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1. 发明专利

JPH01135019A EXPOSURE OF PATTERN FORMATION 失效
公开(公告)号：JPH01135019A
公开(公告)日：1989-05-26
申请号：JP29460587
申请日：1987-11-20
申请人： FUJITSU LTD
发明人： OZASA IKUO , NAKAMURA KAZUO , TAKAHASHI YOSHIO , TSUTSUMI SHOICHI
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
摘要： PURPOSE:To obtain an accurate pattern formation for even a thick photoresist layer by providing a photoresist layer on a disk substrate and by making an exposure by using a photo mask provided with a circular groove which faces the periphery of the substrate. CONSTITUTION:A photoresist layer 2 which has been thickly spin-coated on a disk substrate 1 has a protuberance 7 at the periphery and a photo mask 3 is provided with a groove at its periphery for receiving the protuberance area 7. Thus, even if the photo mask 3 is piled up on the substrate 1, the protuberance part 7 is contained in the groove 4 and it can be closely attached to the surface of the photoresist layer 2 without lifting the photo mask 3. Generally, a glass substrate is used for the photo mask 3, and a thin light-screening pattern layer is formed by the photolithography on one surface of the mask 3. The groove 4 can be easily provided in a similar way. Thus, in the succeeding exposure process, a pattern can be formed accurately even on the thick photoresist later 2, forming a more fine pattern.

2. 发明专利

JPS6473519A PRODUCTION OF THIN FILM MAGNETIC HEAD 失效
公开(公告)号：JPS6473519A
公开(公告)日：1989-03-17
申请号：JP22984187
申请日：1987-09-16
申请人： FUJITSU LTD
发明人： TSUTSUMI SHOICHI , TAKAHASHI YOSHIO , NAKAMURA KAZUO , OZASA IKUO
IPC分类号： G11B5/31
摘要： PURPOSE:To completely remove a resist and to obtain stable and uniform characteristics by subjecting the resist to an oxygen plasma treatment to remove the properties-changed resist on the surface of the resist before a resist cleaning stage. CONSTITUTION:A substrate 1 is subjected to ion milling by projection of ion beams (arrows A) thereto. The properties-changed resist 3a is formed on the surface of the resist 3 at the time when an insulating protective film 2 is patterned. The properties-changed resist 3a is then removed by subjecting this substrate 1 to the oxygen plasma treatment and the resist 3 is removed by cleaning such as ultrasonic cleaning using an org. solvent. The properties- changed layer of the resist surface is removed by such oxygen plasma treatment before the resist cleaning stage, by which the complete removal of the resist in the cleaning stage is executed. The formation of the thin film coil having stable characteristics is thereby enabled.

3. 发明专利

JPH02152219A FORMATION OF ALIGNMENT MARKER OF COMPOSITE SUBSTRATE 失效
公开(公告)号：JPH02152219A
公开(公告)日：1990-06-12
申请号：JP30634988
申请日：1988-12-02
申请人： FUJITSU LTD
发明人： TSUTSUMI SHOICHI , TAKAHASHI YOSHIO
IPC分类号： G03F9/00 , G11B5/31 , H01L21/027 , H01L21/30
摘要： PURPOSE:To easily align a groove with a marker and to enhance an accuracy by a method wherein a thin film for alignment marker use is formed so as to expose one part of the groove, as a reference of an alignment operation, in a composite substrate whose groove in a pattern formation face has been filled with a different kind of material. CONSTITUTION:A mask evaporation jig 13 used to shield one part of a groove 2 as a reference in a composite substrate 7 (composed of a ferrite substrate 1 and of the groove 2 filled with a nonmagnetic material such as glass or the like) is placed on the composite substrate 7; a thin film 8 for marker use is formed by an evaporation operation. Thereby, the thin film 8 for marker use is formed in such a way that one part of the groove 2 is exposed. Since one part of the groove 2 is visible, it is possible to complete a marker 12 which aligns the groove 2 with a marker for photomask use easily and with good accuracy.

