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1. 发明专利

JP2006126082A Method and apparatus for measuring retention distortion 有权
标题翻译：用于测量保持失真的方法和装置
公开(公告)号：JP2006126082A
公开(公告)日：2006-05-18
申请号：JP2004316788
申请日：2004-10-29
申请人： Asahi Glass Co Ltd , Fujinon Corp , フジノン株式会社 , 旭硝子株式会社
发明人： UEKI NOBUAKI , OTSUKA KOJI
IPC分类号： G01B21/32 , G01B11/16
CPC分类号： G03F1/84 , G01B11/2441
摘要： PROBLEM TO BE SOLVED: To enable a retention distortion to be measured in addition to shapes of a face to be tested, which occurs in a plate-like object to be tested such as a photomask or the like, due to its retention state, when retaining the object to be tested in a prescribed retention state. SOLUTION: Measurements are carried out, which comprises; a first measurement of measuring a shape of the first surface 41 of the object to be tested 40 which is retained in the prescribed retention state; a second measurement of measuring a shape of the second surface 42 of the object to be tested 40 which is retained in the same state; and a third measurement of measuring a shape of the second surface 42 of the object to be tested 40 which is retained such that a reverse distortion occurs therein. Then, first data are obtained on the basis of a first-surface shape data set produced by the first measurement and a second-surface shape data set produced by the second measurement, and second data are obtained on the basis of the first-surface shape data set produced by the first measurement and a second-surface shape data set produced by the third measurement. The retention distortion is computed, based on these first and second data. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：除了在诸如光掩模等的被测试的板状物体中发生的被测试面的形状之外，还能够测量保持变形，因为其保留当保持待测物体处于规定的保持状态时。
解决方案：进行测量，其包括：测量保持在规定保持状态的待测试对象40的第一表面41的形状的第一测量; 测量保持在相同状态的待测试对象40的第二表面42的形状的第二测量; 以及测量待测试物体40的第二表面42的形状的第三测量值，其被保持为在其中发生反向变形。然后，基于由第一测量产生的第一表面形状数据集和由第二测量产生的第二表面形状数据集获得第一数据，并且基于第一表面形状获得第二数据由第一测量产生的数据集和通过第三测量产生的第二表面形状数据集。基于这些第一和第二数据来计算保持失真。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2009079933A Interferometer device for measuring large-sized sample 审中-公开
标题翻译：用于测量大尺寸样品的干燥器装置
公开(公告)号：JP2009079933A
公开(公告)日：2009-04-16
申请号：JP2007247884
申请日：2007-09-25
申请人： Fujinon Corp , フジノン株式会社
发明人： UEKI NOBUAKI
IPC分类号： G01B11/06 , G01B9/02
摘要： PROBLEM TO BE SOLVED: To provide an interferometer device for measuring a large-sized sample acquiring in a short period of time a plurality of interference fringe images corresponding to portions in a domain to be measured necessary for aperture synthesis, respectively, and measuring highly accurately thickness irregularities over the whole area of the domain to be measured of a specimen, concerning the large-sized sheet-shaped specimen.
SOLUTION: The first interferometer heads 1A-1G for irradiating measuring light from one surface 9a side of the specimen 9, and acquiring the first interference fringe image carrying transmission wavefront information of each first domain on the specimen 9, and the second interferometer heads 2A-2F for irradiating measuring light from the other surface side 9b of the specimen 9, and acquiring the second interference fringe image carrying transmission wavefront information of each second domain on the specimen 9, are arranged so that the first domain and the second domain which are mutually adjacent are overlapped partially, and that the domain to be measured is included wholly by respective first domains and second domains.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种干涉仪装置，用于测量在较短时间内分别获取对应于孔径合成所需的被测量域中的部分的多个干涉条纹图像的大尺寸样本，以及相对于大尺寸的片状样品，在试样的被测定区域的整个区域的高度精确地测量厚度不均匀性。解决方案：用于从样本9的一个表面9a侧照射测量光的第一干涉仪头1A-1G，并且获取携带在样本9上的每个第一域的透射波前信息的第一干涉条纹图像，以及第二干涉仪用于照射来自样本9的另一表面侧9b的测量光的头2A-2F，并且获取携带样本9上的每个第二域的透射波前信息的第二干涉条纹图像，使得第一域和第二域彼此相邻的部分重叠，并且被测量的域完全由相应的第一域和第二域包括。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2006064669A Interferometer device for measuring virtual contact surface 有权
标题翻译：用于测量虚拟接触表面的干涉仪装置
公开(公告)号：JP2006064669A
公开(公告)日：2006-03-09
申请号：JP2004250877
申请日：2004-08-30
申请人： Fujinon Corp , フジノン株式会社
发明人： UEKI NOBUAKI
IPC分类号： G01B11/26 , G01B9/02
CPC分类号： G01B11/2441
摘要： PROBLEM TO BE SOLVED: To easily and precisely measure coplanar property to the height direction of each small inspected surface by using measurement light of low coherence and adjusting a formation state of an image on a light detection surface of each small inspected surface, in a specimen having a plurality of small inspected surfaces formed to be positioned on mutually parallel different virtual surfaces.
