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1. 发明专利

JP2010123929A Extreme ultraviolet light source apparatus 审中-公开
标题翻译：极光超光源光源装置
公开(公告)号：JP2010123929A
公开(公告)日：2010-06-03
申请号：JP2009242869
申请日：2009-10-21
申请人： Ebara Corp , Gigaphoton Inc , Topcon Corp , ギガフォトン株式会社 , 株式会社トプコン , 株式会社荏原製作所
发明人： NAGAI SHINJI , ISHIHARA TAKANOBU , KAKIZAKI KOJI , SOFUGAWA TAKUJI , MURAKAMI TAKESHI , INOUE MASAHIRO
IPC分类号： H01L21/027
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , H05G2/005
摘要： PROBLEM TO BE SOLVED: To provide an extreme ultraviolet light source apparatus that can collect debris influencing an optical element etc., in a chamber with simple constitution and obtain an EUV optical output having desired intensity.
SOLUTION: The extreme ultraviolet light source apparatus comprises: target supply units (a molten Sn tank 5 and a nozzle 6) supplying droplets 7 as a target into a vacuum chamber 1; an EUV light collector mirror Lb outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light Lb emitted from the droplets 7 being ionized as a plasma by irradiation with CO2 laser light La at a plasma luminescence point P1 in the vacuum chamber 1; and an ion debris removal unit 10 at least a portion of which is located in an obscuration region E including the plasma luminescence point P1.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在具有简单结构的室中收集影响光学元件等的碎片的极紫外光源装置，并获得具有期望强度的EUV光输出。解决方案：极紫外光源装置包括：向真空室1供给作为目标的液滴7的目标供给单元（熔融Sn罐5和喷嘴6）通过在真空室1中的等离子体发光点P1处通过用CO 2激光La照射，通过反射从液滴7发射的远紫外光Lb作为等离子体离子化而输出极紫外光的EUV聚光镜Lb; 以及离子碎片去除单元10，其至少一部分位于包括等离子体发光点P1的遮蔽区域E中。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2004136229A Waste water disinfectant supply control center and waste water disinfectant supply control system equipped with the same 有权
标题翻译：废水消毒剂供应控制中心和废水消毒剂供应控制系统
公开(公告)号：JP2004136229A
公开(公告)日：2004-05-13
申请号：JP2002304500
申请日：2002-10-18
申请人： Ebara Corp , 株式会社荏原製作所
发明人： AYUKAWA MASAO , MAKITA NORIO , HASEGAWA KAZUHIRO , ASAI YOSHIAKI , NAGAI SHINJI
IPC分类号： C02F1/00 , C02F1/50 , G06Q50/00 , G06Q50/26 , G06F17/60
摘要： PROBLEM TO BE SOLVED: To efficiently carry out drug supply to facilities for controlling sewage overflow water. SOLUTION: A control server 41 for controlling the drug supply to a waste water treatment device of the facilities for controlling the sewage overflow water through a network comprises a facility information storage means 411 for storing facility information of each waste water treatment facility, a drug factory information storage means 412 for storing factory information of a drug factory to supply disinfectant and drug inventory information, and a first program module (PM) 430 to determine whether or not to supply drug to the respective facilities for controlling the sewage overflow water based on operation information of each waste water disinfection device. Further, the first PM comprises a drug supply processing PM 420 to be activated when drug supply to a waste water treatment device is determined, and the PM 420 makes reference to the facility infomation on the waste water treatment device of the facility information storage means 411 and the factory information and the drug inventory information of the drug factory information storage means 412, sets the most adequate drug factory to supply the drug to the waste water treatment facility, and sends automatically a supply command including a drug supply time and a supply amount of the drug to the drug factory. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：为控制污水溢流水的设施高效地进行药品供应。解决方案：用于控制通过网络控制污水溢流水的设施的废水处理装置的药物供给的控制服务器41包括用于存储每个废水处理设备的设施信息的设施信息存储装置411，药品厂信息存储装置412，用于存储药厂提供消毒剂和药物清单信息的工厂信息;以及第一程序模块（PM）430，用于确定是否向各个设施供应药物以控制污水溢流水基于每个废水消毒装置的操作信息。此外，第一PM包括在确定向废水处理装置的药物供应时被激活的药物供给处理PM 420，并且PM 420参考设施信息存储装置411的废水处理装置的设施信息以及药厂信息存储装置412的工厂信息和药品清单信息，设定最合适的药厂向废水处理设备供给药物，并自动发送包含药物供给时间和供给量的供给指令的药物到毒品厂。版权所有（C）2004，JPO

