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1. 发明专利

JP2008034869A Substrate processing apparatus 有权
标题翻译：基板加工设备
公开(公告)号：JP2008034869A
公开(公告)日：2008-02-14
申请号：JP2007254638
申请日：2007-09-28
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： MORITA AKIHIKO , OTANI MASAMI , IMANISHI YASUO , TSUJI MASAO , IWAMI MASAKI , NISHIMURA JOICHI
IPC分类号： H01L21/027 , H01L21/677
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which predetermined different processing is sufficiently prevented from being suffered by the atmosphere of other processings.
SOLUTION: The substrate processing apparatus has two processing spaces A, B segmented by a partition 200 extending in a perpendicular direction. Each of the processing spaces A, B includes a plurality of hierarchical levels. A plurality of processing units for executing pre-exposure processing are disposed in the processing space A. A plurality of processing units for executing post-exposure processing are disposed in the processing space B. A conveying unit 11 is disposed in the processing unit A, and a conveying unit 21 is disposed in the processing space B. A delivering chamber SH is disposed over the processing spaces A and B. A delivering unit 31 delivering a substrate is provided in the delivering chamber SH between the chamber SH and the conveying unit 11 of the processing space A, and between the chamber SH and the conveying unit 21 of the processing chamber B.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种基板处理装置，其中充分防止预定的不同处理被其它处理的气氛所困扰。解决方案：基板处理装置具有由沿垂直方向延伸的分隔件200分割的两个处理空间A，B。处理空间A，B中的每一个都包括多个层级。用于执行预曝光处理的多个处理单元设置在处理空间A中。用于执行曝光后处理的多个处理单元设置在处理空间B中。传送单元11设置在处理单元A中，并且输送单元21设置在处理空间B中。输送室SH设置在处理空间A和B的上方。输送单元31输送基板设置在室SH和输送单元11之间的输送室SH中的处理空间A，以及室SH和处理室B的输送单元21之间。（C）2008年，JPO和INPIT

2. 发明专利

JP2005259930A Substrate processor and processing method 审中-公开
标题翻译：基板处理器和处理方法
公开(公告)号：JP2005259930A
公开(公告)日：2005-09-22
申请号：JP2004068553
申请日：2004-03-11
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： NISHIMURA JOICHI , OTANI MASAMI
IPC分类号： H01L21/02 , G06F11/00 , H01L21/00
CPC分类号： H01L21/67253 , H01L21/67276
摘要： PROBLEM TO BE SOLVED: To provide a substrate processor and a processing method with which maintenance work can be implemented accurately within a short period of time.
SOLUTION: A moving image display MV1 displays dynamic images showing the maintenance method. A working person can understand the maintenance method by watching the dynamic images displayed on the dynamic image display MV1 of a manipulation panel 200. Accordingly, the maintenance work can be implemented accurately within the short period of time in accordance with dynamic images displayed on the dynamic image display MV1.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种在短时间内可以精确地实现维护工作的基板处理器和处理方法。
解决方案：运动图像显示器MV1显示显示维护方法的动态图像。工作人员可以通过观察显示在操作面板200的动态图像显示器MV1上的动态图像来理解维护方法。因此，可以在短时间内根据动态图像显示动态图像来精确地实现维护工作图像显示MV1。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2005175083A Device and method for substrate processing 有权
标题翻译：用于基板处理的装置和方法
公开(公告)号：JP2005175083A
公开(公告)日：2005-06-30
申请号：JP2003410693
申请日：2003-12-09
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： NISHIMURA JOICHI , OTANI MASAMI
IPC分类号： H01L21/677 , B65G49/07 , H01L21/00 , H01L21/68 , H01L21/687
CPC分类号： H01L21/67748 , H01L21/67259 , H01L21/681 , H01L21/68707 , Y10S414/135
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing device and a substrate processing method by which a collision of a substrate transfer means and an obstacle can be prevented. SOLUTION: A camera 10 is fixed onto a camera fixture 14 extending from the rear end of an arm 11 to its front upper side. The camera 10 photographs the extension direction of the arm 112 as a static image when a substrate W is shipped in/out. When a normal static image recorded beforehand of a hot plate HP1 matches with the static image photographed by the camera 10, a substrate transfer robot TR ships in/out the substrate W. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供可以防止基板传送装置和障碍物的碰撞的基板处理装置和基板处理方法。解决方案：相机10被固定到从臂11的后端延伸到其前上侧的相机固定件14上。当基板W被输入/输出时，相机10将臂112的延伸方向作为静止图像拍摄。当热板HP1预先记录的正常静态图像与由照相机10拍摄的静态图像相匹配时，基板传送机器人TR在基板W内进出。（C）2005，JPO＆NCIPI

