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1. 发明专利

JP2000031233A CALLING METHOD OF DEFECTIVE POSITION AND DEVICE APPLIED THERETO 失效
公开(公告)号：JP2000031233A
公开(公告)日：2000-01-28
申请号：JP20004198
申请日：1998-07-15
申请人： HITACHI LTD
发明人： SHISHIDO HIROAKI , YOSHITAKE YASUHIRO , SHIMODA ATSUSHI , SHISHIDO CHIE
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To improve operativity by enabling an operator to call a desired cell readily, by instructing a pitch of a cell from an image of a mat part taken in an image processing system during observation, designating a movement amount by the number of cells, and moving a visual field by a distance made by multiplying the number by a pitch of a cell. SOLUTION: A pitch is inputted by an X-direction cell pitch instruction pointer 141 and a Y-direction cell pitch instruction pointer 142. Since a movement amount is large, offset of alignment of an inspection sample is also anticipated. Therefore, a cursor line fit to one side of a line of a cell pattern 144 is drawn by a pointing device by a cell alignment inclination instruction pointer 143 and correction is carried out based on inclination of a cursor line. Input is carried out directly through recognition by a cell pitch amount display/input window 145. A movement amount is inputted by an input/display window of the number of moved cells, and a visible field is moved by the product of a cell pitch and the number of cells. An aimed cell pattern display mark 148 is displayed in a called cell.

2. 发明专利

JPH1151875A METHOD AND APPARATUS FOR MEASURING PHASE DEFECT 失效
公开(公告)号：JPH1151875A
公开(公告)日：1999-02-26
申请号：JP21350397
申请日：1997-08-07
申请人： HITACHI LTD
发明人： SHISHIDO HIROAKI , NAKADA TOSHIHIKO , SHIMASE AKIRA , AZUMA JUNZO
IPC分类号： G01J9/00 , G01N21/88 , G01N21/93
摘要： PROBLEM TO BE SOLVED: To measure the phase detect highly accurately by converting a coherent light into two linearly polarized lights having slightly different frequency and orthogonal plane of polarization for irradiating a sample by a predetermined method and then detecting and processing the reflected light, or the like. SOLUTION: The phase defect measuring system, e.g. a phase shift reticle 1, comprises a birefringence lens 4, a half mirror 5, analyzers 6, 17, probe light and reference light detectors 9, 14, a frequency shifter 12, and a laser oscillator 13. A laser light from an oscillator 13 is converted through the frequency shifter 12 into a reference light and a measuring light having slightly different frequency and orthogonal plane of polarization which are branched through the mirror 5 into a reference light 15 and a probe light 16. The probe light 16 is condensed through the birefringence lens 4, or the like, onto the reticle 1 with a diameter different from that of the measuring light and the reflected light is passed through the analyzer 6 to produce an interfering component of polarized light. The interfering light is detected by the probe light detector 9 and a defect is measured, based on the phase difference from a signal detected by the reference light detectors 14. Alternatively, the defect is measured using the transmitted light.

3. 发明专利

JPH08223524A PORTABLE VIDEO CAMERA 失效
公开(公告)号：JPH08223524A
公开(公告)日：1996-08-30
申请号：JP2069895
申请日：1995-02-08
申请人： HITACHI LTD
发明人： MATSUMOTO KUNIO , SHISHIDO HIROAKI , NARUKAWA YASUHIRO , MIYANO ICHIRO
IPC分类号： H04N5/225 , H04N5/907 , H04N5/91
摘要： PURPOSE: To prevent occurrence of unexpected memory capacity shortage by displaying use capacity of a storage medium on a video display screen so as to inform the user of an idle memory capacity. CONSTITUTION: This video camera is provided with a removable storage medium comprising an IC card and video/audio data picked up by a CCD camera and compressed by the MPEG method are stored in its video audio storage section, and a series number for each image pick up scene, a head address and a frame number or the like are stored in a scene storage address management storage section. A memory indicator 202 is also displayed on a video display screen 110 of a liquid crystal display device 11 or the like in addition to display of a reproduced image. The total length of the memory indicator 202 corresponds to a scale of the total storage capacity of the video audio storage section and a ratio of consumed areas is indicted on the scale with a scene block mark based on the information read from the scene storage address management storage section. A cursor operation command button 111 is used to move a cursor 201 and, e.g. a frame pointer 203 is used to point out a desired scene.

