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1. 发明专利

JPS58175152A STAMPER 失效
公开(公告)号：JPS58175152A
公开(公告)日：1983-10-14
申请号：JP5551482
申请日：1982-04-05
申请人： HITACHI LTD
发明人： OKUDAIRA HIROAKI , FUKAGAWA TAKEO , KOBAYASHI TOSHIO , GOUHARA YOSHIO
IPC分类号： G11B7/26 , B29C33/00 , B29C43/00 , B29C61/00 , B29D17/00 , G11B3/70 , G11B9/06 , G11B23/00
摘要： PURPOSE:To prevent a metallic film from being peeled from a substrate, namely, a backing material when a disc is duplicated, by attaching a peeling prevention member to the outside circumferential part. CONSTITUTION:A stamper consists of a metallic film 2 having a prescribed pattern 1, a substrate 3, and adhesive 4, and a peeling prevention member 10. Nickel is vapor-deposited or plated electrically on a glass original disc having a pattern, which is formed by a photoresist method, to form the metallic film 2. The metallic film 2 is adhered to the substrate 3 by the adhesive 4. An epoxy resin or the like is used as the adhesive 4. The outside circumferential part of the stamper is shaped by a lathe after adhesion. The peeling prevention member 10 is provided for preventing the metallic film 2 from peeling from the substrate 3 when many discs are duplicated. As materials of the peeling prevention member 10, not only an epoxy resin but also a polyester resin or an acrylic resin which can be solidified after application is used without limit.

2. 发明专利

JPS5953691A Electroforming method 失效
标题翻译：电化学方法
公开(公告)号：JPS5953691A
公开(公告)日：1984-03-28
申请号：JP16385082
申请日：1982-09-22
申请人： Hitachi Ltd
发明人： OKUDAIRA HIROAKI , KOBAYASHI TOSHIO , FUKAGAWA TAKEO , OKA HITOSHI
IPC分类号： C25D1/00 , C25D1/10
摘要： PURPOSE: To decrease the stress over the entire part of an electroforming film and to transfer the reversal shape of a matrix exactly to the electroforming film in the stage of forming the electroforming on the matrix, by forming alternately the electroforming film having a compressive stress value and the electroforming film having a tensile stress value.
CONSTITUTION: A current density resulting compressive electrodeposition stress and a current density resulting tensile electrodeposition stress are alternately applied and an electroforming film having a compressive stress value and an electroforming film having a tensile stress value are alternately formed on a matrix of a prescribed shape by electroforming. It is preferred that the total sum of the product of the product of the tensile stress value and the thickness of the electroforming film having tensile stress and the total sum of the product of the compressive stress value and the thickness of the electroforming film having compressive stress are equal but about within 10kg/mm
2 difference between both may be permitted practically.
COPYRIGHT: (C)1984,JPO&Japio
摘要翻译：目的：为了在电铸薄膜的整个部分上减小应力，并在基体上形成电铸阶段将矩阵的反转形状精确地转移到电铸薄膜上，通过交替地形成具有压缩应力值的电铸薄膜电铸薄膜具有拉伸应力值。构成：交替施加导致压电电沉积应力的电流密度和导致拉伸电沉积应力的电流密度，并且具有压应力值的电铸膜和具有拉伸应力值的电铸膜通过电铸交替形成在规定形状的基体上。优选拉伸应力值的乘积与具有拉伸应力的电铸膜的厚度的乘积与压缩应力值的乘积与具有压应力的电铸膜的厚度的总和的总和相等但约在10kg / mm以内。实际上可能允许两者之间的差异。

3. 发明专利

JPH055904B2 失效
公开(公告)号：JPH055904B2
公开(公告)日：1993-01-25
申请号：JP21086483
申请日：1983-11-11
申请人： HITACHI LTD
发明人： OKUDAIRA HIROAKI , TANAKA ISAMU , OKA HITOSHI , KOBAYASHI TOSHIO , FUKAGAWA TAKEO
IPC分类号： C23C14/06 , C23C14/00 , C23C14/04 , C23C14/14 , C25D1/00 , C25D1/10

