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1. 发明专利

JPH04154040A MICROSCOPIC LASER EXCITATION MASS SPECTROMETER 失效
公开(公告)号：JPH04154040A
公开(公告)日：1992-05-27
申请号：JP27626790
申请日：1990-10-17
申请人： HITACHI LTD
发明人： EGUCHI KINYA , YAMAGUCHI HIROKATSU , EDAMURA TAKAO
IPC分类号： G01N27/64 , H01J49/16 , H01J49/26 , H01J49/40
摘要： PURPOSE:To operate a laser beam at high speed on a sample by installing a reflecting mirror provided on the point of a multilayered piezoelectric device between a laser beam source and a sample. CONSTITUTION:Reflecting mirrors 11, 11' provided on the point of a multilayered piezoelectric device are installed on a light passage between a laser beam source 3 and a sample 2, and the reflecting angle of the mirros 11, 11' is changed stepwise. Namely, the laser beam is scanned on the sample 2 by changing the voltage of the multilayered piezoelectric device in the direction X by one of the reflecting mirros 11, 11' mounted on the point of a couple of multilayered piezoelectric device, while scanning in the direction Y is carried out by the reflecting mirror mounted on the point of the other multilayerd piezoelectric device, by changing voltage in the same manner. By defining one end as a fulcrum of the mirror while changing the other end by piezoelectric device, large scanning of laser beam is possible on the sample 2. Thus, mass spectrometry can be carried out by scanning the laser beam at high speed on the sample 2, and the information related to distribution of the sample of various ion intensity correspondent to ion masses, can accurately be measured.

2. 发明专利

JPH04154039A MICROSCOPIC LASER MASS SPECTROMETER 失效
公开(公告)号：JPH04154039A
公开(公告)日：1992-05-27
申请号：JP27626690
申请日：1990-10-17
申请人： HITACHI LTD
发明人： YAMAGUCHI HIROKATSU , EGUCHI KINYA , EDAMURA TAKAO
IPC分类号： G01N27/64 , H01J49/16 , H01J49/26 , H01J49/40
摘要： PURPOSE:To irradiate a laser beam focused very narrowly on a sample to be measured by installing an objective lens on which an ion passage hole is formed in the center part, between a reflecting mirror and the sample. CONSTITUTION:An objective lens 22b on which an ion passage hole 24a in the center, is provided between a reflecting mirror 24 and a sample 2, so as to increase the number of apertures (N.A.). Namely, since there is a reflecting mirror between an objective lens and a sample in a conventional device, the focal interval of the objective lens is long for a structural reason, and N.A. cannot be increased. In the present device, since there is nothing between the objective lens 22b and the sample 2, an objective lens of small focal interval and of large N.A. can be used. A laser beam 7 can thus be focused narrowly on the sample.

3. 发明专利

JPS63154940A CLEANING OF INTERNAL OBSERVATION WINDOW FOR APPARATUS UTILIZING PLASMA 失效
公开(公告)号：JPS63154940A
公开(公告)日：1988-06-28
申请号：JP30121186
申请日：1986-12-19
申请人： HITACHI LTD
发明人： KOMIYAMA YUZURU , OKAMOTO AKIRA , EDAMURA TAKAO
IPC分类号： G01N21/15 , G21B1/00 , G21B1/05 , H05H1/00
摘要： PURPOSE:To enable removal of a plasma product adhering to a window while a thin film working or the like is carried on, by irradiating an observation window of a plasma equipment in operation with a laser beam that has limited absorption by a window material of the observation window. CONSTITUTION:Absorption energy of a plasma reaction product 13 is about 0.1-0.5eV as adhering to an internal observation window 12 of an equipment utilizing plasma. The window 12 is irradiated with a laser beam that has limited absorption by a window material thereof from a laser beam oscillating section 1 through a scanning section 8. s a result, the plasma reaction product 13 absorbs a part of the laser light and a photochemical reaction is caused by the energy thereof to remove the product 13 by decomposition and volatilization thereof. This enables the removal of the plasma product 13 on the observation window 12 while a thin film working or the like is carried on with a plasma apparatus 10 thereby increasing the operating rate of the apparatus significantly.

