专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2013069902A Template regeneration method and template regeneration apparatus 审中-公开
标题翻译：模板再生方法和模板再生装置
公开(公告)号：JP2013069902A
公开(公告)日：2013-04-18
申请号：JP2011207821
申请日：2011-09-22
申请人： Toshiba Corp , 株式会社東芝
发明人： KOBAYASHI MASAKO , HIRABAYASHI HIDEAKI
IPC分类号： H01L21/027
CPC分类号： B29C33/3842 , B29C33/58
摘要： PROBLEM TO BE SOLVED: To provide a template regeneration method and a template regeneration apparatus which achieve a template having high durability.SOLUTION: The template regeneration method according to an embodiment for regenerating a template having both a transfer surface provided with an uneven pattern and a release layer including an inorganic functional group part and an organic functional group part which are bonded to the transfer surface comprises the steps of: removing the organic functional group part of the release layer by oxidative decomposition; removing the inorganic functional group part of the release layer; and bonding a silane coupling agent to the transfer surface to form the release layer.
摘要翻译：要解决的问题：提供实现具有高耐久性的模板的模板再生方法和模板再生装置。解决方案：根据实施方案的用于再生具有设置有不平坦图案的转印面的模板和包含无机官能团部分和有机官能团部分的剥离层的模板再生方法，所述无机官能团部分和有机官能团部分结合到转印表面包括以下步骤：通过氧化分解除去脱模层的有机官能团部分; 去除脱模层的无机官能团部分; 并将硅烷偶联剂粘合到转移表面以形成释放层。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2017118092A 基板処理装置、基板処理方法およびエッチング液审中-公开
公开(公告)号：JP2017118092A
公开(公告)日：2017-06-29
申请号：JP2016126927
申请日：2016-06-27
申请人：株式会社東芝 , Toshiba Corp
发明人： SATO KATSUHIRO , DEURA KAORI , KITAMURA YOSHINORI , TERADA TAKAHIRO , OGAWA YOSHIHIRO , HASHIMOTO YUJI , HIRAKAWA MASAAKI , MURAKAMI YUKAKO , HIRABAYASHI HIDEAKI
IPC分类号： H01L21/308 , H01L21/306
摘要：【課題】シリカの析出を抑制する基板処理装置、基板処理方法およびエッチング液を提供する。【解決手段】本実施形態による基板処理装置は、処理部と、循環路と、加熱部と、第1投入部とを備える。処理部は、リン酸とシリカ析出抑制剤とを含むエッチング液が供給され、エッチング液に、表面にシリコン窒化膜を有する基板を接触させて、基板からシリコン窒化膜を除去する。循環路は、処理部に対してエッチング液を循環させる。加熱部は、エッチング液を加熱する。第1投入部は、循環路に設けられ、エッチング液中にシリカ析出抑制剤を投入する。【選択図】図1

3. 发明专利

JP2013155250A Heating medium 审中-公开
标题翻译：加热介质
公开(公告)号：JP2013155250A
公开(公告)日：2013-08-15
申请号：JP2012015697
申请日：2012-01-27
申请人： Toshiba Corp , 株式会社東芝
发明人： YAMAGE MASASHI , NOMA TAKESHI , KON MASAO , KONISHI CHIAKI , HIRABAYASHI HIDEAKI , MURAYAMA HIROTOSHI
IPC分类号： C09K5/08 , C01B31/02
摘要： PROBLEM TO BE SOLVED: To provide a heating medium having high thermal conductivity.SOLUTION: A heating medium according to an embodiment comprises: a dispersion medium containing at least one chosen from the group consisting of water and an organic solvent; and graphene sheet having a plane shape, wherein the heating medium further comprises a carbon material dispersed in the dispersion medium.
摘要翻译：要解决的问题：提供一种具有高热导率的加热介质。解决方案：根据一个实施方案的加热介质包括：含有选自水和有机溶剂中的至少一种的分散介质; 和具有平面形状的石墨烯片，其中所述加热介质还包含分散在所述分散介质中的碳材料。