3. 发明专利

JP2004013515A Good-quality water selling system 审中-公开
公开(公告)号：JP2004013515A
公开(公告)日：2004-01-15
申请号：JP2002165949
申请日：2002-06-06
申请人： Ebara Corp , 株式会社荏原製作所
发明人： KUSAKABE YASUKI , MATSUNOBU NORIYUKI , TOSHIMITSU MANABU , ASAI YOSHIAKI , NAGAI SHINJI
IPC分类号： G06Q10/00 , G06Q30/06 , G06Q50/00 , G06F17/60
CPC分类号： Y02A20/16
摘要： PROBLEM TO BE SOLVED: To provide a good quality water selling system for safely and inexpensively selling only required quantity of good-quality water. SOLUTION: In this good quality water selling system for selling good quality water of quantity corresponding to orders from users 4 1 to 4 n and 5 1 to 5 n , a selling business unit 2 is provided with a computer having a first storage means for storing good quality water information such as the water quality of good quality water to be supplied for selling and water quality in a water intake place, a reading means connected to the first storage means for allowing a user to read the good quality water information on a web page, and a second storage means for storing order information related with purchase desires from the user. The good quality water is delivered to the user who wants to purchase it based on the order information, and the user who has had the good quality water delivered executes predetermined price settlement. COPYRIGHT: (C)2004,JPO

4. 发明专利

JP2003306959A Raw water supply acceleration system 审中-公开
标题翻译：原水供应加速系统
公开(公告)号：JP2003306959A
公开(公告)日：2003-10-31
申请号：JP2002114194
申请日：2002-04-17
申请人： Ebara Corp , 株式会社荏原製作所
发明人： KUSAKABE YASUKI , MATSUNOBU NORIYUKI , HONCHI YOSHINORI , TOSHIMITSU MANABU , ASAI YOSHIAKI , NAGAI SHINJI
IPC分类号： E03B1/00 , G06Q30/02 , G06Q30/06 , G06Q50/00 , G06Q50/06 , G06F17/60
CPC分类号： Y02A20/22
摘要： PROBLEM TO BE SOLVED: To provide a raw water supply acceleration system capable of supplying raw water with a necessary quality by a necessary volume to water users on the basis of a supply contract, while retaining water rights and ensuring smooth and stable raw water supply over a wide district. SOLUTION: A system for accelerating raw water supply among water right holders mutually contracted in pipes 9-14 contains at least one regional management computer 8 accumulating raw water sales information from applicants to be supplied among raw water users and raw water purchase information from raw water receiving applicants and a central computer 16 connected to the respective regional management computers 8. The central computer 16 is provided with a storage means for accumulating data for a web page on which the raw water sales information up-loaded from the regional management computer 8 and the raw water purchase information are published. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种原水供应加速系统，能够在供水合同的基础上向用水者提供必要量的必需品质的原水，同时保持水权，确保平稳稳定的原料广域供水。解决方案：在管道9-14中相互承包的水权人之间加速原水供应的系统至少包含一个区域管理计算机8，累积来自原水用户和原水采购信息之间供应的申请人的原水销售信息来自原水接收申请人和连接到各个区域管理计算机8的中央计算机16.中央计算机16设置有用于累积用于从区域管理器加载的原水销售信息的网页的数据的存储装置计算机8和原水采购信息。版权所有（C）2004，JPO

