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1. 发明专利

JP2013199618A Polishing pad and method for producing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2013199618A
公开(公告)日：2013-10-03
申请号：JP2012070037
申请日：2012-03-26
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： TATENO TEPPEI , MIYASAKA HIROHITO , MATSUOKA TATSUMA , KANAZAWA KAE , MIYAZAWA FUMIO
IPC分类号： C08J5/14 , B24B37/24 , H01L21/304
CPC分类号： B24B37/24 , C08G18/4238 , C08G18/44 , C08G18/4825 , C08G18/4854 , C08G18/7671 , C08L75/04 , C08L75/06
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a finish-polishing pad capable of polishing with few polishing scratches and of forming a stable film, and the polishing pad.SOLUTION: A polishing pad is produced by a method for producing a polishing pad having a polyurethane resin film as a polishing layer on a deposition substrate. The method includes the steps of: dissolving a composition for polyurethane resin film formation including a polyurethane resin and an additive, in a solvent in which the resin is soluble; removing an insoluble component such that the insoluble component in the solution is less than 1 mass% relative to the total mass of the composition for polyurethane resin film formation; adding and mixing a poor solvent into the solution, from which the insoluble component has been removed, in an amount (ml), which is calculated by formula 1: coagulation value (ml) relative to the poor solvent of the polyurethane resin×A (A=0.007-0.027), relative to a solid content in mass of 1 g; and forming the polyurethane resin film by allowing film formation of the mixed solution on the deposition substrate by a wet-coagulation method.
摘要翻译：要解决的问题：提供一种能够以少量抛光划痕抛光并形成稳定膜的抛光抛光垫的制造方法和抛光垫。解决方案：通过抛光垫的制造方法制造抛光垫在沉积基板上具有聚氨酯树脂膜作为抛光层。该方法包括以下步骤：将包含聚氨酯树脂和添加剂的聚氨酯树脂成膜用组合物溶解在树脂溶解的溶剂中; 除去不溶性成分，使得溶液中的不溶成分相对于聚氨酯树脂成膜用组合物的总质量小于1质量％将不良溶剂加入并除去不溶成分已被除去的溶液中，其量（ml）由式1计算：凝固值（ml）相对于聚氨酯树脂的不良溶剂×A（ A = 0.007-0.027），相对于1g的质量的固体含量; 并通过湿式凝结法在沉积基板上形成混合溶液来形成聚氨酯树脂膜。

