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1. 发明专利

JPS5347776A CONTROL SYSTEM OF CHARGED PARTICLE BEAM DEFLECTION 失效
公开(公告)号：JPS5347776A
公开(公告)日：1978-04-28
申请号：JP12316676
申请日：1976-10-14
申请人： NIPPON TELEGRAPH & TELEPHONE , HITACHI LTD
发明人： IWATA ATSUSHI , FUJINAMI AKIHIRA , SHIBAYAMA AKINORI , YOKOZAWA NORIO , MAIO KENJI , FUJIKATA KENJI
IPC分类号： H01J37/147 , G09G1/08 , H01L21/027 , H04N3/16
摘要： PURPOSE:To improve speed and accuracy by making selective use of an analog system which generates a triangular deflection signal being of low speed but having good linearity and a digital system which generates a stepwise deflection signal changing at a high speed.

2. 发明专利

JPS60244026A METHOD FOR ELECTRON BEAM EXPOSURE 失效
公开(公告)号：JPS60244026A
公开(公告)日：1985-12-03
申请号：JP9867584
申请日：1984-05-18
申请人： HITACHI LTD , NIPPON TELEGRAPH & TELEPHONE
发明人： OZASA SUSUMU , KOMODA TSUTOMU , HARADA KATSUYUKI , FUJINAMI AKIHIRA , IWATATE KAZUMI
IPC分类号： H01J37/305 , G03F7/20 , H01L21/027 , H01L21/30
摘要： PURPOSE:To enable to attain electron beam exposure with high speed motion with simple constitution without generating a fall of precision and an increase of circuit scale by a method wherein a figure is divided into small divisions, and a deflection in a division is performed using the fixed correction. CONSTITUTION:A figure (width is W, height is H) to be exposed is divided into the number of an arbitrary integer of 50 or less respectively by the N pieces in the width direction and by the M pieces in the height direction making a beam size (d) as a unit. To make M=1 is desirable for construction of a circuit, and moreover when N is large, the positions of the divisions are shifted alternately. e At a figure data sending computer 1, a figure data dividing circuit 2, a circuit 3 to add correction of deflection distortion, etc. to positional data of a small division, a circuit 4 to resolve a small division into shot data, and a circuit 5 to control a deflector and a blanker, the circuits 1-3 can be constructed according to circuits slower by several ten times, and the circuits 4, 5 to be necessitated with high speeds are the circuits to perform a simple process such as addition to a constant, and to make to perform high speed action can be attained easily.

3. 发明专利

JPS5792832A DATA PROCESS SYSTEM OF ELECTRON BEAM EXPOSING DEVICE 失效
公开(公告)号：JPS5792832A
公开(公告)日：1982-06-09
申请号：JP16929380
申请日：1980-12-01
申请人： NIPPON TELEGRAPH & TELEPHONE , HITACHI LTD
发明人： SHIBAYAMA AKINORI , OOKUBO TSUNEO , FUJINAMI AKIHIRA , YODA HARUO
IPC分类号： H01L21/822 , H01J37/302 , H01L21/027 , H01L27/04 , H01L21/30
摘要： PURPOSE:To enable to make a data process system of electron beam exposing device to have the sufficient faculty to check digital circuits without help of manufal work by a method wherein check of the data process circuits is enabled to be performed at any time by a computer for control of exposure. CONSTITUTION:Data for control of exposure or data for test of circuit is sent out from the computor 2 for control of exposure. When the data is a data for test of circuit, outputs resulted from process of data thereof in respective digital circuits 3A-3C are stored in respective memory circuits 10A-10C. Because the computor 2 stores previously the results obtained by process of data for test of circuit by the respective digital circuits, memories related to the circuits 10A- 10C are read out at any time to compare both, and normality of operation of the respective digital circuits can be checked from the results thereof. When both do not coincide, by judging from which circuit out of the circuits 10A-10C is non- coinciding data read out, the matter of which digital circuit is abnormal can be checked.

