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1. 发明专利

JP2010122526A Maskless exposure method 审中-公开
标题翻译： MASKLESS曝光方法
公开(公告)号：JP2010122526A
公开(公告)日：2010-06-03
申请号：JP2008297131
申请日：2008-11-20
申请人： Shinko Electric Ind Co Ltd , 新光電気工業株式会社
发明人： YOSHIZAWA KEISUKE
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , H05K3/00
摘要： PROBLEM TO BE SOLVED: To achieve a maskless exposure method for improving alignment accuracy without decreasing throughput.
SOLUTION: The maskless exposure method includes: a distortion information acquiring step of acquiring information relating to distortion in each region on a substrate; an average calculation step of calculating an average of distortion generated in each region by using the information relating to the distortion acquired for a plurality of substrates; a posture shift value acquiring step of acquiring a posture shift amount of an exposure object substrate; a regional correction step of correcting each exposure data specifying an exposure pattern formed in each region on the exposure object substrate by using the average of distortion corresponding to the region; a posture shift correction step of correcting the exposure data corrected in the regional correcting step so as to match the posture shift of the exposure object substrate by using the acquired posture shift value of the exposure object substrate; and an exposure step of directly exposing the exposure object substrate by using each exposure data corrected in the posture shift correction step.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：实现用于提高对准精度而不降低生产量的无掩模曝光方法。无掩模曝光方法包括：失真信息获取步骤，获取与基板上的每个区域中的失真有关的信息; 平均计算步骤，通过使用与针对多个基板获取的失真有关的信息来计算在每个区域中产生的失真的平均值; 姿势偏移值获取步骤，获取曝光对象基板的姿势偏移量; 区域校正步骤，通过使用与该区域对应的失真的平均值来校正指定在曝光对象基板上的每个区域中形成的曝光图案的每个曝光数据; 姿势偏移校正步骤，通过使用获取的曝光对象基板的姿势偏移值来校正在区域校正步骤中校正的曝光数据，以便匹配曝光对象基板的姿态偏移; 以及曝光步骤，通过使用在姿势偏移校正步骤中校正的每个曝光数据直接曝光曝光对象基板。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2008003163A Exposure method and computer program therefor 审中-公开
标题翻译：曝光方法及其计算机程序
公开(公告)号：JP2008003163A
公开(公告)日：2008-01-10
申请号：JP2006170507
申请日：2006-06-20
申请人： Shinko Electric Ind Co Ltd , 新光電気工業株式会社
发明人： YOSHIZAWA KEISUKE , KOYAMA TOSHINORI , AKAGAWA MASATOSHI
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03B27/58 , G03F7/70291 , G03F7/70358
摘要： PROBLEM TO BE SOLVED: To provide an exposure method without causing any resolution failure on a face of an exposure object in a direct exposure device that forms a desired exposure pattern on a face of an exposure object by irradiating the face of the exposure object with light rays through a plurality of spatial light modulation elements, and to provide a computer program therefor. SOLUTION: The direct exposure device forms a desired exposure pattern on the face of the exposure object by irradiating the face of the object with light rays through the plurality of spatial light modulation elements D1, D2, D3 disposed as assigned to the respective irradiation regions defined along a relative moving direction of the exposure object P, in which a predetermined region on the face of the exposure object P located near the boundary T1, T2 of the irradiation regions by the spatial light modulation elements is treated by shifting the exposure object P in a direction perpendicular to the relative moving direction to position the above predetermined region near the center R1, R2 or R3 of the irradiation region and then irradiating the region with light rays through the spatial light modulation elements D1, D2, D3 corresponding to the irradiation region. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种曝光方法，而不会在通过照射曝光的面部在曝光对象的表面上形成期望的曝光图案的直接曝光装置中的曝光对象的面上造成任何分辨率故障通过多个空间光调制元件的光线对象，并提供其计算机程序。解决方案：直接曝光装置通过用分配给相应的多个空间光调制元件D1，D2，D3的多个空间光调制元件D1，D2，D3用光线照射物体的表面，在曝光对象的表面上形成期望的曝光图案沿着曝光对象P的相对移动方向限定的照射区域，其中通过空间光调制元件的照射区域附近位于曝光对象P的边界T1附近的预定区域T2，T2被曝光物体P沿着相对移动方向垂直的方向，以将照射区域的中心R1，R2或R3附近的上述预定区域定位，然后将该区域照射到通过对应于空间光调制元件D1，D2，D3的光线照射区域。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2004152880A Method and device for dividing trapezoid 有权
公开(公告)号：JP2004152880A
公开(公告)日：2004-05-27
申请号：JP2002314663
申请日：2002-10-29
申请人： Shinko Electric Ind Co Ltd , 新光電気工業株式会社
发明人： YOSHIZAWA KEISUKE
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To obtain a method and device for dividing trapezoid for variable forming electron beam exposure by which the frequency of occurrence of very small trapezoidal graphics can be reduced in creating data for exposure. SOLUTION: The device 1 for dividing trapezoid of a variable forming electron beam exposure system is provided with a discriminating means 11 which discriminates the presence of a pair of dividing lines which are faced to each other at an interval smaller than a prescribed size in a combination of dividing lines forming the optimum dividing pattern. The device 1 is also provided with a first dividing means 12 which newly sets a stopper line crossing the pair of dividing lines at right angles, and divides a graphic to be divided into trapezoids by using the stopper line when the discriminating means 11 discriminates that the pair of dividing lines exists; and a second dividing means 13 which divides the graphic to be divided into trapezoids by using the combination of dividing lines forming the optimum dividing pattern when the means 13 discriminates that the pair of dividing lines does not exist. COPYRIGHT: (C)2004,JPO

