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    • 4. 发明专利
    • Method for producing coating film
    • 生产涂膜的方法
    • JP2011047021A
    • 2011-03-10
    • JP2009198460
    • 2009-08-28
    • Ishihara Sangyo Kaisha Ltd石原産業株式会社
    • TOMONARI MASANORIIDA KIYONOBU
    • C23C24/08B05D3/06B05D7/24B22F3/105B22F7/04H01B5/14H01B13/00
    • PROBLEM TO BE SOLVED: To conveniently produce a coating film having electric conductivity and a metallic color tone by using a metal fine particle dispersion with laser irradiation.
      SOLUTION: The coating film is produced by applying a dispersion including at least metal fine particles having an organic compound on particle surfaces and a solvent to a substrate, and is subsequently irradiated with a laser beam in atmosphere. The coating film with low resistance and the metallic color tone is formed by the method. In particular, the method is applicable to base metals such as copper, nickel and so on, and also is applicable to low heat-resistant substrate, such as plastics. The coating film is used for forming a micro electrode and a circuit wiring pattern of a printed wiring board and the like, and for design ornament application utilizing the metallic color tone of the coating film and the like.
      COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:通过使用激光照射的金属微粒分散体,方便地制造具有导电性和金属色调的涂膜。 解决方案:通过将至少包含具有有机化合物的金属细颗粒的分散体施加到基材上并将溶剂涂布在基板上,然后在大气中照射激光束来制造涂膜。 通过该方法形成具有低电阻和金属色调的涂膜。 特别地,该方法适用于铜,镍等贱金属,也适用于塑料等低耐热性基材。 涂膜用于形成印刷线路板等的微电极和电路布线图案,并且用于利用涂膜的金属色调等进行设计装饰应用。 版权所有(C)2011,JPO&INPIT
    • 5. 发明专利
    • Fluid composition and electrode as well as wiring pattern formed using it
    • 流体组合物和电极,如使用其形成的布线图案
    • JP2006073436A
    • 2006-03-16
    • JP2004257667
    • 2004-09-03
    • Ishihara Sangyo Kaisha Ltd石原産業株式会社
    • TOMONARI MASANORISADOHARA HITOMI
    • H01B1/22B01J13/00B22F9/00H05K3/12
    • PROBLEM TO BE SOLVED: To provide a fluid composition which is superior in a long-term stability by preventing occurrence of particle lumps in which metal colloid particles have been abnormally grown up in the fluid composition wherein the metal colloid particles are blended in a high concentration. SOLUTION: A reducing substance such as hydrazine or its hydrated material, or aldehydes is blended in the range of 0.1 to 50 pts. wt to 100 pts. wt. of the metal colloid particles with the fluid composition in which at least 5 wt% of the metal colloid particles are blended. Even if this fluid composition is used after it is stored for a long period, the fluid composition is superior in performance such as conductivity, and easy to form uniform coated materials, and this can be utilized especially for formation or the like of a fine electrode or wiring pattern of a printed-circuit board or the like. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种流体组合物,其通过防止在其中混合金属胶体颗粒的流体组合物中金属胶体颗粒异常生长的颗粒块的发生而具有优异的长期稳定性 高度集中 解决方案:将还原物质如肼或其水合物或醛以0.1-50重量份混合。 重量至100点。 重量。 的具有至少5重量%的金属胶体颗粒的流体组合物的金属胶体颗粒。 即使这种流体组合物在长时间储存​​后使用,流体组合物的性能如导电性也优异,容易形成均匀的涂布材料,特别适用于细电极的形成等 或印刷电路板等的布线图案。 版权所有(C)2006,JPO&NCIPI
    • 6. 发明专利
    • Copper powder, its production method, and copper paste, paint and electrode obtained by using the same
    • 铜粉,其生产方法和使用它的铜膏,油漆和电极
    • JP2005060778A
    • 2005-03-10
    • JP2003292861
    • 2003-08-13
    • Ishihara Sangyo Kaisha Ltd石原産業株式会社
    • TOMONARI MASANORI
    • B22F1/00B22F1/02H01B1/22
    • PROBLEM TO BE SOLVED: To provide copper powder which has excellent oxidization resistance, and to provide its production method.
