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1. 发明专利

JP2004061419A Measuring instrument 有权
公开(公告)号：JP2004061419A
公开(公告)日：2004-02-26
申请号：JP2002223231
申请日：2002-07-31
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： NAYA MASAYUKI
IPC分类号： G01N21/03 , G01N21/27 , G01N21/41
CPC分类号： G01N21/553
摘要： PROBLEM TO BE SOLVED: To accurately measure a specimen even in the case that the specimen is installed again in a measuring instrument for measuring a time change in entire reflection attenuation in the same measuring unit.
SOLUTION: The measuring instrument making a light beam L incident at various angles so as to obtain entire reflection conditions on the interface 11a of a dielectric block 11 and a metal film 12 and detecting the light beam L wholly reflecting on the interface 11a arranges a transparent dielectric film 14 on the metal film 12, makes the light beam L incident on the interface 11a in an angular range where two or more dark lines accompanying the entire reflection attenuation generate, and obtains a variation amount of the other dark lines by making one specimen of the smallest variation accompanying a change in the dielectric constant of the specimen 15 a reference from among the dark lines.
COPYRIGHT: (C)2004,JPO

2. 发明专利

JP2003007593A Proximity field light aligner 有权
标题翻译：临近场灯对准器
公开(公告)号：JP2003007593A
公开(公告)日：2003-01-10
申请号：JP2001188219
申请日：2001-06-21
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： NAYA MASAYUKI
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70566 , G03F7/7035
摘要： PROBLEM TO BE SOLVED: To expose a linear micropattern having a small line width on a photosensitive material, e.g. photoresist, using proximity field light and to reduce the cost required for exposure. SOLUTION: A proximity field light aligner comprising an exposure light source 16 emitting nonpolarized exposure light 15, and an exposure mask 14 having a pattern of openings smaller than the wavelength of the exposure light 15 and disposed at a position being irradiated with the exposure light 15 is provided with a polarizing plate 20 for polarizing the exposure light 15 linearly, and a means 22 for holding the polarizing plate 20 movably between a position entering the optical path of the exposure light 15 between the exposure light source 16 and the exposure mask 14 and a position deviated from the optical path.
摘要翻译：要解决的问题：将具有小线宽的线性微图案曝光在感光材料上，例如，光致抗蚀剂，使用近场光，并降低曝光所需的成本。解决方案：一种包括发射非偏振曝光灯15的曝光光源16的曝光掩模14和具有小于曝光光15的波长的开口图案的曝光掩模14，并配置在照射曝光光15的位置设置有用于使曝光光线15线性偏振的偏振板20和用于将偏振板20可移动地保持在曝光光源16和曝光掩模14之间的曝光光15的光路的位置之间的装置22和偏离光路的位置。

