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1. 发明专利

JPH06229939A INSPECTION APPARATUS FOR FOREIGN MATTER 失效
公开(公告)号：JPH06229939A
公开(公告)日：1994-08-19
申请号：JP4040493
申请日：1993-02-04
申请人： HITACHI ELECTR ENG , HITACHI LTD
发明人： MATSUNAGA RYOJI , OSHIMA YOSHIMASA
IPC分类号： G01B11/30 , G01N21/88 , G01N21/94 , G01N21/956 , G02B27/28 , H01L21/66 , H01S3/00
摘要： PURPOSE:To realize an inspection apparatus of a foreign matter which can detect a minuter foreign matter without lowering an inspection efficiency and, besides, facilitates a unitary control of data. CONSTITUTION:A polarizing-separating element 49 for polarizing a scattered light of an applied laser beam L of an S wave and separating it into an S polarized light and a P polarized light is disposed on a convergence line of the scattered light, and the result Da of detection of the S polarized light by Fourier transform systems 62, 61, 41 and 42 and the result Db of the P polarized light by non-Fourier transform systems 91 and 92 are determined in parallel. Then, either of the results of detection is selected by a selecting circuit 93 in accordance with layout pattern data 74 as discriminative information, so as to obtain one information data on a foreign matter.

2. 发明专利

JP2000105203A DEFECT INSPECTING DEVICE AND METHOD 失效
公开(公告)号：JP2000105203A
公开(公告)日：2000-04-11
申请号：JP20607899
申请日：1999-07-21
申请人： HITACHI LTD , HITACHI ELECTR ENG
发明人： NOGUCHI MINORU , OSHIMA YOSHIMASA , NISHIYAMA HIDETOSHI , MATSUMOTO SHUNICHI , KENBO YUKIO , MATSUNAGA RYOJI , SAKAI SHIGETOSHI , NINOMIYA TAKANORI , WATANABE TETSUYA , NAKAMURA HISATO , JINGU TAKAHIRO , MORISHIGE YOSHIO , CHIKAMATSU SHUICHI
IPC分类号： G01B11/30 , G01N21/956 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To quickly and precisely inspect a defect such as a very small contaminant by calculating dispersion based on signals in a portion with the same circuit patterns formed or in its vicinity, and by extracting a signal indicating the defect such as the very small contaminant out of detected signals based on a threshold set on the basis of a result calculated hereinbefore. SOLUTION: An illumination optical system 100 having a laser beam 101, lenses 102-104, a beam splitter and the like has a precdribed inclination with respect to a main straight line group of a circuit pattern, and an inspected objective substrate 1 is irradiated subtantially orthogonally to a traveling direction of a substrate mounting table 304 for mounting the objective substrate 1. An inspecting optical system 200 detects reflected scattered light provided by a defect such as a contaminant existing on the substrate 1, using image sensors 205, 206 through lenses 201, 203 and a beam aplitter 204, to feed signals to a processing circuit 400. A threshold as a determination reference is set in a defect determining process in the circuit 400 based on a dispersion of the resulting signals, and the signal indicating the defect such as the contaminant is extracted, based on the set threshold.

3. 发明专利

JPH08210989A METHOD FOR DETECTING FINE DEFECT AND DEVICE THEREFOR 失效
公开(公告)号：JPH08210989A
公开(公告)日：1996-08-20
申请号：JP1948995
申请日：1995-02-07
申请人： HITACHI LTD , HITACHI ELECTR ENG
发明人： SHIBA MASATAKA , MORIOKA HIROSHI , NAGAYAMA KAZUHIKO , YANAI TOSHIAKI , WATANABE TETSUYA , MATSUNAGA RYOJI , NOGUCHI MINORU
IPC分类号： G01N21/956 , G01N21/88 , G01N21/94 , G11B5/84 , H01L21/66
摘要： PURPOSE: To provide a method for detecting a fine defect and a device therefor in which a fine defect such as a fine foreign matter present on a base having a thin film for transmitting a light formed thereon can be stably detected with high sensitivity. CONSTITUTION: The laser beam emitted from a semiconductor laser oscillator 5 is made into a plurality of mutually non-interfering luminous fluxes, which are effectively collected and emitted onto a substrate 1 having a thin film 1b for transmitting a light formed thereon at the same time at different incident angles T1 -Tn so that the intensities of the reflected lights generated from the thin film 1b formed on the substrate 1 are smoothed or averaged. The scattered light of the emitted light caused by a fine defect 3 such as a fine foreign matter present on the base is converged by a condenser lens 11, and detected by a detector 14.

