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    • 1. 发明专利
    • Exposure apparatus and adjusting method thereof
    • 曝光装置及其调整方法
    • JP2007005459A
    • 2007-01-11
    • JP2005182017
    • 2005-06-22
    • Shinko Electric Ind Co Ltd新光電気工業株式会社
    • KAZAMA YOSHIKAZU
    • H01L21/027G02B7/198G02B26/08G03F7/20
    • PROBLEM TO BE SOLVED: To enable reduction in size of a mechanism for fine adjustment of DMD and for ensuring continuity and adjustment of the adjusting position through utilization of liquid pressure for adjusting position or inclination of digital micro-mirror device (DMD).
      SOLUTION: In the exposure apparatus, the predetermined pattern data to be exposed is inputted to DMD as an electrical signal, a plurality of micro-mirrors are inclined in accordance with a pattern data, the reflected light from the micro-mirror is projected to an exposure object through projection of light to the DMD, and exposure is conducted corresponding to the pattern data. Consequently, location of the DMD is characteristically adjusted using liquid pressure.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了减少DMD的微调机构的尺寸,并且为了通过利用液压来确保调节位置的连续性和调节,以调整数字微镜装置(DMD)的位置或倾斜度, 。 解决方案:在曝光装置中,将要曝光的预定图案数据作为电信号输入到DMD,多个微镜根据图案数据倾斜,来自微镜的反射光为 通过将光投射到DMD而投射到曝光对象,并且对应于图案数据进行曝光。 因此,使用液体压力来特征地调整DMD的位置。 版权所有(C)2007,JPO&INPIT
    • 2. 发明专利
    • Direct exposure apparatus and illumination adjustment method
    • 直接曝光装置和照明调整方法
    • JP2007140166A
    • 2007-06-07
    • JP2005334166
    • 2005-11-18
    • Shinko Electric Ind Co Ltd新光電気工業株式会社
    • KAZAMA YOSHIKAZU
    • G03F7/20H01L21/027H05K3/00
    • PROBLEM TO BE SOLVED: To provide a direct exposure apparatus and an illumination adjustment method capable of accurately and efficiently controlling the illumination of light on an exposure face of an exposure object.
      SOLUTION: The direct exposure apparatus for forming an exposure pattern on a relatively travelling exposure face is equipped with: a liquid crystal shutter which is disposed between a digital micromirror device (DMD) and the exposure face and has a controllable transmittance distribution for light and which comprises microshutters arranged in a matrix, each as a minimum unit having individually controllable transmittance and corresponding one-to-one with micromirrors arranged in a matrix in the DMD; and a controlling means for controlling the transmittance distribution for light of the liquid crystal shutter. The controlling means controls the transmittance of each microshutter in the liquid crystal shutter to irradiate a scanning track, in terms of the illumination of light at a position corresponding to an exposure face preliminarily measured prior to the exposure, in such a manner that a cumulative illumination value obtained by integrating illumination by each scanning track along the relative travelling direction is equal to the minimum cumulative illumination value.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种能够准确有效地控制曝光对象的曝光面上的光的照射的直接曝光装置和照明调节方法。 解决方案:用于在相对行进的曝光面上形成曝光图案的直接曝光装置配备有:液晶快门,其设置在数字微镜装置(DMD)和曝光面之间,并且具有可控的透射率分布 光,其包括以矩阵形式布置的微通孔,每个具有单独可控的透射率的最小单位,并且在DMD中以矩阵形式布置有微镜对应的一对一; 以及用于控制液晶快门的光的透射率分布的控制装置。 控制装置控制液晶快门中的每个微型摆动器的透射率,以照射在与曝光前预先测量的曝光面相对应的位置处的光的照明的扫描轨迹,使得累积照度 通过沿着相对行进方向对每个扫描轨道进行的照明而得到的值等于最小累积照明值。 版权所有(C)2007,JPO&INPIT