4. 发明专利

JPH01243212A MANUFACTURE OF THIN FILM MAGNETIC HEAD 失效
公开(公告)号：JPH01243212A
公开(公告)日：1989-09-27
申请号：JP7032788
申请日：1988-03-24
申请人： FUJITSU LTD
发明人： TSUTSUMI SHOICHI , TAKAHASHI YOSHIO , NAKAMURA KAZUO , NIIJIMA MASAAKI , MATSUMOTO KOZO
IPC分类号： G11B5/31
摘要： PURPOSE:To form a stable thin film pattern by vapor-depositing a thin film material after shielding a part of a photoresist pattern provided on a substrate, and eliminating the photoresist pattern by penetrating an organic solvent from an exposure part. CONSTITUTION:The photoresist pattern 8 is manufactured by applying photoresist on a substrate 7 made of ceramics, etc., and exposing it by using a mask pattern. After a part of the photoresist pattern 8 is shielded by the hood 12 of a jig 11, a thin film is vapor-deposited. When the jig 11 is removed after the thin film being vapor-deposited uniformly, the part shielded by the hood 12 forms the exposure part 13 on which no thin film is attached. Since the exposure part 13 is formed at the outer periphery of the photoresist 8, the organic solvent can be penetrated surely from the exposure part 13 by soaking in the organic solvent. Therefore, the photoresist 8 can be eliminated surely, and the thin film pattern 10 can be formed surely, and a process is stabilized, and sure re-photo off can be obtained, then, reproducibility can be obtained.

5. 发明专利

JPS6310484B2 失效
公开(公告)号：JPS6310484B2
公开(公告)日：1988-03-07
申请号：JP16899879
申请日：1979-12-25
申请人： FUJITSU LTD
发明人： TSUTSUMI SHOICHI , KUME TOMIO , YONEOKA SEIJI
IPC分类号： G11B5/31 , G11B5/60

6. 发明专利

JPS6124076A Slider chamfering method of magnetic head 失效
标题翻译：磁头滑块切割方法
公开(公告)号：JPS6124076A
公开(公告)日：1986-02-01
申请号：JP14366184
申请日：1984-07-11
申请人： Fujitsu Ltd
发明人： TANI KAZUNORI , INAZU ISOKICHI , TSUTSUMI SHOICHI
IPC分类号： G11B21/21 , G11B5/60
摘要： PURPOSE: To hardly cause head crash by fitting a head arm finished product to a magnetic disc device and applying contact/start/stop operation of a magnetic head while applying external disturbance to a head arm.
CONSTITUTION: The magnetic head 5 is fitted to the head arm 3 via a gimbal spring 4 to form the head arm finished body 16, which is fitted to an actuator 2 of the magnetic disc device and it is used as a device wrapping a slider face of the magnetic head 5. At the C.S.S., mechanical vibration exists in the wrapping device and this vibration is received by the head arm 3 and then the magnetic head 5 causes rolling and pitching, an external disturbance larger than the mechanical vibration is applied positively to cause rolling and pitching of the magnetic head 5, and the end of a floating face 11 of the slider 8 and a corner (b) of the core are wrapped by a disc 1. Thus, the slider chamfering for the magnetic head hardly causing head crash is attained.
COPYRIGHT: (C)1986,JPO&Japio
摘要翻译：目的：通过将头臂成品装配到磁盘装置上，并且在对头臂施加外部干扰时施加磁头的接触/起动/停止操作，几乎不会引起头部碰撞。构成：磁头5经由万向弹簧4装配到头臂3，以形成安装到磁盘装置的致动器2的头臂完成体16，并且其被用作包裹滑块面的装置在CSS中，包裹装置存在机械振动，头臂3受到振动，磁头5产生滚动和俯仰，大于机械振动的外部干扰正向施加于导致磁头5的滚动和俯仰，并且滑块8的浮动面11的端部和芯的角部（b）被盘1包裹。因此，用于磁头的滑块倒角几乎不引起头部崩溃了

