the light source 1. In an optical device which is provided at an apparatus in advance, a relationship between the measured value of the hole diameter of the pinhole and a pixel which corresponds to the pinhole in image data acquired by the image receiving sensor is stored as a correlation approximate equation. When the pinhole is inspected, the number of pixels corresponding to the pinhole is substituted into the correlation approximate equation. The hole diameter of the pinhole is calculated. The number of pinholes is counted according to the hole diameter zone of the pinhole.

4. 发明专利

JP2000176823A MIRROR POLISHING DEVICE FOR CIRCUMFERENTIAL EDGE PART OF DISC SUBSTRATE 失效
公开(公告)号：JP2000176823A
公开(公告)日：2000-06-27
申请号：JP35511398
申请日：1998-12-14
申请人： KURAMOTO SEISAKUSHO CO LTD
发明人： SUZUKI TADAKATSU
IPC分类号： B24B29/00
摘要： PROBLEM TO BE SOLVED: To mirror polish many glass disc substrates containing chamfer parts on their circumferential edge parts in equal polishing accuracy and at low cost by horizontally arranging a shaft and polishing brushes in parallel with each other, and arranging the shaft above the polishing brushes. SOLUTION: While feeding abrasive slurry S, a shaft 11 and two polishing brushes 13, 14 are rotated to polish the circumferential edge part of a disc substrate. At this time, the shaft 11 and both the polishing brushes 13, 14 are rotatably supported between supporting frames horizontally and in parallel with each other, and the shaft 11 is arranged above both the polishing brushes 12, 14. Thereby, the shaft 11 clampedly holding the disc substrate is fitted or detached without being obstructed with both polishing brushes 13, 14. The polishing brush 13 is planted with brush wires made of synthetic resin of wire diameter of 0.10-0.25 mm, and the polishing brush 14 is planted with brush wires made of synthetic resin of which the wire diameter of wire root is 0.10-0.25 mm and the wire diameter of wire tip is 0.03-0.10 mm.

5. 发明专利

JP2000176804A MIRROR FACE POLISHING METHOD AND POLISHING TOOL 失效
公开(公告)号：JP2000176804A
公开(公告)日：2000-06-27
申请号：JP35195698
申请日：1998-12-10
申请人： KURAMOTO SEISAKUSHO CO LTD
发明人： SUZUKI TADAKATSU
IPC分类号： B24B7/24 , B24D3/28 , B24D5/00
摘要： PROBLEM TO BE SOLVED: To accurately mirror polish the end face of a glass by swinging the autorotating shaft of a polishing tool to finish it so as to pressingly contact the polishing tool with the end face of the glass plate, while buffering and absorbing impact force of working when the polishing tool is pressingly come into contact with the glass plate to polish. SOLUTION: This polishing tool 10 is fitted to a frame plate 20 so that it can swing in an arc circumference territory (u) corresponding to a movable territory restricted with the extensible rod part 24 of an air cylinder 23 and a stopper 25 while buffering and absorbing vibration of the frame plate 20, when the autorotating shaft (p) of the polishing tool 10 is moved in a revolving orbit (t) centering around a frame spindle (o). On the other place in the frame plate 20, a drive motor 21 rotationally driving the polishing tool 10 is provided in parallel through a belt 22, and the autorotating shaft (p) is swung to finish so that the polishing tool 10 is followingly pressingly contacted with the end face of a glass plate 1.

6. 发明专利

JPH11183887A LIQUID CRYSTAL DISPLAY SUBSTRATE 失效
公开(公告)号：JPH11183887A
公开(公告)日：1999-07-09
申请号：JP35380297
申请日：1997-12-22
申请人： KURAMOTO SEISAKUSHO CO LTD
发明人： SUZUKI TADAKATSU
IPC分类号： G02B5/20 , C23C14/34 , G02F1/1333
摘要： PROBLEM TO BE SOLVED: To provide a liquid crystal display substrate which obviates the occurrence of damage, such as cracks and wrinkles in color filter pixels and black matrices, has excellent patterning properties free of line thinning and disconnection, has resistance to an alkali, etc., and has practicability of excellent resistance and transmittance. SOLUTION: This liquid crystal display substrate is constituted by successively disposing a first layer: an oxygen-silicon based film of a film thickness 60 to 120 nm obtd. by applying a polysilazane soln. contg. org. polysilazane on a color filter, then heat treating the color filter, a second layer: a nitrogen- silicon based film of a film thickness 10 to 25 nm obtd. by sputtering deposition in a discharge gas formed by mixing argon and nitrogen and a third layer: an ITO film of a film thickness 350 to 450 nm obtd. by sputtering deposition in a discharge gas formed by mixing argon and oxygen on a color filter substrate for a color liquid crystal display panel.

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