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1. 发明专利

JPH11120927A ION SOURCE 失效
公开(公告)号：JPH11120927A
公开(公告)日：1999-04-30
申请号：JP28057697
申请日：1997-10-14
申请人： HITACHI LTD
发明人： KIMURA YOSHIHIRO , HASHIMOTO ISAO , SEKIMOTO SHINYA , OISHI SEITARO
IPC分类号： H01J27/02 , H01J27/08 , H01J37/08
摘要： PROBLEM TO BE SOLVED: To provide an ion source having a large-diameter ion source electrode capable of extracting a uniform and stable ion beam current. SOLUTION: This ion source is constituted of a plasma chamber generating ions and an accelerating electrode 6 and a decelerating electrode 7 arranged at a prescribed interval, combined with multiple tabular split electrodes, and having beam extraction holes for extracting ions from the plasma chamber. Since the accelerating electrode 6 and the decelerating electrode 7 are combined with the tabular split electrodes, the ion source is formed into a pyramidal shape with the center sections of the accelerating electrode 6 and the decelerating electrode 7 used as apexes.

2. 发明专利

JPH0564408B2 失效
公开(公告)号：JPH0564408B2
公开(公告)日：1993-09-14
申请号：JP21416885
申请日：1985-09-27
申请人： HITACHI LTD
发明人： SEKIMOTO SHINYA , HASHIMOTO ISAO
IPC分类号： H01J27/10

3. 发明专利

JPH0376716B2 失效
公开(公告)号：JPH0376716B2
公开(公告)日：1991-12-06
申请号：JP21237883
申请日：1983-11-14
申请人： HITACHI LTD
发明人： SEKIMOTO SHINYA
IPC分类号： H05H1/22 , G12B5/00

4. 发明专利

JPS61288348A ION SOURCE DEVICE 失效
公开(公告)号：JPS61288348A
公开(公告)日：1986-12-18
申请号：JP12984785
申请日：1985-06-17
申请人： HITACHI LTD
发明人： SATO TADASHI , ONO YASUNORI , KUROSAWA TOMOE , SEKIMOTO SHINYA
IPC分类号： H01J27/08
摘要： PURPOSE:To prevent discharge from becoming unstable, by providing an anode member inside the inner circumferential surface of a plasma generation container which also serves as an anode and is fitted with a plurality of permanent magnets on the outer circumferential surface of the container, to keep the anode member at a high temperature to prevent a high-molecular product from clinging thereto. CONSTITUTION:A cylindrical plasma generation container 2A, which also serves as an anode and is fitted with permanent magnets 7A on the outer circumferential surface of the container, and a lid 2B, which is provided with an inlet port 1 for introducing a gas including a CF4 gas or the like and is fitted with a cathode 3 made of a hairpin-shaped tungsten filament, are combined with each other to constitute an ion source device. A cylindrical anode member 4 made of stainless steel or the like is spot-welded to a magnetic member 9, which is held on the inner circumferential surface of the container 2A by the attractive forces of the permanent magnets 7A. As a result, the anode member 4 can be caused to act at a high temperature so that an electrically-insulating high-molecular substance produced by discharge is prevented from clinging to the anode member. The discharge can thus be stabilized.

5. 发明专利

JPS5783776A Pipings taking out structure 失效
标题翻译：管道结构
公开(公告)号：JPS5783776A
公开(公告)日：1982-05-25
申请号：JP15956180
申请日：1980-11-14
申请人： Hitachi Ltd
发明人： ONO YOUICHI , SEKIMOTO SHINYA
IPC分类号： F16L5/00 , F16L5/02

