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1. 发明专利

JP2004037087A Repair device, repair system, and repair method of narrow section in nuclear reactor 有权
公开(公告)号：JP2004037087A
公开(公告)日：2004-02-05
申请号：JP2002190228
申请日：2002-06-28
申请人： Babcock Hitachi Kk , Bab-Hitachi Industrial Co , Hestec Service Co Ltd , Hitachi Ltd , バブコック日立株式会社 , バブ日立工業株式会社 , 株式会社ヘステックサービス , 株式会社日立製作所
发明人： KUROSAWA KOICHI , HIRANO KATSUHIKO , UMAHARA YOICHI , NAGASHIMA TOSHIJI , NITTA ICHIYO , CHIBA NOBORU
IPC分类号： G21C17/08 , G21C17/003 , G21C19/02
摘要： PROBLEM TO BE SOLVED: To safely and efficiently conduct checking works and repair works of a narrow section called an annulus part in a nuclear reactor pressure vessel.
SOLUTION: A shield body 15 is placed on a reactor pressure vessel flange 14 in the reactor pressure vessel 1 filled with cooling water. The cooling water is lowered down to the reactor pressure vessel flange 14 and a guide pipe 17 is inserted in the annulus 8 on the baffle plate 6 where jet pumps stand close together between the reactor pressure vessel 1 and a shroud 5. Cooling water in the reactor pressure vessel 1 is drained. A repair device 13 is inserted in the guide pipe 17 in the air state to send in the annulus part 8. By self-running the repair device 13 on the baffle plate 6, inspection and repair of members adjacent to the annulus part 8 are conducted.
COPYRIGHT: (C)2004,JPO

2. 发明专利

JPH10154678A CLEANING OF SEMICONDUCTOR WAFER 失效
公开(公告)号：JPH10154678A
公开(公告)日：1998-06-09
申请号：JP31448796
申请日：1996-11-26
申请人： HITACHI LTD
发明人： HIRANO KATSUHIKO , ENOMOTO KUNIO
IPC分类号： H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide an equipment and a method for cleaning a semiconductor wafer so as to remove foreign matters in the required degree of pollution and obtain high degree of cleaning by generating cavitation in water or air in a simple way. SOLUTION: In water within a cleaning bath for cleaning a thin film substrate 62 such as a semiconductor wafer, or a LCD, etc., a high-pressure water jet blast accompanied by generation of cavitation bubble is ejected from a injection nozzle 61 to the thin film substrate 62 to clean foreign matters and dust adhering to the surface of the thin film substrate 62. In such a cleaning equipment, an angle θ made by the axial center of the blast ejected from the nozzle 61 and the wafer surface can be adjusted optionally between 0 to 90 degrees, and a nozzle driving mechanism in which a movable member is not immersed in water is provided.

3. 发明专利

JPH10118931A PREVENTIVE MAINTENANCE METHOD OF CYLINDRICAL STRUCTURE INSTALLED IN NUCLEAR REACTOR 失效
公开(公告)号：JPH10118931A
公开(公告)日：1998-05-12
申请号：JP27374696
申请日：1996-10-16
申请人： HITACHI LTD
发明人： ENOMOTO KUNIO , HIRANO KATSUHIKO , OTAKA MASAHIRO , HAYASHI EISAKU , SHIMIZU SADAHITO , MORINAKA TADASHI
IPC分类号： B24C1/10
摘要： PROBLEM TO BE SOLVED: To improve a residual tensile stress in the welded part of cylindrical structure equipment like the shroud in a nuclear reactor to a compressed residual stress by the peening action of the collapse pressure of a cavitation foam and prevent a stress corrosion cracking. SOLUTION: A preventive maintenance device 1 constituted by an upper attachment 15, a lower attachment 20, a frame 21, a nozzle head 8 mounted a nozzle 24 and a position welded line detection sensors 37, 38 and a parallel link 32 for connecting a nozzle drive part 10 with the nozzle head 8 is set in the cylindrical structure like a shroud in a nuclear reactor and a residual stress is improved by jetting the jet 25 of a high pressure water to the welded part. The high pressure water is generated by a high pressure pump 16 and the high pressure pump 16 and the preventive maintenance device 1 is controlled by a control board. The welded part of the cylindrical structure equipment like the shroud in the nuclear reactor, especially the tensile residual stress in the welded part of a corner and a narrow part is improve to the compressed residual stress.

