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    • 3. 发明专利
    • Electron microscope and method for observing specimen
    • 电子显微镜和观察样品的方法
    • JP2013225395A
    • 2013-10-31
    • JP2012096464
    • 2012-04-20
    • Canon Incキヤノン株式会社
    • OSHIMA KANAKOSHIMADA MIKIOKOYAMA SHINYAIFUKU TOSHIHIROKUBOTA JUN
    • H01J37/28H01J37/20
    • PROBLEM TO BE SOLVED: To provide an electron microscope that eliminates an influence of thermal electrons and can obtain a clear specimen image even though a temperature of a specimen and a peripheral part thereof is 1,100°C or higher, and to provide a method for observing the specimen.SOLUTION: The electron microscope comprises: a specimen stage for mounting at least a specimen thereon; an electron detector for detecting detection electrons generated by irradiating the specimen with an electron beam; and an electron accelerating device that is provided between the specimen stage and the electron detector, and accelerates the detection electrons toward a direction of the electron detector. The electron microscope further comprises an electron shielding sheet that is provided between the specimen stage and the electron accelerating device, has a melting point of 1,100°C or higher and a specific heat of 0.1 cal/g K or less, and has a through hole for passing the detection electrons therethrough.
    • 要解决的问题:提供一种消除热电子影响的电子显微镜,即使试样及其周边部分的温度为1100℃以上,也可以获得清晰的标本图像,并提供观察方法 电子显微镜包括:用于在其上至少安装样品的样品台; 电子检测器,用于检测用电子束照射样本产生的检测电子; 以及电子加速装置,其设置在试样台和电子检测器之间,并且将检测电子朝向电子检测器的方向加速。 电子显微镜还包括设置在样品台和电子加速装置之间的电子屏蔽片,其熔点为1100℃以上,比热为0.1cal / gKK以下,具有通孔 用于使检测电子通过其中。
    • 6. 发明专利
    • Oxide semiconductor thin-film transistor
    • 氧化物半导体薄膜晶体管
    • JP2009141001A
    • 2009-06-25
    • JP2007313578
    • 2007-12-04
    • Canon Incキヤノン株式会社
    • SHIMADA MIKIO
    • H01L29/786
    • H01L29/7869H01L29/78618
    • PROBLEM TO BE SOLVED: To solve such a problem that current driving performance is degraded in a bottom gate type TFT because, when voltage is applied to a gate electrode, a channel is formed in a semiconductor layer above the gate electrode, however, no channel is formed in almost many parts of a semiconductor layer immediately under source-drain electrodes, and the semiconductor layer forms a parasitic resistor.
      SOLUTION: The transistor includes a gate electrode, a gate insulating layer, a semiconductor layer including an amorphous oxide, source-drain electrodes, and a protective layer on a substrate. The semiconductor layer includes a first region corresponding to a region in which the source-drain electrodes are formed, and a second region not corresponding to the region in which the source-drain electrodes are formed. At least the first region includes a crystalline component having a composition different from the composition of the amorphous oxide in the second region.
      COPYRIGHT: (C)2009,JPO&INPIT
    • 解决的问题为了解决底栅型TFT的电流驱动性能下降的问题,因为当向栅电极施加电压时,沟道形成在栅电极上方的半导体层中 在源极 - 漏极电极的正下方的半导体层的几乎多个部分中不形成沟道,并且半导体层形成寄生电阻。 解决方案:晶体管包括栅电极,栅极绝缘层,包括非晶氧化物的半导体层,源 - 漏电极和保护层。 半导体层包括对应于形成源极 - 漏极的区域的第一区域和不对应于形成源极 - 漏极电极的区域的第二区域。 至少第一区域包括具有与第二区域中的无定形氧化物的组成不同的组成的结晶组分。 版权所有(C)2009,JPO&INPIT