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    • 5. 发明专利
    • VACUUM CLEANER
    • JPH1142191A
    • 1999-02-16
    • JP19968097
    • 1997-07-25
    • HITACHI LTD
    • TAKAMUNE YUICHIROSUZUKI TOSHIOKAWAMATA MITSUHISA
    • A47L9/28
    • PROBLEM TO BE SOLVED: To simplify the constitution to switch an ordinary operational action and an action except for ordinary operation by closing a power source in a condition where a switch to switch operation of an input control device is pushed down, and performing the action except for ordinary operation when a pushing-down condition passes by a prescribed time. SOLUTION: When a main body switch 7 is pushed down, a level signal convering means 21 outputs a level signal to a microcomputer 14, and the microcomputer 14 starts operation by its level signal, and judges operation mode switching or stopping. This main body switch 7 stops a vaccum cleaner every time when the switch is accepted in an ordinary using condition, and switches a strong mode, a medium mode and a weak mode of suction force in order, and repeats to return again to a stopping condition, but when a demonstration mode is started by the main body switch 7, the main body switch 7 is pushed down for a prescribed time or more at power source closing time. Therefore, a refuse quantity display of a small refuse quantity, a medium refuse quantity and a large refuse quantity can be periodically switched.
    • 6. 发明专利
    • ACTIVE FILTER DEVICE
    • JPH09258839A
    • 1997-10-03
    • JP7231896
    • 1996-03-27
    • HITACHI LTD
    • SAKAI KEIJIROKUBO KENJINUMATA YUKISUZUKI TOSHIO
    • H02J3/01G05F1/70H02M7/48
    • PROBLEM TO BE SOLVED: To satisfy power source higher harmonic restriction, to reduce the loss of a PWM converter and to save energy in an active filter controller where the current of the PWM converter is controlled so as to cancel higher harmonic current at a load side. SOLUTION: The controller is provided with a means for detecting instantaneous harmonic current at the load side by a current detecting equipment 11a so as to adopt it as a higher harmonic compensating current command ic*, a means 16 for detecting the sizes of fifth, seventh, eleventh and thirteenth higher harmonic current at a power source system side and the higher harmonic current restriction value setting means of respective ordinal numbers. A comparing means 17 successively reduce the amplitude of the higher harmonic compensating current command by changing compensation gain K within a range where a higher harmonic current detecting value at every ordinal number does not become more than a restriction value so as to execute an operation by weakening higher harmonic curren compensation. When the amplitude of the current command becomes zero, the comparing means 18 outputs an interrupting signal and a gate voltage to the PWM converter 3 is interrupted from an AND means 15.
    • 8. 发明专利
    • CUTTING MECHANISM FOR COATING
    • JPH07236215A
    • 1995-09-05
    • JP2398294
    • 1994-02-22
    • HITACHI LTDHITACHI SCIENCE SYSTEMS LTD
    • SUZUKI TOSHIOASADA KOICHI
    • H02G1/12
    • PURPOSE:To realize positive stripping of coating without replacing a cutter by providing a mechanism for driving a cutter into a coating, and a mechanism for turning the cutter along the outer periphery of a wire. CONSTITUTION:When a main gear 2 turns in the direction (a), a cam gear 3 sustains current state because the rotating force transmitted thereto is lower than the holding force of a gear 4 and thereby only the main gear 2 is rotated. Consequently, a cutter 6 is shifted along a slide groove 18 in the main gear 2 and a spiral groove 17 in the cam gear 3 toward the center of a wire passing hole 11. When three cutters 6 are arranged at a constant angular pitch of 120 deg., a wire 8 is pinched at three point and thereby the wire 8 does not slip but moved uniformly in the direction of the core. When the cutter 6 is guided along the slide groove 18 through a right square part, the cutter can be used on four sides thereof upon abrasion of chipping of the edge. This mechanism realizes positive stripping of coating without replacing the cutter.
    • 9. 发明专利
    • ELECTRIC WIRE CLAMP MECHANISM
    • JPH07119719A
    • 1995-05-09
    • JP26603193
    • 1993-10-25
    • HITACHI LTDHITACHI SCIENCE SYSTEMS LTD
    • ASADA KOICHISUZUKI TOSHIO
    • F16B2/02H02G1/12
    • PURPOSE:To automatically generate holding power resisting to separating force by eliminating work such as maintenance for an electric wire done by a worker or the replacement of a sleeve jig due to a change in electric wire size, etc. CONSTITUTION:A power transmission system consists of a clamp claw part 13 for positively holding an electric wire and a torque holding mechanism for generating constant torque to the clamp claw part. The clamp claw part and the torque holding mechanism are actuated by means of a belt 9 through a driven pulley 10 and a main pulley 5, respectively. A connecting pulley 10 is actuated by synchronizing with the actuation of the pulley 5 and is suspended its operation when the clamp claw 13 is in a state for holding electric wire covering. In this case, a constant torque is always transmitted to the pulley 5 from a motor 2 owing to the action of a joint 3. Thus, even in 13, the electric wire is constantly and positively held with stable torque. Thus, a reduction in working time and energy saving are achieved.
    • 10. 发明专利
    • LITHOGRAPHY USING FOCUSSED BEAM
    • JPH0729790A
    • 1995-01-31
    • JP16764693
    • 1993-07-07
    • HITACHI LTD
    • KATO HIROSHISUZUKI TOSHIOTSUKIZOE AKIRA
    • H01L21/027
    • PURPOSE:To easily and accurately judge the region on which inpattern proximity effect is generated in a focussed beam lithography and a proximity effect correction treatment is conducted on the above-mentioned region in a simple manner. CONSTITUTION:A lithography pattern is divided into straight lines L12, L13... which are extending in the scanning direction (x-direction) of electron beam, and rectangular regions 10A, 10B,... using straight lines L21, L22... which orthogonally intersecting with the above-mentioned straight lines. Also, the line segment X, which comes in contact with the profile L0 of the pattern and extending in the x-direction, is worked out and the line segment Y, which comes in contact with the profile L0 and orthogonally intersecting with the scanning direction, is worked out. The shortest line segments Xa, Xb, Xc..., passing regions 10A, 10B..., are worked out for each region, and the shortest line segments Ya, Yb, Yc... of the line segment Y pssing the same regions, are worked out. In each region, the shorter one of the line segment X and Y is set on the parameter W which shows the width of region. This value W is compared with the base values W1 and W2, and the intensity I1 to I3 of the beam with which the region is irradiated are determined. They are conducted by one graphic operation treatment.