4. 发明专利

JPS6015925A SOFT X-RAY GENERATOR 失效
公开(公告)号：JPS6015925A
公开(公告)日：1985-01-26
申请号：JP12318383
申请日：1983-07-08
申请人： HITACHI LTD
发明人： NAKANO ASAO , HIRATSUKA YUTAKA , ABE HIROAKI , EDAMURA TAKAO
IPC分类号： H01J35/00 , G03F7/20 , H01L21/027 , H05G1/52 , H01L21/30 , H05G1/00
摘要： PURPOSE:To enable to hold the optimum shape of an image by regulating the converged shape of the X-ray focus image of a soft X-ray generator by a method wherein the X-ray focus image detected by an X-ray detector is inputted to a control means interlinked therewith to control an electron beam. CONSTITUTION:A two-dimentional X-ray detector 41 is arranged at the position to face mutually with the irradiating face 29 of a rotary opposite cathode 28, an electrode 36 is interposed in a gap part between the two-dimentional X-ray detector 41 and the irradiating face 29, and a pin hole 40 is dug in the electrode 36. A control means 42 is connected to the two-dimentional X-ray detector 41, and the control means 42 is interlinked with an electron gun 31 to control an electron lens 35, etc. Moreover, a display 43 is coupled to the control means 42, the converged shape of the electron beam 9 of the irradiating face 29 is detected according to the two-dimentional X-ray detector 41, and the converged shape thereof is controlled according to the control means 42 so as to generate the best beam density.

5. 发明专利

JPS52151089A QUANTIFYING METHOD FOR FOREIGN MATTER IN METAL 失效
公开(公告)号：JPS52151089A
公开(公告)日：1977-12-15
申请号：JP6766576
申请日：1976-06-11
申请人： HITACHI LTD
发明人： EDAMURA TAKAO , HIRATSUKA YUTAKA
IPC分类号： G01N23/225
摘要： PURPOSE:To analyze in short time foreign matter in metal by detecting cathode luminescence within metal.

6. 发明专利

JPH0293070A PLASMA FILM FORMING AND PROCESSING APPARATUS 失效
公开(公告)号：JPH0293070A
公开(公告)日：1990-04-03
申请号：JP24101588
申请日：1988-09-28
申请人： HITACHI LTD
发明人： EDAMURA TAKAO
IPC分类号： B01D45/08 , C23C16/44 , C23C16/50 , H01L21/205 , H01L21/31
摘要： PURPOSE:To improve scavenging efficiency and to reduce the loading of evacuator and toxicity-removing equipment by providing a turbine-shaped collision plate to a trapping device and allowing unreacted gases and reaction products to adhere to the internal wall of the trapping device. CONSTITUTION:Reaction and decomposition products produced in a plasma film forming and processing chamber 2 and unreacted reactant gases unconsumed are passed through an exhaust pipe 3 and a valve 3a and sucked into a trapping device 5. The introduced unreacted gases and reaction and decomposition products are allowed to collide against a turbine-shaped collision plate 8. A part of the reaction products, etc., are allowed to collide against the blades of the turbine-shaped rotary collision plate 8, and a part of the above is sedimented by gravity and further allowed to adhere to the internal wall of the trapping device 5 by means of a refrigerant 6. The turbine-shaped rotary collision plate 8 is always kept turning, by which the reaction products, etc., can be prevented from adhering to only the same position. By this method, even a small foreign matter can be scavenged with superior efficiency, and the maintenance period of the film forming and processing apparatus can be prolonged.

7. 发明专利

JPS63119221A TRAPPING DEVICE FOR PLASMA FILM-FORMATION PROCESSING EQUIPMENT 失效
公开(公告)号：JPS63119221A
公开(公告)日：1988-05-23
申请号：JP26374386
申请日：1986-11-07
申请人： HITACHI LTD
发明人： EDAMURA TAKAO , KOMIYAMA YUZURU
IPC分类号： H01L21/302 , H01L21/205 , H01L21/3065 , H01L21/31
摘要： PURPOSE:To shorten the time of the removal of collecting substances by introducing chemicals dissolving the collecting substances such as an alkaline solution, water, an organic solvent, etc. into a trapping device through a chemical introducing system. CONSTITUTION:A trapping device for a plasma film formation processing equipment is constituted by installing the plasma film-formation processing equipment 2, an introducing system for a reaction gas to the plasma film-formation processing equipment 2, a trapping device 6, a dry-air introducing system to the trapping device 6, a trap exhaust system, a trap bypass system, an air vent system for the trapping device 6, a chemical introducing system to the trapping device 6, a dissolving-liquid discharge system from the trapping device 6, and a toxic-substance removing facility 16 treating an unreacted gas and collecting substances 8 from the trapping device 6. The collecting substances 8 adhering on the inner wall of the trapping device 6 are dissolved by chemicals 15a by admitting the chemicals 15a to the trapping device 6.

