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1. 发明专利

JP2004281230A Beam source and beam treatment device 审中-公开
公开(公告)号：JP2004281230A
公开(公告)日：2004-10-07
申请号：JP2003071071
申请日：2003-03-14
申请人： Ebara Corp , Univ Tohoku , 東北大学長 , 株式会社荏原製作所
发明人： FUKUDA AKIRA , SHIBATA AKIO , HIYAMA HIROKUNI , ICHIKI KATSUNORI , YAMAUCHI KAZUO , SAGAWA SEIJI
IPC分类号： H05H1/46 , H01J27/16 , H01J37/08 , H01J37/305 , H01J37/32 , H01L21/02 , H01L21/205 , H01L21/3065
CPC分类号： H01J37/321 , H01J37/32357
摘要： PROBLEM TO BE SOLVED: To provide a beam source and a beam treatment device capable of irradiating various beams like positive ion, negative ion, neutral particles or the like in a large diameter uniformly on a treated object and realizing charge-free and damage-free properties. SOLUTION: In the beam source provided with an antenna generating plasma inside a plasma generating chamber, a first electrode arranged inside the plasma chamber, a second electrode arranged in opposition to the first electrode inside the plasma generating chamber and a voltage impression part drawing out particles from the plasma generated by the antenna by impressing voltage between the first electrode and the second electrode, both the antenna and the second electrode are placed in opposition to the first electrode. COPYRIGHT: (C)2005,JPO&NCIPI

2. 发明专利

JP2004281232A Beam source and beam treatment device 审中-公开
公开(公告)号：JP2004281232A
公开(公告)日：2004-10-07
申请号：JP2003071073
申请日：2003-03-14
申请人： Ebara Corp , Univ Tohoku , 東北大学長 , 株式会社荏原製作所
发明人： ICHIKI KATSUNORI , SHIBATA AKIO , FUKUDA AKIRA , HIYAMA HIROKUNI , YAMAUCHI KAZUO , SAGAWA SEIJI
IPC分类号： B01J3/00 , B01J19/12 , H01J27/02 , H01J27/16 , H01J37/08 , H01L21/3065 , H01S3/00 , H05H1/46
CPC分类号： H05H1/46 , H01J37/08
摘要： PROBLEM TO BE SOLVED: To provide a beam source and a beam treatment device capable of uniformly irradiating various beams like positive ion, negative ion, neutral particles or the like on a treated object in a large ion current density and in a large diameter, and realizing a large caliber and longer life of a grid electrode. SOLUTION: Provided with a means for leading in gas, a positive and negative ion plasma generating means generating a state in which the positive ion and the negative ion are mixed through plasmolyzation of gas, a positive and negative ion generating chamber generating positive and negative ion, and a plurality of grid electrodes equipped with a plurality of beam-drawing-out holes, the device draws out ion or beams neutralized from the ion through the beam-drawing-out holes fitted to the grid electrodes by accelerating the positive ion or the negative ion through impression of voltage between the plurality of electrodes. COPYRIGHT: (C)2005,JPO&NCIPI

3. 发明专利

JP2004281231A Beam source and beam treatment device 有权
公开(公告)号：JP2004281231A
公开(公告)日：2004-10-07
申请号：JP2003071072
申请日：2003-03-14
申请人： Ebara Corp , Univ Tohoku , 東北大学長 , 株式会社荏原製作所
发明人： FUKUDA AKIRA , SHIBATA AKIO , HIYAMA HIROKUNI , ICHIKI KATSUNORI , YAMAUCHI KAZUO , SAGAWA SEIJI
IPC分类号： H05H1/46 , B01J19/08 , H01J27/02 , H01J27/16 , H01J37/08 , H01L21/205 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a beam source and a beam treatment device capable of uniformly irradiating various beams like positive ion, negative ion, neutral particles or the like in a large diameter on a treated object and realizing charge-free and damage-free properties. SOLUTION: The device, provided with an antenna 2 generating plasma inside a plasma generating chamber, a first electrode 1 arranged inside the plasma generating chamber 4, and a potential difference generating means generating potential difference between the first electrode 1 and the antenna 2, draws out particle beams through the first electrode 1 from the plasma generated between the antenna 2 and the first electrode 1. COPYRIGHT: (C)2005,JPO&NCIPI