2. 发明专利

JP2012130992A Polishing pad, and method for manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2012130992A
公开(公告)日：2012-07-12
申请号：JP2010285527
申请日：2010-12-22
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYAZAWA FUMIO , TATENO TEPPEI
IPC分类号： B24B37/24 , B24B37/20 , C08J9/28 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad capable of suppressing scratches on an article to be polished while securing a polishing rate.SOLUTION: The polishing pad 10 includes a urethane sheet 2 formed of polyurethane resin, through a wet solidification method, having a flow initiation temperature of 150 to 220°C. The urethane sheet 2 has, on one surface side, a protruded part 5 and a recessed part 6 formed between the protruded parts 5. The surface of the protruded part 5 constitutes a polishing surface P. The protruded part 5 has a large number of fine pores 4 of 30 μm or less in an average hole diameter. The fine pores 4 are opened on the surface of the protruded part 5 to form the opened fine pores 4a. Ultrafine pores 4s smaller than the fine pores 4 are formed in the recessed part 6, wherein the pores opened on the surface are reduced in diameter than the fine pores 4 of the protruded part 5 or sealed. In the urethane sheet 2, the opened bubble pores having length in the thickness direction are not formed, and a polishing liquid is circularly supplied with the recessed part 6, causing polishing waste to be discharged.
摘要翻译：要解决的问题：提供一种能够在确保抛光速率的同时抑制要抛光的物品上的划痕的抛光垫。解决方案：抛光垫10包括由聚氨酯树脂形成的氨基甲酸酯片2，通过湿固化方法，流动起始温度为150-220℃。聚氨酯片2在一个表面侧具有形成在突出部5之间的突出部5和凹部6.凸部5的表面构成研磨面P.突出部5具有大量的细孔4的平均孔径为30μm以下。在突出部5的表面上开口细孔4，形成开放的细孔4a。在凹部6中形成比细孔4小的超细孔4，其中在表面上开口的孔的直径比突出部5的细孔4减小或密封。在氨基甲酸酯片2中，没有形成在厚度方向上具有长度的开放的气泡孔，并且抛光液体循环地供应凹部6，导致抛光废料被排出。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2013193181A Sheet for polishing pad, method for manufacturing the same, polishing pad, method for manufacturing the same, and polishing method 有权
标题翻译：抛光垫板，其制造方法，抛光垫，其制造方法和抛光方法
公开(公告)号：JP2013193181A
公开(公告)日：2013-09-30
申请号：JP2012064249
申请日：2012-03-21
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： KANAZAWA KAE , MIYAZAWA FUMIO , MIYASAKA HIROHITO , TATENO TEPPEI , MATSUOKA TATSUMA
IPC分类号： B24B37/26 , B24B37/24 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a sheet for polishing pad capable of sufficiently suppressing the reduction of a circulating volume of slurry and reducing the wear of the polishing pad.SOLUTION: A sheet for a polishing pad includes a polishing layer that includes a plurality of polishing regions with polishing surfaces abutted to an object to be polished and polishes the object to be polished with the polishing surface. In the sheet for the polishing pad, the plurality of polishing regions are arranged to be separated from each other in the in-plane direction of the polishing layer. The polishing region has a polygonal shape in which the projection plane in the thickness direction of the polishing layer has only an obtuse angle, or an aggregate shape of the polygonal shape having only the obtuse angle. Furthermore, the polishing region has a convex curve or a corner cutting surface between a sidewall surface opposing the advancing direction of the object to be polished and the polishing surface.
摘要翻译：要解决的问题：提供一种能够充分抑制浆料的循环体积的减少并减少抛光垫的磨损的抛光垫片。解决方案：用于抛光垫的片材包括：抛光层，其包括多个具有抛光表面的抛光区域与待抛光的物体相邻，并用抛光表面抛光被抛光物体。在用于抛光垫的片材中，多个抛光区域被布置成在抛光层的面内方向上彼此分离。抛光区域具有其中抛光层的厚度方向上的投影平面仅具有钝角的多边形形状或仅具有钝角的多边形的聚集体形状。此外，抛光区域具有与被研磨对象的前进方向相对的侧壁面与研磨面之间的凸曲线或角切割面。

4. 发明专利

JP2011177826A Polishing pad 有权
标题翻译：抛光垫
公开(公告)号：JP2011177826A
公开(公告)日：2011-09-15
申请号：JP2010044070
申请日：2010-03-01
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MOCHIZUKI YOSHIMI , MIYASAKA HIROHITO , TATENO TEPPEI
IPC分类号： B24B37/22 , B24B37/24 , B24B37/26 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad capable of uniformizing planarity while suppressing scratches on a material to be polished. SOLUTION: The polishing pad 10 has a urethane sheet 2 formed by a wet-coagulation method. A base material 8 is laminated on the back surface side of the urethane sheet 2. The base material 8 has a sheet-like main material part 8a having plasticity and a sub material part 8b having a Shore A hardness smaller than that of the main material part 8a and a thickness thinner than that thereof. A plurality of grooves are concentrically formed at a surface side coming into contact with an adhesive layer 7a at the main material part 8a and a resin of which the sub material parts 8b are formed is filled into the grooves. The sub material parts 8b are equally arranged at the main material part 8a. When polishing pressure is applied, difference is caused in pressing force applied to polishing particles between the processing surface of the material to be polished and the polishing surface P of the polishing pad 10 so that the polishing particles are easily moved. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供能够均匀化平面度的抛光垫，同时抑制待抛光材料上的划痕。解决方案：抛光垫10具有通过湿式凝结法形成的聚氨酯片材2。基材8层叠在聚氨酯片2的背面侧。基材8具有具有塑性的片状主材料部分8a和具有小于主材料的肖氏A硬度的副材料部分8b 部分8a并且其厚度比其薄。在与主材料部分8a处的粘合剂层7a接触的表面侧同心地形成多个凹槽，并且将形成有副材料部分8b的树脂填充到凹槽中。副材料部分8b均匀地布置在主材料部分8a处。当施加抛光压力时，在被抛光材料的处理表面和抛光垫10的抛光表面P之间的抛光颗粒上施加的压力产生差异，使抛光颗粒容易移动。版权所有（C）2011，JPO＆INPIT