4. 发明专利

JP2004363261A Substrate treatment equipment 审中-公开
公开(公告)号：JP2004363261A
公开(公告)日：2004-12-24
申请号：JP2003158766
申请日：2003-06-04
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： OTANI MASAMI , NISHIZAWA HISAO
IPC分类号： B08B3/04 , H01L21/027 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide substrate treatment equipment by which a piping diameter for discharging a treatment is lowered and a waste-fluid installation space on the factory side can be reduced.
SOLUTION: Connecting pipes 30b, 30d and 30e have on-off valves 31b, 31d and 31e, respectively; and connect discharge openings 21b, 21d and 21e in treatment tanks 20b, 20d and 20e, with pure water stored, and inflow ports 41b, 41d and 41e in a waste-fluid tank 40. A waste-fluid pipe 50 has the on-off valve 51, and connects the discharge opening 42 in the tank 40 and the waste-fluid pipe 60 in a factory. The on-off valves 31b, 31d and 31e in the connecting pipe 30 and the on-off valve 51 in the waste-fluid pipe 50 are constituted so that their opening and closing are controlled while being mutually delayed by a control unit as a control means in the substrate treatment equipment.
COPYRIGHT: (C)2005,JPO&NCIPI

5. 发明专利

JP2004172632A Device for opening and closing lid of substrate storage container and substrate processing apparatus 有权
公开(公告)号：JP2004172632A
公开(公告)日：2004-06-17
申请号：JP2004025454
申请日：2004-02-02
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： IMANISHI YASUO , OTANI MASAMI , SHIBUKAWA JUN
IPC分类号： H01L21/67 , H01L21/677 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a device for opening and closing a lid of a substrate storage container and a technique for grasping the storage state of a substrate in the substrate storage container in a substrate processing apparatus.
SOLUTION: A reflection type sensor 10 is attached to a shutter member 5 for closing a passage opening 12a of a partition 12. The reflection type sensor 10 that lowers together with the shutter member 5 sequentially detects a substrate W in a cassette 1. A data processing part 11 collects information about the detection of the substrate W. A position detection means detects the position of the reflection type sensor 10 from information sent from an encoder 13a attached to an elevating mechanism 7a. Thus, it is possible for a processing part 14 to grasp the state of the substrate W in the cassette 1 based on information about the detection of the substrate W and the position of the reflection type sensor 10.
COPYRIGHT: (C)2004,JPO

6. 发明专利

JP2003031636A Substrate carrying arm, substrate carrying robot and substrate processor 审中-公开
标题翻译：承载臂的基板，携带机器人和基板处理器的基板
公开(公告)号：JP2003031636A
公开(公告)日：2003-01-31
申请号：JP2001215047
申请日：2001-07-16
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： OTANI MASAMI
IPC分类号： B25J15/08 , B25J19/06 , B65G49/06 , B65G49/07 , H01L21/677 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a substrate carrying arm which can restore the shape easily even when it is deformed by an external force.
SOLUTION: In the substrate carrying arm AM, a rod 21R and springs 211-214 made of a shape memory alloy subjected to shape memory processing are employed at a joint 21 where stress concentrates upon action of an external force. When the joint 21 is deformed by an external force, the rod 21R and springs 211-214 are conduced through a conducting/heating section 50 and heated. When the temperature of the rod 21R and springs 211-214 reaches a shape restoration point, the rod 21R and springs 211-214 restore the shape before deformation through shape memory effect and thereby replacement of the substrate carrying arm AM is not required.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供即使当通过外力变形时也能容易地恢复形状的基板承载臂。解决方案：在基板承载臂AM中，在受到形状记忆处理的形状记忆合金制成的杆21R和弹簧211-214用于在外力作用下集中应力的接头21处。当接头21通过外力变形时，杆21R和弹簧211-214通过导热加热部50被引导并被加热。当杆21R和弹簧211-214的温度达到形状恢复点时，杆21R和弹簧211-214通过形状记忆效应恢复变形前的形状，从而不需要更换基板承载臂AM。