SOLUTION: A light source 11 is a low coherent light source, and optical path adjustment is performed so that the reflected light from an upper surface 55a of each metal wire 55 interferes with the reflected light from a reference surface 21a in a first measuring, and the reflected light from each conductive layer small region surface 54b interferes with the reflected light from the reference surface 21a in a second measuring. The light detection surface 27 is divided into a plurality of detection unit regions. Based on each light intensity averaged and detected every detection unit region, interference pattern information corresponding to the whole shapes of the first or second virtual contact surface contacting with the upper surface 55a of each metal wire 55 or each conductive layer small region surface 54b is provided.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了通过使用低相干性的测量光并且调节每个小检查表面的光检测表面上的图像的形成状态来容易且精确地测量每个小检查表面的高度方向的共面性质，在具有形成为位于相互平行的不同虚拟表面上的多个小检查表面的样本中。解决方案：光源11是低相干光源，并且进行光路调整，使得来自每个金属线55的上表面55a的反射光在第一个光纤中干涉来自参考表面21a的反射光并且来自每个导电层小区域表面54b的反射光在第二测量中干涉来自参考表面21a的反射光。光检测表面27被分成多个检测单元区域。基于对每个检测单位区域进行平均和检测的每个光强度，提供对应于与每个金属线55的上表面55a或每个导电层小区域表面54b接触的第一或第二虚拟接触表面的整体形状的干涉图案信息。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2005274317A Interferometer device for virtual contact surface measurement 有权
标题翻译：用于虚拟接触表面测量的干涉仪装置
公开(公告)号：JP2005274317A
公开(公告)日：2005-10-06
申请号：JP2004087450
申请日：2004-03-24
申请人： Fujinon Corp , フジノン株式会社
发明人： UEKI NOBUAKI
IPC分类号： G01B9/02 , G01B11/24
摘要： PROBLEM TO BE SOLVED: To measure the whole position distribution relative to the height direction of small inspection surfaces by acquiring interference fringe information corresponding to the shape of a virtual contact surface wholly in contact with the small inspection surfaces by allowing reflected light from the small inspection surface such as each support pin tip face of a pin chuck board to reach the light detection surface and by providing an unnecessary light removal means for suppressing arrival of reflected light from other parts. SOLUTION: A shielding mask 19 as the unnecessary light removal means is installed on the back 21b of a reference plate 21. The light detection surface 27 is divided into a plurality of detection unit domains, and an image of the tip face 55 of each support pin 53 is formed on each domain. The phase of each part of the virtual contact surface in contact with each tip face 55 is determined respectively based on each light intensity averaged and detected in each detection unit domain, and the interference fringe information corresponding to the whole shape of the virtual contact surface is acquired based on each phase. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了通过采用与小检查表面完全接触的虚拟接触面的形状来获取对应于干涉条纹信息来测量相对于小检查面的高度方向的整体位置分布，诸如针卡盘板的每个支撑销尖端面的小检查表面到达光检测表面，并且通过提供用于抑制来自其它部件的反射光的到达的不必要的光去除装置。解决方案：作为不必要的光去除装置的屏蔽掩模19安装在参考板21的背面21b上。光检测表面27被分成多个检测单元域，并且尖端面55的图像每个支撑销53形成在每个区域上。基于在每个检测单位域中平均和检测的每个光强度分别确定与每个尖端面55接触的虚拟接触表面的每个部分的相位，并且与虚拟接触表面的整个形状相对应的干涉条纹信息是基于每个阶段获得。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2005147870A Light wave interference measuring method on winding surface, and interferometer device for winding surface measurement 审中-公开
标题翻译：卷绕表面的光波干扰测量方法和用于卷绕表面测量的干涉仪装置
公开(公告)号：JP2005147870A
公开(公告)日：2005-06-09
申请号：JP2003386321
申请日：2003-11-17
申请人： Fujinon Corp , フジノン株式会社
发明人： UEKI NOBUAKI
IPC分类号： G01B9/02 , G01B11/24
摘要： PROBLEM TO BE SOLVED: To perform easily and stably shape measurement of the whole measuring region on the test surface by moving successively an aperture for restricting a light flux range of measuring light toward the test surface in the light flux of the measuring light, performing inclination adjustment of the test surface based on the forming position of an alignment light figure of test surface light reflected from an irradiation region of the measuring light, and thereby acquiring successively interference fringes classified by the region.