4. 发明专利

JPS55120136A METHOD FOR SENSING POSITIONING MARK IN ELECTRONNBEAM LITHOGRAPHY 失效
公开(公告)号：JPS55120136A
公开(公告)日：1980-09-16
申请号：JP2773079
申请日：1979-03-12
申请人： HITACHI LTD , NIPPON TELEGRAPH & TELEPHONE
发明人： ASAI SHIYOUJIROU , ODA ISAMU , OKUMURA MASAHIDE , FUJINAMI AKIHIRA
IPC分类号： H01L21/027 , H01J37/304 , H01L21/30
摘要： PURPOSE:To determin the position of a positioning mark highly accurately, by performing electron-beam scanning along the paths crossing at a mark from the two different points, and sensing the scanning speed of the beam by using the difference in time lengths from the beginning of the scanning and to sensing of the mark. CONSTITUTION:An electron beam is scanned along a path 301 from a point X0- X1, and the beam is turned on and off during the scanning. Scattering of electrons, when the beam crosses a target 302, is sensed; and the time, when the sensed signal crosses a threshold level 303, is sensed. The period from the beginning of the beam scanning to the time at which the threshold crossing is sensed is counted N1-N4 by a counter which is connected to an oscillator with a specified frequency. Then, scanning from a point X0' which is well separated from the point X0 is counted at the same speed to obtain the values N1'-N4'. The scanning speed C is obtained by dividing the distance (X0-X0') by the difference in the arithmetic means of the counted values. The position of the mark can be obtained by X0+C(N1+... +N4)/4 very accurately, and is not affected by the scanning speed of the beam.

5. 发明专利

JPS60244025A ELECTRON BEAM DRAWING DEVICE 失效
公开(公告)号：JPS60244025A
公开(公告)日：1985-12-03
申请号：JP9867784
申请日：1984-05-18
申请人： HITACHI LTD , NIPPON TELEGRAPH & TELEPHONE
发明人： OZASA SUSUMU , SAITOU NORIO , HARADA KATSUYUKI , FUJINAMI AKIHIRA , IWATATE KAZUMI
IPC分类号： H01J37/305 , G03F7/20 , H01J37/317 , H01L21/027 , H01L21/30
摘要： PURPOSE:To enable to attain high speed electron beam drawing with high precision by a method wherein a beam current is changed over corresponding to a figure, and the figure is drawn according to a large beam and a large pitch excluding the case when a figure of minutely high precision is to be drawn according to a small beam and a small pitch. CONSTITUTION:When a beam is small, electron lenses 3, 4 are used. Moreover, when the beam is made large, electron lenses 2, 4 are used to make the system to a magnification system. Namely, the beam can be changed only by selecting either of the lenses 2, 3 to be used, and the change of the beam current becomes to the square of magnification. When the electron beam current is made large, the scanning pitch is made rough, and the scanning speed is made the same, because the number of beam projecting times is small, and the scanning speed is the same when the figure is drawn with a large beam, drawing time can be curtailed.

6. 发明专利

JPS57139607A POSITION MEASURING EQUIPMENT 失效
公开(公告)号：JPS57139607A
公开(公告)日：1982-08-28
申请号：JP2432981
申请日：1981-02-23
申请人： HITACHI LTD , NIPPON TELEGRAPH & TELEPHONE
发明人： KATOU YASUO , HOKOTANI YOSHIO , OZASA SUSUMU , IDO SATOSHI , FUJINAMI AKIHIRA
IPC分类号： G03B27/34 , G01B11/00 , G01B11/02 , G01C3/06 , H01L21/027 , H01L21/30
摘要： PURPOSE:To measure the position of the surface of an object with high accuracy even if the reflectance of the surface differs from place to place by controlling the intensity of the light source in such a manner that the quantity of the light which enters a detector after being reflected by a small light spot on the object is to be the standard value established beforehand. CONSTITUTION:The light from a semiconductor laser 11 is focused on the surface of an object 14 through a diaphragm 12 and a lens 13. At the time the diameter of the spot is made less than ten times of the measurement error. The reflected light is forcused on a detector 16 through a lens 15. When the spot on the surface of the object 14 moves from position A to position A', the image on the detector 16 moves from B to B' and the output voltage difference a-b of terminals a and b of the detector 16 changes according to the displacement of the image. The output c of an amplifier 17 corresponding to a+b is fed back to the semiconductor laser 11 by an amplifier 19 so as to become equal to the standard voltage. The ratio of a-b to a+b is put out through the amplifier 17 and a divider. With this constitution, the position of the object can be measured with high accuracy even if the reflectance of the surface differs from place to place.

