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1. 发明专利

JP2013084971A Driver laser for extreme ultraviolet light source 审中-公开
标题翻译：极光紫外线光源的驱动激光器
公开(公告)号：JP2013084971A
公开(公告)日：2013-05-09
申请号：JP2012264404
申请日：2012-12-03
申请人： Gigaphoton Inc , ギガフォトン株式会社
发明人： HOSHINO HIDEYUKI , SUMIYA AKIRA , KOMORI HIROSHI , ABE TAMOTSU , ARIGA TATSUYA , MIZOGUCHI KAZU , ENDO AKIRA , GEORGE SOUMAGNE
IPC分类号： H01S3/00 , H01L21/027 , H01S3/098 , H01S3/23
摘要： PROBLEM TO BE SOLVED: To provide a driver laser for an extreme ultraviolet light source which achieves high power output while suppressing energy per pulse or energy per unit time of pulse laser light in a single row structure.SOLUTION: The driver laser to be used for an extreme ultraviolet light source device which generates extreme ultraviolet light by turning a target into plasma by irradiating the target with laser light includes: an oscillation stage laser device which generates pulse laser light whose intensity increases with time, using COas a laser medium; and an amplifying stage device which includes at least one amplifier that amplifies, with an amplification factor decreasing with time, the pulse laser light outputted from the oscillation stage laser device, thereby extending the pulse width of the laser light.
摘要翻译：要解决的问题：提供一种用于实现高功率输出的极紫外光源的驱动激光器，同时抑制单行脉冲激光器中每脉冲的能量或单位时间的能量。解决方案：用于通过用激光照射目标物将目标转换成等离子体而产生极紫外光的极紫外光源装置的驱动激光器包括：振荡级激光装置，其产生脉冲激光，其强度使用CO 2 作为激光介质随时间增加; 以及放大级装置，其包括至少一个放大器，放大倍数随时间而减小从振荡级激光装置输出的脉冲激光，从而延长激光的脉冲宽度。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2012256608A Target substance supply device 审中-公开
标题翻译：目标物质供应装置
公开(公告)号：JP2012256608A
公开(公告)日：2012-12-27
申请号：JP2012180699
申请日：2012-08-17
申请人： Gigaphoton Inc , ギガフォトン株式会社
发明人： NAKANO MASANARI , ENDO AKIRA
IPC分类号： H05G2/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To stabilize the temperature of a target substance in a target substance supply device supplying the target substance to a plasma generation chamber of an LPP type EUV light source device.SOLUTION: A target substance supply device includes: a liquefaction chamber 108 for cooling and liquefying a target substance supplied from the exterior; a nozzle 102 for ejecting the target substance liquefied in the liquefaction chamber 108; a rod 109 for controlling a temperature of the target substance in the liquefaction chamber 108; a cooler 110; a heater 111; a temperature sensor 112; a temperature control part 113; a rod 114 for controlling the temperature of the target substance in the nozzle 102; a cooler 115; a heater 116; a temperature sensor 117; and a temperature control part 118.
摘要翻译：要解决的问题：将供给目标物质的目标物质供给装置中的目标物质的温度稳定在LPP型EUV光源装置的等离子体生成室中。解决方案：目标物质供应装置包括：液化室108，用于冷却和液化从外部供应的目标物质; 用于喷射在液化室108中液化的目标物质的喷嘴102; 用于控制液化室108中的目标物质的温度的杆109; 冷却器110; 加热器111; 温度传感器112; 温度控制部113; 用于控制喷嘴102中的目标物质的温度的杆114; 冷却器115; 加热器116; 温度传感器117; 和温度控制部分118.版权所有（C）2013，JPO＆INPIT

