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1. 发明专利

JP2002001239A METHOD FOR CLEANING PLATE-LIKE MEMBER AND CLEANING DEVICE 失效
公开(公告)号：JP2002001239A
公开(公告)日：2002-01-08
申请号：JP2000188891
申请日：2000-06-23
申请人： FUJITSU LTD , FUJITSU VLSI LTD
发明人： HIRANO HIROAKI , NAKAGAWA KENJI , TAKAHASHI MASUMI , IIDA HITOSHI
IPC分类号： B08B1/04 , B08B3/02 , B08B3/04 , G03F1/62 , G03F1/82 , G03F1/08 , G03F1/14
摘要： PROBLEM TO BE SOLVED: To provide a method for cleaning a plate-like member by which only one of the sides of the plate-like member such as a reticle is cleaned as well as a cleaning device. SOLUTION: The tip part of a brush curtain (a liquid shielding member) 12 is brought into contact with the ends of the reticle (the plate-like member) 10. Next, the reticle 10 is arranged in a cleaning chamber 20 in such a state that a liquid is prevented from being scattered from the lower side space to the upper side space of the reticle 10 by means of the brush curtain 12. In this case, the side to which the reticle 10 is applied is set facing upward. Then the lower side of the reticle 10 is cleaned using a cleaning liquid and a sponge scrubber 13 to remove a soil and pure water is sprayed from a pure water spray nozzle 17 to wash off the cleaning liquid.

2. 发明专利

JP2001253491A CASE FOR STORING AND TRANSPORTING MEMBER FOR FABRICATING SEMICONDUCTOR DEVICE 失效
公开(公告)号：JP2001253491A
公开(公告)日：2001-09-18
申请号：JP2000070401
申请日：2000-03-14
申请人： FUJITSU LTD , FUJITSU VLSI LTD
发明人： HIRANO HIROAKI , SATO YOSHIHIRO
IPC分类号： B65D85/86 , G03F1/40 , G03F1/66 , H01L21/027 , H01L21/673 , H01L21/68 , G03F1/14
摘要： PROBLEM TO BE SOLVED: To provide a case for storing and transporting a member for fabricating a semiconductor device, capable of controlling contamination of a wafer, a reticle or the like for a semiconductor due to adhesion of particles and preventing the electrostatic breaking of these device patterns. SOLUTION: The case for storing and transporting a member for fabricating a semiconductor device has a bottom tray 10 on which the member such as a reticle 12 is set and an upper lid 20 for covering the bottom tray 10. The bottom tray 10 is formed of a polycarbonate to which carbon is added, and the upper lid 20 is formed of a non-conductive plastic resin.

3. 发明专利

JPH0439552A CLEAN ROOM 失效
公开(公告)号：JPH0439552A
公开(公告)日：1992-02-10
申请号：JP14498790
申请日：1990-06-01
申请人： FUJITSU LTD
发明人： HIRANO HIROAKI , OHORI KAZUO
IPC分类号： F24F7/06
摘要： PURPOSE:To improve reliability of a semiconductor device by a method wherein a plurality of through-pass holes are formed in a floor, water contacting with air at its surface is flowed just below the through-pass holes, dusts generated from a worker or a device or the like can be discharged out of a clean room together with the water. CONSTITUTION:A plurality of through-pass holes 21a are formed in a floor 21 of a clean room. Water, for example, pure water 20 is flowed just below the through-pass holes 21a. Due to this fact, dusts generated from the workers or devices in the clean room and descending in the clean room pass through the through-pass holes 21a formed in the floor 21, drop onto the water 20 flowing just below the through-pass holes 21a and then the dusts are discharged out of the clean room together with the water 20. Accordingly, even if the workers move within the clean room, the dusts are not blown up from the floor 21 within the clean room. With such an arrangement, reliability of a semiconductor device is improved.

