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1. 发明专利

JP2008156215A Method for finishing surface of preliminary polished glass substrate 有权
标题翻译：初步抛光玻璃基材表面处理方法
公开(公告)号：JP2008156215A
公开(公告)日：2008-07-10
申请号：JP2007295279
申请日：2007-11-14
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： OTSUKA KOJI , OKAMURA KENJI
IPC分类号： C03C15/00 , C03B20/00 , C03C19/00
CPC分类号： G01B9/02065 , C03C15/02 , C03C19/00 , C03C23/006 , C03C2204/08 , G01B9/02057 , G01B9/0209 , G01B11/30 , G03F1/60 , H01J2237/0812 , Y10T428/24355
摘要： PROBLEM TO BE SOLVED: To provide a method for finishing a preliminary polished glass substrate to have a surface excellent in flatness. SOLUTION: The surface of a preliminary polished quartz glass substrate containing a dopant and composed mainly of SiO 2 is finished by any method selected from the group comprising ion beam etching, gas cluster ion beam etching, and plasma etching. The method includes a step of measuring the flatness of the glass substrate surface using a shape measuring means comprising a low coherent light source and an interference optical system for obtaining interference fringe carrying wavefront information of the glass substrate surface and a step of measuring the concentration distribution of a dopant contained in the glass substrate. The conditions for finishing of the glass substrate surface are set for each site of the glass substrate, on the basis of the measured results in the steps. Thereafter, the finishing is carried out under the determined finishing conditions while maintaining the angle of the normal line of the glass substrate to a beam incident on the glass substrate surface at 30 to 89 °. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种完成预抛光玻璃基板以使其表面平坦度优异的方法。解决方案：包含掺杂剂并且主要由SiO 2 SBS组成的初步抛光石英玻璃基板的表面通过选自离子束蚀刻，气体簇离子束蚀刻，和等离子体蚀刻。该方法包括使用包括低相干光源的形状测量装置和用于获得玻璃衬底表面的干涉条纹携带波前信息的干涉光学系统来测量玻璃衬底表面的平坦度的步骤和测量浓度分布的步骤包含在玻璃基板中的掺杂剂。基于步骤中的测量结果，对玻璃基板的每个部位设置玻璃基板表面的整理条件。此后，在确定的整理条件下进行精加工，同时将玻璃基板的法线的角度保持在入射到玻璃基板表面上的光束为30至89°。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2007287737A Method of manufacturing highly flat and smooth glass substrate 有权
标题翻译：制造高平板和平板玻璃基板的方法
公开(公告)号：JP2007287737A
公开(公告)日：2007-11-01
申请号：JP2006109937
申请日：2006-04-12
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： OTSUKA KOJI , KOJIMA HIROSHI , ITO MASABUMI
IPC分类号： H01L21/027 , C03C15/00 , G03F1/22 , G03F1/24 , G21K1/06
CPC分类号： C03C15/02 , B24B7/242 , B24B37/08 , C03C3/06 , C03C19/00 , C03C23/005 , C03C23/006 , C03C2201/42 , C03C2204/08 , Y10T428/24355
摘要： PROBLEM TO BE SOLVED: To provide a machining method of manufacturing a highly flat and smooth glass substrate with satisfactory productivity. SOLUTION: Machining is performed to the glass substrate. The machining includes: a process for measuring the surface shape of a glass substrate surface before machining; a machining process (first machining process) for performing machining to the inside of the surface of the substrate by changing machining conditions depending on locations; and a process (second machining process) for performing finish polishing to the glass substrate surface subjected to the first machining process, thus obtaining the highly flat and smooth glass substrate with satisfactory productivity. In this case, the machining conditions of each place in the surface of the substrate in the first machining process are determined by the uneven shape of the glass substrate surface before the machining, and the inplane distribution of the amount of machining by the second machining process measured by using the same substrate separately. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种制造具有令人满意的生产率的高平坦光滑玻璃基板的加工方法。
解决方案：对玻璃基板进行加工。该加工包括：在加工前测量玻璃基板表面的表面形状的工艺; 用于通过根据位置改变加工条件对基材表面的内部进行加工的加工工艺（第一加工工艺）; 以及用于对经过第一次加工处理的玻璃基板表面进行精加工的工序（第二加工工序），从而以令人满意的生产率得到高平坦光滑的玻璃基板。在这种情况下，第一加工中的基板表面的各处的加工条件由加工前的玻璃基板表面的凹凸形状以及第二加工工序的加工量的面内分布通过分别使用相同的底物测量。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2006240977A Process for polishing glass substrate 有权
标题翻译：抛光玻璃基板的工艺
公开(公告)号：JP2006240977A
公开(公告)日：2006-09-14
申请号：JP2005337329
申请日：2005-11-22
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： OTSUKA KOJI , ITO MASABUMI , KOJIMA HIROSHI
IPC分类号： C03C15/00
摘要： PROBLEM TO BE SOLVED: To provide a process for polishing a glass substrate, capable of polishing a glass substrate having a large waviness formed by mechanical polishing, to have a surface excellent in flatness.
