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1. 发明专利

JP2002039963A VISUAL INSPECTION METHOD 失效
公开(公告)号：JP2002039963A
公开(公告)日：2002-02-06
申请号：JP2001107932
申请日：2001-04-06
申请人： HITACHI LTD
发明人： NOGUCHI MINORU , NAKAGAWA YASUO , HAMADA TOSHIMITSU , FUSHIMI SATOSHI , ISHII KYOZO , HAYASHI TSUNEO
IPC分类号： G01B11/24 , B23K1/00 , G01N21/956 , G06T1/00 , H05K3/34
摘要： PROBLEM TO BE SOLVED: To provide a visual inspection method whereby defects such as missing of soldering at soldering parts, extraordinarily much/extraordinarily little soldering, short circuits of the soldering parts, etc., can be inspected at high speeds with a high reliability, in other words, defects of a sample can be sorted at high speeds by observing an appearance of the sample. SOLUTION: A table is driven on the basis of preliminarily stored position coordinate data to bring a desired region of the sample loaded on the table into a visual field of a microscope. The desired region of the sample brought into the visual field of the microscope is imaged, whereby an image of the desired region is obtained. The image of the desired region is stored, and the stored image of the desired region is sorted.

2. 发明专利

JP2003092443A METHOD FOR SCHEDULING TO PROCESS MULTI-CHAMBER FILM FORMING APPARATUS 审中-公开
公开(公告)号：JP2003092443A
公开(公告)日：2003-03-28
申请号：JP2001282530
申请日：2001-09-18
申请人： HITACHI LTD
发明人： OKUDA KOJI , UMEHARA SATOSHI , IMAGAWA TAKAO , SHIGEMATSU KEISHI , HAYASHI TSUNEO
IPC分类号： H01L43/12
摘要： PROBLEM TO BE SOLVED: To manage a processing time regarding a plurality of films to be formed and to facilitate an edition of a schedule. SOLUTION: A method for scheduling to process a multi-chamber film forming apparatus comprises the steps of calculating the processing time including a film forming time and a conveying time according to a processing order intrinsic for a substrate before starting to process a substrate 13, dividing the calculated processing time at each time, forming a processing schedule based on the processing order intrinsic for the processing time divided at each unit time, and editing to avoid a duplicate when the processing is duplicated within the same unit time between the substrates.

3. 发明专利

JPS62168968A SPARK DISCHARGE DURATION MEASURING SYSTEM FOR IGNITION DEVICE FOR AUTOMOBILE 失效
公开(公告)号：JPS62168968A
公开(公告)日：1987-07-25
申请号：JP16191185
申请日：1985-07-24
申请人： HITACHI LTD
发明人： SHIRATORI SUSUMU , HAYASHI TSUNEO
IPC分类号： F02P17/00
摘要： PURPOSE:To measure a spark discharge duration with high accuracy by storing the wave form of the secondary side voltage of an ignition coil in a wave form memory at a proper sampling speed. CONSTITUTION:A transistor 3 is shut off by an ignition signal generator 1 to cut off a current in the primary coil 4 of an ignition coil 2 and generate a high voltage in the secondary coil 5. A load resistance 7 is connected to the output terminal 6 of the secondary coil 5 and a voltage dividing resistance 8 for measuring a current is connected in series to the load resistance 7. Both terminals of the voltage dividing resistance 8 are connected to a wave form memory 9 to store the wave form of a secondary side current in conformity with the ignition timing of the ignition signal generator 1. This data is analyzed by a microcomputer 10 and a spark discharge duration is calculated from the number of steps from a measurement starting point 24 which is the peak value of the wave form to the end point 28 of the measurement, and a sampling speed, and the result is displayed by a CRT 11.

4. 发明专利

JPH03231105A METHOD AND APPARATUS FOR APPEARANCE INSPECTION OF SOLDERED PART 失效
公开(公告)号：JPH03231105A
公开(公告)日：1991-10-15
申请号：JP2601690
申请日：1990-02-07
申请人： HITACHI LTD
发明人： NOGUCHI MINORU , NAKAGAWA YASUO , HAMADA TOSHIMITSU , FUSHIMI SATOSHI , ISHII KYOZO , HAYASHI TSUNEO
IPC分类号： G01B11/24 , G01N21/88 , H05K3/34
摘要： PURPOSE:To compute the amount of solder and to perform highly reliable appearance inspection at a high speed by shielding regular reflected light with a polarization element, and measuring the three-dimensional shape of the surface of a solder sample close to a mirror surface with a microscope having an optical system using an objective lens. CONSTITUTION:The laser beam which is oscillated in a laser light source 31 is converted into the luminous flux having the specified expansion through a beam expander 32. The beam is made to scan in the direction of X with an X-scanning mirror 33. Only the laser beam which is linearly polarized in the specified direction passes through a polarization beam splitter 34. The beam is made to scan in the direction of Y with a Y-scanning mirror 35 and inputted into an optical system part 50. Then, the beam is condensed 51 on a field lens 52. The image is formed in the vicinity of a solder sample 14 with an objective lens 53 and a Z-direction scanning lens 54. The image of the light reflected and returned from the surface of the sample 14 is formed on the lens 52. The image is reflected and scanned with the mirror 35 through the lens 51. The S-polarized light is shielded with the splitter 34, and only the P-polarized light is reflected and inputted into a detecting part 70. The image is formed 71, and the signal is detected with a one-dimensional linear sensor 72.

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