3. 发明专利

JP2012227167A Driver laser for extreme ultraviolet light source device, and lpp-type extreme ultraviolet light source device 审中-公开
标题翻译：极光紫外线光源装置的驱动激光器和LPP型超极紫外光源装置
公开(公告)号：JP2012227167A
公开(公告)日：2012-11-15
申请号：JP2012174787
申请日：2012-08-07
申请人： Gigaphoton Inc , ギガフォトン株式会社
发明人： ENDO AKIRA , ARIGA TATSUYA , SUGANUMA TAKASHI , MIURA TAISUKE
IPC分类号： H05G2/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To materialize a driver laser for an EUV light source device which achieves both of short pulse formation and multi-line oscillation concurrently.SOLUTION: The driver laser comprises: (i) a short pulse, multi-line oscillation COlaser oscillator having short-pulse-forming means which changes laser light into a short pulse in a laser resonator operable to perform a continuous oscillation and then outputs the short pulse of the laser light to the outside of the laser resonator, an optical element having a wavelength-dependent transmissivity which allows the suppression of the strengths of oscillation spectrum components showing energy peak values of oscillation spectra of the laser light in the laser resonator, and repetition means for activating and deactivating the short-pulse-forming means with a repetition cycle of 50-100 kHz; and (ii) at least one amplifier which accepts input of the short pulse of the laser light output by the short pulse, multi-line oscillation COlaser oscillator, and amplifies and outputs the laser light.
摘要翻译：解决的问题：实现同时实现短脉冲形成和多线振荡的EUV光源装置的驱动激光器。解决方案：驱动器激光器包括：（i）具有短脉冲形成装置的短脉冲，多线振荡CO 2 激光振荡器，其将激光改变为激光谐振器中的短脉冲可操作以执行连续振荡，然后将激光的短脉冲输出到激光谐振器的外部，具有波长依赖透射率的光学元件，其允许抑制振荡光谱分量的强度示出了激光谐振器中的激光的振荡光谱的能量峰值，以及用于以50-100kHz的重复周期激活和去激活短脉冲形成装置的重复装置; 和（ii）至少一个放大器，其接受通过短脉冲输出的短脉冲的输入，多线振荡CO 2 激光振荡器，并放大和输出激光灯。版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2012019225A Extreme ultraviolet light source device 有权
标题翻译：极致超紫外光源设备
公开(公告)号：JP2012019225A
公开(公告)日：2012-01-26
申请号：JP2011189808
申请日：2011-08-31
申请人： Gigaphoton Inc , Komatsu Ltd , ギガフォトン株式会社 , 株式会社小松製作所
发明人： UENO YOSHIFUMI , KOMORI HIROSHI , SUGANUMA TAKASHI , GEORGE SOUMAGNE , TAKABAYASHI YUICHI , ENDO AKIRA
IPC分类号： H01L21/027 , G03F7/20 , H05G2/00
摘要： PROBLEM TO BE SOLVED: To appropriately determine the timing to replace an extreme ultraviolet (EUV) collector mirror by accurately considering influence of a sputtering amount of the mirror in a laser-produced plasma (LPP) EUV light source device.SOLUTION: An EUV light source device comprises: an ion detector which is arranged in a vacuum chamber and detects ions generated from plasma so as to output detection signals indicating ion amounts; a calculation unit which integrates the ion amounts based on the detection signals output from the ion detector so as to calculate an integrated value; and a determination unit which outputs a determination signal indicating timing to replace or repair a collector mirror when the integrated value calculated by the calculation unit reaches a predetermined reference value.
摘要翻译：要解决的问题：通过精确地考虑在激光产生的等离子体（LPP）EUV光源装置中的反射镜的溅射量的影响，适当地确定替代极紫外（EUV）集电镜的时机。解决方案：EUV光源装置包括：离子检测器，其布置在真空室中，并检测从等离子体产生的离子，以输出指示离子量的检测信号; 计算单元，其基于从离子检测器输出的检测信号对离子量进行积分，以计算积分值; 以及确定单元，当由所述计算单元计算的积分值达到预定参考值时，输出指示用于替换或修复集电镜的定时的确定信号。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2011009183A Extreme-ultraviolet light source device 有权
标题翻译：极光紫外光源设备
公开(公告)号：JP2011009183A
公开(公告)日：2011-01-13
申请号：JP2009219547
申请日：2009-09-24
申请人： Gigaphoton Inc , ギガフォトン株式会社
发明人： ENDO AKIRA , NAGAI SHINJI , KAKIZAKI KOJI , WAKABAYASHI OSAMU , UENO YOSHIFUMI
IPC分类号： H05G2/00 , H01L21/027
CPC分类号： H05G2/003 , H05G2/001 , H05G2/008
摘要： PROBLEM TO BE SOLVED: To restrain an optical element and other constituent elements of an EUV light source device from being stained or damaged by debris, and realize their longer life.SOLUTION: The extreme-ultraviolet light source device 1 generating extreme-ultraviolet light by generating plasma of a target matter in a chamber includes a first laser part generating pre-plasma by irradiating first laser light 34 on the target matter, a second laser part generating main plasma generating extreme-ultraviolet light by irradiating second laser light 35 on the pre-plasma, and a magnetic field generating part generating a magnetic field B in the chamber and controlling at least one state out of the pre-plasma and the main plasma.
摘要翻译：要解决的问题：抑制EUV光源装置的光学元件和其他构成元件被碎片污染或损坏，并实现其更长的寿命。解决方案：极紫外光源装置1通过以下方式产生极紫外光：在室内产生目标物质的等离子体包括：通过在目标物质上照射第一激光34而产生预等离子体的第一激光部分;通过在预处理物体上照射第二激光35来产生主等离子体产生极紫外光的第二激光部分以及在室内产生磁场B的磁场产生部分，并且从预等离子体和主等离子体中控制至少一种状态。