SOLUTION: The process for polishing a glass substrate, comprising a step of measuring the surface profile of a mechanically polished glass substrate to identify the width of waviness present in the surface of the glass substrate, and a step of applying dry etching using a beam having a beam size in FWHM (full width of half maximum) value of at most the above size of waviness, to polish the surface of the glass substrate.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种抛光玻璃基板的方法，该玻璃基板能够抛光具有通过机械抛光形成的大波纹的玻璃基板，以具有优异的平面度的表面。解决方案：用于抛光玻璃基板的方法，包括测量机械抛光的玻璃基板的表面轮廓以识别存在于玻璃基板的表面中的波纹宽度的步骤，以及使用具有至多上述波纹尺寸的FWHM（全宽度半值）值的光束的光束，以抛光玻璃基板的表面。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2007022903A Method of finishing pre-polished glass substrate surface 有权
标题翻译：预处理玻璃基板表面的方法
公开(公告)号：JP2007022903A
公开(公告)日：2007-02-01
申请号：JP2006051806
申请日：2006-02-28
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： OTSUKA KOJI
IPC分类号： C03C15/02 , C03C15/00 , G03F1/22 , G03F1/24 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method by which the waviness generated in a glass substrate surface during pre-polishing are removed and the glass substrate is finished so as to have a highly flat surface.
SOLUTION: In the method of finishing a pre-polished glass substrate surface, the glass substrate is made of quartz glass containing a dopant and comprising SiO
2 as a main component. The finishing method comprises a step for measuring a concentration distribution of the dopant contained in the glass substrate and a step for measuring a surface shape of the glass substrate in the pre-polished state, wherein conditions for processing the glass substrate surface are set for each part of the glass substrate based on the results from the step for measuring the concentration distribution of the dopant contained in the glass substrate and the step for measuring the surface shape of the glass substrate.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种在预抛光期间在玻璃基板表面产生的波纹被去除并且玻璃基板被加工成具有高平坦表面的方法。解决方案：在完成预抛光玻璃基板表面的方法中，玻璃基板由含有掺杂剂的石英玻璃制成，并包含SiO 2 为主要成分。精加工方法包括测量玻璃基板中所含的掺杂剂的浓度分布的步骤和在预抛光状态下测量玻璃基板的表面形状的步骤，其中为每个玻璃基板表面设置用于处理玻璃基板表面的条件基于用于测量玻璃基板中所含的掺杂剂的浓度分布的步骤的结果和用于测量玻璃基板的表面形状的步骤的结果的玻璃基板的一部分。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2006008426A Method for polishing glass substrate 有权
标题翻译：抛光玻璃基板的方法
公开(公告)号：JP2006008426A
公开(公告)日：2006-01-12
申请号：JP2004184151
申请日：2004-06-22
申请人： Asahi Glass Co Ltd , 旭硝子株式会社
发明人： OTSUKA KOJI , ITO MASABUMI
IPC分类号： C03C15/00 , C03C15/02 , G03F1/22 , G03F1/24 , H01L21/027
CPC分类号： C03C15/02
摘要： PROBLEM TO BE SOLVED: To provide a method for polishing a glass substrate being required for advanced flatness and smoothness.