4. 发明专利

JPH085575A METHOD AND APPARATUS FOR DETECTING FOREIGN MATTER PROTRUSION ON COLOR FILTER 失效
公开(公告)号：JPH085575A
公开(公告)日：1996-01-12
申请号：JP16285394
申请日：1994-06-21
申请人： HITACHI ELECTR ENG
发明人： MATSUNAGA RYOJI , NEMOTO RYOJI , SUZUKI NOBUHIKO , TABATA TAKAHITO , KOIZUMI MITSUYOSHI
IPC分类号： G01N21/88 , G01M11/00 , G01N21/94
摘要： PURPOSE:To obtain a method and apparatus for detecting a foreign matter protrusion T on a color filter while discriminating from an adhesion foreign matter (p) and selecting a foreign matter protrusion T exceeding an allowable height. CONSTITUTION:The foreign matter protrusion inspection apparatus 10 comprises an XY moving stage 2 mounting a color filter 11, systems 41A, 41B for illuminating the color filter 11 mounted on the stage 2 with luminous fluxes LT(lambdaH) and LT(lambdaL) of wavelengths lambdaH and lambdaL simultaneously at high and low angles of (40+ or -5) deg. and (15+ or -5) deg., respectively, an optical detection system 4 including a system 42 for receiving a scattering light LR from the protrusion T or the adhesion foreign matter (p), and a signal processing section 5 and a data processing section 6 connected sequentially with the light receiving system 42.

5. 发明专利

JP2003240730A SEMICONDUCTOR CHIP EXAMINING APPARATUS 审中-公开
公开(公告)号：JP2003240730A
公开(公告)日：2003-08-27
申请号：JP2002039356
申请日：2002-02-15
申请人： HITACHI ELECTR ENG
发明人： MATSUNAGA RYOJI , TABATA TAKAHITO , YAMAGUCHI KIYOMI , AYABE SAKAE
IPC分类号： G01N21/956 , G06T1/00 , G06T1/20
摘要： PROBLEM TO BE SOLVED: To accurately detect a fault on the surface of a semiconductor chip contained in a tray. SOLUTION: An image sensor 40 detects a reflected light from the surface of the semiconductor chip contained in the tray 2, and outputs a bright field image signal. An image sensor 50 detects a scattered light from the surface of the chip, and outputs a dark field image signal. A bright field image signal processing circuit 140 of an image signal processing apparatus 100 processes the bright field image signal, and detects the fault on the surface of the chip. A dark field image signal processing circuit 150 processes the dark field image signal and outputs the fault on the surface of the chip. COPYRIGHT: (C)2003,JPO

6. 发明专利

JP2002022415A FINE PROTRUSION INSPECTING APPARATUS 失效
公开(公告)号：JP2002022415A
公开(公告)日：2002-01-23
申请号：JP2001128287
申请日：2001-04-25
申请人： HITACHI ELECTR ENG
发明人： MATSUNAGA RYOJI , TAKAHASHI TSUTOMU , ISHIMORI HIDEO , TABATA TAKAHITO
IPC分类号： G01B11/02 , G01B11/00 , G01N21/956 , G02F1/13 , H01L21/60 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To inspect the height of a fine protrusion at a high accuracy and a high speed. SOLUTION: Projection optical system means radiates a light beam so as to locate the surface of a sample under test at a focused position and deflects a beam spot formed on the sample surface to linearly reciprocally scan over an inspecting region at a specified period. Detecting optical system means generates two semi-circular light beams with mutually different regions shielded from light beams reflected from the sample surface, and they are received separately by a first and second optical sensor means to obtain height information from detected signals thereof. Thus the height information are obtained, based on the detected signals from the two systems of optical sensor means, hence the detection accuracy is improved and, if a thermal variation of each optical element constituting the projection optical system means or a deflection error in the deflection causes a spot scan deviation (Δt), a high accuracy measurement can be made, without being influenced thereby.

7. 发明专利

JP2001311608A FINE PROTRUSION INSPECTION APPARATUS 失效
公开(公告)号：JP2001311608A
公开(公告)日：2001-11-09
申请号：JP2000131967
申请日：2000-05-01
申请人： HITACHI ELECTR ENG
发明人： MATSUNAGA RYOJI , TABATA TAKAHITO , ISHIMORI HIDEO
IPC分类号： G01B11/02 , G01B11/00 , G01B11/24 , G01B11/245 , G01B11/30 , G01C3/06 , G03F7/20 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To make highly accurate and fast inspection of the height of a fine protrusion performable. SOLUTION: By a projection optical system means, a light beam is made to irradiate the surface of a simple to be inspected to make the surface the focusing position, and deflects a beam spot formed on the surface of the sample by the light beam so as to reciprocally scan the inspection area linearly at a specified cycle. A branching means branches the light beam reflected from the surface of the sample into two light beams. First and second optical sensor means respectively receive the light beam branched and each have a photodetecting surface having a plurality of light receivable areas arrayed at a specified pitch along the direction of the deflection of the light beam. The light receivable areas correspond to the conventional pinholes and are arrayed in plurality at a specified pitch along the direction of the deflection of the light beam. First and second detection signals are properly extracted corresponding to the light receivable areas in synchronism with the scanning of the light beams, from first and second groups of detection signals which are outputted corresponding to the light beams respectively incident into the plurality of the first and second light receivable areas to determine a differential value between the both, thereby calculating the height information of a fine protrusion formed on the sample.

