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    • 9. 发明专利
    • Frequency converting apparatus, and frequency conversion method
    • 频率转换装置和频率转换方法
    • JP2010252296A
    • 2010-11-04
    • JP2009280288
    • 2009-12-10
    • Canon Anelva Corpキヤノンアネルバ株式会社
    • MAEHARA DAIKI
    • H03D7/00H01L29/82H01L43/08
    • PROBLEM TO BE SOLVED: To provide a frequency converting element which is adaptable to not only Si MMIC (Monolithic Microwave Integrated Circuit) but also a GaAs MMIC by using a magnetoresistive element.
      SOLUTION: The frequency converting element is equipped with: a frequency converting element comprised of a magnetoresistive element including a magnetization free layer, an intermediate layer and a magnetization fixed layer; a magnetic field applying mechanism for applying a magnetic field to the frequency converting element; a local oscillator for applying a local oscillation signal to the frequency converting element; and an input terminal, electrically connected with the frequency converting element, for inputting an external input signal.
      COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:提供一种不仅可以适用于Si MMIC(单片微波集成电路)而且通过使用磁阻元件也可以适用于GaAs MMIC的频率转换元件。 解决方案:变频元件配备有:包括磁阻自由层,中间层和磁化固定层的磁阻元件的变频元件; 用于向频率转换元件施加磁场的磁场施加机构; 本地振荡器,用于将本地振荡信号施加到所述频率转换元件; 以及与频率转换元件电连接的用于输入外部输入信号的输入端子。 版权所有(C)2011,JPO&INPIT
    • 10. 发明专利
    • Vacuum processing apparatus and vacuum processing method
    • 真空加工设备和真空加工方法
    • JP2008282888A
    • 2008-11-20
    • JP2007124047
    • 2007-05-09
    • Canon Anelva Corpキヤノンアネルバ株式会社
    • MAEHARA DAIKIKITANO NAOTAKENAGAMINE YOSHINORIFURUKAWA SHINJI
    • H01L21/31C23C14/58C23C16/56H01L21/316
    • PROBLEM TO BE SOLVED: To improve processing efficiency by increasing the number of active seeds generated within a discharge chamber 3 and also increasing the number of active seeds moving to a substrate processing chamber 4 in the vacuum processing apparatus including the discharge chamber 3 for generating active seeds through excitation of plasma with high frequency discharge, the substrate processing chamber 4 for storing substrates 10 as the processing object by the active seeds generated in the discharge chamber 3, and a partition plate 2 for confining plasma within the discharge chamber 3 and also moving th eactive seeds to the substrate processing chamber 4 from the discharge chamber 3 via a through-hole 5.
      SOLUTION: An interval between the electrodes for generating high frequency discharge within the discharge chamber 3 is set to 15 to 25 mm in order to form high power and high frequency plasma.
      COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:通过增加在放电室3内产生的活性种子的数​​量来提高加工效率,并且还增加在包括排出室3的真空处理设备中移动到基板处理室4的活性种子的数​​量 为了通过激发高频放电的等离子体产生活性种子,用于通过在放电室3中产生的活性种子来存储作为处理对象的基板10的基板处理室4和用于将等离子体限制在排出室3内的隔板2 并且还经由通孔5从放电室3将活性种子移动到基板处理室4.解决方案:在放电室3内产生高频放电的电极之间的间隔被设定为15至25 mm以形成高功率和高频等离子体。 版权所有(C)2009,JPO&INPIT