4. 发明专利

JP2017118067A 配線基板、半導体装置及び配線基板の製造方法审中-公开
公开(公告)号：JP2017118067A
公开(公告)日：2017-06-29
申请号：JP2015255103
申请日：2015-12-25
申请人：新光電気工業株式会社 , Shinko Electric Ind Co Ltd
发明人： KONDO KATSURA , YOSHIZAWA KEISUKE , YOSHINO YUICHI , UCHIYAMA KENTA
IPC分类号： H01L23/12 , H05K3/28 , H05K3/34 , H05K3/46
CPC分类号： H01L23/49816 , H01L21/481 , H01L21/4853 , H01L21/76805 , H01L23/49811 , H01L23/49827 , H01L23/49838 , H01L23/49894 , H01L24/12 , H01L24/16 , H01L2224/16237
摘要：【課題】パッドの狭ピッチ化に容易に対応することができる配線基板を提供する。【解決手段】配線基板10は、最上層の配線層31と、配線層31を被覆するソルダーレジスト層32と、ソルダーレジスト層32を厚さ方向に貫通し、配線層31の上面の一部を露出する貫通孔32Xとを有する。貫通孔32Xは、ソルダーレジスト層32の上面32Aに形成された凹部33と、凹部33の底部に形成された開口部34とが連通されてなる。凹部33の内壁面は曲面に形成されている。開口部34は、凹部33よりも平面形状が小さく形成されている。【選択図】図1