4. 发明专利

JPH0772093A DETECTING METHOD AND INSPECTING APPARATUS FOR DEFECT SUCH AS FOREIGN MATTER 失效
公开(公告)号：JPH0772093A
公开(公告)日：1995-03-17
申请号：JP13984894
申请日：1994-06-22
申请人： HITACHI LTD
发明人： SHISHIDO HIROAKI , MATSUMOTO SHUNICHI
IPC分类号： G01N21/88 , G01N21/93 , G01N21/94 , G01N21/956 , H01L21/66
摘要： PURPOSE:To provide an apparatus for stably detecting a defect such as fine foreign matter, etc., in the order of sub microns adhering onto a substrate with circuit patterns, e.g. photomask or the like, particularly, onto a reticle with a phase shift film intended to improve a transfer resolution. CONSTITUTION:An inclined illumination is applied from front sides 2, 20 of a sample with approximately 780nm wavelength, and from rear sides 3, 30 with approximately 488nm wavelength. Generated scattering lights are converged and divided by wavelength in each illuminating direction by an optical system 41 of 4.0 or more NA on the front side of the sample. In a detecting optical system 4, a diffraction light from a circuit pattern is shut by spatial filters 44, 444 set on Fourier transform planes to form an image on detectors 51, 551. Detected values of the detectors are corrected by circuits 113, 123 in accordance with an illumination irregularity. A maximum value of added values when the circuit and detector for obtaining an added value of detected values of 2X2 pixels shift every one pixel in four peripheral directions is obtained by circuits 114, 124, and an OR as a result of the binarization of the maximum value is obtained by a circuit 57. The apparatus is constituted of these circuits, etc.

5. 发明专利

JPH0580496A FOREIGN MATTER INSPECTING DEVICE 失效
公开(公告)号：JPH0580496A
公开(公告)日：1993-04-02
申请号：JP23948091
申请日：1991-09-19
申请人： HITACHI LTD
发明人： SHISHIDO HIROAKI , NOGUCHI MINORU
IPC分类号： G01B11/24 , G01B11/30 , G01N21/88 , G01N21/956 , G03F1/84
摘要： PURPOSE:To allow the easy and stable detection of the foreign matter of submicron order sticking to the circuit patterns on a transparent or translucent substrate having circuit patterns, and more particularly a reticules, etc., having phase shift films to improve transfer resolution separatedly from the circuit patterns mainly with optical and simple constitution. CONSTITUTION:This inspecting device is constituted of a detecting optical system 4 which condenses the scattering light generated by diagonal illumination 2 from the rear surface of a sample by an optical system 41 having 0.4NA, shields the diffracted light from the circuit patterns by a space filter 44 provided on a Fourier transform surface and forms an image on a detector 51, a circuit 113 which corrects the detection value of the detector in compliance with the unequal illumination, a circuit which determines the addition value of the detected values of 2X2 picture elements, a circuit 114 which determines the max. value of the four added values shifted by one picture element each in the ambient 4 directions of the picture elements of the detector, and a circuit 112 which houses the results of the detection into a memory blocked by each of several hundred picture elements on the sample.

6. 发明专利

JPH04333847A FOREIGN MATTER INSPECTION DEVICE FOR RETICLE MASK 失效
公开(公告)号：JPH04333847A
公开(公告)日：1992-11-20
申请号：JP13353791
申请日：1991-05-09
申请人： HITACHI ELECTR ENG , HITACHI LTD
发明人： MITOMO KENJI , ASAMI KOICHI , NOGUCHI MINORU , SHISHIDO HIROAKI
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , G03F1/84 , H01L21/027 , H01L21/66
摘要： PURPOSE:To offer the foreign matter detection optical system which detects only foreign matter without detecting the writing pattern of a reticle by utilizing the feature of variation of scattered light from the wiring pattern with the projection direction of a laser beam by a reticle foreign matter inspection device. CONSTITUTION:Two projection systems project two laser beams L and L2 which differ in wavelength on an inspection point on the surface of the reticle mask 1 in mutually opposite direction at a low angle; and the laser beam is scattered by the foreign matter equally in all directions and the scattered light beams of both the laser beams are nearly equal, so the foreign matter can excellently be detected from the product of data of both the scattered light beams. In the case of the wiring pattern 1b, one scattered light beams becomes zero, so the product of the both is calculated and equalized to zero not to detect the wiring pattern. Consequently, the influence of the wiring pattern is eliminated to improve the detection performance for the foreign matter on the reticle mask.

7. 发明专利

JPS63315936A PATTERN AND FOREIGN MATTER DISCRIMINATING DEVICE 失效
公开(公告)号：JPS63315936A
公开(公告)日：1988-12-23
申请号：JP15112187
申请日：1987-06-19
申请人： HITACHI LTD
发明人： NOGUCHI MINORU , SHISHIDO HIROAKI , KOIZUMI MITSUYOSHI
IPC分类号： G01B11/24 , G01N21/88 , G01N21/94 , G01N21/956 , G03F7/20
摘要： PURPOSE:To remove reflected light with high directivity from a pattern edge by arranging plural illumination light sources and a reflected light detection lens so that a specific expression is satisfied. CONSTITUTION:Laser diodes 6-9 of a reflection illumination part 14 and laser diodes 15-18 of a transmission illumination part 19 are arranged symmetrically about the plane of a sample 1 and emit beams to the same one point on the sample 1 at an incidence angle i=60 deg.. A detection part 22 consists of an objective 20 and a detector 21 and the numerical aperture N.A. of the objective 20 is so set as to satisfy the equation. Control pulses are outputted to driving sources 10-13 according to the indication of the computer 34 of a control part 36 and the laser diodes are emitted in order, thereby sending synchronizing pulses to delay circuits 29-32 of a signal processing part 43 and operating them. The signal processing part 43 is provided for each picture element of the detector 21, and respective detection signals obtained by separating the detection signal of the detector 21 by the illumination sources and ANDed.