SOLUTION: The aperture 26 is moved so that the irradiation region of the measuring light is dislocated successively over the whole region on the test surface 27a. The inclination adjustment of the test surface 27a is performed at each movement based on the forming position of the alignment light figure of the test surface light, and each shape classified by the region on the test surface 27a is determined successively based on the interference fringes classified by the region acquired thereby. Each acquired shape classified by the region is connected by an aperture synthesis method, to thereby acquire the shape of the whole measuring region on the test surface 27a.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：通过在测量光的光通量中连续移动用于限制测量光的光通量范围的测试光的面向测试表面，在测试表面上简单且稳定地测量整个测量区域的测量基于从测量光的照射区域反射的测试面光的取向光图的形成位置，进行测试面的倾斜调整，从而获取由该区域分类的连续的干涉条纹。
解决方案：孔26被移动，使得测量光的照射区域连续地位于测试表面27a上的整个区域上。基于试验面光的取向光图的形成位置，在每次移动中进行试验面27a的倾斜调整，根据被测试面27a的区域的分类的各形状，依次划分为由此获得的地区。通过孔径合成方法连接由区域分类的每个获取的形状，从而获得测试表面27a上的整个测量区域的形状。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2005098902A Light source output stabilizing method 审中-公开
标题翻译：光源输出稳定方法
公开(公告)号：JP2005098902A
公开(公告)日：2005-04-14
申请号：JP2003334841
申请日：2003-09-26
申请人： Fujinon Corp , フジノン株式会社
发明人： UEKI NOBUAKI , ARAKAWA KAZUHISA
IPC分类号： G01B9/02 , G01N21/01
摘要： PROBLEM TO BE SOLVED: To stably conduct automatic interference measurement of a sample, by slightly changing the inrush current of LD, until a computed value exceeds a threshold, when the computed modulation value of the acquired interference fringe image is below the threshold, or by returning to the proper conditions of a contrast promptly, also when an interference fringe contrast falls according to a mode-hop phenomenon.
