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1. 发明专利

JP2006049790A Polishing liquid for metal, and polishing method 审中-公开
标题翻译：金属抛光液和抛光方法
公开(公告)号：JP2006049790A
公开(公告)日：2006-02-16
申请号：JP2004279491
申请日：2004-09-27
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： YAMASHITA KATSUHIRO , SEKI HIROYUKI , ASANUMA NAOKI , ISHIKAWA TAKATOSHI
IPC分类号： H01L21/304 , B24B37/00 , C09K3/14 , C09K13/06
摘要： PROBLEM TO BE SOLVED: To provide a polishing liquid for metal for manufacturing an LSI which has a quick CMP (chemical mechanical polishing) speed, keeps a uniformity within a wafer face, and generates little corrosion or scratch, thinning, dishing and erosion, and also to provide a polishing method using the polishing liquid. SOLUTION: The polishing liquid for metal, a polishing liquid using chemical mechanical polishing in the manufacturing of a semiconductor device, which contains a compound having a tetrazole frame and an oxidant, and the polishing method using the polishing liquid. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种用于制造具有快速CMP（化学机械抛光）速度的LSI制造用金属的抛光液，保持晶片表面内的均匀性，并且几乎不产生腐蚀或划痕，变薄，凹陷和并且还提供使用抛光液的抛光方法。解决方案：包含具有四唑框架的化合物和氧化剂的在制造半导体器件中使用化学机械抛光的抛光液和使用抛光液的抛光方法。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2005099088A Silver halide photographic sensitive material 审中-公开
标题翻译：银色摄影感光材料
公开(公告)号：JP2005099088A
公开(公告)日：2005-04-14
申请号：JP2003329488
申请日：2003-09-22
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： YAMASHITA KATSUHIRO
IPC分类号： G03C1/12 , G03C1/06
摘要： PROBLEM TO BE SOLVED: To provide a silver halide photographic sensitive material excellent in stability and in storage stability.
SOLUTION: The silver halide photographic sensitive material contains silver halide emulsifier particles and a pigment with a cationic substituent, wherein the pigment is not adsorbed on the silver halide emulsifier particles.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供稳定性和储存稳定性优异的卤化银感光材料。解决方案：卤化银感光材料包含卤化银乳化剂颗粒和具有阳离子取代基的颜料，其中颜料不被吸附在卤化银乳剂颗粒上。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2004191926A Silver halide photographic sensitive material 审中-公开
公开(公告)号：JP2004191926A
公开(公告)日：2004-07-08
申请号：JP2003285136
申请日：2003-08-01
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： YAMASHITA KATSUHIRO , HOSOKAWA JUNICHIRO , TANIGUCHI MASAHIKO
IPC分类号： G03C7/38 , G03C1/08 , G03C1/28 , G03C1/34 , G03C1/42
摘要： PROBLEM TO BE SOLVED: To provide a silver halide photographic sensitive material which recovers retardation of development due to multilayer adsorption and achieves a sensitivity increasing effect to the maximum. SOLUTION: The silver halide photographic sensitive material has at least one silver halide emulsion layer comprising a silver halide photographic emulsion containing silver halide grains on which sensitizing dyes are adsorbed in multiple layers, and also has at least one silver halide layer containing at least one following compound (B). The compound (B) is a compound having at least three heteroatoms and a compound increases the photographic sensitivity of a photosensitive material when contained in the material. COPYRIGHT: (C)2004,JPO&NCIPI