SOLUTION: After the flatness of a preliminarily polished glass substrate is improved by treating its surface with gas cluster ion-beam etching at a first stage, its surface roughness is improved by treating the surface with gas cluster ion-beam etching at a second stage where an irradiating condition is different from that at the first stage. Finishing polishing is performed to be flatness of 0.05 μm or less and surface roughness (Rms) of 0.25 nm or less.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于抛光玻璃基板的方法，以提高平坦度和平滑度。解决方案：通过在第一阶段用气体簇离子束蚀刻处理其表面，在预先抛光的玻璃基板的平坦度得到改善之后，通过用气体簇离子束蚀刻处理表面来改善其表面粗糙度照射条件与第一阶段不同的第二阶段。进行抛光是0.05μm以下的平坦度，0.25nm以下的表面粗糙度（Rms）。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2006126082A Method and apparatus for measuring retention distortion 有权
标题翻译：用于测量保持失真的方法和装置
公开(公告)号：JP2006126082A
公开(公告)日：2006-05-18
申请号：JP2004316788
申请日：2004-10-29
申请人： Asahi Glass Co Ltd , Fujinon Corp , フジノン株式会社 , 旭硝子株式会社
发明人： UEKI NOBUAKI , OTSUKA KOJI
IPC分类号： G01B21/32 , G01B11/16
CPC分类号： G03F1/84 , G01B11/2441
摘要： PROBLEM TO BE SOLVED: To enable a retention distortion to be measured in addition to shapes of a face to be tested, which occurs in a plate-like object to be tested such as a photomask or the like, due to its retention state, when retaining the object to be tested in a prescribed retention state. SOLUTION: Measurements are carried out, which comprises; a first measurement of measuring a shape of the first surface 41 of the object to be tested 40 which is retained in the prescribed retention state; a second measurement of measuring a shape of the second surface 42 of the object to be tested 40 which is retained in the same state; and a third measurement of measuring a shape of the second surface 42 of the object to be tested 40 which is retained such that a reverse distortion occurs therein. Then, first data are obtained on the basis of a first-surface shape data set produced by the first measurement and a second-surface shape data set produced by the second measurement, and second data are obtained on the basis of the first-surface shape data set produced by the first measurement and a second-surface shape data set produced by the third measurement. The retention distortion is computed, based on these first and second data. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：除了在诸如光掩模等的被测试的板状物体中发生的被测试面的形状之外，还能够测量保持变形，因为其保留当保持待测物体处于规定的保持状态时。
解决方案：进行测量，其包括：测量保持在规定保持状态的待测试对象40的第一表面41的形状的第一测量; 测量保持在相同状态的待测试对象40的第二表面42的形状的第二测量; 以及测量待测试物体40的第二表面42的形状的第三测量值，其被保持为在其中发生反向变形。然后，基于由第一测量产生的第一表面形状数据集和由第二测量产生的第二表面形状数据集获得第一数据，并且基于第一表面形状获得第二数据由第一测量产生的数据集和通过第三测量产生的第二表面形状数据集。基于这些第一和第二数据来计算保持失真。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2003260644A MACHINING METHOD OF PLATE-LIKE BODY AND ITS MACHINING DEVICE 审中-公开
公开(公告)号：JP2003260644A
公开(公告)日：2003-09-16
申请号：JP2002062220
申请日：2002-03-07
申请人： ASAHI GLASS CO LTD
发明人： ITO MASABUMI , OTSUKA KOJI
IPC分类号： G01B11/24 , B24B7/24 , B24B37/30 , B24B41/06 , B24B37/04
摘要： PROBLEM TO BE SOLVED: To provide a machining method and a machining device of a plate-like body capable of highly flat machining the plate-like body. SOLUTION: Three-dimensional shape data of the back surface of the plate- like body is previously obtained by measuring the three-dimensional shape of the back surface B of the plate-like body with a shape measuring device. A solid matter is then selectively adhered to the back surface of the plate-like body so that the back surface becomes apparently flat based on the obtained three-dimensional shape data of the back surface of the plate-like body, then the back surface of the plate-like body is held by a surface plate 7, and a surface T of the plate-like body is flattened by a grinding or polishing means. COPYRIGHT: (C)2003,JPO

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