5. 发明专利

JP2003085394A Water supply system and water supply method between water supply business units 审中-公开
标题翻译：供水系统和供水系统之间的供水方式
公开(公告)号：JP2003085394A
公开(公告)日：2003-03-20
申请号：JP2001270667
申请日：2001-09-06
申请人： Ebara Corp , 株式会社荏原製作所
发明人： KUSAKABE YASUKI , MATSUNOBU NORIYUKI , NAGAI SHINJI , ASAI YOSHIAKI
IPC分类号： E03B1/00 , G06Q30/06 , G06Q50/00 , G06Q50/06 , G06F17/60
CPC分类号： Y02A20/22
摘要： PROBLEM TO BE SOLVED: To provide a water supply system connecting a plurality of water supply business units and optimizing supply of service water.
SOLUTION: In the water supply system for trading service water between the plurality of water supply business units A-H, pipelines of required business units of the water supply business units A-H are mutually connected by connecting pipes 3ab-3gh, and flow controllers 2ab-2gh are provided in a midway part of each connecting pipe. Each water supply business unit A-H is communicably connected with a management center CC via a communication network CN. The management center CC mediates trade between a water supply business units desiring purchase of service water and a selling water supply business unit.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供连接多个供水业务单元的供水系统并优化供水服务。解决方案：在多个供水业务单元AH之间的供水系统中，供水业务单元AH的所需业务单元的管道通过连接管3ab-3gh相互连接，流量控制器2ab-2gh 设置在每个连接管的中间部分。每个供水业务单元A-H经由通信网络CN与管理中心CC可通信地连接。管理中心CC协调希望购买服务用水的供水业务单位和卖水供应业务部门之间的贸易。

6. 发明专利

JP2003271790A Work information management system for physically handicapped person 审中-公开
标题翻译：物理操作人员的工作信息管理系统
公开(公告)号：JP2003271790A
公开(公告)日：2003-09-26
申请号：JP2002072380
申请日：2002-03-15
申请人： Ebara Corp , 株式会社荏原製作所
发明人： KASAMA NOBUKATSU , ASAI KIYOSHI , TOSHIMITSU MANABU , ASAI YOSHIAKI , NAGAI SHINJI
IPC分类号： B09B3/00 , B09B5/00 , G06Q10/00 , G06Q10/06 , G06Q10/10 , G06Q50/00 , G06Q50/10 , G06Q50/22 , G06F17/60
摘要： PROBLEM TO BE SOLVED: To secure facilities which use heat energy obtained when organic discharges are gasified as a workplace for physically handicapped persons and to enable a physically handicapped person to work commensurating to the degrees of disorders. SOLUTION: A greenhouse cultivation center 20 communicates operation schedule data regarding greenhouse cultivation using the heat energy obtained by a gasification furnace system 30 to a physically handicapped person work information management center 10. The center 10 relates respective operations in the operation schedule data to the kinds and degree of disorders which enables the physically handicapped person to carry out the works, prepares a dispatch schedule to the greenhouse cultivation center 20 for physically handicapped persons by referencing personal information and work history information in a physically handicapped person database, and gives notice to a physically handicapped person care center 40 and a physically handicapped person 50. When the physically handicapped person requests corrections, an operator is assisted in generating a final dispatch schedule. Consequently, organic discharges are recycled as heat energy and effectively used and the workplace for physically handicapped persons is secured. COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：确保当有机排放气体化为身体残疾人的工作场所时获得的使用热能的设施，并使残疾人能够与障碍程度相称。解决方案：温室栽培中心20使用由气化炉系统30获得的热量向身体残疾人工作信息管理中心10传送关于温室栽培的操作进度数据。中心10将操作进度数据中的各个操作通过将身体残疾人的个人数据库中的个人信息和工作历史信息引用到身体残疾人的温室栽培中心20，为残疾人进行工作的种类和程度提供了准备，并给予通知身体残疾人护理中心40和身体残疾人50.当身体残疾人要求更正时，协助运营人生成最终派遣时间表。因此，有机排放物作为热能循环利用并被有效利用，残疾人的工作场所得到保障。版权所有（C）2003，JPO