4. 发明专利

JP2004281229A Electrode for beam source and manufacturing method of electrode for beam source 审中-公开
公开(公告)号：JP2004281229A
公开(公告)日：2004-10-07
申请号：JP2003071070
申请日：2003-03-14
申请人： Ebara Corp , Univ Tohoku , 東北大学長 , 株式会社荏原製作所
发明人： SHIBATA AKIO , FUKUDA AKIRA , HIYAMA HIROKUNI , ICHIKI KATSUNORI , YAMAUCHI KAZUO , SAGAWA SEIJI
IPC分类号： H05H1/46 , B01J3/00 , B01J19/12 , C23C14/48 , H01J27/02 , H01J27/16 , H01J37/08 , H01L21/205
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of an electrode for beam source capable of manufacturing electrodes for large-diameter beam sources with a number of pores of a high aspect ratio formed at low cost and with ease. SOLUTION: A plurality of thin plates 60, 70 are joined with each other to form an electrode with pores communicating almost in parallel. Latitudinal thin plates 60 with notches 60a formed and longitudinal thin plates 70 with notches 70a formed are prepared. The latitudinal thin plates 60 are arrayed in parallel in a latitudinal direction and the longitudinal thin plates 70 are arrayed in parallel in a longitudinal direction. The notches 60a of the latitudinal thin plates 60 and the notches of the longitudinal thin plates 70 are insertion-coupled with each other to form the electrode with the lattice-shaped pores 40a. COPYRIGHT: (C)2005,JPO&NCIPI

5. 发明专利

JP2004281228A Beam source and beam treatment device equipped with beam source 审中-公开
公开(公告)号：JP2004281228A
公开(公告)日：2004-10-07
申请号：JP2003071069
申请日：2003-03-14
申请人： Ebara Corp , Univ Tohoku , 東北大学長 , 株式会社荏原製作所
发明人： SHIBATA AKIO , FUKUDA AKIRA , HIYAMA HIROKUNI , ICHIKI KATSUNORI , YAMAUCHI KAZUO , SAGAWA SEIJI
IPC分类号： H05H1/46 , B01J3/00 , B01J19/12 , C23C14/48 , H01J27/02 , H01J27/16 , H01J37/08 , H01L21/205 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a beam source with a low-cost structure capable of irradiating large-diameter beams on a treated object. SOLUTION: The device is provided with a plasma generating chamber 16, plasma generating parts 20, 22 generating plasma 24 inside the plasma generating chamber 16, a first electrode 40 arranged inside the plasma generating chamber 16, a second electrode 50 arranged in opposition to the first electrode inside the plasma generating chamber 16, and a voltage impression part 52 drawing out particles from the plasma 24 generated in the plasma generating chamber 16 by impressing voltage between the first electrode 40 and the second electrode 50. The first electrode 40 is divided into a plurality of partial electrodes with a number of pores formed. COPYRIGHT: (C)2005,JPO&NCIPI