SOLUTION: The interference fringe image of a sample is acquired with an interferometer device (S1), modulation value γ for every pixel is computed by analyzing an interference fringes image (S2), and it is determined whether in more than a regulated number, there are pixels in which this modulation value γ exceeds a predetermined threshold (S3). If it is determined that the number is more than the stipulated number, normal interference fringe image analysis processing is performed (S4), whereas if it is determined that the regulated number has not been reached, the inrush current of LD11 is changed only by the predetermined minute amount (S5). Thereafter, the is returned to Step 1 (S1), and this series of processes are repeated.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了稳定地进行样品的自动干涉测量，通过稍微改变LD的浪涌电流，直到计算值超过阈值，当计算出的干涉条纹图像的调制值低于阈值时或者当干扰条纹对比度根据模式跳跃现象而下降时，也可以迅速返回到对比度的适当条件。解决方案：用干涉仪装置（S1）采集样品的干涉条纹图像，通过分析干涉条纹图像（S2）计算每个像素的调制值γ，并确定是否超过调节数字，存在这种调制值γ超过预定阈值的像素（S3）。如果确定数量超过规定数量，则执行正常的干涉条纹图像分析处理（S4），而如果确定尚未达到规定数量，则LD11的浪涌电流仅由预定微量（S5）。之后，返回步骤1（S1），重复一连串处理。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2005062012A Vibration-proof type interferometer device 有权
标题翻译：振动型防干扰器装置
公开(公告)号：JP2005062012A
公开(公告)日：2005-03-10
申请号：JP2003292965
申请日：2003-08-13
申请人： Fujinon Corp , フジノン株式会社
发明人： UEKI NOBUAKI
IPC分类号： G01B9/02 , G01B11/24 , G01J9/02
CPC分类号： G01J9/02 , G01B11/2441
摘要： PROBLEM TO BE SOLVED: To suppress optically a change of interference fringe during measurement even if a relative position relation between a reference plane and an inspection plane is changed, by branching a beam emitted from a low coherence light source into two beams, reflecting the two beams by the reference plane and the inspection plane, and then re-coupling the two beams into one beam to thereby acquire an irradiation beam.
SOLUTION: This device is provided with a half mirror 4 for branching the beam emitted from the low coherence light source 1 into the two beams, a sub-reference plate 6 held integrally with a reference plate 16, and a sub-inspection body 8 held integrally with an inspection body 17. The first beam branched by the half mirror 4 is reflected by a mirror 5 and reaches a sub-reference plane 6a, and is reflected by the sub-reference plane 6a, returned along the same optical path and transmitted through the half mirror 4. The second beam reaches a sub-inspection plane 8a and is reflected by the sub-inspection plane 8a, returned along the same optical path, and coupled with the first beam by the half mirror 4, to thereby form the irradiation beam.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：即使改变参考平面和检查平面之间的相对位置关系，通过将从低相干光源发射的光束分支成两束，也可以光学地抑制测量期间的干涉条纹的变化，通过参考平面和检查平面反射两个光束，然后将两个光束重新耦合到一个光束中，从而获得照射光束。解决方案：该装置设置有半反射镜4，用于将从低相干光源1发射的光束分成两束，与参考板16一体地保持的辅助基准板6和副检查主体8与检查体17一体地保持。由半反射镜4分支的第一光束被反射镜5反射并到达副参考平面6a，并被副参考平面6a反射，沿着相同的光学路径并透过半反射镜4.第二光束到达副检查平面8a，并被副检查平面8a反射，沿着相同的光路返回，并且通过半透半反镜4与第一光束耦合到从而形成照射光束。版权所有（C）2005，JPO＆NCIPI

8. 发明专利

JP2010091513A Transmission wavefront measuring method of birefringence optical element 有权
标题翻译：传输光学元件的透射波形测量方法
公开(公告)号：JP2010091513A
公开(公告)日：2010-04-22
申请号：JP2008263927
申请日：2008-10-10
申请人： Fujinon Corp , フジノン株式会社
发明人： UEKI NOBUAKI , ITO EIJI
IPC分类号： G01M11/02 , G01M11/00 , G01N21/23
摘要： PROBLEM TO BE SOLVED: To provide a transmission wavefront measuring method of a birefringence optical element measuring properly a transmission wavefront, even when imaging an interference fringe having a domain where transmission wavefront information is not carried correctly by an influence of birefringence carried by a test optical element.
