专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2006307084A Composition containing metal fine particle and inorganic fine particle and method for producing the same 有权
标题翻译：含有金属微粒和无机细颗粒的组合物及其制造方法
公开(公告)号：JP2006307084A
公开(公告)日：2006-11-09
申请号：JP2005133483
申请日：2005-04-28
申请人： Fuso Chemical Co Ltd , Koyo Matsukawa , Yukito Matsuura , Osaka Gas Co Ltd , 大阪瓦斯株式会社 , 扶桑化学工業株式会社 , 公洋松川 , 幸仁松浦
发明人： FUJIKI TAKESHI , SAKAMOTO HIRONORI , KOBORI KANA , MOTOKAWA TAKUYA , MATSUKAWA KOYO , MATSUURA YUKITO , KUNITOKI HIDEYUKI , YANAGISAWA TAKAO
IPC分类号： C08L83/16 , C08G77/60 , C08K3/10 , C08K3/36 , C23C18/18 , H01B5/14 , H01B13/00
摘要： PROBLEM TO BE SOLVED: To obtain a composition having improved adhesivity between a substrate and a metal fine particle (especially metal nanoparticle). SOLUTION: The composition comprises a polysilane compound, a metal compound (e.g. noble metal compound) to form the metal fine particle by reduction and an inorganic fine particle (silica). The polysilane compound may be a copolymer of a polysilane and a vinyl monomer containing a unit having affinity for a metal compound and/or a metal fine particle. A substrate is coated with the composition, the polysilane compound is decomposed by action of active energy ray to form a metal fine particle. The method is applied to various methods, for example, a substrate is coated with the composition, exposed to light to form a metal fine particle, which is developed to form a pattern containing the metal fine particle and an electroless plating pattern is formed by an electroless plating treatment. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：获得在基材和金属微粒（特别是金属纳米颗粒）之间具有改善的粘合性的组合物。解决方案：组合物包含聚硅烷化合物，通过还原形成金属微粒的金属化合物（例如贵金属化合物）和无机细颗粒（二氧化硅）。聚硅烷化合物可以是聚硅烷和含有对金属化合物和/或金属微粒具有亲和性的单元的乙烯基单体的共聚物。用该组合物涂布基材，聚硅烷化合物通过活性能量射线的作用分解形成金属微粒。该方法适用于各种方法，例如，用组合物涂布基材，暴露于光以形成金属微粒，其被开发以形成包含金属细颗粒的图案，并且化学镀图案通过化学镀处理。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2007091870A Polymerizable composition and the cured product 有权
标题翻译：可聚合组合物及其固化产品
公开(公告)号：JP2007091870A
公开(公告)日：2007-04-12
申请号：JP2005282809
申请日：2005-09-28
申请人： Koyo Matsukawa , Yukito Matsuura , Osaka Gas Co Ltd , 大阪瓦斯株式会社 , 公洋松川 , 幸仁松浦
发明人： MURASE HIROAKI , KAWASAKI SHINICHI , FUJIKI TAKESHI , MOTOKAWA TAKUYA , MATSUKAWA KOYO , MATSUURA YUKITO
IPC分类号： C08F220/26 , C08F2/50 , C08F220/30 , G02B1/10 , G02B1/14 , G03F7/027 , G03F7/029 , G03F7/075
摘要： PROBLEM TO BE SOLVED: To provide a polymerizable composition useful for obtaining cured products having excellent optical properties[e.g. high refractive index, high transparency(transparency to visible rays)] and also having characteristics including high adhesion to substrate, hard coatability and high heat resistance. SOLUTION: The polymerizable composition comprises a specific polyfunctional (meth)acrylate having a fluorene skeleton[for example, 9,9-bis(4- (meth)acryloyloxyethoxyphenyl)fluorene], a hydrolytically condensable organosilicon compound having polymerizable group[for example, (meth)acryloyloxyalkyl tri-1-4C alkoxysilane], and a photoacid generator. This composition may also contain a photoradical initiator for improving its photopolymerizability. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供可用于获得具有优异光学性质的固化产物的可聚合组合物[ 高折射率，高透明度（透明度至可见光）），并且具有包括对基材的高粘合性，硬涂布性和高耐热性的特性。解决方案：可聚合组合物包含具有芴骨架的特定多官能（甲基）丙烯酸酯[例如9,9-双（4-（甲基）丙烯酰氧基乙氧基苯基）芴]，具有可聚合基团的可水解缩合的有机硅化合物[用于例如，（甲基）丙烯酰氧基烷基三1-4C烷氧基硅烷]和光酸产生剂。该组合物还可以含有用于改善其光聚合性的光自由基引发剂。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2005078001A Method for forming refractive index pattern 有权
$Method for forming refractive index pattern$
标题翻译：形成折射指数图案的方法
公开(公告)号：JP2005078001A
公开(公告)日：2005-03-24
申请号：JP2003311375
申请日：2003-09-03
申请人： Koyo Matsukawa , Yukito Matsuura , Osaka Gas Co Ltd , 大阪瓦斯株式会社 , 公洋松川 , 幸仁松浦
发明人： MATSUKAWA KOYO , MATSUURA YUKITO , KAWASAKI SHINICHI , FUJIKI TAKESHI , TANAKA MASASHI
IPC分类号： G03F7/004 , C08G77/60 , G02B5/18 , G02B6/12