6. 发明专利

JP2007263018A Micropump and rotor 审中-公开
标题翻译：麦克风和转子
公开(公告)号：JP2007263018A
公开(公告)日：2007-10-11
申请号：JP2006090361
申请日：2006-03-29
申请人： Ebara Corp , 株式会社荏原製作所
发明人： HIRATA KAZUYA , ICHIKI KATSUNORI , MOCHIZUKI NOBUHIRO , NOMI MOTOHIKO , HIYAMA HIROKUNI
IPC分类号： F04B43/12
摘要： PROBLEM TO BE SOLVED: To provide a micropump for feeding fluid of minute flow rate continuously without pulsation, constantly and stably. SOLUTION: The micropump 1 is provided with: an elastic tube 10 in which fluid is circulated; a tube support 20 supporting the elastic tube 10; a rotor 30 having a spiral projection part 32 formed thereon; and a motor 40 rotating the rotor 30. The rotor 30 is arranged along the elastic tube 10 supported by a tube supporter 20 and presses the elastic tube 30 at a plurality of pressing points along a longitudinal direction of the elastic tube 10. A motor 40 moves the plurality of pressing points along a longitudinal direction of the elastic tube 10. Intervals of pressing points adjoining along the longitudinal direction are changed along the longitudinal direction in at least a partial section of the longitudinal direction. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种连续稳定地连续输送微量流量的微型泵，无脉动。解决方案：微型泵1设置有：流体循环的弹性管10; 支撑弹性管10的管支撑件20; 具有形成在其上的螺旋突起部32的转子30; 以及旋转转子30的电动机40.转子30沿着由支撑体20支撑的弹性管10配置，并沿着弹性管10的长度方向的多个按压点按压弹性管30.电动机40 沿着弹性管10的长度方向移动多个按压点。沿着纵向方向相邻的按压点的间隔在纵向方向的至少一部分部分沿长度方向变化。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2007270720A Tube for liquid transfer and pump 审中-公开
标题翻译：用于液体转移和泵的管
公开(公告)号：JP2007270720A
公开(公告)日：2007-10-18
申请号：JP2006096998
申请日：2006-03-31
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NOMI MOTOHIKO , MOCHIZUKI NOBUHIRO , ICHIKI KATSUNORI , HIYAMA HIROKUNI , HIRATA KAZUYA
IPC分类号： F04B43/12
摘要： PROBLEM TO BE SOLVED: To provide a tube for liquid transfer having a high pressure resistance and deformable and recoverable easily. SOLUTION: This tube 10 comprises a metal hollow tube 11 made of a shape memory alloy and a solid elastic body 12 inserted into the metal hollow tube 11. A fluid flows in a ring-like space 13 formed between the solid elastic body 12 and the metal hollow tube 11. The solid elastic body 12 is easily deformed by an external force from the projecting part 32 of a rotary body 30, and recovered to its original shape when the external force is removed. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供具有高耐压性和容易变形和回收的用于液体转移的管。解决方案：该管10包括由形状记忆合金制成的金属中空管11和插入金属中空管11中的固体弹性体12.流体在形成在固体弹性体 12和金属中空管11.固体弹性体12容易由旋转体30的突出部32的外力而变形，并且在去除外力时恢复到原来的形状。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2007138786A Micro pump 审中-公开
标题翻译：微型泵
公开(公告)号：JP2007138786A
公开(公告)日：2007-06-07
申请号：JP2005332183
申请日：2005-11-16
申请人： Ebara Corp , 株式会社荏原製作所
发明人： HIRATA KAZUYA , ICHIKI KATSUNORI
IPC分类号： F04B43/12
摘要： PROBLEM TO BE SOLVED: To provide a micropump which can transfer fluid at a very small flow rate without pulsation continuously, constantly and stably. SOLUTION: The micropump 1 is provided with an elastic tube 10 in which the fluid passes, a tube support 20 to support the elastic tube 10, a rotation body 30 in which a projection 32 is formed, and a motor 40 to rotate the rotation body 30. The projection 32 presses the elastic tube 10 supported by the tube support 20 at a plurality of pressing points in the longitudinal direction of the elastic tube 10. The motor 40 moves the plurality of pressing points in the longitudinal direction of the elastic tube 10. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种可以连续，持续且稳定地以非常小的流速传送流体而不脉动的微型泵。解决方案：微型泵1设置有弹性管10，流体通过该弹性管10，用于支撑弹性管10的管支撑件20，形成有突起32的旋转体30和旋转体旋转体30.突起32在弹性管10的长度方向上的多个按压点处按压由管支撑体20支撑的弹性管10.马达40沿着弹性管10的长度方向移动多个按压点弹性管10.版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2006294483A Plasma processing device 审中-公开
标题翻译：等离子体加工装置
公开(公告)号：JP2006294483A
公开(公告)日：2006-10-26
申请号：JP2005115399
申请日：2005-04-13
申请人： Ebara Corp , 株式会社荏原製作所
发明人： ICHIKI KATSUNORI
IPC分类号： H05H1/46 , C23C16/507 , H01L21/205 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a plasma processing device capable of processing large-sized object to be processed like a board having a diameter of not less than 300 mm, capable of generating uniform plasma with low plasma potential and high density. SOLUTION: The plasma processing device is composed of a plasma generation chamber 1 hoising a substance to be processed, a flux path structural body 5 having at least a pair of end faces 5a, 5b facing each other, an antenna coil 11 wound around the flux path structural body 5, and a high frequency generation source supplying high frequency current to the antenna coil 11. The plasma generation chamber 1 is arranged between the end faces 5a, 5b. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种等离子体处理装置，其能够像具有不小于300mm的直径的板的加工大型物体加工，能够产生具有低等离子体电位和高密度的均匀等离子体。解决方案：等离子体处理装置由等离子体生成室1构成，该等离子体生成室1对待处理物质进行加热，通路结构体5具有彼此面对的至少一对端面5a，5b，缠绕的天线线圈11 围绕磁通路径结构体5，以及向天线线圈11提供高频电流的高频发生源。等离子体产生室1设置在端面5a，5b之间。版权所有（C）2007，JPO＆INPIT

