专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2007266156A Wafer support body for vertical wafer boat 审中-公开
标题翻译： WAFER支撑体用于垂直滚筒
公开(公告)号：JP2007266156A
公开(公告)日：2007-10-11
申请号：JP2006086918
申请日：2006-03-28
申请人： Covalent Materials Corp , コバレントマテリアル株式会社
发明人： KUROI SHIGEAKI , YAMAGUCHI TOSHIHIRO
IPC分类号： H01L21/683 , H01L21/31
摘要： PROBLEM TO BE SOLVED: To provide a wafer support member for a vertical wafer boat capable of suppressing slippages, a scratch on the rear surface of a wafer, and the accumulation of a gas flow. SOLUTION: The annular wafer support body 1 for the vertical wafer boat is placed in the groove of the vertical wafer boat so as to support the wafer by placement on the upper surface. The corner (c) of the upper inner periphery and the corner (a) of the upper outer periphery of the wafer support body 1 are chamfered to have a round shape. The corner (e) of the lower outer periphery of the wafer support body is chamfered to have a flat shape. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够抑制滑移的垂直晶片舟皿的晶片支撑构件，晶片的后表面上的划痕以及气流的积聚。解决方案：用于垂直晶片舟的环形晶片支撑体1放置在垂直晶片舟的槽中，以便通过放置在上表面上来支撑晶片。晶片支撑体1的上外周的上部内周和角（a）的角部（c）被倒角成圆形。晶片支撑体的下外周的角部（e）被倒角成平坦的形状。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2009099576A Vertical wafer boat 有权
标题翻译：垂直轮船
公开(公告)号：JP2009099576A
公开(公告)日：2009-05-07
申请号：JP2007266479
申请日：2007-10-12
申请人： Covalent Materials Corp , コバレントマテリアル株式会社
发明人： AOKI TATSUHIKO , SENSAI KOJI , ARAKI KOJI , INABA TAKESHI , YAMAGUCHI TOSHIHIRO , TABEI TAKAHIRO , HANEDA TAKU , TANAKA TATSUYA , KAWAMURA TAKAFUMI , KANAMARU HIDEKAZU , SEKIGUCHI MASAYUKI
IPC分类号： H01L21/22 , H01L21/31 , H01L21/324 , H01L21/683
CPC分类号： H01L21/67309 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a vertical wafer boat which is improved in purification efficiency of purification processing and has a long-sized wafer support portion. SOLUTION: A top plate 7 has an opening portion 7a formed having its center at the center point of a wafer W to be mounted and a slit portion 7b formed on an insertion side of the wafer connecting with the opening portion 7. The width T of the slit 7 is 35 to 45% of the width ϕD of the top plate 7, top-surface corner portions 2a1, 3a1, 4a1, and 5a1 are beveled up to positions which are 40 to 60% of lengths of wafer support portions 2a, 3a, 4a, and 5a from tip portions of the wafer support portions 2a, 3a, 4a and 5a toward column portions 2b, 3b, 4b and 5b, and top-surface corner portions 2a2, 3a2, 4a2 and 5a2 from the beveling end positions to the column portions 2b, 3b, 4b and 5b are formed at angles of ≤90°. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种提高净化处理的净化效率的立式晶片舟皿，并具有长尺寸的晶片支撑部分。解决方案：顶板7具有形成在其中心位于要安装的晶片W的中心的开口部分7a和形成在与开口部分7连接的晶片的插入侧上的狭缝部分7b。狭缝7的宽度T为顶板7的宽度φD的35〜45％，顶面拐角部分2a1,3a1,4a1和5a1倾斜到晶片支承长度的40〜60％的位置部分2a，3a，4a和5a从晶片支撑部分2a，3a，4a和5a的尖端部分朝向柱部分2b，3b，4b和5b，以及顶表面角部分2a2,3a2,4a2和5a2从在柱部分2b，3b，4b和5b处的倾斜端部位置以≤90°的角度形成。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2007273673A Longitudinal wafer boat 审中-公开
标题翻译：长途渔船
公开(公告)号：JP2007273673A
公开(公告)日：2007-10-18
申请号：JP2006096568
申请日：2006-03-31
申请人： Covalent Materials Corp , コバレントマテリアル株式会社
发明人： SATO HIROMASA , INABA TAKESHI , HANEDA TAKU , YAMAGUCHI TOSHIHIRO , TANAKA TATSUYA
IPC分类号： H01L21/683 , C23C16/458 , H01L21/205 , H01L21/22
摘要： PROBLEM TO BE SOLVED: To provide a londitudinal boat which suppresses flaws called rod marks generated on the wafer backside and prevents particles from growing. SOLUTION: The boat has three or more wafer support rods disposed vertically in parallel to one another, and upper and lower support plates disposed at upper and lower ends for fixing them. The wafer support rod has a plurality of grooves perpendicular to its length axis, the groove form a wafer support arm tapered toward the wafer center and inclined upward with a horizontal half-circular wafer support face located at the top end of the wafer support arm, and there is a groove backside in the groove at an angle of 87°-93° with respect to the inclination of the arm. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种横向船，其抑制在晶片背面上产生的称为棒标记的缺陷，并防止颗粒生长。解决方案：船具有三个或更多个彼此平行地垂直设置的晶片支撑杆，并且上和下支撑板设置在上端和下端以固定它们。晶片支撑杆具有垂直于其长度轴线的多个槽，槽形成朝向晶片中心渐缩的晶片支撑臂，并且位于晶片支撑臂顶端的水平半圆形晶片支撑面向上倾斜，并且在凹槽中相对于臂的倾斜以相对角度为87°-93°的凹槽。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2008311254A Vertical wafer boat 有权
标题翻译：垂直轮船
公开(公告)号：JP2008311254A
公开(公告)日：2008-12-25
申请号：JP2007154748
申请日：2007-06-12
申请人： Covalent Materials Corp , コバレントマテリアル株式会社
发明人： YAMAGUCHI TOSHIHIRO , INABA TAKESHI , HANEDA TAKU , SATO HIROMASA , TANAKA TATSUYA , OTSUKA YUKIE
IPC分类号： H01L21/205 , H01L21/22 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide a vertical wafer boat that can prevent production itself of a particle and also prevent sticking of a produced particle on a wafer surface, and further make what is called a rod mark as small as possible. SOLUTION: The vertical wafer boat has a plurality of columns having shelf portions 10 for mounting wafers to be subjected to filming processing, and a top plate and a bottom plate for fixing upper and down end portions of the columns. Each of the shelf portions 10 has an extension portion 11 extended from a flank of the column 2, a wafer mounting portion 12 formed on the top surface of the extension portion 11 to project, and a wafer non-mounting portion 13 formed on the top surface of the extension portion 11 on a side 2 closer to the column than to the wafer mounting portion 12 to project to a height shorter than the wafer mounting portion 12. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够防止颗粒生产本身的垂直晶片舟，并且还防止生产的颗粒在晶片表面上的粘附，并且进一步使所谓的标记尽可能小。解决方案：垂直晶片舟具有多个具有用于安装要进行成膜处理的晶片的搁架部分10的列，以及用于固定柱的上下端部的顶板和底板。每个搁架部分10具有从柱2的侧面延伸的延伸部分11，形成在延伸部分11的顶表面上突出的晶片安装部分12和形成在顶部上的晶片非安装部分13 延伸部11的表面比靠近晶片安装部12更靠近柱的一侧2投影到比晶片安装部12短的高度。版权所有（C）2009，JPO＆INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式