8. 发明专利

JPS63268245A INSPECTING METHOD FOR FOREIGN MATTER AND EQUIPMENT THEREFOR 失效
公开(公告)号：JPS63268245A
公开(公告)日：1988-11-04
申请号：JP10174587
申请日：1987-04-27
申请人： HITACHI LTD
发明人： NOGUCHI MINORU , SHISHIDO HIROAKI
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , G03F1/84 , G03F7/20 , H01L21/027 , H01L21/30 , H01L21/66
摘要： PURPOSE:To enable detecting only harmful foreign matter discriminating from a pattern, by detecting selectively the luminous flux only which passes through the aperture of an objective outside the aperture of incident side of the contraction projection lens of an exposure equipment, after scattering and diffraction due to foreign matter and defects. CONSTITUTION:The number of apertures (abbreviated as N.A. hereinafter) of the incident side (object side) of a demagnification projection lens is designed as a value to obtain a sufficient resolution for the image formation of a pattern on a reticle. Inspection region on the reticle 6 is limited, and the reticle 6 is scanned by a sample stand part 1, so that the examination for all inspection region is enabled. Therefor, an objective 41 is applied whose N.A. is larger than that of the contraction projection lens usually used. In order to detect foreign matter as well as damaging ones, a light shielding plate 44 is not always necessary to be matched with the N.A. of the incident side of the contraction projection lens employed in an exposure equipment, and it is sufficient enough to be matched with the degree of spatial coherence of a transmitting illumination part 2 and a direct illumination part 3. That is, only the 0th-order diffraction light of illumination from the transmitting illumination part 2 and the direct illumination part 3 may be shielded.

9. 发明专利

JPS62248233A STORAGE WAREHOUSE FOR THIN PLATE 失效
公开(公告)号：JPS62248233A
公开(公告)日：1987-10-29
申请号：JP9128786
申请日：1986-04-22
申请人： HITACHI LTD
发明人： SHIBA MASATAKA , OSHIDA YOSHISADA , YOSHITAKE YASUHIRO , SHISHIDO HIROAKI
IPC分类号： H01L21/30 , B65G1/00 , B65G1/02 , B65G1/04 , B65G1/137 , B65G1/16 , G03F7/20 , H01L21/027 , H01L21/67 , H01L21/677
摘要： PURPOSE:To improve the efficiency of a storage space, and to prevent the adhesion of a foreign matter onto a thin plate by storing the thin plate taken out of a case under an upright state in the atmosphere of a clean air flow. CONSTITUTION:Mask storage shelves 2, a mask carrying mechanism 3, a mask holding mechanism 4, and a foreign-matter removing mechanism 5 (not shown) and a foreign-matter inspection mechanism 6 (not shown) each mounted into two cases 501 in the vertical direction are installed into a chamber 10 for a mask storage warehouse 1. An open-close door 10b is fitted to an opposed-side opening section 10a to the mask storage shelves 2, and a clean air unit 11 for reducing probability, in which foreign matters 14 adhere on masks 13 in the chamber 10, particularly, the mask storage shelves 2, is set up at the upper position of the mask storage shelves 2. Accordingly, the thin plates 2 are stored under an upright state in which they are extracted from the cases, thus improv ing the efficiency of a storage space, then preventing the adhesion of foreign matters on the thin plates 2.

10. 发明专利

JP2002039960A METHOD FOR INSPECTING PATTERN DEFECT AND APPARATUS THEREFOR 失效
公开(公告)号：JP2002039960A
公开(公告)日：2002-02-06
申请号：JP2000231382
申请日：2000-07-27
申请人： HITACHI LTD
发明人： MAEDA SHUNJI , YOSHIDA ATSUSHI , SHIBATA YUKIHIRO , YOSHIDA MINORU , UTO YUKIO , SHISHIDO HIROAKI , NAKADA TOSHIHIKO
IPC分类号： G01B11/30 , G01N21/956 , G02B21/06 , G06T1/00
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for detecting defects by detecting fine circuit patterns with a high resolution. SOLUTION: There are provided an optical system 7 including an objective lens for detecting images of a sample 1, a laser light source 3 for illuminating a pupil of the objective lens, a coherence reduction mechanism 4 for reducing a coherence of the laser illumination emitted from the laser light source, a storage type detector 8 and an image processing system 12 for processing detected signals of the detector. Defects of the pattern formed to the sample 1 are detected on the basis of information detected by the detector.

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