10. 发明专利

JP2010276499A Microchip electrophoretic apparatus 审中-公开
标题翻译： MICROCHIP电子装置
公开(公告)号：JP2010276499A
公开(公告)日：2010-12-09
申请号：JP2009129927
申请日：2009-05-29
申请人： Ebara Corp , 株式会社荏原製作所
发明人： ICHIKI KATSUNORI , MORITA TOMOYUKI , MIYA AKIKO
IPC分类号： G01N27/447 , G01N37/00
摘要： PROBLEM TO BE SOLVED: To provide an apparatus capable of performing analysis having high reproducibility by a simple operation, concerning a microchip electrophoretic apparatus for separating double-stranded DNA according to a difference of a base sequence. SOLUTION: This apparatus uses a microchip 9 having a concentration gradient domain channel 27 on which a concentration gradient of a nucleic acid modifier is formed, a plurality of reservoirs 10 and a channel 26 for supplying two buffer solutions including a modifier on the upstream side in each different concentration, and a sample introduction part 28 for introducing a double-stranded nucleic acid sample on the downstream side. In the microchip 9, a high-voltage introduction terminal for applying a voltage to the buffer solution in the reservoir 10 is arranged. A packing for holding a solution on the position of the reservoir 10 is stored by an upper plate and a lower plate having a hole penetrating vertically. The apparatus has a structure wherein the high-voltage introduction terminal and a temperature control mechanism are integrated, and the temperature control mechanism has a contact with a part whose temperature is to be adjusted by using a plate spring, and the high-voltage introduction terminal is arranged in the packing. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：解决的问题：提供一种能够通过简单的操作进行具有高再现性的分析的装置，涉及根据碱基序列的差异分离双链DNA的微芯片电泳装置。解决方案：该装置使用具有浓度梯度域通道27的微芯片9，其上形成有核酸改性剂的浓度梯度，多个储存器10和通道26，用于将包含改性剂的两种缓冲溶液上游侧，以及用于在下游侧引入双链核酸样品的样品导入部28。在微芯片9中，设置有用于向储存器10中的缓冲溶液施加电压的高压引入端子。用于将溶液保持在储存器10的位置的填料通过具有垂直穿透的孔的上板和下板储存。该装置具有将高压引入端子和温度控制机构一体化的结构，并且温度控制机构通过使用板簧与要调节温度的部分接触，并且高压引入端子排列在包装中。版权所有（C）2011，JPO＆INPIT

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