摘要： PROBLEM TO BE SOLVED: To provide a method for forming a chemically stable refractive index pattern, having a relatively large difference in the refractive indices. SOLUTION: In the method for forming the refractive index pattern, a hybrid material comprising a polysilane compound and an inorganic compound is irradiated with an active energy line via a mask, a polysilane decomposition product of the irradiated part is removed, and then the whole hybrid material is hardened by heating. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种形成折射率差异较大的化学稳定折射率图案的方法。解决方案：在形成折射率图案的方法中，通过掩模用活性能量线照射包含聚硅烷化合物和无机化合物的杂化材料，除去照射部分的聚硅烷分解产物，然后整个混合材料通过加热硬化。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2013108097A Modifier for resin and resin composition including the modifier 有权
标题翻译：用于树脂和树脂组合物的改性剂，包括改性剂
公开(公告)号：JP2013108097A
公开(公告)日：2013-06-06
申请号：JP2013048043
申请日：2013-03-11
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： SAKAMOTO KANA , FUJIKI TAKESHI , YAMADA MASAHIRO , SAKAMOTO HIRONORI , TANAKA AKIRA , TOKUMITSU KATSUHISA
IPC分类号： C08L23/06 , C08K5/54 , C08L83/16
摘要： PROBLEM TO BE SOLVED: To enhance or improve flowability in melt molding of resins, such as engineering plastics.SOLUTION: A modifier composed of a polysilane compound is added to a resin (for example, a thermoplastic resin, such as a polyamide-based resin, a polyester-based resin, a polyacetal resin, a polycarbonate resin, a poly(thio)ether-based resin, a polysulfone-based resin, a polyketone-based resin, a polyimide-based resin, an ultrahigh molecular weight polyolefin-based resin, and a fluorine-based resin). The polysilane compound may be, for example, polyalkylarylsilane (such as polymethylphenylsilane), polydiarylsilane (such as polydiphenylsilane), etc. The modifier can be added to the resin, for example, in such an amount of 0.1-50 pts.wt. based on 100 pts.wt. of the resin.
摘要翻译：要解决的问题：提高或提高树脂（如工程塑料）的熔融成型流动性。解决方案：将由聚硅烷化合物组成的改性剂加入到树脂中（例如，聚酰胺类树脂，聚酯类树脂，聚缩醛树脂，聚碳酸酯树脂，聚（硫醚）醚系树脂，聚砜系树脂，聚酮系树脂，聚酰亚胺系树脂，超高分子量聚烯烃系树脂，氟系树脂等）。聚硅烷化合物可以是例如聚烷基芳基硅烷（例如聚甲基苯基硅烷），聚二芳基硅烷（例如聚二苯基硅烷）等。可以将改性剂加入树脂中，例如以0.1-50重量份的量加入到树脂中。基于100重量的树脂。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2011180269A Photosensitive resin composition, thin film thereof and pattern forming method 有权
标题翻译：光敏树脂组合物，薄膜及其形成方法
公开(公告)号：JP2011180269A
公开(公告)日：2011-09-15
申请号：JP2010042667
申请日：2010-02-26
申请人： Japan Science & Technology Agency , Osaka Gas Co Ltd , Osaka Municipal Technical Research Institute , 地方独立行政法人大阪市立工業研究所 , 大阪瓦斯株式会社 , 独立行政法人科学技術振興機構
发明人： KAWASAKI SHINICHI , FUJIKI TAKESHI , MATSUKAWA KOYO , HAMADA TAKASHI
IPC分类号： G03F7/038 , G03F7/004 , G03F7/075 , G03F7/40 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide: a photosensitive resin composition which has high photoreactivity, can be patterned and can form a film with high hydrophobicity and excellent dielectric properties; a thin film of the composition; and a pattern forming method.
SOLUTION: The photosensitive resin composition comprising a block copolymer and a photoacid generator, the block copolymer having a block containing a cationic polymerizable group (a polymer block of an epoxy group-containing vinyl monomer) and a polysilane block, is applied to a substrate, and a formed coating film is selectively exposed to actinic rays and developed to thereby form a film pattern (a protective film or an insulating film) with high hydrophobicity and excellent dielectric properties through photocationic polymerization of the cationic polymerizable group and photocleavage of the polysilane block. The film is useful to form a thin film transistor using an organic semiconductor layer.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供：具有高的光反应性的感光性树脂组合物，可以被图案化并且可以形成具有高疏水性和优异的介电性能的膜; 该组合物的薄膜; 和图案形成方法。解决方案：将包含嵌段共聚物和光致酸产生剂的嵌段共聚物（含有阳离子可聚合基团的嵌段（含环氧基的乙烯基单体的聚合物嵌段）和聚硅烷嵌段）的光敏树脂组合物施加到基板和成膜的涂膜选择性地暴露于光化学射线并显影，从而通过阳离子可聚合基团的光阳离子聚合形成具有高疏水性和优异的介电性能的膜图案（保护膜或绝缘膜）聚硅烷嵌段。该薄膜可用于形成使用有机半导体层的薄膜晶体管。版权所有（C）2011，JPO＆INPIT

