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1. 发明专利

JP2010242135A Hard-film-coated member and production method therefor 有权
标题翻译：硬膜组件及其生产方法
公开(公告)号：JP2010242135A
公开(公告)日：2010-10-28
申请号：JP2009089833
申请日：2009-04-02
申请人： Dowa Thermotech Kk , Dowaサーモテック株式会社
发明人： SHIMIZU YUICHIRO , KITAMURA MASAHIRO , TOISHI MITSUTERU , WATANABE NAOKO
IPC分类号： C23C14/34 , C23C14/06
摘要： PROBLEM TO BE SOLVED: To provide a hard-film-coated member which is coated with a hard film having superior adhesiveness to a substrate and high hardness, while keeping the desired hardness, and to provide a production method therefor.
SOLUTION: The method for producing the hard-film-coated member includes forming a chromium film as an underlayer 2 on a substrate 1, and forming a plurality of chromium films 3 and a plurality of nitrogen-containing chromium films 4 so that the chromium film 3 and the nitrogen-containing chromium film 4 are alternately arranged on the underlayer 2 respectively as a stress relaxation layer and as a hard layer, wherein the chromium film 3 and the nitrogen-containing chromium film 4 are alternately formed by sputtering at a bias voltage of -70 to -30 V and preferably -50 to -30 V so that the chromium film 3 has an approximately even thickness of 10-50 nm and preferably 20-40 nm, and the nitrogen-containing chromium film 4 has an approximately even thickness of 10-50 nm and preferably 20-40 nm.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种涂覆有与基材具有优异粘合性的硬膜并具有高硬度同时保持所需硬度的硬膜涂覆部件，并提供其制备方法。解决方案：制造该涂膜部件的方法包括在基板1上形成作为底层2的铬膜，并且形成多个铬膜3和多个含氮铬膜4，使得铬膜3和含氮铬膜4分别作为应力松弛层和硬质层交替配置在底层2上，其中铬膜3和含氮铬膜4通过溅射交替形成偏置电压为-70〜-30V，优选为-50〜-30V，使得铬膜3具有大致均匀的厚度10-50nm，优选为20-40nm，含氮铬膜4具有大约均匀的厚度为10-50nm，优选为20-40nm。版权所有（C）2011，JPO＆INPIT

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