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1. 发明专利

JP2010242135A Hard-film-coated member and production method therefor 有权
标题翻译：硬膜组件及其生产方法
公开(公告)号：JP2010242135A
公开(公告)日：2010-10-28
申请号：JP2009089833
申请日：2009-04-02
申请人： Dowa Thermotech Kk , Dowaサーモテック株式会社
发明人： SHIMIZU YUICHIRO , KITAMURA MASAHIRO , TOISHI MITSUTERU , WATANABE NAOKO
IPC分类号： C23C14/34 , C23C14/06
摘要： PROBLEM TO BE SOLVED: To provide a hard-film-coated member which is coated with a hard film having superior adhesiveness to a substrate and high hardness, while keeping the desired hardness, and to provide a production method therefor.
SOLUTION: The method for producing the hard-film-coated member includes forming a chromium film as an underlayer 2 on a substrate 1, and forming a plurality of chromium films 3 and a plurality of nitrogen-containing chromium films 4 so that the chromium film 3 and the nitrogen-containing chromium film 4 are alternately arranged on the underlayer 2 respectively as a stress relaxation layer and as a hard layer, wherein the chromium film 3 and the nitrogen-containing chromium film 4 are alternately formed by sputtering at a bias voltage of -70 to -30 V and preferably -50 to -30 V so that the chromium film 3 has an approximately even thickness of 10-50 nm and preferably 20-40 nm, and the nitrogen-containing chromium film 4 has an approximately even thickness of 10-50 nm and preferably 20-40 nm.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种涂覆有与基材具有优异粘合性的硬膜并具有高硬度同时保持所需硬度的硬膜涂覆部件，并提供其制备方法。解决方案：制造该涂膜部件的方法包括在基板1上形成作为底层2的铬膜，并且形成多个铬膜3和多个含氮铬膜4，使得铬膜3和含氮铬膜4分别作为应力松弛层和硬质层交替配置在底层2上，其中铬膜3和含氮铬膜4通过溅射交替形成偏置电压为-70〜-30V，优选为-50〜-30V，使得铬膜3具有大致均匀的厚度10-50nm，优选为20-40nm，含氮铬膜4具有大约均匀的厚度为10-50nm，优选为20-40nm。版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2010229463A Member coated with hard film and method for manufacturing the same 有权
标题翻译：用硬膜包覆的构件及其制造方法
公开(公告)号：JP2010229463A
公开(公告)日：2010-10-14
申请号：JP2009076932
申请日：2009-03-26
申请人： Dowa Thermotech Kk , Dowaサーモテック株式会社
发明人： SHIMIZU YUICHIRO , TOISHI MITSUTERU
IPC分类号： C23C14/06 , C23C8/12 , C23C26/00 , C23C28/04
摘要： PROBLEM TO BE SOLVED: To provide a member coated with a hard film having not only excellent mechanical strength such as wear resistance and adhesion but also excellent chemical stability such as high temperature oxidation resistance, alkali resistance and releasability and to solve the problem that a method for manufacturing the member coated with the hard film capable of forming the hard film at low costs is not conventionally obtained. SOLUTION: In the member coated with the hard film and the method for manufacturing the same, a nitrogen-containing chromium film is formed on a substrate and then the nitrogen-containing chromium film is oxidized to form a chromium oxidized film on the nitrogen-containing chromium film. Before the nitrogen-containing chromium film is formed on the substrate, a chromium film is formed as an underlayer on the substrate. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了提供涂覆有不仅具有优异的机械强度如耐磨性和粘合性的硬膜的构件，而且还具有优异的化学稳定性，例如耐高温氧化性，耐碱性和脱模性，并且解决问题通常不能获得用于制造涂覆有能够以低成本形成硬膜的硬膜的构件的方法。解决方案：在涂覆有硬膜的构件及其制造方法中，在基板上形成含氮铬膜，然后将含氮铬膜氧化形成铬氧化膜含氮铬膜。在基板上形成含氮铬膜之前，在基板上形成作为底层的铬膜。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2010084193A Member coated with hard film and method for manufacturing the same 有权