4. 发明专利

JP2006295152A Polishing solution for metal and polishing method 审中-公开
标题翻译：抛光金属和抛光方法
公开(公告)号：JP2006295152A
公开(公告)日：2006-10-26
申请号：JP2006075065
申请日：2006-03-17
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： YAMASHITA KATSUHIRO
IPC分类号： H01L21/304 , B24B37/00 , C09K3/14
摘要： PROBLEM TO BE SOLVED: To resolve physical properties required for a polishing solution for metal in order to allow a high polishing rate to be compatible with favorable dishing performance, and provide the polishing solution for metal with the physical properties attained, and a polishing method using the same. SOLUTION: A polishing solution for metal contains an oxidant. In the polishing solution for metal, E1/E2 is 1.5 or more, when expressing an oxidation reaction rate immediately after the metal surface to be polished starts to be oxidized as E1 and the oxidation reaction rate at the time when the oxidation reaction reaches a stationary state as E2. Moreover, the time required for reaching the oxidation reaction rate of (E1+E2)/2 is 1 to 50 seconds. There is provided a polishing method using the same. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了解决金属抛光溶液所需的物理性能，以使得高抛光速率与良好的凹陷性能相适应，并提供具有所获得的物理性能的金属抛光溶液，并且抛光方法使用相同。解决方案：用于金属的抛光溶液含有氧化剂。在金属的研磨液中，E1 / E2为1.5以上时，在将要研磨的金属表面开始氧化为E1以及氧化反应达到稳定时的氧化反应速度之后立即表现出氧化反应速度状态为E2。此外，达到（E1 + E2）/ 2的氧化反应速度所需的时间为1〜50秒。提供了使用其的抛光方法。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2006190890A Polishing solution and polishing method using it 审中-公开
标题翻译：使用它的抛光解决方案和抛光方法
公开(公告)号：JP2006190890A
公开(公告)日：2006-07-20
申请号：JP2005002734
申请日：2005-01-07
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： KAMIMURA TETSUYA , YAMASHITA KATSUHIRO
IPC分类号： H01L21/304 , B24B37/00 , C09K3/14
摘要： PROBLEM TO BE SOLVED: To provide polishing solution capable of improving the yield by raising polishing speed and of realizing high flatness by the prevention of dishing, while preventing a scratch and surface roughness, at the time of polishing the metal layer of a wiring section, and to provide a chemical mechanical polishing method using the polishing solution. SOLUTION: The polishing solution contains at least one kind of derivative selected out of a tetrazole derivative and an anthranilic acid derivative along with containing at least two sorts of grains whose hardness are different. The chemical mechanical polishing method uses the polishing solution. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供能够通过提高抛光速度并且通过防止凹陷来实现高平坦度同时防止划痕和表面粗糙度提高成品率的抛光溶液在抛光金属层的时候布线部分，并提供使用抛光溶液的化学机械抛光方法。解决方案：抛光溶液含有选自四唑衍生物和邻氨基苯甲酸衍生物中的至少一种衍生物，并含有至少两种硬度不同的晶粒。化学机械抛光方法使用抛光液。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2006023785A Silver halide photographic emulsion and silver halide photographic sensitive material containing said silver halide photographic emulsion 有权
标题翻译：银色摄影乳液和银色摄影感光材料，含有银色半透明摄影乳液
公开(公告)号：JP2006023785A
公开(公告)日：2006-01-26
申请号：JP2005288701
申请日：2005-09-30
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： YAMASHITA KATSUHIRO , KOBAYASHI KATSU
IPC分类号： G03C1/29 , G03C1/16 , G03C1/22
摘要： PROBLEM TO BE SOLVED: To provide a silver halide photographic emulsion having high sensitivity by spectral sensitization and a silver halide photographic sensitive material using the emulsion. SOLUTION: The silver halide photographic emulsion contains at least one sensitizing dye having a specific structure and at least one sensitizing dye having a specific structure different from the above structure, wherein at least one of the sensitizing dyes is added in an amount equivalent to ≥80% of a saturated coated amount and a total amount of the sensitizing dyes added is equivalent to ≥160% of the saturated coated amount. The silver halide photographic sensitive material characterized by having at least one silver halide photographic emulsion layer containing the silver halide photographic emulsion. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：通过光谱增感提供具有高灵敏度的卤化银照相乳剂和使用该乳液的卤化银感光材料。解决方案：卤化银照相乳剂含有至少一种具有特定结构的敏化染料和至少一种具有与上述结构不同的特定结构的增感染料，其中至少一种感光染料的加入量相当于至饱和涂布量的≥80％，加入的增感染料的总量相当于饱和涂布量的≥160％。该卤化银感光材料的特征在于具有至少一个含有卤化银照相乳剂的卤化银照相乳剂层。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2006179845A Polishing solution for metal, and polishing method 审中-公开
标题翻译：金属抛光解决方案和抛光方法
公开(公告)号：JP2006179845A
公开(公告)日：2006-07-06
申请号：JP2005071153
申请日：2005-03-14
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： SEKI HIROYUKI , YAMASHITA KATSUHIRO , AKATSUKA TOMOHIKO , INABA TADASHI
IPC分类号： H01L21/304 , B24B37/00 , C09K3/14
CPC分类号： C09G1/02 , H01L21/3212
摘要： PROBLEM TO BE SOLVED: To provide a polishing solution for metal and a polishing method using the same capable of manufacturing LSI at fast chemical mechanical polishing speed, for improved flatness with less dishing as well as improved copper/tantalum selectivity. SOLUTION: The polishing solution for metal contains specific organic acid having carboxyl group as well as oxidant. The polishing method uses the solution. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种能够以快速化学机械抛光速度制造LSI的金属抛光溶液和使用该抛光溶液的抛光方法，为了改善平坦度，减少凹陷以及改进的铜/钽选择性。解决方案：金属抛光液含有具有羧基的特定有机酸以及氧化剂。抛光方法使用该方案。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2005134430A Silver halide photographic sensitive material 审中-公开
标题翻译：银色摄影感光材料
公开(公告)号：JP2005134430A
公开(公告)日：2005-05-26
申请号：JP2003367065
申请日：2003-10-28
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： KAWANISHI YASUHIRO , KOBAYASHI KATSU , YAMASHITA KATSUHIRO
IPC分类号： G03C1/29 , G03C1/035 , G03C1/12 , G03C1/14
摘要： PROBLEM TO BE SOLVED: To provide a silver halide photographic sensitive material with high sensitivity. SOLUTION: The silver halide photographic sensitive material contains a silver halide emulsion in which at least two dye chromophores are adsorbed in multiple layers on the surfaces of silver halide grains, wherein at least one dye chromophore in at least two dye chromophores is represented by formula I and the other dye chromophore is a dye chromophore having at least one hydrogen bond donative substituent. In the formula (I), Z 1 and Z 2 each represent a group of atoms required to form an N-containing heterocycle; R 1 and R 2 each represent H, alkyl, aryl or a heterocyclic group, at least one of R 1 and R 2 contains carboxyl; L 1 -L 7 each represent methine; p 1 and p 2 each represent 0 or 1; n represents 0, 1, 2, 3 or 4; Ma represents a charge equilibrated counter ion; and ma represents a number of ≥0 required to neutralize the charge of each molecule. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供高灵敏度的卤化银感光材料。解决方案：卤化银感光材料含有卤化银乳剂，其中至少两种染料发色团在卤化银颗粒表面上被吸附在多层中，其中至少一种染料发色团中的至少一种染料发色团被表示通过式I和其它染料发色团是具有至少一个氢键供体取代基的染料发色团。在式（I）中，Z SB 1和Z SB 2各自表示形成含氮杂环所需的一组原子; R SB 1和R SB 2各自表示H，烷基，芳基或杂环基，R SB 1和R SB 2中的至少一个含有羧基; L 1 7 各自代表次甲基; p 1 和p 2 各自表示0或1; n表示0,1,2,3或4; Ma代表电荷平衡的抗衡离子; 并且ma表示中和每个分子的电荷所需的≥0的数量。版权所有（C）2005，JPO＆NCIPI

