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    • 5. 发明专利
    • DETECTOR, RECORDER, CONTAINER, INK CARTRIDGE AND DETECTING METHOD
    • JPH0843174A
    • 1996-02-16
    • JP18025494
    • 1994-08-01
    • CANON KK
    • KATO MASAOTORIGOE MAKOTO
    • B41J2/175G01F23/28
    • PURPOSE:To detect the residual quantity of a material in a container accurately and easily with no influence of the optical characteristics by making light incident from one end of an optical waveguide touching the material in the container and detecting the quantity of light by means of an optical detector disposed at the other end. CONSTITUTION:When an optical waveguide 5 is made of a plastic having significant difference in the retractive index from air and small difference from a material, e.g. an ink 2, the incident light leaks into the ink 2 when the level of ink 2 in the container (ink cartridge) 1 is higher than the optical waveguide 5 because the difference of retractive index is small between them and the quantity of liquid reaching a photodetector 4 decreases significantly. When the level of ink 2 decreases and the optical waveguide 5 is exposed to the air, the incident light is confined in the optical waveguide 5 because the difference of refractive index is large between the waveguide and the air thus increasing the quantity of light reaching the photodetector 4. The detected quantity of light is compared with a preset threshold value thus detecting the residual quantity of ink 2 in the cartridge 1.
    • 9. 发明专利
    • PROJECTION EXPOSURE DEVICE
    • JPH01112727A
    • 1989-05-01
    • JP27138887
    • 1987-10-27
    • CANON KK
    • TORIGOE MAKOTO
    • G03F9/00H01L21/027H01L21/30
    • PURPOSE:To enable a wafer to be positioned highly accurately without being influenced by fluctuation of focusing position by forming a pattern for focusing on reticle surface on wafer surface by projection optic system, observing non- developed pattern image at this time by the observation optic system to detect the focusing position, and by performing focusing. CONSTITUTION:A stage 5 is moved to allow a pattern image forming position on the surface of a wafer 5 to be positioned immediately below a protection optic system 3, masking is inserted in light path of illuminating light to allow a pattern 9 to be selectively illuminated by an illumination optic system 1, the pattern 9 is formed on the resist surface of a wafer 4 by the projection optic system 3, the wafer stage 5 is moved again, non-developed pattern image is positioned immediately below an observation system 10, and image-forming status is observed by a TV camera 14. Non-developed pattern image is processed by a computer within a controller 100 and the amount of deviation delta from the focusing position is obtained, for example, from the contrast of pattern image and size as compared with the original pattern. The wafer 4 is moved in the direction for compensating for the amount of deviation delta, for example, up and down, to match it to the focusing position.
    • 10. 发明专利
    • ALIGNER
    • JPS6489327A
    • 1989-04-03
    • JP24524487
    • 1987-09-29
    • CANON KK
    • TORIGOE MAKOTOSUZUKI AKIYOSHI
    • H01L21/30G03F9/00H01L21/027H01L21/68
    • PURPOSE:To correct a position aligning with an output of an observation optical system and to improve an aligning accuracy by disposing a writable/erasable recording medium outside an element to be exposed, placed on a moving stage, and detecting the variations in the magnification, focus of an optical system for exposing and transferring a pattern on a first article on the element to be exposed by the observation optical system. CONSTITUTION:A light irradiated from an illumination optical system 1 of an aligner is irradiated to a reticle 2 as a first article, and its pattern is transferred by a projecting optical system 3 to a wafer 4 as a second article. The wafer 4 is placed on a moving stage 5, an optomagnetic recording medium 6 is disposed as a recording medium outside the wafer 4, its height is set to substantially the same as that of the wafer 4, and a magnetic field is applied by an electromagnet 7 buried in the lower section of the medium 6 in the optical axis direction of the system 3. The part of the exposure light of the system 1 is irradiated by mark illumination optical systems 11a, 11b, the mark of the reticle 2 is detected, the variations in the magnification and focus of the system 3 are detected, and an accurate alignment preferably corrected is conducted.