4. 发明专利

JPS60103194A STAMPER AND ITS PRODUCTION 失效
公开(公告)号：JPS60103194A
公开(公告)日：1985-06-07
申请号：JP21086483
申请日：1983-11-11
申请人： HITACHI LTD
发明人： OKUDAIRA HIROAKI , TANAKA ISAMU , OKA HITOSHI , KOBAYASHI TOSHIO , FUKAGAWA TAKEO
IPC分类号： C23C14/06 , C23C14/00 , C23C14/04 , C23C14/14 , C25D1/00 , C25D1/10
摘要： PURPOSE:To obtain a stamper which is particulary suitable for an optical disc and has high accuracy by irradiating UV light to a photoresist film formed with a prescribed pattern on a mother plate then forming a thin metallic film thereon by a vapor growth method, adhering a linging material to the plating film formed thereon and stripping the mother plate from the thin metallic film. CONSTITUTION:UV light is irradiated on a mother plate 7 consisting of forming a prescribed pattern 4 on a photoresist film 5 deposited on a glass plate 4. An Ni film 8 deposited by evaporation is then formed on the pattern 4 of the plate 7 by a vapor deposition method and further and Ni plating film 9 is formed by an electroplating method on the film 8. A flat lining material 11 consisting of carbon steel is adhered onto the film 9 by using an acrylic adhesive agent 10. The plate 7 is stripped from th film 8 and finally the outside circumference is shaped, by which the stamper 12 having the versal pattern 6' reversed from the pattern 6 formed to the film 5 of the plate 7 is obtd.

5. 发明专利

JPH0466021B2 失效
公开(公告)号：JPH0466021B2
公开(公告)日：1992-10-21
申请号：JP14903483
申请日：1983-08-15
申请人： HITACHI LTD
发明人： OKUDAIRA HIROAKI , KOBAYASHI TOSHIO , FUKAGAWA TAKEO
IPC分类号： G03F7/40 , B41M5/26 , G03F7/039 , G03F7/20 , H01L21/027

6. 发明专利

JPS62141633A METHOD FOR WORKING SUBSTRATE FOR MAGNETIC RECORDING MEDIUM 失效
公开(公告)号：JPS62141633A
公开(公告)日：1987-06-25
申请号：JP28090785
申请日：1985-12-16
申请人： HITACHI LTD
发明人： FUKAGAWA TAKEO , OOTA SAKAE
IPC分类号： G11B5/84 , B24B37/00
摘要： PURPOSE:To form such a stuck film which increases the adhesive power between a substrate and magnetic recording layer in wet type polishing of the substrate by subjecting the substrate to polishing by using a working fluid contg. Cu, Cr, Sn ions or metals in an acidic working fluid having

7. 发明专利

JPS58185049A Stamper and its production 失效
标题翻译：冲压及其生产
公开(公告)号：JPS58185049A
公开(公告)日：1983-10-28
申请号：JP6637582
申请日：1982-04-22
申请人： Hitachi Ltd
发明人： OKUDAIRA HIROAKI , FUKAGAWA TAKEO , KOBAYASHI TOSHIO , GOUHARA YOSHIO
IPC分类号： G11B7/26 , B29C33/00 , B29C61/00 , B29D17/00 , G11B3/70 , G11B9/06 , G11B23/00
CPC分类号： G11B23/0057
摘要： PURPOSE:To eliminate the separation of a metallic layer from a substrate, by forming a metallic layer having high coupling force with an adhesive on a metallic film to which a recording track pattern is formed and then adhering the metallic layer to the substrate. CONSTITUTION:A metallic film 1 uses nickel, and a metallic layer 8 has high coupling force with nickel and high affinity to an adhesive 4. The film 1 is adhered to a substrate 3 with the adhesive 4 and via the layer 8. Copper is suited to the layer 8. It is effective to use zinc, tin, iron, brass, etc. in place of copper in terms of easiness of plating. Furthermore, a metallic oxide film is formed on the layer 8 to increase the coupling force.
摘要翻译：目的：为了消除金属层与基板的分离，通过在形成有记录轨迹图案的金属膜上形成具有高粘合力的金属层与粘合剂，然后将金属层粘合到基底上。构成：金属膜1使用镍，金属层8与镍具有高的耦合力并且对粘合剂4具有高亲和力。膜1通过粘合剂4并通过层8粘合到基底3上。铜适合在镀层的容易性方面，使用锌，锡，铁，黄铜等代替铜是有效的。此外，在层8上形成金属氧化物膜以增加耦合力。