SOLUTION: Each interference fringe is imaged relative to each of a plurality of imaging arrangement positions set so that a relative position relation between a direction of a plane of polarization of measuring light and the test optical element is mutually different, and improper domains A
1 , A
2 where the transmission wavefront information is not carried correctly are specified in each imaged interference fringe. Each wavefront shape information in other domains excluding the improper domains A
1 , A
2 is linked mutually by a synthetic aperture method to determine wavefront shape information of the whole transmission wavefront area, and an aberration of the transmission wavefront is determined based on the wavefront shape information of the whole transmission wavefront area.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供适当地测量透射波前的双折射光学元件的透射波面测量方法，即使对具有透射波前信息的区域的干涉条纹进行成像，由于双折射的影响，测试光学元件。解决方案：每个干涉条纹相对于设定的多个成像布置位置中的每一个成像，使得测量光的偏振平面的方向与测试光学元件之间的相对位置关系彼此不同，并且不适当的结构域在每个成像的干涉条纹中指定发送波前信息未正确携带的 1 ，A 2 。除了不正确的域A 1 ，A 2 的其他域中的每个波阵面形状信息通过合成孔径方法相互链接以确定整个发射波阵面区域的波阵面形状信息，并且基于整个发送波前区域的波阵面形状信息确定发送波阵面的像差。版权所有（C）2010，JPO＆INPIT

9. 发明专利

JP2010054348A Aberration measurement error correction method 审中-公开
标题翻译： ABERRATION测量误差校正方法
公开(公告)号：JP2010054348A
公开(公告)日：2010-03-11
申请号：JP2008219765
申请日：2008-08-28
申请人： Fujinon Corp , フジノン株式会社
发明人： UEKI NOBUAKI
IPC分类号： G01M11/02
摘要： PROBLEM TO BE SOLVED: To provide an aberration measurement error correction method capable of correcting measurement errors of coma aberration which occurs due to tilt errors of a null optical element in the transmitted wavefront measurement of a lens to be inspected.
SOLUTION: The correlation between the amount of occurrence of tilt errors of the null optical element and the amount of occurrence of coma aberration is determined by computer simulation, and the actual amount of occurrence of the tilt errors of the null optical element is measured. The predicted amount of occurrence of coma aberration predicted to occur due to the actual amount of occurrence is determined on the basis of the determined correlation and the actual amount of occurrence of the tilt errors of the null optical element. Measurement errors are corrected on the basis of the predicted amount of occurrence.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：提供一种像差测量误差校正方法，其能够校正由于要检查的透镜的透射波前测量中的零光学元件的倾斜误差而产生的彗形像差的测量误差。解决方案：通过计算机模拟确定零光学元件的倾斜误差的发生量与彗形像差的发生量之间的相关性，并且零光学元件的倾斜误差的实际发生量为测量。基于确定的相关性和零光学元件的倾斜误差的实际发生量来确定由于实际发生量而预测发生的彗差的预测发生量。基于预测的发生量校正测量误差。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2010025649A Thickness measuring method of parallel flat plate 有权
标题翻译：平行平板厚度测量方法
公开(公告)号：JP2010025649A
公开(公告)日：2010-02-04
申请号：JP2008185485
申请日：2008-07-17
申请人： Fujinon Corp , フジノン株式会社
发明人： UEKI NOBUAKI
IPC分类号： G01B11/06 , G01B9/02 , G01M11/02
摘要： PROBLEM TO BE SOLVED: To measure the thickness of a transparent parallel flat plate highly accurately contactlessly.
SOLUTION: A simulated transmission wavefront is measured in with a simulated parallel flat plate having a known thickness arranged between a measuring lens 1 and a reference spherical reflecting mirror 7, by means of computer simulation, and a correspondence relation is determined, between spherical aberration of the simulated transmission wavefront acquired by transmission through the measuring lens 1 and the simulated parallel flat plate and the thickness of the simulated parallel flat plate. A correction plate 6 is arranged between the measuring lens 1 and the reference spherical reflecting mirror 7, and spherical aberration of a test transmission wavefront acquired by transmission through the measuring lens 1 and the correction plate 6 is measured actually, and the thickness of the correction plate 6 is calculated based on the measured value and the correspondence relation.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：高精度地非接触地测量透明平行平板的厚度。解决方案：通过计算机模拟测量具有布置在测量透镜1和参考球面反射镜7之间的具有已知厚度的模拟平行平板的模拟透射波前，并且确定对应关系，通过透射测量透镜1和模拟平行平板获得的模拟透射波前的球面像差和模拟的平行平板的厚度。在测量透镜1和基准球面反射镜7之间设置有校正板6，实际测量通过测量透镜1和校正板6透射而获得的测试透射波面的球面像差，校正厚度基于测量值和对应关系计算板6。版权所有（C）2010，JPO＆INPIT

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