7. 发明专利

JP2009065212A Substrate detecting apparatus 有权
标题翻译：基板检测装置
公开(公告)号：JP2009065212A
公开(公告)日：2009-03-26
申请号：JP2008324245
申请日：2008-12-19
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： IMANISHI YASUO , OTANI MASAMI , SHIBUKAWA JUN
IPC分类号： H01L21/67
摘要： PROBLEM TO BE SOLVED: To provide a substrate detecting apparatus to grasp containment condition of a substrate inside a substrate holding container. SOLUTION: A reflecting type sensor 10 is mounted on a shutter member 5 to block a passing opening 12a of a separating wall 12. The reflecting type sensor 10 descending with the shutter member 5 detects substrates W inside a cassette 1 successively. A data processing part 11 collects detection information of the substrate W. A position detecting means detects a position of the reflecting type sensor 10 from information transmitted from an encoder 13a mounted on ascending/descending mechanism 7a. A processing part 14 grasps condition of the substrate W inside the cassette 1 from the detection information of the substrate W and the position of the reflecting type sensor 10. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种基板检测装置，以掌握基板保持容器内部的基板的封闭状态。解决方案：反射型传感器10安装在挡板部件5上，以阻挡分隔壁12的通过开口12a。随闸板部件5下降的反射型传感器10连续检测盒1内的基板W。数据处理部11收集基板W的检测信息。位置检测单元从安装在上下降机构7a上的编码器13a发送的信息中检测反射型传感器10的位置。处理部14从基板W的检测信息和反射型传感器10的位置掌握盒1内的基板W的状态。（C）2009，JPO＆INPIT

8. 发明专利

JP2006313936A Substrate processing apparatus and system 有权
标题翻译：基板加工设备和系统
公开(公告)号：JP2006313936A
公开(公告)日：2006-11-16
申请号：JP2006207326
申请日：2006-07-31
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SHIGA MASAYOSHI , HAJIKI KENJI , OTANI MASAMI , NISHIMURA JOICHI
IPC分类号： H01L21/027 , H01L21/677
摘要： PROBLEM TO BE SOLVED: To provide substrate processing technology capable of performing suitable inspection of a substrate while suppressing reduction of throughput. SOLUTION: An inspection unit 30 is provided between a coating processing unit 10 which performs a resist coating process to the substrate and a development processing unit 20 which performs a development process. The inspection unit 30 is arranged with laminated four inspection parts composed of a thickness measuring device 32, a line width measuring device 33, a superposition measuring device 34, and a macro defect inspecting device 35. One part or each of the whole parts of a plurality of substrates of one set to be performed by the same content process is fed to one inspection part selected from the four inspection parts of the inspection unit 30, whereby not less than one sheet to less than the total number of the plurality of substrates of one set are fed to each of the four inspection parts. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供能够在抑制生产量降低的同时对衬底进行适当检查的衬底处理技术。解决方案：在对基板进行抗蚀剂涂布处理的涂布处理单元10和执行显影处理的显影处理单元20之间设置检查单元30。检查单元30布置有由厚度测量装置32，线宽测量装置33，叠加测量装置34和宏观缺陷检查装置35组成的层叠的四个检查部分。一部分或全部部分将通过相同的内容处理执行的一组的多个基板供给到从检查单元30的四个检查部中选择的一个检查部，由此不少于一个片材，小于多个基板的总数一组送入四个检查部件中的每一个。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2005207963A Fluid supply monitoring device and substrate processing apparatus 审中-公开
标题翻译：流体供应监测装置和基板处理装置
公开(公告)号：JP2005207963A
公开(公告)日：2005-08-04
申请号：JP2004016653
申请日：2004-01-26
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： OTANI MASAMI
IPC分类号： G01F1/22
摘要： PROBLEM TO BE SOLVED: To provide a fluid supply monitoring device capable of monitoring fluid supply conditions concerning a plurality of pipes, and dealing easily with a change in the number of pipes to be monitored, by a simple and low-cost composition.
SOLUTION: This fluid supply supervising device 21 is provided in a substrate processing apparatus 1, and includes area type flow meters 23a-23d interposed into the middle of pipes 9a-9d for supplying fluids being supervising objects; an imaging camera 25 for imaging pictures of the flow meters 23a-23d; and a monitoring portion 27 for monitoring the supply conditions of the fluids on the basis of the imaged pictures by the imaging camera 25. By the monitoring portion 27, a picture imaged by the imaging camera 25 at each monitor timing set beforehand and a memorized picture registered beforehand and corresponding to that point of time are compared, whether or not the height position of a float picture of each flow meter 23a-23d in the imaged picture is within a predetermined permissible range, with respect to a reference position of the float picture in the corresponding memorized picture is determined, and it is determined whether or not there are any abnormalities in the supply conditions (flow rate, etc.) of each fluid.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种流体供应监测装置，其能够监测关于多个管道的流体供应状况，并且通过简单且低成本的组成容易地处理待监测的管道数量的变化。解决方案：该流体供应监控装置21设置在基板处理装置1中，并且包括插入管9a-9d的中间的区域型流量计23a-23d，用于供给作为监督对象的流体; 用于对流量计23a-23d的图像进行成像的成像摄像机25; 以及监视部分27，用于根据成像照相机25的成像图像监视流体的供应状况。通过监视部分27，在预先设置的每个监视定时处由成像相机25拍摄的图像和存储的图像将与该时间点相对应的事先登记，比较成像图像中的每个流量计23a-23d的浮动图像的高度位置是否处于预定的允许范围内，相对于浮动图像的基准位置确定对应的存储图像，并且确定每个流体的供给条件（流量等）是否存在异常。版权所有（C）2005，JPO＆NCIPI