6. 发明专利

JP2010103104A Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and saturable absorber control method to be used for extreme ultraviolet light source device 有权
标题翻译：极光紫外线光源装置，用于极光紫外光源装置的激光光源装置和用于极光超紫外光源装置的可饱和吸收器控制方法
公开(公告)号：JP2010103104A
公开(公告)日：2010-05-06
申请号：JP2009216203
申请日：2009-09-17
申请人： Gigaphoton Inc , Komatsu Ltd , ギガフォトン株式会社 , 株式会社小松製作所
发明人： ENDO AKIRA , NOWAK KRZYSZTOF , HOSHINO HIDEYUKI , ARIGA TATSUYA , MORIYA MASATO , WAKABAYASHI OSAMU
IPC分类号： H05G2/00 , H01L21/027 , H01S3/00 , H01S3/23
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： PROBLEM TO BE SOLVED: To provide an EUV light source device which stably and continuously uses a saturable absorber in a high heat load condition.
SOLUTION: A saturable absorber (SA) device 33 is provided in a laser beam line for absorbing feeble light such as self oscillation light, parasitic oscillation light or return light. SA gas from a SA gas cylinder 334(1) and buffer gas from a buffer gas cylinder 334(2) are mixed with each other into mixture gas. The mixed gas is supplied via a supply pipeline 333(1) to a SA gas cell 330 for absorbing the feeble light in laser beam L1. The mixed gas is exhausted via an exhaust pipeline 333(2) and delivered to a heat exchanger 332. The mixed gas cooled by the heat exchanger 332 is delivered to the SA gas cell 330 again by a circulation pump 331(1).
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种在高热负荷条件下稳定且连续地使用可饱和吸收体的EUV光源装置。解决方案：可饱和吸收器（SA）装置33设置在激光束线中，用于吸收诸如自身振荡光，寄生振荡光或返回光的微弱光。来自SA气瓶334（1）的SA气体和来自缓冲气瓶334（2）的缓冲气体彼此混合成混合气体。混合气体经由供给管道333（1）供给到用于吸收激光束L1中的微弱光的SA气体单元330。混合气体通过排气管道333（2）排出并输送到热交换器332.由热交换器332冷却的混合气体通过循环泵331（1）再次输送到SA气室330。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2010021543A Extreme ultra violet light source apparatus 审中-公开
标题翻译：极光紫外线光源设备
公开(公告)号：JP2010021543A
公开(公告)日：2010-01-28
申请号：JP2009141103
申请日：2009-06-12
申请人： Gigaphoton Inc , Komatsu Ltd , ギガフォトン株式会社 , 株式会社小松製作所
发明人： MORIYA MASATO , ABE TAMOTSU , SUGANUMA TAKASHI , ENDO AKIRA , SUMIYA AKIRA , WAKABAYASHI OSAMU
IPC分类号： H01L21/027 , H05G2/00
CPC分类号： G21K5/04 , G03F7/70191 , G03F7/70575 , G03F7/70858 , G03F7/70941 , G21K1/10 , H05G2/005 , H05G2/008
摘要： PROBLEM TO BE SOLVED: To provide an EUV light source apparatus using a spectrum purity filter for obtaining high spectrum purity EUV light.
SOLUTION: The EUV light source apparatus includes: a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for radiating a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam radiated by the driver laser.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种使用光谱纯度滤光片获得高光谱纯度的EUV光的EUV光源装置。解决方案：EUV光源装置包括：腔室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光器激光器，用于将激光束照射到靶材料以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔超过由驱动器激光器辐射的激光束的最短波长的一半。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2008270549A Driver laser for extreme ultraviolet light source 有权
标题翻译：极光紫外线光源的驱动激光器
公开(公告)号：JP2008270549A
公开(公告)日：2008-11-06
申请号：JP2007111929
申请日：2007-04-20
申请人： Gigaphoton Inc , Komatsu Ltd , ギガフォトン株式会社 , 株式会社小松製作所
发明人： HOSHINO HIDEYUKI , SUMIYA AKIRA , KOMORI HIROSHI , ABE TAMOTSU , ARIGA TATSUYA , MIZOGUCHI KAZU , ENDO AKIRA , SMAN GEORG
IPC分类号： H01S3/117 , H01L21/027 , H01S3/10
摘要： PROBLEM TO BE SOLVED: To provide a driver laser for an extreme ultraviolet light source which achieves high power output while suppressing the energy per pulse or energy per time of pulse laser light in a single row structure. SOLUTION: The driver laser includes (1) an oscillation stage laser device which has a laser discharge tube that excites laser light using CO 2 as a laser medium, a total reflector and a partial reflector arranged across the laser discharge tube to make up an optical resonator, and an acoustooptic element disposed on a laser light path between the total reflector and the partial reflector. The oscillation stage laser device includes an amplifying stage device which includes (2) a laser control unit that controls the acoustooptic element so that a burst of laser light pulse train having a given repetition frequency is generated at a given cycle and (3) at least one amplifier that amplifies laser light output from the oscillation stage laser device. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于实现高功率输出的极紫外光源的驱动器激光器，同时抑制单行脉冲激光器中每脉冲的能量或每时刻的能量。驱动激光器包括：（1）振荡台激光装置，其具有使用CO 2 作为激光介质激发激光的激光放电管，全反射器和部分反射器布置穿过激光放电管以构成光学谐振器，以及设置在全反射器和部分反射器之间的激光路径上的声光元件。振荡级激光装置包括放大级装置，其包括：（2）激光控制单元，其控制声光元件，使得在给定周期产生具有给定重复频率的激光脉冲串，以及（3）至少一个放大器，用于放大来自振荡台激光器件的激光输出。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2007317598A Extreme-ultraviolet light source device 有权
标题翻译：极光紫外光源设备
公开(公告)号：JP2007317598A
公开(公告)日：2007-12-06
申请号：JP2006148054
申请日：2006-05-29
申请人： Gigaphoton Inc , Komatsu Ltd , ギガフォトン株式会社 , 株式会社小松製作所
发明人： KOMORI HIROSHI , ENDO AKIRA
IPC分类号： H05G2/00 , H01L21/027
CPC分类号： G21K1/14 , H05G2/003 , H05G2/008
摘要： PROBLEM TO BE SOLVED: To efficiently ionize neutral particles emitted from plasma, in an extreme-ultraviolet light source device discharging debris containing high-speed ions and neutral particles by the action of a magnetic field. SOLUTION: This extreme-ultraviolet light source device includes: a target supply device 11, a target nozzle 12 and a laser device 15 for generating plasma emitting at least extreme-ultraviolet light by a pulse operation; an EUV focusing mirror 17 focusing the extreme-ultraviolet light emitted from the plasma; a microwave generator 20, a microwave waveguide 21 and a microwave antenna 22 for ionizing neutral particles emitted from the plasma by radiating microwaves by a pulse operation to a space with a magnetic field formed therein to generate cyclotron resonance; and electromagnetic coils 19a and 19b generating the magnetic field and forming a magnetic field for trapping at least the ionized particles. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了有效地离子化等离子体发射的中性粒子，在极紫外光源装置中，通过磁场释放含有高速离子和中性粒子的碎片。解决方案：该极紫外光源装置包括：目标供给装置11，目标喷嘴12和激光装置15，用于通过脉冲操作产生至少发射极紫外光的等离子体; 聚焦来自等离子体的极紫外光的EUV聚焦镜17; 微波发生器20，微波波导21和微波天线22，用于通过脉冲操作将微波辐射从等离子体发射的中性粒子到具有形成在其中的磁场的空间以产生回旋共振; 以及产生磁场的电磁线圈19a和19b，并形成用于捕获至少所述电离粒子的磁场。版权所有（C）2008，JPO＆INPIT