4. 发明专利

JPH039247A MASK SURFACE INSPECTING DEVICE 失效
公开(公告)号：JPH039247A
公开(公告)日：1991-01-17
申请号：JP14499289
申请日：1989-06-06
申请人： FUJITSU LTD
发明人： TOKUMARU YUICHI , SAKA TAKETORA , HIRANO HIROAKI
IPC分类号： G01N21/84 , G01N21/88 , G01N21/94 , G01N21/956 , H01L21/027 , H01L21/30 , H01L21/66
摘要： PURPOSE:To prevent foreign matter from sticking during inspection and to improve the reliability of the device by providing a holder where a mask is mounted with a protection film with a frame which covers a light shielding film formation surface separably when detecting whether or not there is foreign matter present on a mask substrate which has a light shielding film formed on the surface by using a lens. CONSTITUTION:The mask 4 consists of the mask substrate 4a which has the light shielding film 4b formed on the surface and is placed on the holder 1 of the mask surface inspecting device and an Al-made frame 3b which has a protection film 3a stuck on the top surface and a buffer material 4a on the reverse surface is mounted on the surface of the substrate 4a with the side of the buffer material 3c down. Here, the film 3c is formed of nitrocellulose, etc., to eliminate the influence of a detection rate at the time of inspection by the lens 2, the frame 3b is 3 - 6mm high, and the buffer material 3c is made of silicone rubber, etc. Thus, foreign matter 5 is prevented from sticking on the surface of the mask 4 during the inspection and the frame 3b is freely hopped up around a retractable hinge 6 to easily clean the surface of the mask 4.

5. 发明专利

JPH05226310A CLEANING METHOD 失效
公开(公告)号：JPH05226310A
公开(公告)日：1993-09-03
申请号：JP2311592
申请日：1992-02-10
申请人： FUJITSU LTD
发明人： HIRANO HIROAKI
IPC分类号： H01L21/304 , B08B7/00
摘要： PURPOSE:To completely clean an object to be cleaned after chemical treatment so as not to leave residue, by a method wherein residue adhering to the surface of the object to be cleaned after washing is frozen under a reduced pressure, and the frozen residue is blown out and eliminated by pressurized hot air. CONSTITUTION:An object 1 to be cleaned after washing is retained by a retaining plate 2 in a process chamber 8. Nitrogen gas is introduced from a nitrogen gas feeding port 6, and discharged from an exhaust vent 7, thereby keeping the inside of a washing chamber 8 in a reduced pressure state (10 -10 Torr). In this case, the surface of the object 1 to be cleaned is frozen by cooling the surface with a cooling equipment 21 while discharging gas. After that, pressurized hot air is blown against the object 1 to be cleaned from a nozzle 3. The pressurized hot air nozzle 3 scans the object to be cleaned by a scanning equipment 4, and blows off the frozen residue. Thereby the object 1 to be cleaned is so completely washed that residue is not left after washing.

6. 发明专利

JPH0366124A CLEANING APPARATUS 失效
公开(公告)号：JPH0366124A
公开(公告)日：1991-03-20
申请号：JP20299789
申请日：1989-08-04
申请人： FUJITSU LTD
发明人： HIRANO HIROAKI
IPC分类号： H01L21/304
摘要： PURPOSE:To clean an object to be cleaned such as a wafer, a mask or a reticle without using a holder which becomes a source of particles by a method wherein a holding device which holds the object to be cleaned such as the wafer or the like in a vertically erected state is installed inside a cleaning tank and the holding device is constituted of the same material as the cleaning tank. CONSTITUTION:At a cleaning tank 1, a wafer 6 is inserted into the cleaning tank 1 from a slit 5 by using a hanger 7 which grips an end part of the wafer 6. When the hanger 7 is retreated in a state that a lower-end part of the wafer 6 has been inserted into a holding groove 2, the wafer 6 is held in a vertically erected state by means of the holding groove 2 and the slit 5. At the cleaning tank 1 in which the wafer 6 is treated with a chemical, the cleaning tank 1 is filled with a cleaning liquid by a prescribed chemical; the wafer 6 is cleaned by using the cleaning liquid. In the cleaning tank 1 used for a spray cleaning operation, the wafer 6 which has been held in the vertically erected state is sprayed with pure water and is cleaned. Consequently, a cleaning effect of the wafer 6 can be enhanced, and a yield of a semiconductor device manufactured by using this wafer 6 can be enhanced.

7. 发明专利

JPH0325441A PELLICLE 失效
公开(公告)号：JPH0325441A
公开(公告)日：1991-02-04
申请号：JP16182189
申请日：1989-06-22
申请人： FUJITSU LTD
发明人： HIRANO HIROAKI , ITO AKIHIKO
IPC分类号： G03F1/62 , H01L21/027
摘要： PURPOSE:To prevent the release of dust to the inner side of the pellicle at the time of sticking the pellicle to a reticule, mask, etc., by providing a dust preventive film on the inner side of an adhesive agent. CONSTITUTION:The dust preventive film 2 stuck to the adhesive agent 1c is provided on the inner side of a frame 1b over the entire circumference on the inner side of the frame 1b. The thickness of the adhesive agent 1c decreases slightly when this pellicle 1 is pressed to the front surface of the mask 3 and is stuck by the adhesive agent 1c. The adhesive agent 1c and the side face of the dust preventive film 2 are then brought into contact with the surface of the mask 3 and the size of the contact part between the film 2 and the frame 1b is increased by as much as the decreased component of the thickness of the adhesive agent 1c. The sticking of the dust released from the adhesive agent 1c to the inner side of the pellicle onto the surface of the mask 3 or into the pellicle 1 is prevented in this way.

