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    • 1. 发明专利
    • METHOD AND INSTRUMENT FOR MEASURING ELECTRICAL CHARACTERISTIC OF ELECTRONIC DEVICE
    • JPH08136612A
    • 1996-05-31
    • JP27101294
    • 1994-11-04
    • HITACHI LTD
    • NAKAGAWA KIYOSHIMIZUKAMI YOSHIMASASAITO TOSHINAO
    • G01R31/26G01R31/28H01L21/66
    • PURPOSE: To accurately measure the characteristic value of an electronic device at which the device drifts due to its own heat generation, etc., in a short time by again measuring the characteristic value by adding a preliminarily impressing fixed voltage pulse or current pulse to the device after the initial characteristic value is once measured. CONSTITUTION: After the initial characteristic value of a semiconductor device (electronic device) is measured by using a first measurement pulse P1, the characteristic value of the device is again measured by using a second measurement pulse P3 by adding a preliminary impressing fixed voltage (or current) pulse P2 and the final value of the device is predicted from the difference between the two measured values. Namely, the final value which is close to the real value of the device is found by adding or subtracting the correcting value obtained from the difference to or from the initial value or the characteristic value of the device is measured while the heat generation is maintained in a saturated state by enlarging the voltage (or current) value of the preliminarily impressing voltage (or current) pulse before measuring the electrical characteristics of the device. Therefore, such an electrical characteristic of the device that the characteristic drifts due to its own heat generation, etc., can be accurately measured in a short time. In addition, the yield and productivity of the electronic device can be improved.
    • 4. 发明专利
    • TREATMENT METHOD AND APPARATUS THEREFOR
    • JPS62169421A
    • 1987-07-25
    • JP1007486
    • 1986-01-22
    • HITACHI LTD
    • NAKAGAWA KIYOSHIOKAWACHI AKITOSHI
    • H01L21/306
    • PURPOSE:To improve the dimensional accuracy of a pattern to be formed on a material without deteriorating the efficiency of the treatment, by providing a storage section for storing data of end points of materials already treated, and determining an unknown end point for a material now treated from the known data stored in the storage section. CONSTITUTION:As an area occupied by light transmitting sections 9 of a light transmission film 2 is increased progressively by etching action of an etching solution 7 given to the light transmitting film 8 of a photo mask blank 2, a progressively larger amount of light 12 is transmitted by the light transmitting sections 9, reflected by a corner cube 13, again transmitted by the light transmitting section 9 and reaches a light receiving section 11. A control section 14 calculates an arithmetical mean, for example, from data of elapsed times Ta and Tb from the initiation to end points for photo mask blanks 2 already treated, the data being held in a storage section 15, and determines a required time to the end point Tc. Thus, the end point is found automatically and precisely based on elapse of the time Tc, and supply of the etching solution 7 and rotation of a rotary table 1 are stopped.
    • 6. 发明专利
    • Inspecting device for photo-mask
    • 检查照相机的设备
    • JPS59105318A
    • 1984-06-18
    • JP21390482
    • 1982-12-08
    • Hitachi Ltd
    • KAWASHIMA HIDEAKINAKAGAWA KIYOSHI
    • G01N21/88G01N21/93G01N21/956G03F1/84H01L21/027H01L21/30H01L21/66
    • G03F1/84
    • PURPOSE:To simplify the constitution of a device, and to miniaturize the device by each evaluating at least two chip patterns of a photo-mask to be inspected and chip patterns in the same number of a standard photo-mask, mutually comparing the values, calculating the correlation of each defect obtained and computing a common defect. CONSTITUTION:Two chip patterns of the photo-mask 2 to be inspected are pattern-detected by a pattern detecting means 10 while two corresponding chip patterns of the standard photo-mask 3 are detected by a pattern detecting means 11. Each pattern is each changed into binary-coded signals in binary-coding converting sections 13, 14, and inputted to a mutual comparison section 15. Binary- coded pattern signals are compared one by one by the photo-mask to be inspected and the standard photo-mask, a section where both are not conformed, a defect section, is outputted to an arithmeic means 16 as its coordinate, and memorized to a micro-computer 17. Accordingly, each defect of the chip patterns in compared number can be detected by their coordinates.