3. 发明专利

JP2005189198A Optical device 审中-公开
标题翻译：光学装置
公开(公告)号：JP2005189198A
公开(公告)日：2005-07-14
申请号：JP2003433809
申请日：2003-12-26
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： NAYA MASAYUKI , SASAKI HIROTOMO , INABA TADASHI , EZOE TOSHIHIDE
IPC分类号： G01N33/543 , C07C259/06 , C07C335/20 , C07D409/12 , C12Q1/68 , C23C26/00 , G01N21/27 , G01N21/41 , G01N33/53
CPC分类号： G01N21/553 , G01N21/554
摘要： PROBLEM TO BE SOLVED: To prevent the characteristics of an optical device, which has a structure capable of inducing surface plasmon resonance or local plasmon resonance, from being deteriorated by the oxidation of a metal film. SOLUTION: An oxidation preventing film comprising a mercapto compound having a benzene ring or a hetero-ring or a reducible compound having a bonding group with a metal constituting the metal film is formed so as to cover the surface of the metal film. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题为了防止具有能够引起表面等离子体共振或局部等离子体共振的结构的光学器件的特性被金属膜的氧化劣化。解决方案：形成包含具有苯环或异环的巯基化合物或与构成金属膜的金属具有键合基团的可还原化合物的氧化防止膜，以覆盖金属膜的表面。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2005172569A Fine structure, method for creating fine structure, and raman spectroscopy and spectroscope 有权
标题翻译：精细结构，创造精细结构的方法，拉曼光谱和光谱
公开(公告)号：JP2005172569A
公开(公告)日：2005-06-30
申请号：JP2003411790
申请日：2003-12-10
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： NAYA MASAYUKI
IPC分类号： B82B1/00 , B82B3/00 , G01N21/65
CPC分类号： G01N21/658
摘要： PROBLEM TO BE SOLVED: To provide a device that has the reinforcing function of Raman scattered light, has high performance and high quality, and can be created relatively easily.
SOLUTION: A substrate 2 in a structure in which a plurality of micropores 6 are formed on the surface, is obtained by anodizing a substrate 1 made of, for example an aluminum layer 4. Metal is filled into the micropores 6 of the substrate 2 by electrical plating, or the like for forming a metal fine particle 8. Plating treatment continues until the head section of the metal fine particle 8 projects from the surface of the substrate 2 and the diameter of the head section is larger than the hole diameter of the micropores after metal is filled to the same position as the surface of the substrate 2. Plating treatment is preferably allowed to continue until the gap between the head sections of the metal particle becomes 10nm or smaller. In the structure thus formed, Raman scattered light is effectively reinforced by an electric field generated at the gap section of the head section, so that high Raman reinforced effect can be obtained. Additionally, a gold fine particle is arranged in the micropores that are formed in advance, so that the surface structure is homogeneous, thus obtaining a stable result in Raman spectrum.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供具有拉曼散射光的增强功能的装置，具有高性能和高质量，并且可以相对容易地制造。解决方案：通过对由例如铝层4制成的基板1进行阳极氧化，获得其表面上形成有多个微孔6的结构中的基板2.将金属填充到基板2通过电镀等形成金属细颗粒8.电镀处理继续进行，直到金属微粒8的头部从基板2的表面突出，并且头部的直径大于孔的直径将金属填充到与基板2的表面相同的位置之后的微孔的直径。优选地进行电镀处理，直到金属颗粒的头部之间的间隙变为10nm以下。在如此形成的结构中，通过在头部的间隙部分产生的电场有效地增强拉曼散射光，从而可以获得高的拉曼增强效果。另外，在预先形成的微孔中配置有金微粒子，使得表面结构均匀，从而获得拉曼光谱的稳定结果。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2005195441A Raman spectroscopy, and device for raman spectroscopy 审中-公开
标题翻译：拉曼光谱仪和拉曼光谱仪器
公开(公告)号：JP2005195441A
公开(公告)日：2005-07-21
申请号：JP2004001553
申请日：2004-01-07
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： NAYA MASAYUKI
IPC分类号： G01N21/65 , G01N33/53
CPC分类号： G01N21/658
摘要： PROBLEM TO BE SOLVED: To efficiently intensify Raman scattered light to enhance precision for a Raman spectroscopy. SOLUTION: An objective substance is adsorbed on a surface of a device having structure formed with a plurality of micropores on a metal film having 50-200nm of thickness on a dielectric substrate, and the Raman spectroscopy is executed thereunder. A pore size of the micropore and a period thereof are determined in response to a wavelength of an irradiation light to obtain a light confinement effect. The irradiated light is utilized to the maximum by confining the light in the device, intensity of an electric field generated in a periphery gets maximum, and the Raman scattered light is intensified remarkably by the electric field. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了有效地增强拉曼散射光，以提高拉曼光谱的精度。解决方案：在电介质基板上，在具有50-200nm厚度的金属膜上，将目标物质吸附在具有由多个微孔形成的结构的器件的表面上，并在其下执行拉曼光谱。响应于照射光的波长确定微孔的孔径和周期，以获得光限制效果。通过将光束限制在器件中来最大限度地利用照射光，外围产生的电场强度最大，并且拉曼散射光通过电场显着增强。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2005056981A Exposure mask 审中-公开
标题翻译：曝光面膜
公开(公告)号：JP2005056981A
公开(公告)日：2005-03-03
申请号：JP2003284890
申请日：2003-08-01
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： NAYA MASAYUKI
IPC分类号： G03F1/38 , G03F1/68 , G03F1/82 , H01L21/027 , G03F1/16
摘要： PROBLEM TO BE SOLVED: To prevent the breakage of an exposure mask due to adhesion to a photosensitive material or the breakage of the photosensitive material when the exposure mask is peeled from the photosensitive material such as a photo resist or the like.
SOLUTION: The exposure mask 14 is formed of a light shielding metallic film 21 that is provided with an opening 21a with a specified pattern and is formed on a transparent substrate 20, and it is used to expose a photosensitive material by a light given through the metallic film from the side of the transparent substrate 20 in a state where the metallic film 21 is adhered to the photosensitive material. The surface of the metallic film 21 adhered to the photosensitive material is coated with a hydrophilic film 22, thereby improving peeling property between the exposure mask 14 and the photosensitive material.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了防止当曝光掩模从感光材料如光致抗蚀剂等上剥离时由于对感光材料的粘附而导致的曝光掩模的损坏或感光材料的破损。解决方案：曝光掩模14由遮光金属膜21形成，遮光金属膜21具有指定图案的开口21a并形成在透明基板20上，并且用于通过光曝光感光材料在金属膜21粘附到感光材料的状态下通过金属膜从透明基板20的侧面给出。粘附到感光材料上的金属膜21的表面涂覆有亲水膜22，从而改善了曝光掩模14和感光材料之间的剥离性能。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2004245638A Measuring apparatus 有权
公开(公告)号：JP2004245638A
公开(公告)日：2004-09-02
申请号：JP2003033760
申请日：2003-02-12
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： TANI TAKEHARU , NAYA MASAYUKI
IPC分类号： G01N21/27
摘要： PROBLEM TO BE SOLVED: To prevent measurement errors from occurring and prevent bonding reactions between sensing substances and specific substances from being blocked when using a light beam having a range of wavelength as measuring light in a measuring apparatus such as an apparatus or the like for measuring surface plasmon resonances. SOLUTION: The measuring apparatus is provided with a dielectric block 10, a thin film layer 12 being formed on a surface of the dielectric block 10 and being in contact with a sample, a light source 14 emitting the light beam having the range of wavelength, an incident optical system 15 enabling the light beam 13B to enter the dielectric block 10 so as to be totally reflected by an interface 10a between the dielectric block 10 and the thin film layer 12, and a light detecting means 20 detecting intensity of the light beam 13B being totally reflected by the interface 10a. The measuring apparatus further includes a filter means 23 which is disposed between the light source 14 and the thin film layer 12 and cuts off light having a wavelength range other than that of the light beam 13B subjected to the measurement of the intensity. COPYRIGHT: (C)2004,JPO&NCIPI