6. 发明专利

JPH0883834A PROCESSING EQUIPMENT BY ION BEAM 失效
公开(公告)号：JPH0883834A
公开(公告)日：1996-03-26
申请号：JP24339694
申请日：1994-09-12
申请人： HITACHI LTD
发明人： OISHI SEITARO , SEKIMOTO SHINYA
IPC分类号： C23C14/50 , C23F4/00 , H01J37/08 , H01J37/305 , H01L21/203 , H01L21/302 , H01L21/3065 , H01L21/31 , H01L21/68 , H01L21/683
摘要： PURPOSE: To improve processing precision and cooling performance for a sample and to make high a throughput of processing equipment by making the size of a sample holder be the same substantially as the bore diameter of an ion source and by disposing it in a plurality of arrays at the inner and outer circumferences thereof. CONSTITUTION: A diameter of setting of a sample holder is made the same substantially as the one of an ion source of a large bore diameter and a sample holder 10 on the outer circumference side and a sample holder 20 on the inner circumference side are provided over the whole of an ion beam irradiation plane at the inner and outer circumferences thereof. Thereby ion beams emitted can be used at the maximum. In order to cool down a sample 21 subjected to irradiation by the ion beams, cooling water is supplied to the sample holders 10 and 20 from a cooling water inlet-outlet joint 43 through cooling pipings 44 in directions of arrows. In this way, the sample 21 is cooled down directly by supplying the cooling water even onto the rear sides of the sample holders 10 and 20. According to this constitution, it is possible to improve a cooling characteristic and processing precision (of uniformity and a processed shape) and to attain a high throughput.

7. 发明专利

JPH0574901B2 失效
公开(公告)号：JPH0574901B2
公开(公告)日：1993-10-19
申请号：JP3437285
申请日：1985-02-25
申请人： HITACHI LTD
发明人： SEKIMOTO SHINYA , HASHIMOTO ISAO
IPC分类号： H01J37/08 , H01J1/02 , H01J27/08

8. 发明专利

JPS61267237A EDGED ELECTRODE 失效
公开(公告)号：JPS61267237A
公开(公告)日：1986-11-26
申请号：JP10819285
申请日：1985-05-22
申请人： HITACHI LTD
发明人： SEKIMOTO SHINYA
IPC分类号： G01N27/62 , H01J27/02
摘要： PURPOSE:To lengthen the insulation of spacer by grinding the electrode and the edge integrally. CONSTITUTION:The electrode and the edge are machined integrally. The plasma chamber 1 is provided with a current lead-in terminal 3 for leading the filament current and heating the filament 2 and a gas lead-in port 4. Ion acceleration electrode 5, deceleration electrode 6 and grounding electrode 7 are secured to the electrode support metal 9 while maintaining gaps through insulation spacers 8 made of ceramics, for example. The portion of respective electrode for accelerating the ions in quite thin thus to maintain a micro gap. While the outercircumferential edge for securing respective electrode is made thick to provide long insulation length of spacer. Consequently, an ion source enable of long term operation without causing dielectric breakdown can be obtained even when active gas such as CF4 is used.

9. 发明专利

JPS559408A REACTOR 失效
公开(公告)号：JPS559408A
公开(公告)日：1980-01-23
申请号：JP8101878
申请日：1978-07-05
申请人： HITACHI LTD
发明人： HAGITANI TAKASHI , MONMA NOBUYUKI , SEKIMOTO SHINYA
IPC分类号： H01F27/28 , H01F27/26 , H01F27/30 , H01F27/36 , H01F37/00
摘要： PURPOSE:To eliminate time required for drilling, as well as to reduce core loss by installing an insulation material inside an insulation sleeve to prevent a silicon steel plate from dislocation, thus eliminating through holes in a magnetic shield of the silicon steel plate. CONSTITUTION:An insulator 7 which prevents a magnetic shield 2 of a silicon steel plate from dislocation, is installed in an insulation sleeve where a coil 1 of the magnetic sheild 2 comes into contact. The insulator 7 is fixed to an upper metallic clamping tool 4A through a locking bolt 12 that is inserted into a gap 9 provided in the magnetic shield 2. As a result, the magnetic shield 2 is bound between the insulator 7 and the metallic clamping tool 4A. Securing the magnetic shield, in the silicon steel piling direction, is provided by the clamping tool 4 together with horizontal locking bolts 8 at above and below the magnetic shield 2. Consequently, time required for drilling the silicon steel plate is eliminated, and core loss is reduced.

10. 发明专利

JPH0570896B2 失效
公开(公告)号：JPH0570896B2
公开(公告)日：1993-10-06
申请号：JP8004287
申请日：1987-04-01
申请人： HITACHI LTD
发明人： OOISHI SEITARO , HASHIMOTO ISAO , SEKIMOTO SHINYA
IPC分类号： H01J27/08

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