      SOLUTION: Silicone oil and a sulfur compound are treated to copper grains, and they are made present on the surface of copper respectively. As the method for the treatment, the one where a copper compound and a reducing agent are reacted in a solvent liquid in the presence of a sulfur compound and a protective colloid to obtain copper grains in which the sulfur compound is made present, and next, the obtained copper grains and silicone oil are brought into dry or wet contact is preferable. As the silicone oil, dimethylpolysiloxane, methylhydrogenpolysiloxane, mercapto modified polysiloxane or the like can be used. Further, as the sulfur compound, mercaptopropionic acid, dodecanethiol, hexanethiol, methyl thioglycolate, cycteine or the like can be used.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供耐氧化性优异的铜粉,并提供其制造方法。 解决方案:将硅油和硫化合物处理成铜颗粒,并将它们分别存在于铜的表面上。 作为处理方法,在硫化合物和保护胶体的存在下,在溶剂液中使铜化合物和还原剂反应的方法得到存在硫化合物的铜颗粒,接着, 获得的铜颗粒和硅油进行干燥或湿接触是优选的。 作为硅油,可以使用二甲基聚硅氧烷,甲基氢聚硅氧烷,巯基改性聚硅氧烷等。 此外,作为硫化合物,可以使用巯基丙酸,十二烷硫醇,己硫醇,巯基乙酸甲酯,cycteine等。 版权所有(C)2005,JPO&NCIPI
    • 9. 发明专利
    • Copper microparticle and process for producing the same
    • 铜微生物及其生产方法
    • JP2012052241A
    • 2012-03-15
    • JP2011240015
    • 2011-11-01
    • Ishihara Sangyo Kaisha Ltd石原産業株式会社
    • TOMONARI MASANORIHONMA MASATOSHIKUNIFUSA YOSHIYUKI
    • B22F9/20B22F1/00H01B1/00H01B1/22H01B5/00H01B13/00
    • B22F9/20H05K1/092
    • PROBLEM TO BE SOLVED: To provide copper microparticles that are fine and contain substantially none of agglomerated particles, for example, copper microparticles of 0.005 to 0.5 μm average particle diameter (D) as measured by an electron microscope, 0.005 to 0.5 μm average particle diameter (d) as measured by a dynamic light scattering method particle size distribution measuring apparatus and 0.7 to 1.5 d/D ratio.SOLUTION: In the process for producing copper microparticles, a divalent copper oxide is mixed with a reducing agent in a liquid medium to produce metallic copper microparticles, in the presence of a complexing agent and a protective colloid. Then, at least one of donor atoms of ligand included in the complexing agent is sulfur, and the complexing agent is used in an amount of ≥0.01 and
    • 要解决的问题为了提供细微的并且基本上不含有附聚颗粒的铜微粒,例如通过电子显微镜测量的0.005至0.5μm平均粒径(D)的铜微粒0.005至0.5μm 通过动态光散射法粒度分布测量装置测量的平均粒径(d)和0.7至1.5d / D比。 解决方案:在铜微粒的制造方法中,在络合剂和保护胶体的存在下,将二价氧化铜与液体介质中的还原剂混合,生成金属铜微粒。 然后,配位剂中所含的配体的供体原子中的至少一个是硫,配合剂的用量为≥0.01和<0.5重量份。 基于1,000 pts.wt. 的二价氧化铜。 版权所有(C)2012,JPO&INPIT
    • 10. 发明专利
    • Copper microparticle and process for producing the same
    • 铜微生物及其生产方法
    • JP2012052240A
    • 2012-03-15
    • JP2011240008
    • 2011-11-01
    • Ishihara Sangyo Kaisha Ltd石原産業株式会社
    • TOMONARI MASANORIHONMA MASATOSHIKUNIFUSA YOSHIYUKI
    • B22F9/20B22F1/00H01B1/00H01B1/22H01B5/00H01B13/00
    • B22F9/20H05K1/092
    • PROBLEM TO BE SOLVED: To provide copper microparticles that are fine and contain substantially none of agglomerated particles, for example, copper microparticles of 0.005 to 2.0 μm average particle diameter (D) as measured by an electron microscope, 0.005 to 2.0 μm average particle diameter (d) as measured by a dynamic light scattering method particle size distribution measuring apparatus and 0.7 to 2 d/D ratio.SOLUTION: A divalent copper oxide is mixed with a reducing agent in a liquid medium to produce metallic copper microparticles, in the presence of: at least one complexing agent selected from amines, nitrogen-containing heterocyclic compounds, nitriles and cyanogen compounds, ketones, amino acids and alkanolamines, or the salts or derivatives of them; and a protective colloid.
    • 要解决的问题为了提供细微的铜微粒,并且基本上不含凝聚颗粒,例如通过电子显微镜测量的平均粒径(D)为0.005-2.0μm的铜微粒为0.005-2.0μm 通过动态光散射法粒度分布测定装置测定的平均粒径(d)和0.7〜2d / D比。 解决方案:在以下存在下,将二价氧化铜与还原剂在液体介质中混合以制备金属铜微粒:至少一种选自胺,含氮杂环化合物,腈和氰化合物的络合剂, 酮,氨基酸和链烷醇胺,或它们的盐或衍生物; 和保护胶体。 版权所有(C)2012,JPO&INPIT