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    • 1. 发明专利
    • Method for forming metal oxide film
    • 形成金属氧化膜的方法
    • JP2006161098A
    • 2006-06-22
    • JP2004353859
    • 2004-12-07
    • Canon Incキヤノン株式会社
    • NISHIMOTO TOMONORITOYAMA JOHAYASHI SUSUMUSONODA YUICHIMIYAMOTO YUSUKEIWATA MASUMITSUKONDO TAKAHARUYAMADA SATOSHI
    • C25D21/00C25D9/08C25D21/12H01L31/04
    • Y02E10/50
    • PROBLEM TO BE SOLVED: To swiftly detect the abnormality of an electric circuit in the production of a metal oxide film by electrodeposition, and to prevent the reduction of yield. SOLUTION: In the film formation method where a d.c. source is connected to each of a plurality of metal electrodes arranged in parallel, and a metal oxide film is electrodeposited on a beltlike electrically conductive counter substrate, the electric potential of each metal electrode to the electric potential of a correcting electrode located on the beltlike substrate is measured, further, in the case the difference in the electric potential between the adjoining metal electrodes exceeds a prescribed value, the electric circuit on the side whose electric potential is higher is shielded from the whole circuit. Alternatively, after the shielding, an electrode in a spare system is energized. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:通过电沉积来快速检测生产金属氧化物膜的电路的异常,并防止产率降低。

      解决方案:在成膜方法中, 源极连接到平行布置的多个金属电极中的每一个上,并且将金属氧化物膜电沉积在带状导电对衬底上,每个金属电极的电位与位于带状衬底上的校正电极的电位 此外,在相邻的金属电极之间的电位差超过规定值的情况下,电位越高的一侧的电路就从整个电路被屏蔽。 或者,在屏蔽之后,备用系统中的电极被通电。 版权所有(C)2006,JPO&NCIPI