标题翻译：用硬膜包覆的构件及其制造方法
公开(公告)号：JP2010084193A
公开(公告)日：2010-04-15
申请号：JP2008254515
申请日：2008-09-30
申请人： Dowa Thermotech Kk , Dowaサーモテック株式会社
发明人： SHIMIZU YUICHIRO , KITAMURA MASAHIRO , TOISHI MITSUTERU
IPC分类号： C23C14/06 , B21D37/01 , C23C14/14 , C23C14/16 , C23C14/34 , C23C28/00
摘要： PROBLEM TO BE SOLVED: To provide a member coated with a hard film which has adequate wear resistance and seizure resistance, is also superior in adhesiveness to a substrate and durability, and has high hardness, and to provide a method for manufacturing the same. SOLUTION: The coated member has a chromium film functioning as an underlayer 2 formed on the substrate 1, and has a plurality of chromium films and a plurality of nitrogen-containing chromium films formed on the underlayer 2 so that the chromium films functioning as stress relaxation layers 3 and the nitrogen-containing chromium films functioning as hard layers 4 have an approximately same thickness of 200 nm or less and are alternately arranged. The underlayer 2, the stress relaxation layer 3 and the hard layer 4 are continuously formed in a treatment chamber of an apparatus which sputters a chromium target therein. When the underlayer 2 and the stress relaxation layer 3 are formed, the treatment chamber is set at argon gas atmosphere, and when the hard layer 4 is formed, the treatment chamber is set at an atmosphere containing argon gas and nitrogen gas. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有足够的耐磨性和耐咬合性的涂覆有硬膜的构件，与基材的粘附性和耐久性也优异，并且具有高硬度，并且提供一种制造方法相同。解决方案：涂层构件具有用作形成在基底1上的下层2的铬膜，并且在底层2上形成多个铬膜和多个含氮铬膜，使得铬膜起作用作为应力松弛层3，作为硬质层4起作用的含氮铬膜的厚度大致相同，为200nm以下，交替配置。底层2，应力松弛层3和硬质层4连续地形成在其中喷射铬靶的装置的处理室中。当形成底层2和应力松弛层3时，将处理室设置在氩气气氛下，当形成硬质层4时，将处理室设置在含有氩气和氮气的气氛中。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2014012896A Hard film covering member 有权
标题翻译：硬膜覆盖件
公开(公告)号：JP2014012896A
公开(公告)日：2014-01-23
申请号：JP2013168432
申请日：2013-08-14
申请人： Dowa Thermotech Kk , Dowaサーモテック株式会社
发明人： SHIMIZU YUICHIRO , TOISHI MITSUTERU
IPC分类号： C23C14/08 , B29C33/38 , C23C14/58
摘要： PROBLEM TO BE SOLVED: To provide a hard film covering member having not only excellent mechanical strength such as wear resistance and adhesiveness, but also excellent chemical stability such as resistance to oxidation at high temperatures, alkali resistance, and releasability.SOLUTION: A hard film covering member comprises: a substrate; and a nitrogen containing chrome film with thickness of 1-30 μm, and a chromium oxide film with thickness of 0.1-3 μm, which are formed on the substrate in this order.
摘要翻译：要解决的问题：提供一种不仅具有优异的机械强度如耐磨性和粘合性，而且还具有优异的化学稳定性（例如耐高温氧化，耐碱性和脱模性）的硬膜覆盖件。解决方案：硬膜覆盖部件包括：基板; 和厚度为1-30μm的含氮铬膜和厚度为0.1-3μm的氧化铬膜，依次形成在基板上。

5. 发明专利

JP2010084202A Member coated with hard film and method for manufacturing the same 有权
标题翻译：用硬膜包覆的构件及其制造方法
公开(公告)号：JP2010084202A
公开(公告)日：2010-04-15
申请号：JP2008255045
申请日：2008-09-30
申请人： Dowa Thermotech Kk , Dowaサーモテック株式会社
发明人： SHIMIZU YUICHIRO , KITAMURA MASAHIRO , TOISHI MITSUTERU
IPC分类号： C23C14/06 , B21D37/01 , C23C14/14 , C23C14/16 , C23C14/34
摘要： PROBLEM TO BE SOLVED: To provide a member coated with a hard film which has adequate wear resistance and seizure resistance, is also superior in adhesiveness to a substrate and durability, and has high hardness, and to provide a method for manufacturing the same.