5. 发明专利

JP2014204005A 配線基板、半導体装置及び配線基板の製造方法有权
标题翻译：接线板，半导体器件，接线板制造方法
公开(公告)号：JP2014204005A
公开(公告)日：2014-10-27
申请号：JP2013079781
申请日：2013-04-05
申请人：新光電気工業株式会社 , Shinko Electric Ind Co Ltd
发明人： HARUHARA SATOSHI , YOSHIZAWA KEISUKE
IPC分类号： H05K3/46 , H01L23/12
CPC分类号： H05K1/115 , H01L23/49822 , H01L23/49827 , H01L23/49894 , H01L2224/16225 , H01L2924/15174 , H05K3/4602 , H05K3/4673 , H05K2201/0195 , H05K2201/0209 , H05K2201/09627 , H05K2203/1476
摘要：【課題】歩留まりの低下を抑制することができる配線基板を提供する。【解決手段】配線基板20は、コア基板30の上面30A側に形成された絶縁層61,62と、絶縁層62上に形成された配線層72と、絶縁層62上に積層され、配線層72を被覆し、フィラーを含有する絶縁層64と、絶縁層64上に積層され、フィラーを含有していない絶縁層65とを有する。また、配線基板20は、絶縁層64,65を厚さ方向に貫通するビアV5と、絶縁層65上に積層され、ビアV5を介して配線層72と電気的に接続された配線層81とを有する。【選択図】図1
摘要翻译：要解决的问题：提供能够抑制产量降低的布线基板。解决方案：布线板20包括：形成在芯基板30的上表面30A侧的绝缘层61和62; 形成在绝缘层62上的布线层72; 叠层在绝缘层62上的绝缘膜64覆盖布线层72并包括填料; 以及绝缘层65，其被层压在绝缘层64上，不包括填料。布线基板20还具有贯通绝缘层64和65的厚度方向的通孔V5; 以及层叠在绝缘层65上并通过通孔V5与配线层72电连接的布线层81。

6. 发明专利

JP2008203506A Maskless exposure method and apparatus 审中-公开
标题翻译： MASKLESS曝光方法和装置
公开(公告)号：JP2008203506A
公开(公告)日：2008-09-04
申请号：JP2007039265
申请日：2007-02-20
申请人： Shinko Electric Ind Co Ltd , 新光電気工業株式会社
发明人： YOSHIZAWA KEISUKE
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an exposure method using a structure of moving a stage that mounts an exposure substrate, by which exposure time can be reduced by exposure in a time period matching the degree of pattern roughness to be exposed and to provide an exposure apparatus.
SOLUTION: The exposure apparatus functions to reflect light beams emitting from a light source on a plurality of spatial light modulation elements such as a digital micro device (DMD) and to irradiate a photosensitive material on a substrate (10) mounted on a moving stage with spots (S) of light, wherein the exposure apparatus is equipped with a means of switching the resolution to at least two levels of a first resolution (γ
1 ) for exposure of a fine pattern and a second resolution (γ
2 ) for exposure of a rough pattern, different from the first resolution.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种使用移动安装曝光基板的台架的结构的曝光方法，通过曝光时间可以在与要曝光的图案粗糙度的程度相匹配的时间段内减少曝光时间，并且提供曝光装置。解决方案：曝光装置用于将从光源发射的光束反射在诸如数字微型装置（DMD）的多个空间光调制元件上，并将感光材料照射在安装在具有光斑（S）的移动台，其中曝光装置配备有将分辨率切换到用于曝光精细图案的第一分辨率（γ 1 ）的至少两个水平的装置，以及用于暴露与第一分辨率不同的粗糙图案的第二分辨率（γ 2 ）。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2004153111A Method and device for creating exposure data and computer-readable storage medium 有权
公开(公告)号：JP2004153111A
公开(公告)日：2004-05-27
申请号：JP2002318038
申请日：2002-10-31
申请人： Shinko Electric Ind Co Ltd , 新光電気工業株式会社
发明人： YOSHIZAWA KEISUKE , KAZAMA YOSHIKAZU
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method and a device for creating exposure data by which exposure data for an electron beam exposure system can be created at a high speed by reducing the frequency of occurrence of very small trapezoidal graphics in creating the exposure data, and to provide a computer-readable storage medium. SOLUTION: The device 1 for creating exposure data is provided with a means 11 which sets a margin area including the boundary between adjacent areas with respect to an area specified after a plotted area is divided, and a means 12 which obtains a field by distributing an objective graphic contained in the margin area to the adjacent areas. The method for creating exposure data includes a step of setting the margin area including the boundary between the adjacent areas with respect to the area specified after the plotted area is divided, and a step of obtaining the field by distributing the objective graphic contained in the margin area to the adjacent areas. In addition, the computer-readable storage medium stores the program used for causing a computer to execute the method. COPYRIGHT: (C)2004,JPO

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