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    • 2. 发明专利
    • PLASMA MONITOR
    • JPS61206226A
    • 1986-09-12
    • JP4657285
    • 1985-03-11
    • HITACHI LTD
    • OKAMOTO AKIRAKOMIYAMA YUZURUKANEKAWA MASAOOSADA HISAJIRO
    • C23F4/00H01L21/302H01L21/3065
    • PURPOSE:To improve the plasma control capacity by a method wherein multiple photosensers to sense specific light passing through optical filters are arranged on the surface of a plasma etching apparatus to measure with time the luminous intensity of specific chemical product produced in the plasma. CONSTITUTION:Multiple photosensers 3a-3d composed of optical filters (interferofilters) 6 passing specific wavelength only, photoconversion elements sensing the light passing through said interferofilters 6 to convert it into electric signals and an amplifier are arranged at an equal interval around a parallel and flat plate type dry etching apparatus 1 so that the photosensers 3a-3d may face toward the surface of a work 8 to be etched contained in the dry etching apparatus 1. The spectral lines 12 radiated from gas plasma excited in the plasma etching apparatus 1 enter into the photosensers 3a-3d through pin holes 9 to be converted into electric signals. Those signals may be transmitted to a multiple type recorder 5 by coaxial cables 4a-4d to record any luminous intensity on a chart by this recorder.
    • 4. 发明专利
    • JPS6218861B2
    • 1987-04-24
    • JP19840181
    • 1981-12-11
    • HITACHI LTD
    • OSADA HISAJIROHIRATSUKA YUTAKA
    • C23C14/54G01N21/27G01N21/64H05H1/00
    • Disclosed is a plasma monitor which measures the distribution of particular chemical species (atom, molecule, ion) in plasma generated inside an instrument making use of the plasma. Laser light having a particular wavelength is radiated to the particular chemical species so as to let it generate fluorescence. The fluorescence is picked up for each of a plurality of zones divided in the radiating direction of the laser light and the concentration of the chemical species in each zone is determined on the basis of the intensity of the fluorescence in each zone in order to determine the concentration distribution of the particular chemical species contained in the plasma. The operative condition within the sealed vessel can be grasped more accurately by measuring the distribution of the concentration of the chemical species which is closely related with the condition of deposition or etching.
    • 6. 发明专利
    • PLASMA MONITOR APPARATUS
    • JPS61200447A
    • 1986-09-05
    • JP3870885
    • 1985-03-01
    • HITACHI LTD
    • OKAMOTO AKIRAKOMIYAMA YUZURUKANEKAWA MASAOOSADA HISAJIRO
    • G01N21/64H01L21/66
    • PURPOSE:To rapidly measure the three-dimensional distribution of the specific chemical seed in plasma, by two-dimensionally irradiating the interior of a plasma utilizing apparatus with laser beam by a laser scanning mechanism consisting of a plurality of prisms and a drive motor. CONSTITUTION:A prism 3 is constituted so as to bend laser beam 2 to a vertical upward direction and a prism 4 makes the laser beam 2 from the prism 3 parallel to the observation window of a plasma utilizing apparatus while a prism 5 is fixed to a prism fixing stand 14 to be arranged to the central part of a stand 10-2 and made movable to the left and right horizontal directions by a drive motor 12 and the laser beam 2 issued from the prism 4 is bent to a horizontal direction by 90 deg. to irradiate the interior of the plasma utilizing apparatus. In order to move laser beam up and down in the vertical direction, a stand moving shaft 13 is rotated by the stand moving motor 11 arranged to a stand 10-1 and the stand 10-2 is moved up and down. By this method, laser beam can be moved two-dimensionally.
    • 7. 发明专利
    • Plasma monitoring method
    • 等离子体监测方法
    • JPS6186635A
    • 1986-05-02
    • JP20807084
    • 1984-10-05
    • Hitachi Ltd
    • OKAMOTO AKIRAKOMIYAMA YUZURUOSADA HISAJIROKANEKAWA MASAO
    • G01N21/63G01N21/64
    • G01N21/6402
    • PURPOSE:To make it possible to monitor the state of plasma accurately, by detecting fluorescence excited by laser from a specified chemical species and light emission from one or more other chemical species in the plasma. CONSTITUTION:Laser light 6 having a specified wavelength from a variable wavelength laser generator 1 is projected into a plasma generating source 5. Fluorescence 8 is emitted from the excited specified chemicals species A in the direction perpendicular to the output direction of the laser light 6. The fluorescence 8 is emitted accompanied by the formation of the plasma. Light emission 7 is caused by a specified chemical species B representing the plasma state. The fluorescence 8 and the light 7 are received by a light receiving scanning mechanism 14, which is in parallel with the outputting direction of the laser light 6 and can be moved up and down and right and left. The intensities of the received light beams are measured by light detectors 11 and 12. Based on the results, an operator 13 performs monitoring operation. When the intensities of the light beams are changed and the ratio or the difference between the intensities of the light beams are changed, the operator 13 obtains the state of each light beam. Thus the monitoring can be performed.