7. 发明专利

JPH02192617A FORMATION OF THIN FILM DEVICE 失效
公开(公告)号：JPH02192617A
公开(公告)日：1990-07-30
申请号：JP1242989
申请日：1989-01-20
申请人： FUJITSU LTD
发明人： AMEMORI KAZUHIKO , TAKAHASHI YOSHIO , TSUTSUMI SHOICHI
IPC分类号： G11B5/31 , H01B13/00 , H01L21/302 , H01L21/3065
摘要： PURPOSE:To increase insulation resistance in each thin film device by performing ion mealing or sputter etching, and then, by performing dry etching or plasma etching using a specified gas according to a conductive material that is used for the formation of a conductive film or to an insulating material that is used for the formation of an insulating substrate film. CONSTITUTION:After a conductive film 2 is formed on an insulating substrate film 3 by a thin film process technique, masking done on a part of the conductive film 2 as required by a resist 1, unnecessary part of the conductive film 2 is removed by ion mealing or sputter etching, and then, according to a conductive material that is used for the formation of the conductive film 2 or to an insulating material that is used for the formation of the insulating substrate film 3, dry ethcing or plasma etching is performed using a specified gas. A residual part of the unnecessary metal, or a metallic particle abrashed by an argon particle that re-adheres to the insulating substrate film 3 during ion mealing or sputter etching, is reduced to a gas compound so as to be removed by exhaust. Unnecessary metal can thus be completely removed from the insulating substrate film 3, and insulation resistance in each thin film device can be increased.

8. 发明专利

JPS6472309A MANUFACTURE OF THIN FILM MAGNETIC HEAD 失效
公开(公告)号：JPS6472309A
公开(公告)日：1989-03-17
申请号：JP22850687
申请日：1987-09-14
申请人： FUJITSU LTD
发明人： TSUTSUMI SHOICHI , TAKAHASHI YOSHIO , NAKAMURA KAZUO , OZASA IKUO
IPC分类号： G11B5/31
摘要： PURPOSE:To prevent the pattern transfer accuracy from being deteriorated due to a swell-up of resist coating by performing an exposure for eliminating a resist swell-up part before an exposure transfer process of a thin film pattern. CONSTITUTION:When a resist 2 is brought to coating on a substrate 1, a swell-up part 2a is formed on the resist 2, in the peripheral edge part of the substrate. Subsequently, by exposing the resist 2 by using a mask 3 having a mask pattern 4 for eliminating this swell-up part 2a and executing a development, the swell-up part is eliminated from the resist 2 on the wafer 1. Next, by executing an exposure by using a mask 5 having a pattern 6 to be formed on the resist 2, and executing a development, a desired pattern 2b is formed on the resist. In such a way, since an exposure process for eliminating the resist swell-up part is contained, the surface of the resist 2 becomes a uniform flat surface and the mask pattern 6 adheres closely to the surface of the resist 2. In such a way, deterioration of the pattern transfer accuracy based on the swell-up of the resist can be prevented.

9. 发明专利

JPS61177692A METHOD FOR ADJUSTMENT OF FLOATING BALANCE OF MAGNETIC HEAD 失效
公开(公告)号：JPS61177692A
公开(公告)日：1986-08-09
申请号：JP1694685
申请日：1985-01-31
申请人： FUJITSU LTD
发明人： TSUTSUMI SHOICHI , HOSHINO NAOTOSHI , NAITO MASAOMI , TOKITA TAKASHI
IPC分类号： G11B21/21
摘要： PURPOSE:To substantially improve the yield of a floating magnetic head device by examining the floating balance of the magnetic head while rotating a glass disk of a floating tester, and performing the required adjustment. CONSTITUTION:The transparent glass disk 9 of the floating tester is turned to float the magnetic head 6. by examining the floating balance from the float displacement, securing a spring arm 4 and adjusting the angle of a jimbal spring 5, the floating balance is adjusted and the yield of the floating magnetic head device is substantially improved.

10. 发明专利

JP2001020095A PLATING DEVICE 失效
公开(公告)号：JP2001020095A
公开(公告)日：2001-01-23
申请号：JP19360899
申请日：1999-07-07
申请人： FUJITSU LTD
发明人： TSUTSUMI SHOICHI , TAKAHASHI YOSHIO
IPC分类号： C25D17/00
摘要： PROBLEM TO BE SOLVED: To provide a plating device capable of suppressing the generation of bubbles. SOLUTION: The plating device 40 possesses a plating vessel 1, a storage tank 18 for a plating liquid, a liquid feed pipe 20 disposed between the storage tank 18 and the plating vessel 12, a liquid feed pump 21 for sending the plating liquid through the liquid feed pipe 20 from the storage tank 18 to the plating vessel 12 and returning pipes 25, 27 for returning the plating liquid from the plating vessel 12 to the storage tank 18. Defoaming filter members 42 each composed of a chemical resistant material and containing cloth having a mesh capable of passing the plating liquid are attached to opening ends of the returning pipes 25, 27 in the storage tank 18.

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