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    • 1. 发明专利
    • Photosensitive material for forming conductive film, and method for manufacturing conductive film
    • 用于形成导电膜的感光材料和制造导电膜的方法
    • JP2011131500A
    • 2011-07-07
    • JP2009293139
    • 2009-12-24
    • Fujifilm Corp富士フイルム株式会社
    • SUDO ATSUSHIICHIKI AKIRA
    • B32B15/01G03C1/00G03C1/047G03C1/30G03C1/74H01B5/14H01B13/00
    • PROBLEM TO BE SOLVED: To provide a photosensitive material for forming a conductive film excelling in manufacturing aptness while forming the conductive film sufficiently low in surface resistance, and a method for manufacturing the conductive film excelling in manufacturability while forming the conductive film sufficiently low in surface resistance. SOLUTION: The photosensitive material for forming the conductive film includes an emulsion layer containing silver salt, on a support body, and at least one layer on the support body contains alum. The method for manufacturing the conductive film includes a metal silver forming process for exposing the photosensitive material for forming the conductive film including at least the emulsion layer containing silver salt on the support body and carrying out development to form a metal silver part to thereby form a conductive film precursor, and an alum-containing solution dipping process for dipping the photosensitive material for forming the conductive film, in an alum-containing solution prior to the development in the metal silver forming process to contain alum in at least one layer on the support body in the photosensitive material for forming the conductive film. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供一种形成导电膜的感光材料,同时形成表面电阻足够低的导电膜,以及制造导电膜的方法在制造导电膜时具有优异的可制造性,同时形成导电膜 表面电阻低。 解决方案:用于形成导电膜的感光材料包括在载体上的含有银盐的乳剂层,并且载体上的至少一层含有明矾。 制造导电膜的方法包括金属银形成工艺,用于将用于形成导电膜的感光材料暴露在载体上至少包含含有银盐的乳剂层,并进行显影以形成金属银部分,从而形成 导电膜前体和用于在用于形成导电膜的感光材料中浸渍的含铝溶液浸渍方法在金属银形成工艺中显影之前的含铝溶液中,以在载体上的至少一层中含有明矾 用于形成导电膜的感光材料中。 版权所有(C)2011,JPO&INPIT
    • 3. 发明专利
    • Pattern exposure method, method for producing conductive film, and conductive film
    • 图案曝光方法,制造导电膜的方法和导电膜
    • JP2010276998A
    • 2010-12-09
    • JP2009131487
    • 2009-05-29
    • Fujifilm Corp富士フイルム株式会社
    • MATSUDA TOYOMISUDO ATSUSHIBABA YUKIMIHASHI DAISUKE
    • G03F7/20
    • H01B5/00G03F1/14H05K1/0393H05K3/0082H05K3/106H05K2201/0108H05K2201/09681H05K2203/056H05K2203/1545Y10T428/24917Y10T428/24997
    • PROBLEM TO BE SOLVED: To provide a pattern exposure method capable of reducing generation of moire, and to provide a method for producing a conductive film and a conductive film. SOLUTION: The conductive film 10 is obtained by subjecting a photosensitive material to proximity exposure through a photomask disposed away from the photosensitive material via a proximity gap of 70 to 200 μm, and transferring the mask pattern onto the photosensitive material as a periodical pattern periodical in a conveyance direction. The conductive film 10 has a conductive portion 12 composed of a plurality of conductive metal thin wires and a plurality of openings 14, wherein side portions of a first metal thin wire 12a and of a second metal thin wire 12b are shaped to have protruding portions 26, which protrude toward the openings 14 from virtual lines m representing a design width Wc of the first metal thin wire 12a and of the second metal thin wire 12b, and have a protrusion amount of 1/25 to 1/6 of the design width Wc. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供能够减少莫尔条纹产生的图案曝光方法,并提供导电膜和导电膜的制造方法。 解决方案:导电膜10通过经由70至200μm的接近间隙使感光材料接近曝光通过远离感光材料设置的光掩模获得,并将掩模图案作为周期性传送到感光材料上 在传送方向的图案周期。 导电膜10具有由多个导电金属细线构成的导电部12和多个开口部14,第一金属细线12a和第二金属细线12b的侧部成形为具有突出部26 从虚拟线m向第一金属细线12a和第二金属细线12b的设计宽度Wc突出的开口14突出,并且具有设计宽度Wc的1/25至1/6的突出量 。 版权所有(C)2011,JPO&INPIT