8. 发明专利

JPS59192941A Plasma distribution monitor 失效
标题翻译：等离子体分布监测仪
公开(公告)号：JPS59192941A
公开(公告)日：1984-11-01
申请号：JP6566083
申请日：1983-04-15
申请人： Hitachi Ltd
发明人： KANEKAWA MASAO , OSADA HISAJIROU , EDAMURA TAKAO
IPC分类号： G01N21/64 , H05H1/00
CPC分类号： G01N21/6402
摘要： PURPOSE:To measure the two-dimensional distribution state of chemical species securely even when fluoresce is weak by providing a fluoresce converging means on the side opposite to the incidence side of a plasma utilizing device for laser light for excitation. CONSTITUTION:The plasma utilizing device 4 has an incidence window 5 formed in its vacuum container, and transmitted laser light 25 passed through plasma is guided out of a measurement window 6 formed on the side opposite to the incidence window 5. Laser light 24 incident to the device 4 operates on plasma material 28 to generate fluoresce. This fluoresce is incident to a polarizer 28 together with the transmitted laser light 25 by the laser light 24, so an electric signal corresponding to light with the wavelength of the fluoresce is obtained from a detector 11. A microprocessor 18 performs specific arithmetic every time laser light 23 is pulsated and outputted by a variable laser oscillator 1, and a desired integral value is diagramed and displayed on a display device 19.
摘要翻译：目的：通过在激光的激光等离子体利用装置的入射侧的相反侧提供荧光收敛装置，即使在荧光弱的情况下，也可以安全地测量化学物质的二维分布状态。构成：等离子体利用装置4具有在其真空容器内形成的入射窗5，通过等离子体的透射激光25从形成在与入射窗5相反的一侧的测量窗6引出。激光24入射到器件4在等离子体材料28上操作以产生荧光。这种荧光通过激光24与透射的激光25一起入射到偏振器28，因此从检测器11获得对应于具有荧光波长的光的电信号。微处理器18每次在激光器光23被可变激光振荡器1脉冲输出，并且所需的积分值被示出并显示在显示装置19上。

9. 发明专利

JPS5773653A Automatic measuring apparatus for specific gravity of liquid 失效
标题翻译：液体特殊重量的自动测量装置
公开(公告)号：JPS5773653A
公开(公告)日：1982-05-08
申请号：JP14941280
申请日：1980-10-27
申请人： Hitachi Ltd
发明人： WATANABE MASAHIRO , EDAMURA TAKAO , ODAJIMA KENJI
IPC分类号： G01N9/04
CPC分类号： G01N9/04
摘要： PURPOSE:To measure the specific gravity of process liquid continuously and automatically, by keeping the volume of the liquid entered measuring pipe by a siphon mechanism constant and measuring its weight continuously. CONSTITUTION:A liquid 3 is collected in a measuring pipe 2 successively by supplying the liquid 3 from a supply pipe 1. When a water level A in a supply side straight pipe 21 of the liquid 3 is exceeded a maximum water level B obtained at the upper S-shaped crooked part, the liquid 3 flows out and nearly the whole quantity of the liquid 3 flows out by a siphon mechanism. When discharge of the liquid is finished, the liquid 3 from the pipe 1 is collected in the pipe 2 successively. The pipe 2 is placed and is fixed to a weighing stand 5 of a weight balance 4 and the weight variation by the increase and decrease of the liquid is converted into an electric signal by a transducer 6 and said signal is sent to a display device 7 and a recorder 8. Only the maximum value is recorded and displaying and recording value can be expressed as the specific gravity by calculating it.
摘要翻译：目的：连续自动测量加工液的比重，通过虹吸机构保持进入测量管的液体体积不变，连续测量其重量。构成：通过从供给管1供给液体3，连续地将液体3收集在测量管2中。当液体3的供给侧直管21中的水位A超过在液体3处获得的最大水位B时上部S形弯曲部分，液体3流出，并且几乎全部液体3通过虹吸机构流出。当液体排出完成时，来自管1的液体3依次被收集在管道2中。管2被放置并固定到重量平衡4的称重台5上，并且通过换能器6将液体的增加和减少的重量变化转换成电信号，并将所述信号发送到显示装置7 和记录器8.仅记录最大值，并且通过计算显示和记录值可以表示为比重。

10. 发明专利

JPS5451067A METHOD AND APPARATUS FOR SEPARATING POWDER 失效
公开(公告)号：JPS5451067A
公开(公告)日：1979-04-21
申请号：JP11688977
申请日：1977-09-30
申请人： HITACHI LTD
发明人： WATANABE MASAHIRO , EDAMURA TAKAO
IPC分类号： B01D29/01 , B03B5/00 , B07B1/00
摘要： PURPOSE:To provide a method and apparatus for separating powder effectively, wherein a powder having a grain size within an exact range can be obtained. CONSTITUTION:Powder is introduced into the present apparatus through intakes 13 while liquid is introcuced through inlets 13. The liquid with the powder dispersed therein is forced by means of pumps 1 to flow in an direction indicated by arrows, and in a first tank 4 the liquid becomes an asending stream with a higher velocity due to an upper narrowed portion 5 and flows upward through a filter 6. In this case, only a powder having a smaller grain size can pass through the filter 6 while a powder having a greater grain size adheres on the filter 6 or deposits on the bottom of the tank 4. The stream which has passed through the filter 6 flows into a second tank 4 through a pipe 9. Thus the stream further passes succesively through filters 6, a reservoir 11 and a filter 10 to be finally collected in a reservoir 12 for the liquid, from which a powder having a grain size within a certain range can be obtained.

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