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1. 发明专利

JP2013064159A Crosslinked fluorine-containing elastomer fine particle, method for producing the same, and composition 有权
标题翻译：交联含荧光体的弹性体微粒，其制造方法和组合物
公开(公告)号：JP2013064159A
公开(公告)日：2013-04-11
申请号：JP2013003469
申请日：2013-01-11
申请人： Daikin Industries Ltd , ダイキン工業株式会社
发明人： NAKAGAWA HIDETO , MORI HARUHIKO , AOYAMA HIROICHI , TERADA JUNPEI , KAWABE RUMI
IPC分类号： C08F214/18 , C08L27/12
CPC分类号： C08J3/12 , C08J3/24 , C08J2327/12 , C08L2205/02 , C08L2205/22 , Y10T428/2982 , C08L27/18 , C08L27/16
摘要： PROBLEM TO BE SOLVED: To provide: a novel crosslinked fluorine-containing elastomer fine particle; a method for producing the crosslinked fluorine-containing elastomer fine particle; and a resin composition containing the crosslinked fluorine-containing elastomer fine particle.SOLUTION: This invention relates to: the crosslinked fluorine-containing elastomer fine particle having a gel fraction of not less than 85 mass%; or the crosslinked fluorine-containing elastomer fine particle obtained by crosslinking a fluorine-containing elastomer particle having at least three iodine atoms per one polymer molecule at an end thereof. This invention further relates to: a composition containing such the crosslinked fluorine-containing elastomer fine particle and a synthetic resin; and a method for producing a crosslinked fluorine-containing elastomer fine particle, which is characterized in that an aqueous dispersion containing a peroxide-crosslinkable fluorine-containing elastomer particle, a peroxide and a polyfunctional unsaturated compound is heated, thus peroxide-crosslinking the fluorine-containing elastomer particle.
摘要翻译：待解决的问题：提供：新型交联的含氟弹性体微粒; 交联的含氟弹性体微粒的制造方法; 和含有交联的含氟弹性体微粒的树脂组合物。本发明涉及凝胶分数为85质量％以上的交联含氟弹性体微粒子。或通过在其一端交联每个聚合物分子中具有至少三个碘原子的含氟弹性体颗粒而获得的交联的含氟弹性体微粒。本发明还涉及含有这种交联的含氟弹性体微粒和合成树脂的组合物; 以及交联的含氟弹性体微粒的制造方法，其特征在于，加热含有过氧化物交联性含氟弹性体粒子，过氧化物和多官能不饱和化合物的水分散体，含弹性体颗粒。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2011086966A Dry etching gas and dry etching method 有权
标题翻译：干燥气体和干蚀刻方法
公开(公告)号：JP2011086966A
公开(公告)日：2011-04-28
申请号：JP2011018054
申请日：2011-01-31
申请人： Daikin Industries Ltd , ダイキン工業株式会社
发明人： HIROSE ZENKO , NAKAMURA SHINGO , ITANO MITSUJI , AOYAMA HIROICHI
IPC分类号： H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a dry etching gas and a dry etching method, capable of forming a contact hole with a high aspect ratio and etching a low dielectric constant film excellently.
SOLUTION: There are provided a method for etching a silicon oxide film and/or a silicon nitride film selectively to resist and silicon under a dry etching gas plasma (for example, an ICP discharge power of 200 to 3,000 W, a bias power of 50 to 2,000 W, and a pressure of 100 mTorr (13.3 Pa) or less), the dry etching gas plasma being formed by mixing, as required, CF
3 CF=CFCF=CF
2 and/or CF
2 =CFCF=CF
2 with at least one gas chosen from a group consisting of He, Ne, Ar, Xe, Kr, O
2 , CO, and CO
2 ; and a dry etching method for etching silicon group materials such as a low dielectric constant film or the like containing a silicon oxide film and/or silicon under a dry etching gas containing at least one compound expressed by a general formula (1) having two double bonds: CaFbHc (a=4 to 7, b=1 to 12, c=0 to 11, and b+c=2a-2), and the gas plasma.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供能够形成具有高纵横比的接触孔并且优异地蚀刻低介电常数膜的干蚀刻气体和干法蚀刻方法。解决方案：提供了一种用于在干蚀刻气体等离子体（例如，200至3,000W的ICP放电功率，偏置电压）下选择性地蚀刻氧化硅膜和/或氮化硅膜以抵抗硅的方法功率为50〜2000W，压力为100mTorr（13.3Pa）以下），干蚀刻气体等离子体通过根据需要混合形成CF 3 CF = CFCF = CF 2 和/或CF 2 = CFCF = CF 2 ，其中至少一种选自He，Ne，Ar，Xe，Kr ，CO 2和CO 2 ; 以及干蚀刻方法，用于在含有至少一种由通式（1）表示的化合物的干蚀刻气体中蚀刻含有氧化硅膜和/或硅的低介电常数薄膜等的硅基材料，键：CaFbHc（a = 4〜7，b = 1〜12，c = 0〜11，b + c = 2a-2）和气体等离子体。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2011044740A Dry etching gas, and dry etching method 有权
标题翻译：干燥气体和干蚀刻方法
公开(公告)号：JP2011044740A
公开(公告)日：2011-03-03
申请号：JP2010256142
申请日：2010-11-16
申请人： Daikin Industries Ltd , ダイキン工業株式会社
发明人： HIROSE ZENKO , NAKAMURA SHINGO , ITANO MITSUJI , AOYAMA HIROICHI
IPC分类号： H01L21/3065 , H01L21/28 , H01L21/768
摘要： PROBLEM TO BE SOLVED: To form a contact hole having a high aspect ratio, and to suitably etch a low-permittivity film.