4. 发明专利

JP2013077843A Substrate processing device and substrate processing method 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：JP2013077843A
公开(公告)日：2013-04-25
申请号：JP2013006141
申请日：2013-01-17
申请人： Toshiba Corp , 株式会社東芝
发明人： SAKURAI NAOAKI , HIRABAYASHI HIDEAKI
IPC分类号： H01L21/306
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing device capable of enhancing in-plane uniformity of an etching amount of a substrate to be processed at the time of etching of the substrate to be processed.SOLUTION: A substrate processing device comprises: a processing chamber having a gas supplying section and a gas discharging section; a holding member that is disposed in the processing chamber and holds a substrate to be processed in a rotatable and vertically movable manner; a first temperature regulator for performing temperature regulation of gas supplied to the processing chamber; an etching liquid supplying member for supplying etching liquid to the substrate to be processed and performing an etching process; an etching liquid supplying tank connected to the etching liquid supplying member outside the processing chamber; a second temperature regulator for performing temperature regulation of the etching liquid in the etching liquid supplying tank; and a controlling mechanism for controlling the temperature regulation of the gas and the temperature regulation of the etching liquid performed by first and second temperature regulators such that a temperature in the processing chamber becomes higher than a temperature of the etching liquid in the etching liquid supplying tank and a difference between the temperatures becomes constant.
摘要翻译：要解决的问题：提供一种能够在蚀刻待处理基板时提高待处理基板的蚀刻量的面内均匀性的基板处理装置。解决方案：一种基板处理装置，包括：具有气体供给部和气体排出部的处理室; 保持构件，其设置在处理室中并以可旋转且可垂直移动的方式保持待处理基板; 第一温度调节器，用于对供应到处理室的气体进行温度调节; 蚀刻液供给部件，用于向被处理基板供给蚀刻液，进行蚀刻处理; 在处理室外部与蚀刻液供给部件连接的蚀刻液供给槽; 第二温度调节器，用于对蚀刻液供应罐中的蚀刻液进行温度调节; 以及用于控制气体的温度调节和由第一和第二温度调节器执行的蚀刻液的温度调节的控制机构，使得处理室中的温度变得高于蚀刻液供应罐中的蚀刻液体的温度并且温度之间的差异变得恒定。版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2012069696A Substrate processing device and substrate processing method 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：JP2012069696A
公开(公告)日：2012-04-05
申请号：JP2010212632
申请日：2010-09-22
申请人： Toshiba Corp , 株式会社東芝
发明人： SAKURAI NAOAKI , HIRABAYASHI HIDEAKI
IPC分类号： H01L21/306 , B08B3/02 , H01L21/304
CPC分类号： H01L21/67248 , H01L21/31111 , H01L21/6708 , H01L21/67109
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing device, capable of improving in-plane uniformity of an etching amount on a substrate to be processed when etching the substrate to be processed.SOLUTION: A substrate processing device comprises: a processing chamber having a gas supply unit and an exhaust unit; a retention member disposed in the processing chamber, for retaining the substrate to be processed rotatably and vertically movably; a first temperature regulator for controlling gas temperature to be supplied to the chamber; an etchant supply member for etching by supplying etchant to the substrate to be processed; an etchant supply tank connected to the etchant supply member outside the chamber; a second temperature regulator for controlling etchant temperature in a tank; and a control mechanism for controlling the gas temperature and the etchant temperature by the first and second temperature regulators, in such a manner that the temperature in the chamber is higher than the etchant temperature in the tank, and the temperature difference therebetween is maintained constant.
摘要翻译：要解决的问题：提供一种基板处理装置，其能够在蚀刻待处理基板时提高待加工基板上的蚀刻量的面内均匀性。解决方案：基板处理装置包括：具有气体供应单元和排气单元的处理室; 设置在所述处理室中的保持构件，用于将所述被处理基板可旋转地和垂直地移动地保持; 第一温度调节器，用于控制供应到所述室的气体温度; 蚀刻剂供给部件，用于通过向待处理的基板供给蚀刻剂进行蚀刻; 蚀刻剂供应罐，连接到室外的蚀刻剂供应构件; 用于控制罐中蚀刻剂温度的第二温度调节器; 以及用于通过第一和第二温度调节器控制气体温度和蚀刻剂温度的控制机构，使得室中的温度高于罐中的蚀刻剂温度，并且其间的温度差保持恒定。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2011232224A Scintillator member, radiation detector and radiation monitor 有权
标题翻译：扫描仪成员，辐射探测器和辐射监测器
公开(公告)号：JP2011232224A
公开(公告)日：2011-11-17
申请号：JP2010103748
申请日：2010-04-28
申请人： Toshiba Corp , 株式会社東芝
发明人： HATTORI KANAKO , SAKAI HIROTAKA , AOKI MASASHI , SUMIDA AKIO , MAKINO SHUNICHIRO , HIRABAYASHI HIDEAKI , HAYAMIZU NAOYA , IINO DAIKI , SASAKI SHINICHI
IPC分类号： G01T1/20
摘要： PROBLEM TO BE SOLVED: To provide a scintillator member which can measure radiation ray, especially beta ray, with high sensitivity and whose mechanical strength is enhanced and to provide a radiation detector using the scintillator member.SOLUTION: A radiation detector includes a scintillator 14 for generating fluorescence upon incidence of radiation ray, a reflection layer 16 for inhibiting the transmission of light formed on the surface of the radiation ray entering surface of the scintillator 14, a light blocking layer 17 provided on the surface of the reflection layer 16 and a protection layer 18 provided on the surface of the light blocking layer 17 and enhances the mechanical strength of the scintillator.
摘要翻译：要解决的问题：提供一种可以高灵敏度地测量辐射线，特别是β射线并且其机械强度增强并且提供使用闪烁体部件的辐射探测器的闪烁体部件。解决方案：辐射检测器包括用于在辐射线入射时产生荧光的闪烁体14，用于抑制在闪烁体14的辐射线入射表面的表面上形成的光的透射的反射层16，遮光层 17设置在反射层16的表面上，保护层18设置在遮光层17的表面上，提高了闪烁体的机械强度。版权所有（C）2012，JPO＆INPIT