7. 发明专利

JP2013128156A Gas discharge chamber 有权
标题翻译：气体放电室
公开(公告)号：JP2013128156A
公开(公告)日：2013-06-27
申请号：JP2013068221
申请日：2013-03-28
申请人： Gigaphoton Inc , ギガフォトン株式会社
发明人： NAGAI SHINJI , YOSHIDA FUMIKA , WAKABAYASHI OSAMU , KAKIZAKI KOJI
IPC分类号： H01S3/034
CPC分类号： H01S3/034 , G02B1/02 , G02B5/3091 , H01S3/0346 , H01S3/08054 , H01S3/0816 , H01S3/225 , H01S3/2251
摘要： PROBLEM TO BE SOLVED: To provide a gas discharge chamber using a calcium fluoride crystal for reducing phenomena of its breakage due to mechanical stress (a window holder and a laser gas pressure) and thermal stress generated by the absorption of the light or the like, and for enhancing linear polarization purity of the output laser while suppressing the deterioration by irradiation of strong ultraviolet laser beam (in particular ArF).SOLUTION: In a first window (2) and a second window (3) of a gas discharge chamber, an incident flat plane and an emitting flat plane are parallel to (111) crystal face of calcium fluoride crystal, the laser beam incident in the calcium fluoride crystal passes through a plane having axis and axis of each of the first window (2) and the second window (3) when viewed from the inside of the chamber (1), and the first window (2) and the second window (3) are installed in a state of being rotated by the same angle around the axis.
摘要翻译：要解决的问题：提供一种使用氟化钙晶体的气体放电室，用于减少由于机械应力（窗口保持器和激光气体压力）而导致的破损现象和由于吸收光而产生的热应力并且为了提高输出激光器的线偏振纯度，同时通过强紫外激光束（特别是ArF）的照射来抑制劣化。解决方案：在气体放电室的第一窗口（2）和第二窗口（3）中，入射平面和发射平面平行于氟化钙晶体的（111）晶面，激光束当从室（1）的内部观察时，氟化钙晶体中的入射通过第一窗口（2）和第二窗口（3）各自具有<111>轴和<001轴的平面，并且第一窗口（2）和第二窗口（3）以围绕<111>轴旋转相同角度的状态安装。版权所有（C）2013，JPO＆INPIT

8. 发明专利

JP2012169580A Extreme-ultraviolet light generating apparatus 有权
标题翻译：极光紫外线发光装置
公开(公告)号：JP2012169580A
公开(公告)日：2012-09-06
申请号：JP2011049687
申请日：2011-03-07
申请人： Gigaphoton Inc , ギガフォトン株式会社
发明人： NAGAI SHINJI , ABE TAMOTSU , NAGANO HITOSHI , WAKABAYASHI OSAMU
IPC分类号： H01L21/027 , H05G2/00
CPC分类号： G03F7/70033 , G03F7/70891 , G03F7/70916 , G03F7/70925 , G21K1/06 , G21K2201/064 , G21K2201/067 , H05G2/005 , H05G2/008
摘要： PROBLEM TO BE SOLVED: To prevent performance deterioration of optical elements arranged in a chamber.SOLUTION: An extreme-ultraviolet light generating apparatus is used together with a laser apparatus, and is connected to supply extreme-ultraviolet light to an external apparatus. The extreme-ultraviolet light generating apparatus may include: a chamber having at least one incident port for allowing laser light to enter the interior; a target supply section disposed in the chamber and supplying a target material to a predetermined region in the chamber; an etching gas loading section disposed in the chamber and allowing passage of etching gas loaded for etching debris of the target material which is released when the target material is irradiated with the laser light in the chamber and is attached to the at least one optical element; an exhaust pump connected to the chamber; at least one optical element arranged in the chamber; and at least one temperature adjustment mechanism for controlling the temperature of the at least one optical element.
摘要翻译：要解决的问题：为了防止布置在室中的光学元件的性能劣化。解决方案：一种极光紫外光发生装置与激光装置一起使用，并被连接以向外部装置提供极紫外光。所述极紫外光发生装置可以包括：具有用于允许激光进入内部的至少一个入射端口的腔室; 设置在所述室中并将目标材料供给到所述室中的预定区域的目标供给部; 设置在所述室中的蚀刻气体负载部分，并且允许用于蚀刻所述目标材料的碎屑的蚀刻气体通过，所述目标材料的碎屑在所述室中的所述激光照射并被附着到所述至少一个光学元件时被释放; 连接到所述室的排气泵; 布置在所述腔室中的至少一个光学元件; 以及用于控制至少一个光学元件的温度的至少一个温度调节机构。版权所有（C）2012，JPO＆INPIT

