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    • 2. 发明专利
    • MANUFACTURE OF THIN FILM
    • JPH04162327A
    • 1992-06-05
    • JP28645190
    • 1990-10-24
    • HAMAMATSU PHOTONICS KK
    • YOKOYAMA TOSHIKISUGIYAMA MASARUOBA AKIRA
    • C23C14/06H01J9/12H01J9/233
    • PURPOSE:To obtain a thin film easily peeled from a substrate and causing no deterioration on a photoelectric face by forming a support film made of an organic material and generating the adhesive strength to the thin film larger than the adhesive strength between the substrate and the thin film on the thin film made of a material with the preset light characteristic. CONSTITUTION:A thin film 2 made of a material with the preset light characteristic (e.g., photoelectric transfer characteristic) is formed on the smooth face of a substrate 1, and a support film 3 made of an organic material and generating the adhesive strength to the thin film 2 larger than the adhesive strength between the substrate 1 and the thin film 2 is formed on the thin film 2. The adhesive strength between the support film 3 and the thin film 2 is made larger than the adhesive strength between the thin film 2 and the substrate 1, thus the support film 3 can be easily peeled from the substrate 1 together with the thin film 2, the thin film 2 is pinched by the support film 3 and the substrate 1 before it is peeled, and no deterioration occurs during storage.
    • 4. 发明专利
    • JPH05249300A
    • 1993-09-28
    • JP4854192
    • 1992-03-05
    • HAMAMATSU PHOTONICS KK
    • YOKOYAMA TOSHIKIOBA AKIRASUGIYAMA MASARU
    • G21K7/00
    • PURPOSE:To arrange on an optical axis a window with a specified size or a window with a specified material in accordance with X-ray image observation conditions without breaking the vacuum in an X-ray optical system. CONSTITUTION:Provided are an X-ray source 1, an X-ray optical system 2, aparture part 20 with a window, first and second bellows 12, 18 fixed air-tight at the end between the inlet window 2a of the X-ray optical system 2 and the aparture part 20 with a window, an X-Y stage consisting of first and second movable frames 13a, 13b supporting the aparture part 20 with a window movablly in the direction perpendicular to the light axis, and first and second screws 28, 29 adjusting the X-Y stage 13 to the reference of a reference surface structure part 14. By moving two dimensionally the aparture 20 with a window in the direction perpendicular to the light axis, a window 30 with different size or a window 30 of a different material can be brought on the optical axis without breaking the vacuum.
    • 5. 发明专利
    • APPARATUS FOR OBSERVING ENLARGED RADIATION IMAGE
    • JPH04213047A
    • 1992-08-04
    • JP40063290
    • 1990-12-06
    • HAMAMATSU PHOTONICS KK
    • OBA AKIRASUGIYAMA MASARUOSUGA SHINJIYOKOYAMA TOSHIKI
    • G01N23/04G21K7/00
    • PURPOSE:To make it possible to observe X-ray, visible light and other radiation image by providing a constitution wherein an X-ray screening means transmits the specified radiation and casts the radiation on a sample setting position, and a slant-incident reflecting mirror expands the image of the specified radiation from the sample setting position. CONSTITUTION:A reflecting and diffusing plate 52 is made to go back. X rays are emitted from an X-ray source 51 on a sample 54. Thus the X-ray image is formed. The X rays are transmitted through an incident window 55 and cast on a radiation- image enlarging part 56. The X rays are reflected from a slant-incident reflecting mirror 7. The enlarged X-ray image is focused on a photoelectric plane 9. Meanwhile, the X rays emitted into the cylindrical cavity of the slant-incident reflecting mirror 7 are screened with a lens 58a. The lens 58a does not transmit the X rays but transmits the specified radiation. The visual light beam emitted from a light source 71 is made to pass through a half mirror 73 and cast into a mirror 58b. The light beam passes through the lens 58a, and the small spot image is condensed at the position of the sample 54. The spot image is enlarged with the slant-incident reflecting mirror 7 and projected on the photoelectric plane 9. When a reflecting mirror 10 is moved, the spot image is detected with a first photodetector 12.