6. 发明专利

JP2010111876A Fluorene-based composition and molded product of the same 有权
标题翻译：基于氟的组合物及其成型产品
公开(公告)号：JP2010111876A
公开(公告)日：2010-05-20
申请号：JP2009298393
申请日：2009-12-28
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： YAMADA MASAHIRO , KAWASAKI SHINICHI , MURASE HIROAKI , FUJIKI TAKESHI , SAKAMOTO HIRONORI , KOBORI KANA , TANAKA MASASHI , HIGASHIYAMA MASARU , YAMADA MITSUAKI , SUDA YASUHIRO
IPC分类号： C08L101/02 , C08K3/04 , C08L101/00 , C09D133/00 , C09D163/00 , C09D169/00 , C09D175/04
摘要： PROBLEM TO BE SOLVED: To provide a fluorene-based composition which is excellent in dispersibility of an additive and can exhibit the function of the additive with a small amount of compounding thereof, and to provide a molded product of the fluorene-based composition. SOLUTION: The fluorene-based composition comprising: a compound or a derivative thereof represented by formula (I) and the additive is prepared, and the molded body is formed by using the composition. In the formula, X 1 and X 2 are identical to each other or different from each other and are hydroxy group or -O(AO) p H group (therein, A represents 2-3C alkylene group and p denotes an integer of 1 or more). COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：待解决的问题：提供一种添加剂的分散性优异的芴类组合物，并且可以通过少量配混发挥添加剂的功能，并提供芴基的成型品组成。解决方案：制备包含由式（I）表示的化合物或其衍生物和添加剂的芴基组合物，并且通过使用该组合物形成成型体。在该式中，X 1 和X 2 彼此相同或彼此不同，为羟基或-O（AO） p