8. 发明专利

JPH07301576A PRESSING FORCE MEASURING JIG FOR DISC PRESSING ROLLER 失效
公开(公告)号：JPH07301576A
公开(公告)日：1995-11-14
申请号：JP11961694
申请日：1994-05-09
申请人： HITACHI ELECTR ENG , HITACHI LTD
发明人： NAKAO TAKAFUMI , FUKAGAWA TAKEO
IPC分类号： G01L5/00 , G11B25/04
摘要： PURPOSE:To measure the pressing force of a pressing roller accurately using a strain gauge having high measurement accuracy. CONSTITUTION:A test disc 4 having the same diameter as a disc to be machined is loaded to the spindle 2 of a rotary mechanism with the pressure sensor part 5 directing upward and brought into stationary state. When an air cylinder is actuated to depress a press roller 22, the protrusion 6a of a press dowel 6 presses the protrusion 52a of a diaphragm 52 to distort a strain gauge 53 thus generating a voltage corresponding to the pressing force F. The voltage is indicated on a digital indicator 54 and the air pressure of the air cylinder is regulated to obtain a predetermined voltage value. Consequently, an appropriate pressing force F can be set accurately for the roller 22.

9. 发明专利

JPH01201484A CHEMICAL NICKEL PLATING LIQUID AND METHOD OF USING SAID LIQUID 失效
公开(公告)号：JPH01201484A
公开(公告)日：1989-08-14
申请号：JP15231088
申请日：1988-06-22
申请人： HITACHI LTD
发明人： NAKAGAWA YOSHIO , OKA HITOSHI , FUJISAWA MASAKO , FUKAGAWA TAKEO , GOHARA YOSHIO
IPC分类号： C23C18/18 , C23C18/31 , C23C18/36
摘要： PURPOSE:To obtain a stable chemical plating liquid which can form a specific excellent plating film by dissolving hypophosphorous acid or the salt thereof as a reducing agent into an aq. nickel salt soln. and further combining and selecting complexing agents and adding the same thereto to prevent precipitation. CONSTITUTION:The hypophosphorous acid or the salt thereof is dissolved at 0.10-0.45mol./l as the reducing agent into the aq. nickel salt soln. contg. 0.09-0.20mol./l Ni and the complexing agents are so combined and selected as to prevent generation of the precipitation of nickel hypophosphite and nickel hydroxide equilibriously in the entire regions of the pH at the time of plating and the pH of an alkaline replenishing liquid, then said complexing agents are added to the soln. The complexing agents consist of 0.18-0.75mol./l malic acid, 0.14-0.50mol./l glycine, 0.09-0.30mol./l gluconic acid or ammonium and the pH of the aq. soln. is preferably adjusted to 4.0-7.0. The anionic surfactant of 1-200mg/l is preferably added further to this aq. soln. to obtain the stable chemical plating liquid. A nonmagnetic substrate consisting of an Al alloy, etc. is immersed in this plating liquid, by which the plating film having excellent heat resistant nonmagnetic characteristics is obtd. at a high plating speed.

10. 发明专利

JPS6041227A DEFORMATION PREVENTIVE METHOD OF PHOTO RESIST PATTERN 失效
公开(公告)号：JPS6041227A
公开(公告)日：1985-03-04
申请号：JP14903483
申请日：1983-08-15
申请人： HITACHI LTD
发明人： OKUDAIRA HIROAKI , KOBAYASHI TOSHIO , FUKAGAWA TAKEO
IPC分类号： G03F7/40 , B41M5/26 , G03F7/039 , G03F7/20 , H01L21/027 , H01L21/30
摘要： PURPOSE:To prevent deformation of a pattern due to heating by irradiating 0.5J/cm or more ultra-violet rays on a photo resist film formed in a specific pattern by exposure and development. CONSTITUTION:On a glass plate, positive type photo resist is coated by rolling and a photo resist film of approx. 2,130Angstrom is formed. The rotation speed is 1,200rpm and the time of rotation is 30sec. The film is prebaked at approx. 80 deg.C, exposed, developed and a linear pattern of approx. 10mum wide is formed. Then, ultra-violet rays are projected up to 5J/cm using a high-tension mercury lamp.

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