4. 发明专利

JP2003271993A Monitor image processing method, image monitoring system, and maintenance work system 审中-公开
标题翻译：监控图像处理方法，图像监控系统和维护工作系统
公开(公告)号：JP2003271993A
公开(公告)日：2003-09-26
申请号：JP2002074845
申请日：2002-03-18
申请人： Aries Inc , Hitachi Ltd , 株式会社アリエス , 株式会社日立製作所
发明人： KUROSAWA KOICHI , HIRANO KATSUHIKO , HAYATA TAKASHI , OBA SHIGERU , YAMAMURA HAJIME
IPC分类号： H04N7/18 , G06T17/40
摘要： PROBLEM TO BE SOLVED: To provide an image monitoring system capable of securing the identity of a three-dimensional graphic image plane of a real time simulator and a monitor image plane by a camera image. SOLUTION: In this system wherein A monitor camera 1 is operated by a camera operation board 3 to display an image of a monitored object on a camera monitor 5, a camera operation signal outputted from the camera operation board 3 is supplied to an operation device 7, and a three-dimensional real time simulation model is read out from the model database 8 to display the same on a simulation model monitor 10, a display mode of the image of the monitored object displayed on the camera monitor 5 and a display mode of the graphic model image displayed on the simulation model monitor 10 are same as each other. COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种能够通过相机图像确保实时模拟器的三维图形图像平面和监视器图像平面的图像监视系统。解决方案：在该系统中，由相机操作板3操作监视摄像机1以在相机监视器5上显示被监视对象的图像，将从相机操作板3输出的照相机操作信号提供给操作装置7，并从模型数据库8中读出三维实时模拟模型，以在模拟模型监视器10上显示它们，在相机监视器5上显示被监视对象的图像的显示模式，以及显示在仿真模型监视器10上的图形模型图像的显示模式彼此相同。版权所有（C）2003，JPO

5. 发明专利

JP2000121786A METHOD FOR WATER JET PEENING OF INTERNAL STRUCTURAL MEMBER IN REACTOR PRESSURE VESSEL AND WATER JET PEENING DEVICE 失效
公开(公告)号：JP2000121786A
公开(公告)日：2000-04-28
申请号：JP22595399
申请日：1999-08-10
申请人： HITACHI LTD , HITACHI NUCLEAR ENG , HITACHI IBARAKI BUSINESS ENGIN
发明人： ENOMOTO KUNIO , HIRANO KATSUHIKO , HAYASHI EISAKU , MORINAKA TADASHI , SHIMIZU SADAHITO , SUGANO SATOSHI , TANAKA SHIGERU , ISHIKAWA TETSUYA
IPC分类号： B23K31/00 , B23K9/00 , C21D7/06 , G21C19/00 , G21D1/00
摘要： PROBLEM TO BE SOLVED: To prevent such damage as stress corrosion cracking by providing a structure where the jet containing cavitation bubbles from a nozzle is collided against a flat collision surface of a baffle body to change the direction of the jet and hit it with the surface of an internal structural member. SOLUTION: A nozzle 4 of an ascending and descending axis 6 is inserted parallel to an outer face of a shroud 23 by using an auxiliary hoist of a refueling machine. A jet 3 containing cavitation bubbles 2a from the nozzle 4 is injected downward and is collided against a flat surface of a baffle 5a near a vertical weld 17. The jet 3 collides with the vertical weld 17 as a collision jet 9a. On this occasion, it is preferable that the distance L between the tip of the nozzle 4 and the collision surface of the baffle 5a is 50 or less times as long as the injection aperture of the nozzle. Minute cavitation bubbles 2a that did not collapse when they collided with the baffle body 5a grow in a collision jet 9a and collapse by high pressure in the vertical weld 17, whereby tensile residual stress of the vertical weld 17 can be reduced effectively. It is preferable that the angle α between the central axis 3a of the injection aperture of the nozzle 4 and the collision surface 50 of the baffle body 5a is 60 deg. or more.

6. 发明专利

JPH1119608A WASHING DEVICE 失效
公开(公告)号：JPH1119608A
公开(公告)日：1999-01-26
申请号：JP17804697
申请日：1997-07-03
申请人： HITACHI LTD
发明人： HIRANO KATSUHIKO , ENOMOTO KUNIO
IPC分类号： G02F1/13 , B08B3/08 , B08B3/10 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To efficiently remove the foreign matter sticking to member surfaces by injecting high-pressure water in water or water atmosphere to generate cavitation and casting the cavitation air bubbles diffused by a refraction and diffusion plate to wafer surfaces without directly bringing these bubbles colliding to the wafers etc. which are the objects to be washed. SOLUTION: The mechanically polished or chemically polished wafers 401 prior to washing are transferred by a manipulator from storage shelves to a washing tank and are chucked by a polyhedral chuck 402 previously installed in the washing tank. While a table 407 mounted at a chucking device is rotated, the high-pressure water is injected into the water tank from a nozzle 408 for a water jet and is directed toward the cavitation reflection and diffusion plate 403 on the table 407, by which the cavitation air bubbles are generated. The deposits are removed by the microjets or impact waves generated when the cavitation air bubbles diffused on the surfaces of the wafers 401 by the cavitation reflection and diffusion plate 403 collapse at their surfaces and near the surfaces.