9. 发明专利

JP2004004407A Silver halide photosensitive material 审中-公开
公开(公告)号：JP2004004407A
公开(公告)日：2004-01-08
申请号：JP2002177378
申请日：2002-06-18
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： HIOKI TAKANORI , TAKIZAWA HIROO , YAMASHITA KATSUHIRO
IPC分类号： G03C1/12
摘要： PROBLEM TO BE SOLVED: To provide a silver halide photosensitive material having a high sensitivity and desired spectral sensitivity distribution. SOLUTION: The silver halide photosensitive material contains at least one multi-chromophore dye compound which have at least two dye chromophors coupled by covalent bonding or coordinate bonding and in which at least two dye chromophors form dye chromophor groups and the light absorption by the dye chromophor groups exhibits the absorption varying from the sum of the independent light absorptions of the respective dye chromophors constituting the dye chromophor groups. COPYRIGHT: (C)2004,JPO

10. 发明专利

JP2006093467A Polishing fluid for barrier metal and polishing method 审中-公开
标题翻译：抛光液用于阻挡金属和抛光方法
公开(公告)号：JP2006093467A
公开(公告)日：2006-04-06
申请号：JP2004278299
申请日：2004-09-24
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： YAMASHITA KATSUHIRO , SEKI HIROYUKI
IPC分类号： H01L21/304 , B24B37/00 , C09K3/14 , C09K13/00
摘要： PROBLEM TO BE SOLVED: To provide a polishing fluid for metal that improves chemical/mechanical polishing speed remarkably, reduces dishing, and can manufacture improved LSIs. SOLUTION: The polishing fluid for barrier metals contains at least one of oxidizer, a compound expressed by a general formula (I), and a compound expressed by a general formula (II) while the concentration of abrasive grains in the polishing fluid is 5 percentages by mass or larger for the entire amount of polishing fluid. In the chemical/mechanical polishing method, the polishing fluid for barrier metals is used. In the formula (I), R 1 and R 2 indicate hydrogen atoms or substituents independently. In the formula (II), R 3 -R 8 indicate hydrogen atoms or substituents independently. M + indicates a cation. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供显着提高化学/机械抛光速度的金属抛光液，减少凹陷，并且可以制造改进的LSI。解决方案：用于阻挡金属的抛光液含有氧化剂，由通式（I）表示的化合物和由通式（II）表示的化合物中的至少一种，而研磨液中的磨料颗粒的浓度对于整个抛光液量为5质量％以上。在化学/机械抛光方法中，使用用于阻挡金属的抛光液。式（I）中，R SB 1和R SB 2独立地表示氢原子或取代基。式（II）中，R SB 3 -R SB 8独立地表示氢原子或取代基。 M + 表示阳离子。版权所有（C）2006，JPO＆NCIPI

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