SOLUTION: This application provides a method for etching a silicon oxide film and/or silicon nitride film selectively to a resist and silicon by the use of dry etching gas plasma (e.g., with ICP discharge power of 200-3,000 W, bias power of 50-2,000 W and pressure of 100 mTorr (13.3 Pa) or lower) obtained by mixing CF
3 CF=CFCF=CF
2 and/or CF
2 =CFCF=CF
2 with at least one kind of gas selected from among a group consisting of He, Ne, Ar, Xe, Kr, O
2 , CO and CO
2 as required. This dry etching method is used for etching a silicon-based material, such as a silicon oxide and/or a low-permittivity film containing silicon by the use of a dry etching gas containing at least one compound expressed by formula (1): CaFbHc (where a=4 to 7, b=1 to 12, c=0 to 11 and b+c=2a-2), having two double bonds, and gas plasma.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：形成具有高纵横比的接触孔，并适当地蚀刻低电容率膜。解决方案：本申请提供了通过使用干蚀刻气体等离子体（例如，利用200-3,000W的ICP放电功率，偏置电压）来选择性地将氧化硅膜和/或氮化硅膜蚀刻到抗蚀剂和硅的方法 CF CF = CF SB 2和/或CF SB获得的压力为50-2000W，压力为100mTorr（13.3Pa）或更低）具有选自由He，Ne，Ar，Xe，Kr，O 2 组成的组中的至少一种气体的CFCF = CF 2 ，CO和CO 2 。该干蚀刻方法用于通过使用含有至少一种由式（1）表示的化合物的干蚀刻气体来蚀刻诸如氧化硅和/或含硅的低介电常数膜的硅基材料：CaFbHc （其中a = 4至7，b = 1至12，c = 0至11和b + c = 2a-2），具有两个双键和气体等离子体。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2013032281A Surface-modified nanofiller and polymer composite material 有权
标题翻译：表面改性纳米复合材料和聚合物复合材料
公开(公告)号：JP2013032281A
公开(公告)日：2013-02-14
申请号：JP2012233182
申请日：2012-10-22
申请人： Daikin Industries Ltd , ダイキン工業株式会社
发明人： NAKAGAWA HIDETO , MORI HARUHIKO , AOYAMA HIROICHI
IPC分类号： C01B33/40
CPC分类号： C08J5/005 , B82Y30/00 , C08K9/04
摘要： PROBLEM TO BE SOLVED: To provide a polymer composite material having superior heat resistance, mechanical physical properties, substance permeation barrier properties, flame retardant properties, electrical conductivity and the like; and a new surface-modified nanofiller useful for this type of polymer composite material.SOLUTION: The polymer composite material includes nanofillers, fluorine compounds and polymers. The fluorine compounds bond to the surfaces of the nanofillers. The nanofillers to which the fluorine compounds are surface-bonded are mixed with or dispersed in the polymers.
摘要翻译：要解决的问题：提供具有优异的耐热性，机械物理性质，物质渗透阻隔性，阻燃性，导电性等的聚合物复合材料; 以及可用于这种类型的聚合物复合材料的新的表面改性纳米填料。解决方案：聚合物复合材料包括纳米填料，氟化合物和聚合物。氟化合物键合到纳米填料的表面。氟化合物表面结合的纳米填料与聚合物混合或分散在聚合物中。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2009029854A Fluorine-containing (meth)acrylic polymer and method for producing fluoropolymer 审中-公开
标题翻译：含氟（甲基）丙烯酸聚合物及其制备方法
公开(公告)号：JP2009029854A
公开(公告)日：2009-02-12
申请号：JP2007192592
申请日：2007-07-24
申请人： Daikin Ind Ltd , ダイキン工業株式会社
发明人： TSUDA NOBUHIKO , AOYAMA HIROICHI
IPC分类号： C08F20/22 , B01F17/52 , C08F2/24 , C08F14/18 , C08J3/16
摘要： PROBLEM TO BE SOLVED: To provide a fluorine-containing (meth)acrylic polymer useful for producing a fluoropolymer, and a method for producing a fluoropolymer using the (meth)acrylic polymer.