5. 发明专利

JP2014195839A 研磨パッド及び研磨パッドの製造方法有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2014195839A
公开(公告)日：2014-10-16
申请号：JP2013071937
申请日：2013-03-29
申请人：富士紡ホールディングス株式会社 , Fujibo Holdings Inc
发明人： TAKAGI MASATAKA , TATENO TEPPEI
IPC分类号： B24B37/26 , B24B37/24 , H01L21/304
摘要：【課題】長寿命で且つ研磨性能が安定した湿式研磨パッド、及びこのような湿式研磨パッドの製造方法を提供する。【解決手段】湿式研磨パッド7は、研磨面9に複数の溝17が形成された湿式研磨パッドであって、涙形気泡25を有する研磨シート19と、研磨シート19の一方の面19aに形成された接着層23と、涙形気泡25を有し一方の面21aが接着層23に貼り付けられた研磨シート21と、を備え、複数の溝17は、研磨シート19の他方の面19bから、研磨シート23の他方の面21b近傍までの深さを有している。【選択図】図3
摘要翻译：要解决的问题：提供一种具有长寿命和稳定的抛光性能的湿式抛光垫和一种制造湿式抛光垫的方法。溶液：一种湿式抛光垫7，其中在抛光上形成多个槽17 表面9包括：具有泪状气泡25的抛光片19; 形成在研磨片19的一个表面19a上的粘合剂层23; 以及具有泪状气泡25并且一个表面21a粘附到粘合剂层23的抛光片21.多个凹槽17具有从抛光片19的另一个表面19b到另一个的附近的深度研磨片21的表面21b。

6. 发明专利

JP2014079878A Polishing pad 有权
标题翻译：抛光垫
公开(公告)号：JP2014079878A
公开(公告)日：2014-05-08
申请号：JP2013202487
申请日：2013-09-27
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYASAKA HIROHITO , TATENO TEPPEI , KANAZAWA YOSHIE , MATSUOKA RYUMA
IPC分类号： B24B37/24 , B24B37/26 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad capable of improving flatness of an object to be polished and prolonging the lifetime.SOLUTION: A polishing pad 10 has a polyurethane sheet 2 formed by wet film formation without use of carbon black for stabilizing foam formation or a hydrophilic activator having a function of promoting foam formation. In the polyurethane sheet 2, open holes 5 and open holes 6 are formed in the polishing surface P. In the polyurethane sheet 2, taking the contact angle 0.5 s after dropping a water droplet onto the polishing surface P as CA1 and the contact angle 120.5 s after dropping a water droplet as CA2, the rate of change of the contact angle, expressed as {(CA1-CA2)/CA1}×100, is adjusted to be smaller than 10%. The slurry supplied during polishing hardly infiltrates the polyurethane sheet 2.
摘要翻译：要解决的问题：提供一种能够提高待抛光物体的平坦度并延长寿命的抛光垫。解决方案：抛光垫10具有通过湿膜形成而形成的聚氨酯片材2，而不使用用于稳定泡沫形成的炭黑或具有促进泡沫形成功能的亲水性活化剂。在聚氨酯片材2中，在研磨面P上形成有开孔5和开孔6.在聚氨酯片材2中，将作为CA1的水滴滴下到研磨面P上的接触角为0.5s，接触角120.5 在将水滴滴入CA2后，以{（CA1-CA2）/ CA1}×100表示的接触角变化率调整为小于10％。在抛光时供给的浆料几乎不渗透聚氨酯片材2。