7. 发明专利

JP2006107738A Manufacturing method of image display device 审中-公开
标题翻译：图像显示装置的制造方法
公开(公告)号：JP2006107738A
公开(公告)日：2006-04-20
申请号：JP2004288313
申请日：2004-09-30
申请人： Toshiba Corp , 株式会社東芝
发明人： SAITO SHUICHI , SAKURAI NAOAKI , HIRABAYASHI HIDEAKI
IPC分类号： H01J9/227 , H01J9/22
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing a planar image display device using low-cost and excellent electron emission elements by curtailing manufacturing processes of its front substrate without deteriorating its performance.
SOLUTION: The manufacturing method of the image display device includes a process of forming a front substrate by forming a light-shielding layer having a lattice-shaped pattern, forming a light selection and transmission layer as well as a phosphor layer in turn on each area on the substrate zoned by the light-shielding layer with an ink-jet method, and forming a metal-back layer on the phosphor layer.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种通过缩短其前基板的制造工艺来制造使用低成本和优异的电子发射元件的平面图像显示装置的方法，而不会降低其性能。解决方案：图像显示装置的制造方法包括通过形成具有格子图案的遮光层来形成前基板的工艺，依次形成光选择和透射层以及荧光体层在通过喷墨法由遮光层划分的基板上的每个区域上，并在荧光体层上形成金属背层。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2014062297A Processing apparatus, method for producing processing liquid, and method for producing electronic device 审中-公开
标题翻译：加工设备，生产加工液的方法和用于生产电子设备的方法
公开(公告)号：JP2014062297A
公开(公告)日：2014-04-10
申请号：JP2012207599
申请日：2012-09-20
申请人： Toshiba Corp , 株式会社東芝
发明人： HIRABAYASHI HIDEAKI , NAGASHIMA YUJI , HIRAKAWA MASAAKI
IPC分类号： C25B9/00 , C02F1/46 , H01L21/304
CPC分类号： H01L21/02041 , H01L21/02052
摘要： PROBLEM TO BE SOLVED: To provide a processing apparatus with which productivity of a processing liquid is increased, a method for producing the processing liquid, and a method for producing an electronic device.SOLUTION: A Processing apparatus includes: an electrolysis part in which an anode electrode and a cathode electrode are installed and which electrolyzes a solution including alkali without metal, hydrochloric acid, and water; an alkali addition part to further add alkali without metal to the electrolyzed solution; and a processing part to process an object by using the solution to which the alkali without metal has been added.
摘要翻译：要解决的问题：提供一种处理液的生产率提高的处理装置，一种处理液的制造方法和一种电子装置的制造方法。一种处理装置，包括：电解部，其中，阳极电极和阴极电极，并且电解包含碱的溶液而不含金属，盐酸和水; 碱加成部分，以进一步向电解液中添加不含金属的碱; 以及通过使用没有添加没有金属的碱的溶液来处理物体的处理部。