8. 发明专利

JPH04318447A FOREIGN MATTER DETECTING METHOD 失效
公开(公告)号：JPH04318447A
公开(公告)日：1992-11-10
申请号：JP11236691
申请日：1991-04-17
申请人： HITACHI ELECTR ENG
发明人： NEMOTO RYOJI , MATSUNAGA RYOJI
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , H01L21/66
摘要： PURPOSE:To detect a foreign matter without deteriorating the S/N of the output voltage of a converter by intercepting the regularly reflected component of the reflected light of a vertical laser beam by means of a stopper. CONSTITUTION:A wafer 1 is irradiated with an S-polarized beam having a wavelength lambda1 at a low angle and with another S-polarized beam having a wavelength lambda2 from a light source 23 in the direction perpendicular to the wafer 1. Each reflected light is condensed by means of an objective 31 and passed to a beam splitter 25. Then the light is subjected wavelength separation by means of a wavelength separating prism 32 and polarized light having the optimum detecting sensitivity is extracted from the reflected light having the wavelength lambda2 by means of an analyzer 33 and received by a photoelectric converter 34 from which a voltage VL is outputted. Regarding the reflected light having the wavelength lambda2, on the other hand, the regularly reflected component of the reflected light is intercepted by means of a stopper 37 after the light is subjected to wavelength separation and polarized waves are similarly extracted by means of the analyzer 35. The extracted polarized light is received by a photo-electric converter 36 and a voltage VH is outputted. Both output voltages are inputted to a divider 41 by which a ratio VH/VL is calculated and a foreign matter pulse Pa is obtained through a comparator 42.

9. 发明专利

JP2001074423A METHOD AND APPARATUS FOR DETECTING HEIGHT OF MICRO PROTRUSION AND DEFECT DETECTOR 失效
公开(公告)号：JP2001074423A
公开(公告)日：2001-03-23
申请号：JP24830199
申请日：1999-09-02
申请人： HITACHI ELECTR ENG
发明人： MATSUNAGA RYOJI , TABATA TAKAHITO
IPC分类号： G01B11/24
摘要： PROBLEM TO BE SOLVED: To detect the height of a micro protrusion, e.g. a bump, with high accuracy by receiving a plurality of detection signals from an optical sensor and calculating the height of the micro protrusion, based on the plurality of detection signals. SOLUTION: A detection area 3 on a wafer 1 is irradiated with a laser beam 4 in a projection optical system 16 and scanned repeatedly at high speed with a constant width covering the width of a bump in the sub-scanning direction, i.e., the Y direction. The optical sensor in a focus error detection optical system 15 has a division width corresponding to the repetitive scanning width in the sub-scanning direction and the image of a detection area obtained with the scanning width is received by the optical sensor to produce a series of detection signals for each scan. Furthermore, a plurality of detection signals are obtained by repeating scanning while deflecting the light beam 4 thus obtaining three- dimensional data of a micro protrusion at high rate. Subsequently, the height is calculated or a defect is detected based on the three-dimensional data thus detecting a defect, e.g. chipping, of the micro protrusion.

10. 发明专利

JPH04142450A ILLUMINATION OPTICAL SYSTEM FOR FOREIGN OBJECT INSPECTING DEVICE 失效
公开(公告)号：JPH04142450A
公开(公告)日：1992-05-15
申请号：JP26485290
申请日：1990-10-02
申请人： HITACHI ELECTR ENG
发明人： MATSUNAGA RYOJI
IPC分类号： G01N21/84 , G01J1/02 , G01J1/04 , G01N21/88 , G01N21/94 , G01N21/956 , G03F1/84
摘要： PURPOSE:To improve detection performance by changing the laser light flux emitted from a light source into a parallel flux with a collimator, expanding the long diameter of a pseudo elliptic shape with light flux changing prism systems, and shrinking its short diameter with a cylindrical lens. CONSTITUTION:The laser light with the power several times larger than that in the single mode is emitted from a multi-mode LD 2. The light flux is changed into a parallel flux by a collimator 4, the long diameter is expanded by light flux changing prism systems 3, the short diameter is shrunk by a cylindrical lens 10, the laser light with a linear cross section having the long/short ratio of tens is obtained, and a linear spot wholly focused by a focusing lens system 5 at the same long/short ratio is radiated to an inspected object. The illuminance of the spot is increased by the increase and linearization of the laser power, and detection performance is improved. Two light flux changing prism systems 3 are used at the most, thus the sensitivity irregularity due to the interference phenomenon disappears. The long diameter of the multi-mode laser light is long, and the long diameter can be expanded to nearly the same length as that in the single mode by two or less light flux changing prisms.

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