10. 发明专利

JP2008072140A Substrate processing apparatus 有权
标题翻译：基板加工设备
公开(公告)号：JP2008072140A
公开(公告)日：2008-03-27
申请号：JP2007301595
申请日：2007-11-21
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： OTANI MASAMI , IMANISHI YASUO , TSUJI MASAO , KAWAMOTO TAKANORI , IWAMI MASAKI , NISHIMURA JOICHI , MORITA AKIHIKO
IPC分类号： H01L21/027 , H01L21/677
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing apparatus that is excellent in workability during maintenance and that has high flexibility to arrange processing units.
SOLUTION: A unit arrangement portion 10 includes: a chemical cabinet 11 arranged in the lowermost part thereof; application processing units SC1 and SC2 that form a resist film to a substrate as a liquid processing unit, and development units SD1 and SD2 that perform processing procedure to the exposed substrate, wherein these units SC1, SC2, SD1 and SD2 are each arranged on the upper of the chemical cabinet 11 and in respective four corners of the apparatus as liquid processing units; multiple stage heat treatment units 20 for heat-treating the substrate further arranged on the upper of these liquid processing units and in the front or rear of the apparatus; and a cleaning process unit SS for supplying a cleaning solution such as a purified water to the substrate to clean the substrate as a substrate processing unit, the unit SS being arranged in the front side of the apparatus and between the application processing units SC1 and SC2.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种在维护中具有优异的可加工性并且具有高灵活性以布置处理单元的基板处理装置。解决方案：单元布置部分10包括：设置在其最下部分的化学柜11; 对作为液体处理单元的基板形成抗蚀剂膜的应用处理单元SC1和SC2以及对暴露的基板执行处理程序的显影单元SD1和SD2，其中这些单元SC1，SC2，SD1和SD2分别布置在化学品柜11的上部和装置的相应四个角中作为液体处理单元; 多级热处理单元20，用于对进一步设置在这些液体处理单元的上部和设备的前部或后部的基板进行热处理; 以及清洁处理单元SS，用于将诸如净化水的清洁溶液供应到基板以清洁作为基板处理单元的基板，单元SS布置在设备的正面以及应用处理单元SC1和SC2之间。版权所有（C）2008，JPO＆INPIT

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