7. 发明专利

JP2014079877A Polishing pad 有权
标题翻译：抛光垫
公开(公告)号：JP2014079877A
公开(公告)日：2014-05-08
申请号：JP2013202486
申请日：2013-09-27
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYASAKA HIROHITO , TATENO TEPPEI , KANAZAWA YOSHIE , MATSUOKA RYUMA
IPC分类号： B24B37/24 , B24B37/26 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad which reduces the rise time in polishing and enables improving flatness while securing retention of slurry.SOLUTION: A polishing pad 10 has a polyurethane sheet 2 formed by wet film formation. The polyurethane sheet 2 does not contain carbon black or an ionic surfactant. In the polyurethane sheet 2, a skin layer is removed, and open holes 5 and 6 are formed in the polishing surface P. In the polyurethane sheet 2, taking the mass in the dried state as W1 and the mass after an exposure to an environment of a temperature of 25°C and a humidity of 50% until variation of the mass stabilizes as W2, the hygroscopic degree defined by {(W2-W1)/W1}×100 is adjusted to 0.7-1.0%. A slurry supplied during polishing is easily adsorbed onto the inner surfaces of long foam 3 and foam 4 through the open holes 5 and 6 in the polishing surface P.
摘要翻译：要解决的问题：提供一种减少抛光上升时间的抛光垫，并且能够在确保浆料保持的同时提高平坦度。抛光垫10具有通过湿膜形成形成的聚氨酯片材2。聚氨酯片2不含炭黑或离子性表面活性剂。在聚氨酯片2中，除去表皮层，在研磨面P上形成开孔5,6。在聚氨酯片2中，以干燥状态的质量为W1，暴露于环境后的质量的温度为25℃，湿度为50％，直至质量的变化稳定为W2，将{（W2-W1）/ W1}×100定义的吸湿度调整为0.7〜1.0％。抛光时提供的浆料容易通过抛光表面P中的开孔5和6吸附到长泡沫3和泡沫4的内表面上。

8. 发明专利

JP2014069273A Polishing pad and method of producing the same 有权
标题翻译：抛光垫及其生产方法
公开(公告)号：JP2014069273A
公开(公告)日：2014-04-21
申请号：JP2012216616
申请日：2012-09-28
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： MIYASAKA HIROHITO , TATENO TEPPEI , KANAZAWA YOSHIE , MATSUOKA RYUMA
IPC分类号： B24B37/24 , C08J5/14 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad having excellent abrasion resistance, compared with conventional polishing pads, and reducing occurrence of scratches and its production method.SOLUTION: A polishing pad is formed by a wet film formation method and includes a polyurethane abrasive sheet containing a plurality of tear-shaped bubbles and a plurality of fine bubbles being smaller in size than the plurality of tear-shaped bubbles and having circle equivalent diameters of 3-10 μm. Taking the thickness of the polyurethane abrasive sheet as T, the area of a range of 0-T×1/6 in the thickness direction from the polishing surface of the polyurethane abrasive sheet in an arbitrary cut surface obtained by cutting the polyurethane abrasive sheet in the thickness direction as Aand the area obtained by subtracting the area occupied by the tear-shaped bubbles within the area Afrom the area Aas B, the area ratio of the fine bubbles contained in the area Bis less than 1 area%.
摘要翻译：要解决的问题：提供与常规抛光垫相比具有优异耐磨性的抛光垫，并减少划痕的发生及其制造方法。解决方案：抛光垫通过湿法成膜法形成，并包括聚氨酯研磨片包含多个泪状气泡和多个细小气泡，其尺寸小于多个泪状气泡，并具有3-10μm的圆当量直径。以聚氨酯研磨片的厚度为T，在通过将聚氨酯研磨片切割而获得的任意切割面中的聚氨酯研磨片的研磨面的厚度方向上的0-T×1/6范围的面积厚度方向为A，通过减去区域Aas B内所含的细小气泡的面积比减去面积之内的泪状泡沫所占的面积而获得的面积，小于1面积％。

