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    • 3. 发明专利
    • DEVICE AND METHOD FOR COATING ENAMEL WIRE
    • JPH02267820A
    • 1990-11-01
    • JP8757189
    • 1989-04-06
    • HITACHI CABLE
    • YOSHIDA HIROMICHI
    • H01B13/16
    • PURPOSE:To obtain an enamel wire having a uniform coat thickness by provid ing a device for imparting one or more rotations to a core wire while once passing the core wire on at least either of the inlet part or outlet part of a horizontal baking furnace. CONSTITUTION:To make an enamel wire 2, a core wire 1 is passed to an enam el coating part 3 through a guide roller 5 and baked in a horizontal baking furnace 4, the baked enamel coated wire is again passed to the enamel coating part 3 through the guide roller 6, and baking is repeated in the baking furnace 4, whereby the enamel wire 2 is obtained. Rotation adding parts 9 are provided on the inlet part and outlet part of the baking furnace 4, and impart one or more rotations to the core wire or enamel coated wire 1 while the core wire or enamel coated wire 1 is once passed. Hence, an enamel wire having a uni form coat thickness can be obtained even by the horizontal baking furnace.
    • 4. 发明专利
    • HIGH-SPEED PARTIAL PLATING DEVICE
    • JPH02159393A
    • 1990-06-19
    • JP31309388
    • 1988-12-12
    • HITACHI CABLE
    • OTAKA TATSUYAYOSHIDA HIROMICHI
    • C25D5/02
    • PURPOSE:To form a plating film having a uniform thickness by pressing soluble anodes by springs according to the consumption of anodes to maintain the specified spacing from the material to be plated at the time of shielding the surface of the plate object to be plated with a mask having apertures of a specific shape and subjecting the object to partial plating by using the anodes. CONSTITUTION:The metallic plate to be plated is superposed on the mask 5 having the aperture patterns 6 of the prescribed shape, and a plating liquid is ejected from nozzles 8 through the aperture patterns 6 of the mask 5 to the metallic plate to be plated as a cathode while the plate is kept moved in a specified direction to execute plating in the aperture pattern parts. The soluble anodes consisting of the same metal as the plating metal are used as the anodes 4 in the area of at least twice the area of the plating surface. The anodes are pressed upward by the springs 12 to ascend according to the consumption thereof and are thereby pressed to noncontinuous anode positioning pieces 10 to maintain always the specific spacing with the metallic plate to be plated as the cathode. The aperture pattern-shaped plating is thus formed on the surface of the object to be plated at the uniform thickness.