7. 发明专利

JP2009235358A Polysilane resin composition 有权
标题翻译：多晶树脂组合物
公开(公告)号：JP2009235358A
公开(公告)日：2009-10-15
申请号：JP2008086892
申请日：2008-03-28
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： FUJIKI TAKESHI , OSAWA SHINGO , YAMADA MASAHIRO
IPC分类号： C08L83/16 , C08K5/1515 , C08K5/54 , G02F1/1337
摘要： PROBLEM TO BE SOLVED: To provide a resin composition high in water repellency, heat resistance, and transparency.
SOLUTION: The resin composition includes a polysilane and a hydrophobic alkyl compound. The polysilane may contain at least one selected from polymonoaryl silane units, polydiaryl silane units, and polyalkyl aryl silane units. Further, the polysilane may contain at least one selected from mono 6-20C arylsilane units, and 1-6C alkyl 6-20C aryl saline units. The hydrophobic alkyl compound may contain a 6-24C alkyl group and at least one selected from a polymeric unsaturated group, a hydrolytically condensable group, a hydroxyl group, an alkoxy group, a mercapto group, an alkylthio group, a halogen atom, a carboxyl group, an alkoxycarbonyl group, a carbonyl halide group, an epoxy group and an isocyanate group.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供具有高斥水性，耐热性和透明性的树脂组合物。解决方案：树脂组合物包括聚硅烷和疏水性烷基化合物。聚硅烷可以含有选自多元芳基硅烷单元，聚二芳基硅烷单元和聚烷基芳基硅烷单元中的至少一种。此外，聚硅烷可以含有选自单6-20C芳基硅烷单元和1-6C烷基6-20C芳基盐单元中的至少一种。疏水性烷基化合物可以含有6-24C烷基和选自聚合不饱和基团，水解缩合基团，羟基，烷氧基，巯基，烷硫基，卤原子，羧基中的至少一种烷氧基羰基，羰基卤基，环氧基和异氰酸酯基。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2008266433A Polysilane and its manufacturing method 有权
标题翻译：多晶硅及其制造方法
公开(公告)号：JP2008266433A
公开(公告)日：2008-11-06
申请号：JP2007110128
申请日：2007-04-19
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： OSAWA SHINGO , SAKAMOTO HIRONORI , FUJIKI TAKESHI
IPC分类号： C08G77/60 , C08L63/00 , C08L83/16
摘要： PROBLEM TO BE SOLVED: To provide a polysilane which excels in curability, can independently cure even in the absence of a curing agent, and is useful as a curing agent for thermosetting resins such as an epoxy resin. SOLUTION: The polysilane is constituted of a structural unit represented by formula (1a) (wherein R 1a is an aryl group which may have a substituent) and a structural unit represented by formula (1b) [wherein R 1b is an alkyl group which may have a substituent, and when R 1a in the above formula (1a) is a phenyl group, R 1b in the formula (1b) may be a methyl group]. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供固化性优异的聚硅烷，即使在不存在固化剂的情况下也可以独立地固化，并且可用作热固性树脂如环氧树脂的固化剂。解决方案：聚硅烷由式（1a）表示的结构单元（其中R 1a 是可具有取代基的芳基）和由式（1b）表示的结构单元构成， [其中R“SP”是可以具有取代基的烷基，并且当上述式（1a）中的R“1”是苯基时，R“ 式（1b）中的/ SP>可以是甲基]。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2008111138A Fluorene-containing resin 审中-公开
标题翻译：含氟树脂
公开(公告)号：JP2008111138A
公开(公告)日：2008-05-15
申请号：JP2008020932
申请日：2008-01-31
申请人： Nagase Chemtex Corp , Osaka Gas Co Ltd , ナガセケムテックス株式会社 , 大阪瓦斯株式会社
发明人： FUJIKI TAKESHI , SAKAMOTO HIRONORI , MORITA TAKAYUKI , HOSOMI TETSUYA , TAMAKOSHI HIDEAKI
IPC分类号： C08G59/04 , C08G59/30
摘要： PROBLEM TO BE SOLVED: To provide a thermosetting or photo-curable resin capable of forming a cured material having a high refractive index, excellent heat resistance and electric characteristics, and also being excellent in patterning property. SOLUTION: The specific epoxy resin having a fluorene skeleton, an epoxy acrylate resin and an alkali-soluble irradiation polymerizable unsaturated resin containing fluorene are provided. COPYRIGHT: (C)2008,JPO&INPIT

10. 发明专利

JP2006241224A Alkali-soluble resin 有权
标题翻译： ALKALI-SOLUBLE树脂
公开(公告)号：JP2006241224A
公开(公告)日：2006-09-14
申请号：JP2005055792
申请日：2005-03-01
申请人： Nagase Chemtex Corp , Osaka Gas Co Ltd , ナガセケムテックス株式会社 , 大阪瓦斯株式会社
发明人： MURASE HIROAKI , FUJIKI TAKESHI , SAKAMOTO HIRONORI , MORITA TAKAYUKI , KITANO KEI , HOSOMI TETSUYA
IPC分类号： C08G63/133 , G03F7/023 , G03F7/027
摘要： PROBLEM TO BE SOLVED: To provide an alkali-soluble resin composition constituting the main component of a radiation-sensitive resin composition capable of forming a resist film which is excellent in sensitivity, residual film ratio, developability, resolution, adhesion to various kinds of substrates, transparency in the visible light region, thermal discoloration and chemical resistance, particularly has a very high heat resistance and easily forms desired patterns under a variety of curing conditions. SOLUTION: The alkali-soluble resin is obtained by reacting an epoxy ester compound, a polyhydric alcohol and a polybasic carboxylic acid or its anhydride. COPYRIGHT: (C)2006,JPO&NCIPI

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式