8. 发明专利

JP2003307488A Measuring apparatus 有权
标题翻译：测量装置
公开(公告)号：JP2003307488A
公开(公告)日：2003-10-31
申请号：JP2002088864
申请日：2002-03-27
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： KIMURA TOSHIHITO , NAYA MASAYUKI , MORI NOBUFUMI , SHIMIZU HITOSHI , SATO SHU
IPC分类号： G01B11/26 , G01N21/03 , G01N21/13 , G01N21/27
CPC分类号： G01N21/553
摘要： PROBLEM TO BE SOLVED: To perform an accurate measurement even if a sample is reinstalled in a measuring apparatus for observing a time change in total reflection attenuation for the same measurement unit.
SOLUTION: In a sensor for detecting light beams L1 that are totally reflected on an interface 11a while the light beams L1 are made incident at various angles to obtain total reflection conditions on an interface 11a on a thin-film layer 12 on a dielectric block 11, light beams L2 for measuring slope are made incident to the interface 11a, the light beams 12 for measuring inclination being reflected by the interface 11a are received by a light detection means 37, the slope between the first and second measurements for measuring the total reflection attenuation on the interface 11a is obtained, and the second measurement value is corrected by a signal-processing section 20 according to the obtained slope.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：即使将样品重新安装在用于观察相同测量单元的全反射衰减的时间变化的测量装置中，也执行准确的测量。解决方案：在用于检测光束L1全部反射的光束L1的传感器中，同时光束L1以各种角度入射以获得在薄膜层12上的界面11a上的全反射条件介质块11，用于测量斜率的光束L2入射到界面11a，用于测量由界面11a反射的倾斜度的光束12被光检测装置37接收，用于测量的第一和第二测量值之间的斜率获得接口11a上的全反射衰减，并且由信号处理部20根据获得的斜率来校正第二测量值。版权所有（C）2004，JPO