7. 发明专利

JPH09281278A JOINT MADE OF SHAPE MEMORY ALLOY 失效
公开(公告)号：JPH09281278A
公开(公告)日：1997-10-31
申请号：JP9504996
申请日：1996-04-17
申请人： HITACHI LTD
发明人： AMANO KAZUO , FUJIMORI HARUO , ENOMOTO KUNIO , SHIGENAKA NAOTO , MOCHIZUKI MASATO , OTAKA MASAHIRO , HIRANO KATSUHIKO , MASUDA MINORU
IPC分类号： G21C19/20 , B21D39/04 , C22C19/03
摘要： PROBLEM TO BE SOLVED: To facilitate and rationalize piping replacement work by providing the outside surface of a cylindrical liner with grooves having parts penetrating this cylindrical liner and forming shape memory allay rings and the cylindrical liner to a fit structure. SOLUTION: The shape memory allay rings 1 are manufactured by using shape memory alloys. These allays are made to memorize a shape in such a manner that the diameter thereof is reduced by heating the allays to their austenitic transformation temp. or above. The cylindrical liner 2 to be inserted into the inner side of the shape memory allay rings 1 is provided with two rows of annular projecting parts 3a, 3b in its circumferential direction and the outside surface is provided with the grooves 5 having the parts penetrating the inside of the liner. When the shape memory alloy rings 1 restore the shape to the reduced diameter by inducing the austenitic transformation, the cylindrical liner 2 is deformed and the annular projecting parts 3a, 3b formed on its inside surface bite into a piping, thereby clamping the piping. In such a case, the rigidity of the cylindrical liner 2 is enhanced if the width of the grooves 5 on the outside surface of the cylindrical liner 2 is made small and the number of the grooves is reduced.

8. 发明专利

JPH09108596A FLUID JET NOZZLE AND STRESS IMPROVING METHOD USING THE SAME 失效
公开(公告)号：JPH09108596A
公开(公告)日：1997-04-28
申请号：JP27228595
申请日：1995-10-20
申请人： HITACHI LTD , BABCOCK HITACHI KK
发明人： ENOMOTO KUNIO , HIRANO KATSUHIKO , OTAKA MASAHIRO , AMANO KAZUO , HAYASHI EISAKU , SHIMIZU SADAHITO , MORINAKA TADASHI , SATOU KAZUNORI
IPC分类号： B23K31/00 , B05B1/00 , E21B7/18
摘要： PROBLEM TO BE SOLVED: To provide a nozzle which is suitable to efficiently improve stress using jet water containing bubbles due to cavitation in an environment in liquid and a method for efficiently improve stress. SOLUTION: A cavitation bubble nucleus excitor, which generates, in large number, cavitation bubble nuclei or cavitation bubbles, is provided at a throat section 6 and/or between the throat section 6 and a diffusion chamber 8 so as to function as an increasing chamber 7, and a jet water including a large number of cavitation bubble nuclei and cavitation bubbles is ejected from a jet nozzle 1 against a metal material to effect peening on the surface of the metal material.

9. 发明专利

JP2002168992A METHOD FOR REPAIR OF INSIDE REACTOR PRESSURE VESSEL, AND REPAIRING DEVICE 失效
公开(公告)号：JP2002168992A
公开(公告)日：2002-06-14
申请号：JP2000365807
申请日：2000-11-30
申请人： HITACHI LTD , BABCOCK HITACHI KK , BAB HITACHI IND CO , HESTEC SERVICE CO LTD
发明人： KUROSAWA KOICHI , UMAHARA YOICHI , NAGASHIMA TOSHIJI , NITTA ICHIYO , GO SHINJI , SUZUKI YOSHINORI , HIRANO KATSUHIKO
IPC分类号： G21C19/02 , G21C17/007
摘要： PROBLEM TO BE SOLVED: To provide a method for repair of a inside of reactor pressure vessel, and a repairing device permitting repairing work at an annulus part of the reactor pressure vessel to be easily conducted in a short time. SOLUTION: Recirculation piping 72 connected to a recirculation nozzle 2 of the reactor pressure vessel 1 is cut to form an opening part 3, a repairing device is carried into the annulus part 10 of the reactor pressure vessel 1 from this opening part 3, and repair to the inside of annulus part 10 is conducted.

10. 发明专利

JP2000298189A METHOD AND DEVICE FOR PEENING INSIDE OF NUCLEAR REACTOR 失效
公开(公告)号：JP2000298189A
公开(公告)日：2000-10-24
申请号：JP10621199
申请日：1999-04-14
申请人： HITACHI LTD
发明人： HIRANO KATSUHIKO , ENOMOTO KUNIO , HAYASHI MAKOTO
IPC分类号： G21C13/00 , G21C19/02 , G21F9/28
摘要： PROBLEM TO BE SOLVED: To provide a method and device for improving residual stresses on a structure in a nuclear reactor without recycling shots in the atmosphere during the execution of replacement construction. SOLUTION: A scaffold 73 is assembled at the bottom of a reactor and the welded parts of the bottom of the reactor are peened therefrom. The portion of an ice projecting gun end 74 is elongated by means of a jig or the like. The main body 76 of a peening device is installed on the side of a worker 75, who holds the ice projecting gun 74 to construct the target part of an in- reactor structure. The dimension from the scaffold to the bottom of the reactor, which varies depending on plants, is generally 1.2 m or so, allowing for operation of the ice projecting gun 74. A drain 77 is installed at the bottom of the reactor to discharge liquid after ices collected at the bottom of the reactor are melted.

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