9. 发明专利

JP2013202775A Polishing pad and method for manufacturing polishing pad 有权
标题翻译：抛光垫和制造抛光垫的方法
公开(公告)号：JP2013202775A
公开(公告)日：2013-10-07
申请号：JP2012077416
申请日：2012-03-29
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： TATENO TEPPEI , MIYASAKA HIROHITO , MATSUOKA TATSUMA , KANAZAWA KAE , MIYAZAWA FUMIO
IPC分类号： B24B37/24 , B24B37/26 , H01L21/304
CPC分类号： B24B37/24 , B24B37/26
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a finishing polishing pad which can polish with few polishing scratches, and can form a stable film, and the polishing pad thereof.SOLUTION: In a polishing pad having a polyurethane resin film on a deposition substrate as a polishing layer, the polishing layer is composed of a polishing slurry holding part and a polishing slurry flow path part, the polishing slurry holding part has bubbles, and meanwhile the polishing slurry flow path part has no bubbles. Further, the polishing layer includes 0.5-6 mass% of hydrophobic spherical silica with respect to the total mass of the polyurethane resin film. The problem is solved by this polishing pad.
摘要翻译：要解决的问题：提供一种能够抛光少量抛光划痕并可形成稳定膜的抛光抛光垫的制造方法及其抛光垫。解决方案：在具有沉积物的聚氨酯树脂膜的抛光垫中作为研磨层的基板，研磨层由抛光浆料保持部和研磨浆流路部构成，研磨浆保持部具有气泡，同时抛光浆流路部没有气泡。此外，抛光层相对于聚氨酯树脂膜的总质量含有0.5-6质量％的疏水性球形二氧化硅。这个抛光垫解决了这个问题。

10. 发明专利

JP2012096344A Polishing pad, and method of manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：JP2012096344A
公开(公告)日：2012-05-24
申请号：JP2010248715
申请日：2010-11-05
申请人： Fujibo Holdings Inc , 富士紡ホールディングス株式会社
发明人： TATENO TEPPEI , MIYAZAWA FUMIO
IPC分类号： B24B37/26 , B24B37/24 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing pad for giving scratchless polishing surface of an object to be polished.SOLUTION: The polishing pad 10 has a urethane sheet 2 formed by a wet-coagulation process. The urethane sheet 2 has protrusions 5, and recesses 6 between the protrusions 5, on one side surface. Surfaces of the protrusions 5 constitute a polishing surface P. In the protrusion 5, a plurality of foams 3 with the maximum diameter acquired by cross-section observation in a range of 50-300 μm are formed and a large number of fine holes 4 with the maximum diameter in a range of 1 to 10 μm are formed between the foams 3. Open holes 3a, 4a are formed on the polishing surface P. Open holes 3a are crushed when forming the recesses 6 by thermal emboss process and open holes 4a are contracted in their diameters or closed at a surface of the recesses 6. Retention of polishing liquid or polishing sludge is suppressed in the recesses 6, and the polishing liquid is circulation-supplied and the polishing sludge is exhausted through the recesses 6.
摘要翻译：要解决的问题：提供一种用于提供待抛光对象的无划伤抛光表面的抛光垫。解决方案：抛光垫10具有通过湿式凝结工艺形成的聚氨酯片材2。聚氨酯片2在一个侧表面上具有突起5和突起5之间的凹部6。突起5的表面构成研磨面P.在突起部5中，形成有通过横截面观察获得的最大直径的多个泡沫3在50〜300μm的范围内，并且形成多个具有在泡沫3之间形成1〜10μm范围内的最大直径。在研磨面P上形成开孔3a，4a。通过热压花加工形成凹部6时，开孔3a被破碎，开孔4a为在凹部6中抑制了研磨液或研磨污泥的保留，并且研磨液循环供给，研磨废液通过凹部6排出。版权所有（C）2012，JPO＆INPIT

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