7. 发明专利

JPS5795629A ELECTRON BEAM EXPOSURE DEVICE 失效
公开(公告)号：JPS5795629A
公开(公告)日：1982-06-14
申请号：JP17157980
申请日：1980-12-05
申请人： NIPPON TELEGRAPH & TELEPHONE , HITACHI LTD
发明人： UNO TAIDOU , TAKAMOTO KIICHI , FUJINAMI AKIHIRA , MATSUDA KOREHITO , OZASA SUSUMU , YODA HARUO
IPC分类号： H01L21/027 , H01J37/317 , H01L21/30
摘要： PURPOSE:To make it possible to detect errors in a pattern due to erroneous operation and the like, by providing a circuit memorizing the number of shots required for pattern scribing, a blanking counter, and a beam detection counter, and comparing the contents of the circuits one another at the appropriate time. CONSTITUTION:The ON and OFF operation and the deflection of the electron beam are controlled by a digital control circuit 11 based on the pattern data and the control signal from a CPU10. For example, in a formed beam system, the number of divisions of the pattern is computed and sent to a shot number memory circuit 12. Pulses are sent to the blanking counter 14 every time the blanking signal is generated from a driving circuit 16. The pulses are sent to the beam detection counter 15 through a detector 25 and a circuit 17 every time the detected signal of the beam which has arrived at a exposing specimen 26, exceeds a specified level, and the pulses are counted. The contents of the circuits 12, 14, and 15 are inputted in a comparator 13 which is provided in the circuit 11, every time the scribing of the arbitrary unit of the pattern data has completed. The erroneous operation or abnormality in the circuit systems and the electrooptical systems can be detected based on the agreement or disagreement in the comparison, and the pattern error can be confirmed.

8. 发明专利

JPS55111130A ELECTRON BEAM SCANNING SYSTEM 失效
公开(公告)号：JPS55111130A
公开(公告)日：1980-08-27
申请号：JP1834079
申请日：1979-02-21
申请人： HITACHI LTD , NIPPON TELEGRAPH & TELEPHONE
发明人： KURODA KATSUHIRO , FUJINAMI AKIHIRA , SHIBAYAMA AKINORI , OOKUBO TSUNEO
IPC分类号： H01L21/027 , H01J37/302
摘要： PURPOSE:To obtain a high speed electron scanning, by a method, when a square aperture is reduced in shape and projected on an electron sensitive material to display a pattern, wherein a digital scanning and an analog scanning are performed jointly. CONSTITUTION:When a pattern shown in the figure is to be displayed and the electron beam is stopped at a position 11, the electron beam radiation is continued for a predetermined time t1, then the electron beam is shifted and stopped at a position 12 in a time t2 and the radiation is continued for the time t1, and is shifted again to a position 13 after the time t2. In this way the beam is digitally scanned one after another along the circumference of the pattern till the beam reaches a position 14. Then the beam is shifted to a position 15 and scanned till it reaches a position 16 radiating the electron beam to the electron sensitive material. From this position, the beam is shifted without radiating the electron beam to a position 17. From the position 17, the beam is scanned radiating the electron beam similarly till the beam reaches to a position 18, and displays the inside of the pattern by the analog scanning.

9. 发明专利

JPS5541654A ELECTRON BEAM DEFLECTOR 失效
公开(公告)号：JPS5541654A
公开(公告)日：1980-03-24
申请号：JP11462878
申请日：1978-09-20
申请人： HITACHI LTD , NIPPON TELEGRAPH & TELEPHONE
发明人： KURODA KATSUHIRO , TAKEUCHI YOSHINOBU , FUJINAMI AKIHIRA , MORIYA SHIGERU
IPC分类号： H01J37/147 , H01J37/305 , H01L21/027 , H01L21/30
摘要： PURPOSE:To make the promotion of improvement of the frequency characteristic, without causing an error of positioning, by such means that, near around a magnetic field type deflector, be arranged an electrostatic deflector, with its deflecting plate insulator applied a non-magnetic conductive material, to make both of the deflecting center coinciding. CONSTITUTION:The constitution comprises an electrostatic deflector, in which a non-magnetic conductive material 22 is applied to surfaces of an insulator 21 plate, and a magnetic field type deflector, consisting of a deflecting coil 23 and a magnetic substance 24 like ferrite, and deflection centers of the both deflectors are made coinciding. In this way, a worsening of magnetic response, caused by an eddy current of the magnetic field type deflector, can be prevented, thus the dynamic characteristic (frequency characteristic) can be improved.

10. 发明专利

JPS5362084A DIGITAL TYPE POSITIONING CONTROL SYSTEM 失效
公开(公告)号：JPS5362084A
公开(公告)日：1978-06-03
申请号：JP13728876
申请日：1976-11-17
申请人： HITACHI LTD , NIPPON TELEGRAPH & TELEPHONE
发明人： ODA ISAMU , MATSUOKA GENYA , ISHIKAWA SHIZUO , FUJINAMI AKIHIRA
IPC分类号： G05D3/12
摘要： PURPOSE:To remove the error due to the vibration and the inertia of a control object, by means of resetting and correcting the error at atopping time after the positioning.

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