SOLUTION: The fluorine-containing (meth)acrylic polymer is obtained by polymerizing in an aqueous medium a monomer composition containing at least one compound represented by the general formula (1): CX
1 X
2 =CX
3 -COOM, wherein X
1 and X
2 are the same or different and represent H or F; X
3 represents -CF
3 or F; and M represents H, K, Na or NH
4 .
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供可用于制备含氟聚合物的含氟（甲基）丙烯酸类聚合物，以及使用（甲基）丙烯酸类聚合物制造含氟聚合物的方法。解决方案：含氟（甲基）丙烯酸类聚合物通过在水性介质中聚合含有至少一种由通式（1）表示的化合物的单体组合物获得：CX < SP> 2 = CX 3 -COOM，其中X 1 和X 2 相同或不同，表示H或F ; X 3 表示-CF 3 或F; M表示H，K，Na或NH 4 。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2009256455A Fluorine-containing block copolymer 有权
标题翻译：含氟的嵌段共聚物
公开(公告)号：JP2009256455A
公开(公告)日：2009-11-05
申请号：JP2008106637
申请日：2008-04-16
申请人： Daikin Ind Ltd , Kaneka Corp , ダイキン工業株式会社 , 株式会社カネカ
发明人： KATSUKAWA KENICHI , MORI HARUHIKO , AOYAMA HIROICHI , TOZAWA TOMOKAZU , KUSAKABE MASATO , HORII ETSUO , TSUJI RYOTARO
IPC分类号： C08F8/12 , B01F17/52 , C08F283/06 , C08F293/00 , C08L27/12 , C08L53/00
摘要： PROBLEM TO BE SOLVED: To provide a block copolymer composed of a hydrophilic polymer segment the main components of which are a fluoropolymer segment and a vinyl alcohol component, and to provide an emulsifier for a fluoropolymer and an emulsion composition. SOLUTION: This block copolymer composed of the hydrophilic polymer segment the main components of which are the fluoropolymer segment and the vinyl alcohol component is produced by iodine transfer polymerization of a vinyl ester monomer under presence of a fluoropolymer having an iodine atom at a terminal and by saponification of a vinyl ester component of a resultant block copolymer. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供由主要成分为氟聚合物链段和乙烯醇组分的亲水性聚合物链段构成的嵌段共聚物，并提供含氟聚合物和乳液组合物的乳化剂。解决方案：由亲水性聚合物链段构成的嵌段共聚物，其主要成分是含氟聚合物链段和乙烯醇组分，是通过乙烯基酯单体在具有碘原子的含氟聚合物的存在下的碘转移聚合制备的并通过皂化所得嵌段共聚物的乙烯基酯组分。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2009029853A Method for producing fluoropolymer 审中-公开
标题翻译：生产氟聚合物的方法
公开(公告)号：JP2009029853A
公开(公告)日：2009-02-12
申请号：JP2007192591
申请日：2007-07-24
申请人： Daikin Ind Ltd , ダイキン工業株式会社
发明人： TSUDA NOBUHIKO , AOYAMA HIROICHI
IPC分类号： C08F2/24 , C08F6/22 , C08F214/18 , C08J3/16 , C08L57/08
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a fluoropolymer excellent in dispersion stability.
SOLUTION: The method for producing a fluoropolymer includes polymerizing a fluoromonomer in the presence of a reactive emulsifier comprising a compound represented by the general formula (1): CX
1 X
2 =CX
3 -COOM, wherein X
1 and X
2 are the same or different and represent H or F; X
3 represents -CF
3 or F; and M represents K, Na or NH
4 .
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决问题的方法：提供分散稳定性优异的含氟聚合物的制造方法。解决方案：含氟聚合物的制造方法包括在含有通式（1）表示的化合物的反应性乳化剂存在下使含氟单体聚合：CX < 其中X 1 和X 2 相同或不同，表示H或F; X 3 表示-CF 3 或F; M表示K，Na或NH 4 。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2012238891A Dry etching gas and dry etching method 审中-公开
标题翻译：干燥气体和干蚀刻方法
公开(公告)号：JP2012238891A
公开(公告)日：2012-12-06
申请号：JP2012173985
申请日：2012-08-06
申请人： Daikin Ind Ltd , ダイキン工業株式会社
发明人： HIROSE ZENKO , NAKAMURA SHINGO , ITANO MITSUSHI , AOYAMA HIROICHI
IPC分类号： H01L21/3065 , H01L21/3105 , H01L21/311 , H01L21/768
CPC分类号： H01L21/76802 , H01L21/31056 , H01L21/31116
摘要： PROBLEM TO BE SOLVED: To provide a dry etching gas which allows for patterning of a contact hole, or the like, having a high aspect ratio.SOLUTION: The dry etching gas contains a compound having a CFCF fragment bonded directly to a double bond (excepting, CFCF=CFCF=CF). In particular, the dry etching gas preferably contains CFCF=CFand CHF.