SOLUTION: The member has a chromium film functioning as an underlayer 2 formed on the substrate 1, has a plurality of chromium films and a plurality of nitrogen-containing chromium films formed on the underlayer 2 so that the chromium films functioning as stress relaxation layers 3 having an approximately same thickness of 40 nm or more and the nitrogen-containing chromium films functioning as hard layers 4 having an approximately same thickness of 250 nm or less are alternately arranged. The underlayer 2, the stress relaxation layer 3 and the hard layer 4 are continuously formed in a treatment chamber of an apparatus which sputters a chromium target therein. When the underlayer 2 and the stress relaxation layer 3 are formed, the treatment chamber is set at argon gas atmosphere, and when the hard layer 4 is formed, the treatment chamber is set at an atmosphere containing argon gas and nitrogen gas.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有足够的耐磨性和耐咬合性的涂覆有硬膜的构件，与基材的粘合性和耐久性也优异，并且具有高硬度，并且提供制造方法相同。解决方案：该构件具有用作形成在基板1上的下层2的铬膜，在底层2上形成有多个铬膜和多个含氮铬膜，使得铬膜用作应力具有大致相同厚度的40nm以上的松弛层3和具有大致相同厚度为250nm以下的作为硬质层4的含氮铬膜交替排列。底层2，应力松弛层3和硬质层4连续地形成在其中喷射铬靶的装置的处理室中。当形成底层2和应力松弛层3时，将处理室设置在氩气气氛下，当形成硬质层4时，将处理室设置在含有氩气和氮气的气氛中。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2010084197A Member coated with hard film and method for manufacturing the same 有权
标题翻译：用硬膜包覆的构件及其制造方法
公开(公告)号：JP2010084197A
公开(公告)日：2010-04-15
申请号：JP2008254788
申请日：2008-09-30
申请人： Dowa Thermotech Kk , Dowaサーモテック株式会社
发明人： SHIMIZU YUICHIRO , KITAMURA MASAHIRO , TOISHI MITSUTERU
IPC分类号： C23C14/06 , B21D37/01 , C23C14/14 , C23C14/16 , C23C14/34 , C23C28/00
摘要： PROBLEM TO BE SOLVED: To provide a member coated with a hard film which has adequate wear resistance and seizure resistance, is also superior in adhesiveness to a substrate and durability, and has high hardness, and to provide a method for manufacturing the same. SOLUTION: The coated member has a plurality of chromium films and a plurality of nitrogen-containing chromium films formed on the substrate 1 so that the chromium films functioning as stress relaxation layers 3 having an approximately same thickness and the nitrogen-containing chromium films functioning as hard layers 4 having an approximately same thickness are alternately arranged. The thickness of each of the plurality of the nitrogen-containing chromium films is 200 nm or less, and is 1.2-5 times of the thickness of each of the plurality of the chromium films. The stress relaxation layer 3 and the hard layer 4 are continuously formed in a treatment chamber of an apparatus which sputters a chromium target therein. When the stress relaxation layer 3 is formed, the treatment chamber is set at argon gas atmosphere, and when the hard layer 4 is formed, the treatment chamber is set at an atmosphere containing argon gas and nitrogen gas. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有足够的耐磨性和耐咬合性的涂覆有硬膜的构件，与基材的粘合性和耐久性也优异，并且具有高硬度，并且提供制造方法相同。解决方案：涂覆部件具有多个铬膜和在基板1上形成的多个含氮铬膜，使得用作具有大致相同厚度的应力松弛层3的铬膜和含氮铬作为具有大致相同厚度的硬质层4的薄膜交替布置。多个含氮铬膜的厚度为200nm以下，为多个铬膜的厚度的1.2〜5倍。应力松弛层3和硬质层4连续地形成在其中溅射铬靶的设备的处理室中。当形成应力松弛层3时，处理室设定在氩气气氛下，当形成硬质层4时，将处理室设置在含有氩气和氮气的气氛中。版权所有（C）2010，JPO＆INPIT

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