9. 发明专利

JP2002372490A Sensor utilizing total reflection attenuation and measurement chip assembly 审中-公开
标题翻译：传感器利用总反射衰减和测量芯片组件
公开(公告)号：JP2002372490A
公开(公告)日：2002-12-26
申请号：JP2002085970
申请日：2002-03-26
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： MORI NOBUFUMI , HAYASHI KATSUMI , NAYA MASAYUKI , OGURA NOBUHIKO , KUNUKI YOSHIYUKI
IPC分类号： G01N21/03 , G01N21/01 , G01N21/13 , G01N21/27 , G01N21/45 , G01N35/04 , G01N35/10
CPC分类号： G01N21/553
摘要： PROBLEM TO BE SOLVED: To prevent sample liquid being supplied to a measurement unit from being evaporated and to improve measurement accuracy in a sensor utilizing total reflection attenuation due to surface plasmon resonance or the like. SOLUTION: A cup-shaped measurement unit 10 is arranged on a turntable 20 by a loading/unlociding mechanism 65, and measurement liquid is dropped and supplied to the measurement unit 10 by a sample liquid supply mechanism 64. The turntable 20 is rotated, and a small amount of oil is dropped and supplied at a specific position by an oil supply mechanism 80. Further, the turntable 20 is rotated, light beams 30 are allowed to enter at various angles so that total reflection conditions can be obtained at the interface between a metal film formed on the inner bottom surface of a measurement unit 10 and a dielectric block under the metal film, and the light beams 30 being totally reflected on the interface are detected by a photodetector 40 and the characteristics of sample liquid are obtained by measuring the state of total reflection attenuation based on the light detection value. The surface of sample liquid in the measurement unit 10 is covered with oil, thus preventing the sample liquid from being evaporated and improving measurement accuracy.
摘要翻译：要解决的问题：为了防止供给测量单元的样品液体蒸发，并且利用由于表面等离子体共振等引起的全反射衰减来提高传感器中的测量精度。解决方案：杯形测量单元10通过装载/分离机构65布置在转盘20上，并通过样品液体供应机构64将测量液体滴落并提供给测量单元10.转盘20旋转，少量的油被油供给机构80掉落并在特定位置供给。此外，转盘20旋转，允许光束30以各种角度进入，从而可以在在测量单元10的内底表面上形成的金属膜和金属膜下面的介质块，并且通过光电检测器40检测在界面上全反射的光束30，并且通过测量获得样品液体的特性基于光检测值的全反射衰减状态。测量单元10中的样品液体的表面被油覆盖，从而防止样品液体蒸发并提高测量精度。

10. 发明专利

JP2006040347A Near field light emission element and optical head 有权
标题翻译：近场辐射元件和光学头
公开(公告)号：JP2006040347A
公开(公告)日：2006-02-09
申请号：JP2004216210
申请日：2004-07-23
申请人： Fuji Photo Film Co Ltd , Fuji Xerox Co Ltd , 富士ゼロックス株式会社 , 富士写真フイルム株式会社
发明人： KAMIYANAGI KIICHI , NAYA MASAYUKI , TOMARU YUICHI
IPC分类号： G11B7/135 , G03F7/20 , H01L21/027 , H01S5/18
CPC分类号： G11B7/1387
摘要： PROBLEM TO BE SOLVED: To provide a near field light emission element which can be easily manufactured and can emit near field light of high intensity with high light utilization efficiency and an optical head.
SOLUTION: The laser beam 4a emitted from a semiconductor laser 3 is shaped to parallel 4b beams of light by a collimator lens 5, is made incident on a first face 6a at of a transparent medium 6, is reflected by a reflection film 6d formed on the surface of a third face 6c and is condensed to an aperture 10d of a metallic film 10 prepared on an under surface 2a of a floating slider 2. Surface plasmon is excited on first and second surfaces 10a and 10b of the metallic film 10 by the laser beam condensed to the aperture 10d and the surface plasmon is reflected by an end surface 10c and is converged to the aperture 10d. The near field light 4e emitted from the aperture 10d is drastically amplified by the interaction of the laser beam and the plasmon near the aperture 10d.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种可以容易地制造并且可以发射具有高光利用效率的高强度的近场光和光学头的近场发光元件。解决方案：从半导体激光器3发射的激光束4a通过准直透镜5成形为平行的4b束光，入射到透明介质6的第一面6a上，被反射膜反射 6d形成在第三面6c的表面上并且被冷凝到制备在浮动滑块2的下表面2a上的金属膜10的孔10d。表面等离子体激元在金属膜的第一和第二表面10a和10b上被激发 10被激光束聚光到孔10d，表面等离子体激元被端面10c反射并且会聚到孔10d。从孔10d发射的近场光4e通过激光束和孔10d附近的等离子体激元的相互作用而被大幅放大。版权所有（C）2006，JPO＆NCIPI

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