摘要翻译：要解决的问题：为了提供允许具有高纵横比的接触孔等的图案化的干蚀刻气体。干法蚀刻气体包含直接与双键结合的CF（CF 3 SB）= 3/3> CF片段的化合物（除了CF 3 < / SB> CF = CFCF = CF 2 ）。特别地，干蚀刻气体优选地包含CF < F 2 。版权所有（C）2013，JPO＆INPIT

9. 发明专利

JP2003037104A Supply system and supply method of tetrafluoroethylene gas to dry etching unit 审中-公开
标题翻译：四氯氟乙烯气体供应系统及供应方法
公开(公告)号：JP2003037104A
公开(公告)日：2003-02-07
申请号：JP2001225760
申请日：2001-07-26
申请人： Daikin Ind Ltd , ダイキン工業株式会社
发明人： AOYAMA HIROICHI , YAMAMOTO AKINORI , KOTANI TETSUHIRO
IPC分类号： B01D53/22 , C09K13/08 , H01L21/302 , H01L21/3065
CPC分类号： B01D53/22 , Y02C10/10
摘要： PROBLEM TO BE SOLVED: To obtain TFE gas suitable for dry etching.
SOLUTION: A supply system of tetrafluoroethylene gas to a dry etching unit is provided with a film separation system which separates a gas mixture of tetrafluoroethylene(TFE)/carbon dioxide (CO
2 ) into each gas component, a gas supply part which supplies the separation system with the TFE/CO
2 mixed gas, a TFE supply unit which supplies the dry etching unit with the TFE separated by the film separation system, and a CO
2 exhaust unit, which discharges CO
2 separated by the film separation system.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：获得适合干蚀刻的TFE气体。解决方案：四氟乙烯气体向干蚀刻单元的供给系统设置有将四氟乙烯（TFE）/二氧化碳（CO 2）的气体混合物分离成各气体成分的膜分离系统，供给分离系统使用TFE / CO 2混合气体，TFE供给单元，其向干式蚀刻单元供给由膜分离系统分离的TFE，以及CO 2排出单元，其排出由膜分离系统分离的CO 2。

10. 发明专利

JP2010144080A Fluorine-containing polyether-based block copolymer and process for producing the same 有权
标题翻译：含氟聚合物基嵌段共聚物及其制备方法
公开(公告)号：JP2010144080A
公开(公告)日：2010-07-01
申请号：JP2008323810
申请日：2008-12-19
申请人： Daikin Ind Ltd , Kaneka Corp , ダイキン工業株式会社 , 株式会社カネカ
发明人： KATSUKAWA KENICHI , MORI HARUHIKO , AOYAMA HIROICHI , TOZAWA TOMOKAZU , KUSAKABE MASATO , HORII ETSUO , TSUJI RYOTARO
IPC分类号： C08F293/00
摘要： PROBLEM TO BE SOLVED: To provide: a process for efficiently producing a fluorine-containing polyether-based block copolymer containing a fluorine-containing polyether segment and a vinyl-based monomer component, and to provide an anti-soiling material and an emulsifier for fluorine-based polymers which utilize the characteristics of the fluorine-containing polyether-based block copolymer obtained by the process. SOLUTION: The process for producing the fluorine-containing polyether-based block copolymer comprises subjecting a vinyl-based monomer to atom transfer radical polymerization, using a perfluoropolyether containing a perfluoropolyether segment and having a carbon-iodine bond at both or one of the terminals as the initiator in the presence of a complex of at least one metal selected from the group consisting of copper, nickel, ruthenium, and iron. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：提供一种高效制备含有含氟聚醚链段和乙烯基类单体成分的含氟聚醚类嵌段共聚物的方法，提供防污材料和利用该方法获得的含氟聚醚基嵌段共聚物的特性的氟基聚合物乳化剂。解决方案：含氟聚醚类嵌段共聚物的制造方法包括：使用含有全氟聚醚链段的全氟聚醚并在碳原子间具有碳 - 碘键的两个或一个上进行原子转移自由基聚合在由铜，镍，钌和铁组成的组中选择的至少一种金属的配合物的存在下，将端基作为引发剂。版权所有（C）2010，JPO＆INPIT

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