8. 发明专利

JPS6377056A CORRECTING METHOD FOR PHOTOMASK 失效
公开(公告)号：JPS6377056A
公开(公告)日：1988-04-07
申请号：JP22256386
申请日：1986-09-19
申请人： FUJITSU LTD
发明人： HIRANO HIROAKI
IPC分类号： G03F1/00 , G03F1/72 , H01L21/027
摘要： PURPOSE:To obtain a high-accuracy transfer pattern by coating a chromium film which coats a defect part with a 2nd resist, etching away the chromium film except said part and further removing the resist. CONSTITUTION:After the positive resist 3 is coated over the entire surface on a photomask having the defect part 20, the defect part 20 is subjected to spot exposure. The resist is then removed from only the exposed part by development and a window is formed like a spot. The chromium film 4 having several hundreds Angstrom film thickness is then deposited atop the same by a sputtering method and the resist 5 (2nd resist) is dropped onto the chromium film 4 in the defect part 20. The exposed chromium film 4 except said part is etched away. The positive resist 3 and resist 5 are thereafter dissolved in an org. solvent and are removed. The defect part is thereby eliminated and the photomask having the good surface condition is obtd. The reproduction of the high-quality photomask is thus permitted.

9. 发明专利

JPH02201926A HOLDER FOR AND METHOD OF WET CLEANING 失效
公开(公告)号：JPH02201926A
公开(公告)日：1990-08-10
申请号：JP1950689
申请日：1989-01-31
申请人： FUJITSU LTD
发明人： KANEMITSU HIDEYUKI , HIRANO HIROAKI , MIYAZONO SUKENARI , HONMA SHINICHI
IPC分类号： B08B3/08 , H01L21/304
摘要： PURPOSE:To prevent damage to an article to be cleaned due to static electricity generated during the cleaning by forming a wet cleaning holder from insulating material in a cage shape, and covering the surface thereof with electrically conductive material. CONSTITUTION:A wet cleaning holder 10 is formed from insulating material 11, so as to have sufficient size for receiving an article to be cleaned, in a cage shape with a handle 12. Then, the surface thereof is covered with electrically conductive material 13 which is hardly soluble in chemicals and which has no harmful effect on the article to be cleaned. The article to be cleaned is placed in the holder 10, and immersed and cleaned in pure water 15, and at that time, the holder 10 and the pure water 15 rub each other to generate static electricity. But, because the holder 10 is covered with the electrically conductive material 13, it is conducted to the plane part 12a of the handle 12 above the water surface, and neutralized by the ion shower 18 radiated from an ionizer gun 17, so that there is approximately no charge. Thus, damage to the article to be cleaned due to static electricity can be prevented.

10. 发明专利

JPH04152523A MANUFACTURE OF SEMICONDUCTOR DEVICE 失效
公开(公告)号：JPH04152523A
公开(公告)日：1992-05-26
申请号：JP27694190
申请日：1990-10-16
申请人： FUJITSU LTD
发明人： HIRANO HIROAKI
IPC分类号： H01L21/306 , H01L21/304
摘要： PURPOSE:To make it possible to completely remove remaining substance on a process chemical agent substrate by a method wherein, when a substrate is washed in a water-washing tank with pure water after a substrate has been processed with chemical agent, a separation wall plate is arranged, at least, on one side of the substrate at intervals so that washing is performed, with the pure water flowing only near the surface of the substrate. CONSTITUTION:When a substrate 1 is washed with pure water 3 in a water- washing tank 6 after the substrate 1 has been processed with a chemical agent, a separation wall plate 2 is arranged, at least, on one side of the substrate 1 at an interval so that washing is performed, with the pure water 3 flowing only near the surface of the substrate 1. For example, a rectangular washing tank 6 is used in the same way as conventional one in which one reticle substrate 1 is set on a substrate holder 4, a separation wall plate 2 is arranged on the both sides of the substrate 1 at intervals of 3-10mm so that water flows only on the surface of the substrate to flow away the remaining chemical agent at the time of the wet etching. Moreover, a honeycomb-shaped or porous overflow plate 5 is provided on the upper side of the substrate so that the pure water 3 overflows smoothly from the water-washing tank 6.

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