9. 发明专利

JP2011023712A Euv light source device 审中-公开
标题翻译： EUV光源设备
公开(公告)号：JP2011023712A
公开(公告)日：2011-02-03
申请号：JP2010138303
申请日：2010-06-17
申请人： Gigaphoton Inc , Komatsu Ltd , ギガフォトン株式会社 , 株式会社小松製作所
发明人： KAKIZAKI KOJI , NAGAI SHINJI , YANAGIDA TATSUYA
IPC分类号： H01L21/027 , H05G2/00
CPC分类号： G21K5/00 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
摘要： PROBLEM TO BE SOLVED: To provide a cleaning method for removing debris adhering to an optical element in a chamber.
SOLUTION: An extreme ultraviolet (EUV) light source device for generating ultraviolet light from plasma generated by irradiating a target substance with laser light includes a chamber in which extreme ultraviolet light is generated, an electromagnetic field generating unit for generating an electric field or a magnetic field in the chamber, and a cleaning unit for electrifying debris adhered to the optical element in the chamber, before debris separation them from the optical element or for separating the debris from the optical element after debris electrification.
COPYRIGHT: (C)2011,JPO&INPIT

10. 发明专利

JP2009081363A Optical element for gas laser, and gas laser device using same 有权
标题翻译：用于气体激光的光学元件和使用该激光器的气体激光器件
公开(公告)号：JP2009081363A
公开(公告)日：2009-04-16
申请号：JP2007250865
申请日：2007-09-27
申请人： Gigaphoton Inc , ギガフォトン株式会社
发明人： WAKABAYASHI OSAMU , NAGAI SHINJI , NOTOMI RYOICHI
IPC分类号： H01S3/034 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an optical element for gas laser using a CaF 2 crystal such that latent damage is reduced by cutting the CaF 2 crystal on the hardest crystal plane (111) and polishing the crystal surface to small surface roughness with high precision to prevent surface damage of the CaF 2 crystal due to laser irradiation and deterioration in polarization purity due to intrinsic birefringence is prevented by making a Fresnel reflection factor to P polarized light small, and to provide a gas laser device using the same. SOLUTION: At least one of an incident plane and a projection plane is parallel to the (111) crystal plane of the CaF 2 crystal, and laser light which is incident from the incident plane passes between a [111] axis and a [001] axis in a plane containing the [111] axis and [001] axis, between the [111] axis and [010] axis in a plane containing the [111] axis and [010] axis, or between the [111] axis and [100] axis in a plane containing the [111] axis and [100] axis to be projected from the projection plane. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供使用CaF 2 SBS晶体的气体激光器的光学元件，以便通过最难切割CaF 2 SBB结晶来降低潜在损伤晶体平面（111），并且以高精度将晶体表面抛光到较小的表面粗糙度，以防止由于激光照射导致的CaF 2 晶体的表面损伤，由于通过制造固有双折射防止了极化纯度的劣化对P偏振光的菲涅耳反射因子小，并提供使用该偏振光的气体激光装置。解决方案：入射平面和投影平面中的至少一个平行于CaF 2 SB晶体的（111）晶面，并且入射平面入射的激光在在包含[111]轴的平面和[010]轴的[111]轴和[010]轴之间，包含[111]轴和[001]轴的平面中的[111]轴和[001] 轴，或者在包含[111]轴和[100]轴的平面中的[111]轴和[100]轴之间从投影平面投影。版权所有（C）2009，JPO＆INPIT

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