    • 目的:为了简化装置的结构,并且通过每个评估待检查的光掩模的至少两个芯片图案和相同数量的标准光掩模的芯片图案相互比较,来简化装置的小型化, 计算获得的每个缺陷的相关性并计算共同的缺陷。 构成:由图案检测装置10对要检查的光掩模2的两个芯片图案进行图案检测,同时通过图案检测装置11检测标准光掩模3的两个对应芯片图案。每个图案各自改变 转换成二进制编码转换部分13,14中的二进制编码信号,并输入到相互比较部分15.二进制编码的图案信号通过要检查的光掩模和标准光掩模, 其中两个不一致的缺陷部分作为其坐标输出到算术装置16,并且被存储到微计算机17.因此,可以通过它们的坐标来检测比较数目中的每个芯片图案的缺陷。
    • 7. 发明专利
    • Pattern inspecting method
    • 图案检查方法
    • JPS58211601A
    • 1983-12-09
    • JP9312382
    • 1982-06-02
    • Hitachi Ltd
    • NAKAGAWA KIYOSHIYABUHARA YOUJINAKAJIMA JIYUUMEIKAWASHIMA HIDEAKITANABE ISAO
    • G01N21/88G01B11/24G01B11/30G01N21/93G01N21/956G03F1/84H01L21/027H01L21/66
    • G01N21/95607
    • PURPOSE:To make it possible to automate pattern inspection, by performing binary coding of pattern forming data and the pattern of a body to be inspected, comparing both binary coded signals, and detecting the defects in the pattern. CONSTITUTION:Pattern data to be formed in a body under inspection is stored in a memory medium 1. The data in said memory medium 1 is divided into a plurality of rectangular pieces of information in data conversion part 2. The data is stored in a memory 11 in the binary coded state in association with the moving signals for an XY table 7. In a memory 10, the pattern of the body under inspection 6, which is optically detected, is stored in the binary coded state. In a comparing circuit 13, stored data in the memory 10 and the data in the memory 11 are compared. When the contents of both memories are not equal, a defect signal is outputted.
    • 目的:为了使模式检查自动化,通过对图案形成数据进行二进制编码和检测体的图案,比较二进制编码信号,并检测图案中的缺陷。 构成:将要检查的身体中形成的图案数据存储在存储介质1中。所述存储介质1中的数据在数据转换部分2中被分成多个矩形的信息。数据存储在存储器 与XY表7的运动信号相关联的二进制编码状态11中。在存储器10中,被检测到的被检体6的图案以二进制编码状态存储。 在比较电路13中,比较存储器10中存储的数据和存储器11中的数据。 当两个存储器的内容不相等时,输出缺陷信号。
    • 8. 发明专利
    • Inspecting method and device for foreign substance
    • 外部物质的检查方法和装置
    • JPS58199527A
    • 1983-11-19
    • JP8145582
    • 1982-05-17
    • Hitachi Ltd
    • KAWASHIMA HIDEAKINAKAGAWA KIYOSHI
    • G01N21/88G01N21/93G01N21/94G01N21/956H01L21/027H01L21/30H01L21/66
    • H01L21/30
    • PURPOSE:To inspect the presence a foreign substance in high reliability by projecting a light of fine luminous flux diameter to an article to be inspected, receiving the transmitted light by an image sensor, and detecting and discriminating the output characteristics. CONSTITUTION:When the fine luminous flux of a light from a luminous flux source 6 is projected to the lower surface of an article 1 to be inspected, the article 1 is spot emitted, the emitted part is focused by a focusing lens 7, and an image is formed on a linear image sensor 8. A pattern of the surface of the article 1 is focused on a plurality of image pickup elements arranged in one- dimension of the sensor 8, and electric signals are outputted from the respective image pickup elements to a detection discriminator 9. Various modes of characteristics are stored in advance in the discriminator 9, and when the output is compared with the modes, the presence of a foreign substance can be detected.
    • 目的:通过将待检测物品投射出细光通量的光,通过图像传感器接收透射光,并检测和识别输出特性,来检查高可靠性的外来物质的存在。 构成:当来自光束源6的光的细光通量投射到待检查物品1的下表面时,物品1被点发射,发射部分被聚焦透镜7聚焦,并且 图像形成在线性图像传感器8上。物品1的表面的图案被聚焦在布置在传感器8的一维中的多个图像拾取元件上,并且电信号从各个图像拾取元件输出到 检测鉴别器9.各种特征模式预先存储在鉴别器9中,并且当输出与模式进行比较时,可以检测异物的存在。
    • 9. 发明专利
    • PATTERN INSPECTING APPARATUS
    • JPS57130424A
    • 1982-08-12
    • JP1573781
    • 1981-02-06
    • HITACHI LTD
    • NAKAGAWA KIYOSHIKAWASHIMA HIDEAKI
    • G01N21/88G01N21/93G01N21/956G03F1/00G03F1/84H01L21/027H01L21/30H01L21/66
    • PURPOSE:To enable a positioning in pattern inspection automatically and at a high accuracy by shifting a position of a movable detecting section in response to a calculation output on the basis of a signal from the fixed and movable detecting section. CONSTITUTION:A fixed detecting section 16 is set roughly over a predetermined unit pattern P3 for a photo mask 10 mounted on X-Y table 11 and the unit pattern P3 is compared with a reference pattern signal 22. Subsequently, the table 16 is shifted so that the pattern P3 is set at a predetermined position for the detection part 16. Subsequently, after a movable detecting section 17 is set roughly over a unit patter P4 to be compared, a pattern signal for the detecting sections 17, 16 is compared with the other. In this case, if there exists a displacement between the pattern signals, an operation decision circuit 21 is operated to actuate a motor 18 through a control circuit 24 and perform a positioning for the pattern P4 through a feedback control of the detecting section 17, 16. Therefore, after the positioning for the detecting sections 17, 16 has been completed, the circuit 21 performs a detailed comparison between the shapes of the patterns P3 and P4 to decide the acceptability concerning the quality of the patterns 4, 3.