9. 发明专利

JP2006107739A Manufacturing method of image display device 审中-公开
标题翻译：图像显示装置的制造方法
公开(公告)号：JP2006107739A
公开(公告)日：2006-04-20
申请号：JP2004288314
申请日：2004-09-30
申请人： Toshiba Corp , 株式会社東芝
发明人： SAKURAI NAOAKI , HIRABAYASHI HIDEAKI , SAITO SHUICHI
IPC分类号： H01J9/02 , H01J1/316
摘要： PROBLEM TO BE SOLVED: To manufacture a low-cost and excellent image display device by curtailing manufacturing processes of its front substrate without deteriorating its performance. SOLUTION: A pair of element electrodes are connected with a first wiring and a second wiring formed in electric insulation from each other, and then, these are connected. COPYRIGHT: (C)2006,JPO&NCIPI

10. 发明专利

JP2006100226A Manufacturing method of image display device 审中-公开
标题翻译：图像显示装置的制造方法
公开(公告)号：JP2006100226A
公开(公告)日：2006-04-13
申请号：JP2004288225
申请日：2004-09-30
申请人： Toshiba Corp , 株式会社東芝
发明人： SAITO SHUICHI , HIRABAYASHI HIDEAKI , MATSUNAKA SHIGEKI
IPC分类号： H01J9/22
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of an image display device in which discharge current can be suppressed sufficiently.
SOLUTION: This is the manufacturing method of the image display device which comprises a front substrate having a fluorescent screen including a phosphor layer and a light shielding layer and a metal back layer of lattice shape provided overlapped on this fluorescent screen, and a rear substrate which is arranged opposed to the front substrate and is arranged with an electron emitting element for emitting electrons toward the fluorescent screen. In the manufacturing method, after a metal film 23 for forming the metal back layer is formed on the main surface of the fluorescent screen, the light from a lamp 25 is irradiated on the metal film 23 through a patterned light shielding mask 24 and the metal film 23 is selectively evaporated, and the metal back layer 19 of lattice shape is formed.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决的问题：提供可以充分抑制放电电流的图像显示装置的制造方法。解决方案：这是一种图像显示装置的制造方法，其包括具有荧光屏的前面基板，该荧光屏包括荧光体层，遮光层和重叠在该荧光屏上的格子状金属背层，以及后基板，其布置成与前基板相对并且布置有用于向荧光屏发射电子的电子发射元件。在制造方法中，在荧光屏的主面上形成用于形成金属背层的金属膜23之后，通过图案遮光掩模24将来自灯25的光照射在金属膜23上，并且金属选择性地蒸镀薄膜23，形成格子状金属背层19。版权所有（C）2006，JPO＆NCIPI

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式