10. 发明专利

JP2007200671A Extreme-ultraviolet light source device 有权
标题翻译：极光紫外光源设备
公开(公告)号：JP2007200671A
公开(公告)日：2007-08-09
申请号：JP2006016934
申请日：2006-01-25
申请人： Gigaphoton Inc , Komatsu Ltd , ギガフォトン株式会社 , 株式会社小松製作所
发明人： UENO YOSHIFUMI , KOMORI HIROSHI , SUGANUMA TAKASHI , GEORGE SOUMAGNE , TAKABAYASHI YUICHI , ENDO AKIRA
IPC分类号： H05G2/00 , G21K5/08 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To make the time for replacing an EUV collector mirror to be appropriately judged by exactly reflecting the sputtering amount on the mirror in an LPP type EUV light source device.
SOLUTION: The light source device comprises, in a vacuum chamber, an extreme-ultraviolet light detection section 20 which detects EUV light radiated from plasma and outputs a detection signal expressing the emission amount, a calculation section 32 which calculates an integration value by integrating the emission amount of the extreme-ultraviolet light based on the detection signal outputted from the EUV light detection section, and a judgment section 33 which outputs a judgment signal expressing a replacement time or repair time for the EUV collector mirror 15 when the integration value calculated by the calculation section reaches a predetermined reference value.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：通过在LPP型EUV光源装置中精确地反映反射镜上的溅射量来使EUV集电镜更换的时间适当地判断。解决方案：光源装置在真空室中包括检测从等离子体辐射的EUV光并输出表示发射量的检测信号的极紫外光检测部分20，计算部分32计算积分值通过基于从EUV光检测部输出的检测信号，对极紫外光的发射量进行积分，以及判断部33，其在积分时输出表示EUV收集镜15的更换时间或修复时间的判断信号由计算部计算出的值达到规定的基准值。版权所有（C）2007，JPO＆INPIT

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