    • 目的:通过检测来自特定化学物质的激光激发的荧光和等离子体中一种或多种其他化学物质的光发射,可以准确地监测等离子体的状态。 构成:将来自可变波长激光发生器1的具有指定波长的激光6投射到等离子体发生源5中。从与激光6的输出方向垂直的方向的激发的特定化学品种类A发射荧光。 伴随着等离子体的形成而发射荧光8。 发光7由表示等离子体状态的指定化学物质B引起。 荧光8和光7被受光扫描机构14接收,该光接收扫描机构14与激光6的输出方向平行,并且可以上下左右移动。 接收光束的强度由光检测器11和12测量。根据结果,操作器13执行监视操作。 当光束的强度改变并且光束的强度之间的比率或差异改变时,操作者13获得每个光束的状态。 因此,可以执行监视。
    • 8. 发明专利
    • JPS6318134B2
    • 1988-04-16
    • JP9487482
    • 1982-06-04
    • HITACHI LTD
    • EDAMURA TAKAOOSADA HISAJIRO
    • G01N21/64
    • PURPOSE:To monitor the distribution of plasma whose change is quick accurately, by delaying the starting time for measuring the intensity of fluorescence, which is excited by laser light, by a specified time, and obtaining a ratio of a computed value of the laser light and a computed value of fluorescence intensity. CONSTITUTION:Pulse shaped laser light 24 is emitted from a pigment laser 1 for ultraviolet rays based on the trigger from a control part 17. The laser light is scanned by a scanning device 3 in two dimensions and inputted to an incident window of a plasma utilizing device 5, where plasma material is excited and fluorescence 25 is generated. The fluorescence 25 is irradiated through a measuring window 7 and received by a scanning device 8 in two dimensions. Then the light is inputted to an integrator 12 through a spectroscope 9, a detector 26, an amplifier 10, an AD converter 11. Meanwhile, the laser light 24 is reflected by a half mirror 2 and inputted to an integrator 16 through a monitoring detector 13, an amplifier 14, and an AD converter 15. The laser light 24 further operates a timer 19 through a level detector 18. A trigger is applied to a fluorescence intensity measuring circuit. The ratio of the outputs of the integrators 12 and 16 is obtained by an operator 20.
    • 9. 发明专利
    • PLASMA MONITOR
    • JPS61292538A
    • 1986-12-23
    • JP13407885
    • 1985-06-21
    • HITACHI LTD
    • KANEKAWA MASAOKOMIYAMA YUZURUOSADA HISAJIROOKAMOTO AKIRA
    • G01N21/62
    • PURPOSE:To measure the concentration of a specified chemical species or the ratio of more than one chemical species, by a method wherein plasma light alone is sampled and then, the emission of more than one specified chemical species contained in the plasma light is analyzed. CONSTITUTION:It is necessary that an optical fiber 8 should equally divide a plasma 5 in three to be propagated to the positions of interference filters 11-13 arranged in parallel to measure plasma lights 81-83 with three wavelengths in a plasma 2. The fiber shall be one-piece on the incidence side and branched into three parts on the emission side. The filters 11-13 transmit lights 81-83 of specified wavelengths respectively. Then, the quantity of the lights 81-83 transmitted through detectors 21-23 is converted into electrical signals 41-43. An arithmetic unit 9 computes the value from the computation of the ratio the signal 41 to 42 of the same chemical species among the signals 41-43 in comparison with the signal 43 of different chemical species to determine the concentration ratio of the different chemical species. Then, displays 51-54 and a recorder 10 display and record the value corresponding to the concentration ratio computed with the arithmetic unit 9.
    • 10. 发明专利
    • PLASMA DISTRIBUTION MONITOR
    • JPS61200446A
    • 1986-09-05
    • JP3870685
    • 1985-03-01
    • HITACHI LTD
    • OSADA HISAJIROKOMIYAMA YUZURUOKAMOTO AKIRAKANEKAWA MASAO
    • G01N21/64
    • PURPOSE:To rapidly measure plasma three-dimensional distribution, by providing a beam introducing apparatus having optical groups arranged in a direction along laser beam in parallel and a beam detection apparatus having a linear beam detector connected to said beam introducing apparatus. CONSTITUTION:When laser beam 2' is introduced into a vacuum container 27 from the optical fiber 6 of a laser beam scanning apparatus 7 through a lens 11 and a window 14, the specific chemical seed in plasma present in laser beam 19 is excited to generate fluorescent beam 24. This fluorescent beam 24 is generated linearly along a laser beam irradiation path but, looking from the optical fiber groups 33 of a beam introducing apparatus 32, only the fluorescent beam 24 present in the beam receiving angle of each optical fiber is received by the optical fiber groups 33 and spectrally diffracted by the spectroscope of a beam detection apparatus 28 and only fluorescent beam with a specific wavelength is converted to an electric signal having magnitude proportional to the receiving quantity of fluorescent beam by a linear beam detector 35. Said signal is amplified by an amplifier 36 to be sent to a microcomputer 37.